GaAs1-xPx:N束缚激子的压力行为

本文研究了77K温度下GaAs_0.15P_0.85:N样品的静压光致发光。在P>10kbar时,可清楚地观察到NN₁的发光。同时,观察到压力下N_x带发光猝灭及谱带窄化现象。结果表明,压力效应明显地加强了N_x→NN₁的热助能量转移过程。对N_x能级和NN₁能级的压力行为进行了分析和拟合计算,得到相应能级的压力系数及波函数中各能谷的有关参数。 关键词：     

GaAs中N等电子陷阱的研究

对离子注N的GaAs样品作了77K的静压光致荧光研究。观察到了N陷阱中心元胞势束缚激子N_x的发光光谱及畸变势束缚激子N_T的发光峰。测量N_X能级的压力系数为2.8meV/kbar,常压下N的共振态高于导带边179meV。讨论了N等电子陷阱的电声子耦合强度及有效束缚激子半径随压力的变化关系。 关键词：     

GaP和GaAs1-xPx中N束缚激子压力行为的理论计算

本文在Koster-Slater单带位势近似下对GaP和GaAs_1-xP_x中N等电子中心束缚激子的压力行为与能带结构的关系进行讨论与分析,得到杂质态压力系数的一个近似的解析表达式,并对N和NN_i中心能级的压力关系进行计算。同时,给出NN_i中心配位的一组新的指认。 关键词：     

1.8—4.2K GaAs1-xPx注N+,注Zn+光荧光谱

本文研究了1.8—4.2K下离子注N,注ZnGaAs_1-xP_x样品的光致发光行为。实验结果表明由N-Zn跃迁完全转变到N束缚激子复合的x值依赖N,Zn的浓度。利用Campbell局域化模型计算了N-Zn跃迁与N束缚激子复合的几率比。这一几率比是组分x和N-Zn浓度的函数。在1.8K,在同一样品上我们清晰地观测到对应N-Zn跃迁与N束缚激子复合的光谱。 关键词：     

GaAsP混晶中的DX中心

用高分辨率深能级瞬态谱、光照深能级瞬态谱及光电容谱方法,对不同组份的掺Te的GaAsP混晶进行了实验研究,结果表明,所有被测样品中同时存在三种施主深能级,其热发射激活能各为0.18,0.28,0.38eV.通过仔细测量与分析它们的电学和光学性质后,认为它们是由Te施主杂质形成的三种类DX中心,可能对应于Te运动会替位施主的不同原子构形. 关键词：     

ZnS中Te等电子中心的时间分辨光谱研究

用时间分辨光谱研究了很大的Te组分范围内的ZnS_1-xTe_x（x=00 05—085）合金的发光动力学特性，结果表明：不同形态的Te等电子中心具有不同的辐射复 合寿命，从几个ns到几十个ns的范围内变化，当x＝015左右时，寿命达到最大值（约 40ns）.其物理机理源于不同的Te等电子中心具有不同的局域化特性.当Te组分较小时，等 电子中心从Te₁逐渐演变到Te₂，Te₃或Te₄ 时，相应发光寿命增加，表现出不断增强 的激子发光局域化特性；而当Te组分较大时，Te原子团变得较大，其局域势与基体原子势的 相互作用增强，等电子中心的局域化特性减弱，而基体价带扩展态特征变得明显起来，相应 发光寿命逐渐减小.还研究了激子束缚能随Te组分的变化以及发光强度随温度的变化关系， 所得结果进一步支持了时间分辨光谱研究所得到的结论. 关键词： ZnS 等电子中心 时间分辨光谱 局域态     

硅中热施主的电子结构

利用20—300K的Hall系数测量和6-300K的红外光吸收,研究了含氧P型CZ硅单晶经450℃不同时间热处理后所产生的热施主问题。Hall系数测量表明:经100hr热处理的样品存在两个施主能级:E₁=58meV,E₂=110meV。对不同热处理时间的样品,从低温红外光吸收则可看见由于热施主所引起的复杂吸收光谱。这些吸收峰的数目随着热处理时间的加长而增加和加强。利用类氢模型和有效质量理论拟会和计算,可以证明与氧有关的热施主很可能是双重电荷施主。这些双重施主有多种组态,它与450℃热处理的时间有关。 关键词：     

磁场和量子点尺寸对激子性质的影响

在In_0.6Ga_0.4As/GaAs量子点中,采用一维等效势模型和有限差分法理论计算了激子态的性质,得到了激子跃迁能和束缚能随磁场、横向束缚强度以及量子点尺寸的变化关系.结果表明:加入磁场后,Zeeman效应使得激子的能级简并度解除,激子的基态跃迁能与实验符合得很好;横向束缚强度或磁场强度的增加使得激子的束缚增强;量子点的尺寸对激子的束缚产生重要的影响;通过电子-空穴间平均距离以及激子体系波函数分布图像分析了其产生的物理机制.     

Si中Au受主能级的流体静压力移动

用恒温的瞬态电容法测量了各向同性流体静压力P下,Si中Au受主能级E_T的压力系数。在0—8kbar压力范围内,(?(E_c-E_T))/(?P)=-1.9meV/kbar。该能级对电子俘获截面在实验误差范围内与压力无关。以上数据与文献[13]报道的Si中Au受主深能级在单轴应力下的压力系数作了比较。结果说明该深能级缺陷势不具有T_d对称性,因此Si中Au受主能级看来并不来源于简单的Si中Au替位或间隙组态。 关键词：     

砷化镓铝间接带的发光

研究了掺Sn,Te或Zn杂质的Al_xGa_(1-x)As发光,其中Al组份多,因此谱带跃迁是间接的。观察到属于激子、自由束缚载流子和施主—受主复合的几个发光带。实验数据得出Sn和Te施主“光学”离化能的范围在59±7meV;而对Zn受主则为56±5meV。得到的这些数值是和 AlAs中的类似。     

GaP:N photoluminescence at high nitrogen concentrations

The increase of nitrogen concentration considerably affects the 1.6°K photoluminescence spectra of very heavily doped GaP:N. The first moment of the spectral emission shifts towards the red, while the ratio of the intensities of large-momentum phonon replicas of A, NN₃ and NN₁ lines to the no-phonon lines increases. An explanation is proposed in terms of overlapping of the bound exciton wave functions.     

Method of low-temperature optical measurements with diamond anvil cells

Abstract

Constructions of a cryogenic diamond anvil system with mechanical clamping press and helium pressure medium for microscopic optical studies are described. Low temperature nonmagnetic cells ø40 and ø20 mm have been developed. GaP samples doped with S, Te and isoelectronic impurities N, NN have been investigated up to 20 GPa at 1.5-300K.     

On the possibility of stimulated emission in GaP : N

The luminescence decay times of NN_i-pair emission are found to decrease when the photoexcitation density is increased from several W/cm² to 10⁶–10⁷ W/cm². For lightly N-doped GaP, the reduction is typically from 3000 to 30 nsec (A-line, low temperature); for heavily N-doped GaP it is from about 1000 nsec to a few nanoseconds. From this decay time reduction the onset of a new recombination mechanism is concluded. No mechanism is likely to explain previously reported high gain values for GaP : N.     

Theory for the binding energies of the first-row,deep donors in GaP and Si

Substitutional oxygen in GaP is known to be a very deep, non-effective-mass-like donor, capable of binding one or two electrons. No conclusive experiment exists for substitutional N in Si. In this paper, the recently developed Pseudo Impurity Theory is applied to these cases. Without employing any adjustable parameters, the two levels of GaP:O_P are predicted in good agreement with experiment. Si:N is predicted to behave in a similar way. The implications of these results are discussed.     

Hg1-xCdxTe n+-p光电二极管中的深能级及其电流机构的流体静压力研究

在流体静压力(0—2GPa)下,对Hg_1-xCd_xTe n⁺-p光电二极管(x=0.5)室温电学特性进行了实验和理论研究。通过考虑深能级压力效应及其对深能级辅助隧道电流的影响,较好地解释了实验上观察到的p-n结伏安特性在小偏压范围下呈现的“反常”压力关系。由对实验数据的理论拟合得到两个深能级:D₁(=E_v+0.75E_g)和D₂(=E_v关键词：     

Identification of the tellurium donor at the residual level in GaAs

Lightly tellurium doped epilayers have been grown by the AsCl₃GaH₂ technique. The position of the residual donors and of the Te donor have been determined by the high resolution photoluminescence technique and the position of the Te donor is found to be coincident with that of the a-donor reported by Cooke et al. within experimental uncertainty.     

Electronic structure and structural phase stability of CuAlX2 (X=S, Se, Te) under pressure

The electronic and structural properties of chalcopyrite compounds CuAlX₂ (X=S, Se, Te) have been studied using the first principle self-consistent Tight Binding Linear Muffin-Tin Orbital (TBLMTO) method within the local density approximation. The present study deals with the ground state properties, structural phase transition, equations of state and pressure dependence of band gap of CuAlX₂ (S, Se, Te) compounds.Electronic structure and hence total energies of these compounds have been computed as a function of reduced volume. The calculated lattice parameters are in good agreement with the available experimental results. At high pressures, structural phase transition from bct structure (chalcopyrite) to cubic structure (rock salt) is observed. The pressure induced structural phase transitions for CuAlS₂, CuAlSe₂, and CuAlTe₂ are observed at 18.01, 14.4 and 8.29 GPa, respectively. Band structures at normal as well as for high-pressure phases have been calculated. The energy band gaps for the above compounds have been calculated as a function of pressure, which indicates the metallic character of these compounds at high-pressure fcc phase. There is a large downshift in band gaps due to hybridatization of the noble-metal d levels with p levels of the other atoms.     

Sputtering of A 3 B 5 materials (GaP, GaAs, GaSb, InP, and InSb) by 2-to 14-keV N 2 + ions

Investigations of the general characteristics and distinctive features of sputtering of A ³ B ⁵ materials (GaP, GaAs, GaSb, InP and InSb) under bombardment with N ₂ ⁺ ions have been carried out. From the experimental data, dependences of the sputtering yield of these materials on the incidence angle and ion energy have been obtained and the surface relief patterns produced by target etching have been studied. It has been shown that the dependence on energy of the sputtering yield for GaP, GaAs, and InP can be adequately described by the Haffa-Switkovski formula for binary materials and Yudin’s approximation for elemental targets. Sputtering of GaSb and InSb proceeds in the surface layer recrystallization mode, and the sputtering yield agrees with calculations based on Onderlinden’s model. From a comparison of the experimental and calculated dependences, the surface bonding energies have been determined.