快中子辐照直拉硅中受主和施主的研究

通过傅里叶红外光谱、正电子湮没寿命谱和Hall技术研究了高剂量快中子辐照直拉硅的辐照 缺陷、电阻率、载流子迁移率、载流子浓度随退火温度的变化.经快中子辐照，直拉硅样品 的导电类型由n型转变为p型.在450和600℃热处理出现两种受主中心，分别由V2_{2O22，V22O，VO22，V-O-V及V44型缺 陷引起，这些缺陷态的出现使得样品中空穴浓度迅速增加；大于650℃热处理这些受主态 缺陷迅速消失， 关键词： 快中子辐照 空位型缺陷 受主 施主}     

等离子体氧轰击硅生成缺陷的研究

本文对等离子体氧轰击硅产生的缺陷进行了研究。发现等离子体氧轰击在硅中引入两个缺陷E₁(E_c—0.46eV)及E₂(E_c—0.04eV)。测量了缺陷的光电离截面谱,分析表明,缺陷E₂的电子声子相互作用很强,其Frank-Condon移动达0.76eV,缺陷E₁的电子声子相互作用较小,其Frank-Condon移动为0.04eV。由实验结果得到与缺陷E₁、E₂相耦合的声子模分别为hω_p⁽¹⁾=28meV,hω_p⁽²⁾=20meV。 关键词：     

(Bi,Pb)2Sr2Ca2Cu3Oy单相样品的超导电性与载流子浓度

对(Bi,Pb)₂Sr₂Ca₂Cu₃O_y单相样品进行不同条件下的热处理,通过X射线衍射、电阻-温度关系、交流磁化率,以及Hall系数等测量,发现样品均具有较好的单相性,随着热处理条件的变化,其超导转变中点温度(T_c)有规律地分布在100—110K之间,T_c随载流子浓度(n_H)的增加而升高。实验结果表明,热处理条件对样品的相结构、超导 关键词：     

Li2Mo2O6多晶材料的结构与电性能的研究

本文用固相反应烧结制备出Li₂Mo₂O₆多晶材料。经X射线分析、红外光谱和电子顺磁共振谱(EPR)的研究,确定了它的结构是Li₂Mo₂O₄和MoO₂两个晶相组成的烧结体。钼离子以四价状态存在于MoO₂晶相结构中。采用交流阻抗谱分析了晶界与温度变化的相关性。测得了样品的ln(σ_总T)-1/T 曲线是由两段直线和一段曲线所组成;总电导率化能σ_27℃=1.36×10^-3(Ω·cm)^-1,σ_115℃=1.49×10^-3(Ω·cm)^-1,σ_300℃=9.71×10^-3(Ω·cm)^-1,σ_370℃=2.42×10^-3(Ω·cm)^-1;电导活化能E₁=0.043eV,E₂=0.235eV,E_平均=0.76eV。采用维格纳极化电池法测得电子电导率σ_e,σ_e27℃=2.240×10^-5(Ω·cm)^-1,σ_e300℃=4.476×10^-3(Ω·cm)^-1。实验证明,室温下材料为固体电解质,300℃附近为良好的离子与电子混合导体。 关键词：     

GaP(N,Te,Zn)的静压光致荧光研究

对GaP(N,Te,Zn)样品做了77K的静压光致荧光研究。得到了N,NN₁,NN₃束缚激子能级的压力系数,以及施主Te和中性施主Te的束缚激子能级的压力系数。讨论了这些能级随压力的变化行为,并首次观察到Gap中自由激子的零声子发射。 关键词：     

电子辐照硅层中缺陷能级的研究

用12MeV电子辐照硅p⁺n结,在硅中除引入氧空位E₁(E_c-0.19eV),双空位E₂(E_c-0.24eV)和E₄(E_c-0.44eV)外,还引入缺陷E₃(E_c-0.37eV)。用DLTS方法和反向恢复时间测量研究了这些能级的退火行为,可以看到,E₃的退火温度最高(≈520℃)。由退火特 关键词：     

液相外延GaAs1-xPx混晶的光学声子、等离子体激元和LO声子-等离子体激元耦合模

在40—700cm^-1波数和4.2—300K温度范围内研究了不同组份液相外延n型CaAs_1-xP_x样品的红外反射谱。对反射谱进行了赝谐振子拟合与K-K关系计算。从而获得了有关描述CaAs_1-xP_x样品的光学声子模、等离子体激元、LO声子-等离子体激元耦合模的重要物理参量及红外光学常数信息。基于这些计算结果,提出了双导带谷并计及与X能谷相联系的施主能级模型,用它解释等离子体激元频率和实验观察的三支主要的耦合模的温度变化规律。 关键词：     

n型Bi2Te3基化合物的类施主效应和热电性能

晶粒细化是提高Bi₂Te₃基热电材料力学性能的重要方法,但晶粒细化过程中伴随的类施主效应严重劣化了材料的热电性能,并且一旦产生类施主效应,就很难通过简单的热处理等工艺消除.本文系统研究n型Bi₂Te₃基化合物烧结前粉体颗粒尺寸对材料类施主效应和热电性能的影响规律.随着颗粒尺寸减小,氧诱导的类施主效应明显增强,载流子浓度从10 M烧结样品的3.36×10¹⁹ cm^-3急剧增加到120 M烧结样品的7.33×10¹⁹ cm^-3,严重偏离最佳载流子浓度2.51×10¹⁹ cm^-3,热电性能严重劣化.当粉体颗粒尺寸为1—2 mm时,烧结样品的Seebeck系数为–195 μV/K,载流子浓度为3.36×10¹⁹ cm^-3,与区熔样品沿着ab面方向的Seebeck系数为–203 μV/K和载流子浓度为2.51×10¹⁹     

GaAs中N等电子陷阱的研究

对离子注N的GaAs样品作了77K的静压光致荧光研究。观察到了N陷阱中心元胞势束缚激子N_x的发光光谱及畸变势束缚激子N_T的发光峰。测量N_X能级的压力系数为2.8meV/kbar,常压下N的共振态高于导带边179meV。讨论了N等电子陷阱的电声子耦合强度及有效束缚激子半径随压力的变化关系。 关键词：     

YBa2Cu3O6+δ的高频模及其随氧含量δ的变化

在中国原子能科学研究院新建的宽角(～30°)Be过滤探测器中子非弹性散射谱仪上,在入射中子能量从10直至150meV的范围内,测量了几种不同氧含量的YBa₂Cu₃O_6+δ样品的中子非弹性散射能谱。结果表明:(1)在δ=0和0.2时,在60至150meV能量范围内,发现有强的高频模存在,当其温度高到Nel点(～410K)以上直至466K时,没有观察出高频模强度的减弱。而δ=0.78和0.97时,在75至150meV能量范围内,散射强度在测量误 关键词：     

Temperature dependance of the fundamental absorption edge in CdTe

Optical measurements made on CdTe put in light an extrinsic transition previously used to determine the interband edge of this compound. The donor level involved has a depth of 30 meV inside the bandgap at 77°K and of 60meV at 300°K. The value obtained for its temperature coefficient, suggests an association of this level with the L minimum of the conduction band.Also, determined is the true optical bandgap of CdTe between many conflicting results. One obtains: E_g = 1.529 meV with a temperature coefficient of ?3.10^?4eV/°K.     

Heat treatment effects on the structural and electrical properties of thermally deposited AgIn5S8 thin films

The heat treatment effects on structural and electrical properties of thermally deposited AgIn₅S₈ thin films have been investigated. By increasing the annealing temperature of the sample from 450 to 500 K, we observed a change in the crystallization direction from (420) to (311). Further annealing of the AgIn₅S₈ films at 550, 600 and 650 K resulted in larger grain size in the (311) preferred direction. The room temperature electrical resistivity, Hall coefficient and Hall mobility were significantly influenced by higher annealing temperatures. Three impurity levels at 230, 150, and 78 meV were detected for samples annealed at 350 K. The electrical resistivity decreased by four orders of magnitude when the sample annealing temperature was raised from 350 to 450 K. The temperature dependent electrical resistivity and carrier concentration of the thin film samples were studied in the temperature ranges of 25-300 K and 140-300 K, respectively. A degenerate-nondegenerate semiconductor transition at approximately 180 was observed for samples annealed at 450 and 500 K. Similar type of transition was observed at 240 K for samples annealed at 600 and 650 K.     

Excitation spectra of self-activated luminescence in ZnSe crystals under pressure

A narrow excitation band observed for S-A luminescence in ZnSe crystal is attributed to free exciton absorption. Some overlap with a higher characteristic band of low intensity is considered for low temperature spectra.This band shifts under pressure toward higher energies with a coefficient dE/dP = (7.5±0.3) meV Kb^-1 at 300 K and (7.4±0.5) meV Kb^-1 at 85 K.The pressure shift of the excitation due to edge absorption is (7.0± 0.5) meV Kb^-1.     

A PTIS study of quenched-in acceptors in germanium

The shallow acceptors produced in germanium crystals by quenching from 820–925 C have been studied for the first time using Photo-Thermal Ionization Spectroscopy (PTIS). We have found two acceptor-continua, which correspond to the E_v + 8.4 meV and E_v + 12 meV levels observed in earlier Hall measurements. With the lower energy continuum there are associated two previously unobserved hydrogenic acceptors. They are shallower than any known acceptor in germanium: their ionization energies are 8.69 ±0.01 meV and 9.48 ±0.01 meV. We attribute the acceptors to two different defects because of differences in their creation and annealing behaviour. No discrete lines were found to be associated with the higher energy continuum. We estimate the acceptor ionization energy to be about 14 meV. Finally, we have observed a number of as yet unexplained negative lines superimposed on both acceptor-continua.     

DX-Like behavior of Se-impurity centers in gasb under hydrostatic pressure

Abstract

Hall coefficient (R_H) and electrical resistivity measurements have been performed as a function of temperature (between 77 K and 300 K) and under hydrostatic pressures (up to 15 kbar) on a set of Se-doped GaSb samples with impurity concentrations in the range 8×10¹⁷ cm^?3 - 1×10¹⁸ cm^?3. With increasing pressure at 300 K, the electrons are strongly trapped into a resonant impurity level. The pressure induced occupation of this level leads to time-dependent effects at T<120 K. The activated thermal electron emission over a potential barrier E<sb>B = 300×30 meV gives clear evidence for a large lattice relaxation around the impurity centers characteristic for DX-like behavior.     

DLTS and PTIS of new donors in oxygen-doped germanium

Two new DLTS bands I and II have been observed in n-type germanium containing 10¹⁶ cm^-3 interstitial oxygen. The signature of II is: E_c?E_II = 0.031 eV, K = 4 × 10⁷ cm^?2s^?1; level I is about half as deep. In addision, the excitation spectrum of I is recorded by PTIS. It is composed of three hydrogenic donor series Ia, b, c with activation energies 17.25, 17.6 and 18.1 meV. The donors I and II are thought to correspond with the well known thermal oxygen donors. Energies for the latter were determined at 0.017 and 0.04 eV from Hall effect by Fuller and Doleiden. The possibility of double donors is examined, in analogy with the case of oxygen donors in silicon.     

Galvanomagnetic measurements on n- and p-type α-tin electron-irradiated at 5 K

Galvanomagnetic measurements were obtained for pure and doped n- and p-type α-tin filaments irradiated by 1 MeV electrons at ～ 5 K. Variations in the Hall coefficient for highly degenerate samples were in qualitative agreement with theory. Carrier removal rates are reported; changes in these as a function of the initial position of the Fermi level indicate the presence of donor defect sites near E_F = 0 and acceptor defect sites deeper in the valence band. Isochronal annealing data have been obtained.     

Thermoelectric properties of Bi-Sb semiconducting alloys prepared by quenching and annealing

Bi_100−xSb_x (x=8-17) alloys were prepared by direct melting of constituent elements, which was followed by quenching and annealing. The synthesis of high-homogeneity alloys was confirmed by X-ray diffraction, differential thermal analyses and electron microprobe analysis. The semiconducting and thermoelectric properties of the samples were investigated by measuring Hall coefficient, electrical resistivity and Seebeck coefficient in the temperature range from 20 to 300 K for both the as-quenched and annealing samples. The properties change gradually with the Sb concentration x, which is attributed to the variation of the energy gap. The Hall mobility was enhanced by annealing, which leads to a small electrical resistivity and a large Seebeck coefficient. Consequently, large values of about 8.5 mW/mK² for the power factor were obtained in the annealed alloys of x=8,12, and 14.     

Color centers in neutron-irradiated Y3Al5O12, CAF2 and LiF single crystals

The thermal annealing behavior of the Y₃Al₅O₁₂, CaF₂ and LiF single crystals bombarded at Algiers with reactor neutrons has been monitored by optical absorption spectroscopy. The irradiation was performed at about 315 K. On heating samples after irradiation, the optical absorption bands decrease and disappear completely at 873 and 523 K in the case of Y₃Al₅O₁₂ and CaF₂, respectively. Activation energies of 1.2±0.02 and 0.9±0.2 eV are estimated for Y₃Al₅O₁₂ and CaF₂, respectively. On the other hand, the LiF crystal shows a complex annealing behavior. Here, the optical absorption spectrum presents different shapes after each annealing temperature. Four steps are distinguished and discussed on heating samples from 300 to 673 K. Above 673 K, the absorption drops by about 50%; it completely disappears at 773 K.     

Electrical properties of n-type Si layers doped with proton bombardment induced shallow donors

Sheet Hall coefficients and resistivities of n-type Si layers doped with shallow donors produced by proton bombardment have been measured between 35 and 300°K. The donor ionization energy is (26 ± 1) meV. The donor concentration profile has been determined.