气体滞留时间对高速沉积的微晶硅薄膜性能的影响分析

实现高速沉积对于薄膜微晶硅太阳电池产业化降低成本是一个重要手段.采用超高频等离子体增强化学气相沉积(VHF-PECVD)技术，实现了微晶硅硅薄膜的高速沉积，并通过改变气体总流量改变气体滞留时间，考察了气体滞留时间在化学气相沉积(CVD)过程中对薄膜的生长速率以及光电特性和结构特性的影响.采用沉积速率达到12?/s的高速微晶硅工艺制备微晶硅电池，电池效率达到了5.3％. 关键词： 气体滞留时间 高速沉积 微晶硅 超高频等离子体增强化学气相沉积     

用SiCl4/H2气源沉积多晶硅薄膜光照稳定性的研究

对以SiH₄/H₂及SiCl₄/H₂为源气体、采用 等离子体增强化学气相沉积技术制备的非晶硅薄膜和多晶硅薄膜进行了光照稳定性的研究.实验表明，制备的多晶硅薄膜并没有出现 非晶硅中的光致衰减现象，其光电导、暗电导在光照过程中没有下降反而有所上升且电导率 变化快慢受氢稀释度的制约.多晶硅薄膜的光照稳定性可能来源于高的晶化度及Cl元素的存在. 关键词： 多晶硅薄膜 稳恒光电导效应 晶界 光致衰退效应     

氢稀释对高速生长纳米晶硅薄膜晶化特性的影响

以SiH₄与H₂为气源,采用射频等离子体增强化学气相沉积技术,在较高的压强(230Pa)下,研究氢稀释率对纳米晶硅薄膜的生长速率和晶化特性的影响. 实验表明,薄膜的晶化率,晶粒尺寸随着氢稀释率的提高而增加,当氢稀释率为99%,薄膜的晶化率接近70%. 而沉积速率却随着氢稀释率的减小而增加,当氢稀释率从99%减小到95%时,薄膜的沉积速率由0.3nm/s 增加至0.8nm/s. 关键词： 纳米晶硅薄膜 氢稀释 晶化率 硅烷     

H2对Ar稀释SiH4等离子体CVD制备多晶硅薄膜的影响

以SiH₄，Ar和H₂为反应气体，采用射频等离子体化学气相沉积方法在300℃下制备了低温多晶Si薄膜.实验发现，反应气体中H₂的比例是影响薄膜结晶质量的重要因素，在适量的H₂比例下制备的多晶Si薄膜具有结晶相体积分数高，氢含量低，生长速率快、抗杂质污染等特性. 关键词： 低温多晶Si薄膜 等离子体CVD 4')" href="#">Ar稀释SiH₄ 2比例')" href="#">H₂比例     

大气压等离子体辅助多晶硅薄膜化学气相沉积参数诊断

本文采用发射光谱法诊断了大气压下Ar气、SiCl₄及H₂气混合气体（Ar/SiCl₄/H₂）射频放电等离子体射流特性.利用Si原子谱线强度计算了电子激发温度并以此估算了Si原子数密度,研究了射频功率及气体流量对电子激发温度和Si原子数密度以及SiCl₄解离率的作用. 关键词： 大气压等离子体射流 发射光谱 电子激发温度 多晶硅薄膜沉积     

射频激发热丝化学气相沉积制备硅薄膜过程中光发射谱的研究

采用射频(rf)激发,在热丝化学气相沉积(HWCVD)制备微晶硅薄膜的过程中产生发光基元,测量了rf激发HWCVD (rf-HWCVD)的光发射谱,比较了相同工艺条件下rf-HWCVD和等离子体增强CVD(PECVD)的光发射谱,分析了rf功率、热丝温度和沉积气压对rf-HWCVD光发射谱的影响.结果表明,在射频功率<0.1W/cm²时,rf-HWCVD发射光谱反映了HWCVD高的气体分解效率和高浓度原子氢的特点,能够解释气压变化与微晶硅薄膜微结构的关系,是研究HWCVD气相过程的有 关键词： HWCVD OES 微晶硅     

HW-MWECR-CVD法制备氢化微晶硅薄膜及其微结构研究

用热丝辅助微波电子回旋共振化学气相沉积方法制备出高晶化体积分数的氢化微晶硅(μc-Si:H)薄膜.拉曼散射和X射线衍射技术对样品的微观结构测量分析表明，当反应气体中SiH₄浓度在3.6%—50%之间大范围变化时，μc-Si:H薄膜均具有高的晶化体积分数.进一步的分析表明，在SiH₄浓度较大时制备的薄膜，其结构以非晶-微晶的过渡相为主.薄膜易于晶化或生长为过渡相的主要原因是微波电子回旋共振使SiH₄气体高度分解，等离子体高度电离. 关键词： 微波电子回旋共振化学气相沉积 氢化微晶硅薄膜 拉曼散射 X射线衍射     

微晶硅薄膜的表面粗糙度及其生长机制的X射线掠角反射研究

采用等离子体增强化学气相沉积技术沉积一系列处于不同生长阶段的微晶硅薄膜.通过同步辐射X射线掠角反射技术研究微晶硅薄膜的表面粗糙度随时间等的演化，探讨微晶硅薄膜的生长动力学过程及其生长机制.研究结果表明，在衬底温度为200 ℃，电极间距为2 cm，沉积气压为6.66×1０² Pa，射频功率密度为0.22 W/cm²，氢稀释度分别为99%和98%的沉积条件下，在玻璃衬底上生长的微晶硅薄膜生长指数β分别为0.21±0.01和0.24±0.01.根据KPZ模型，微晶硅薄膜的生长机制为有限扩散生长. 关键词： X射线掠角反射 微晶硅薄膜 表面粗糙度 生长机制     

p种子层对单室制备微晶硅电池性能的影响

采用单室等离子体化学气相沉积技术沉积pin微晶硅电池时,硼污染降低了本征材料的晶化率并影响了p/i界面特性.针对该问题文中采用p种子层技术,即在沉积p层后采取高的H₂/SiH₄比率及适当的功率又沉积一个薄的p层,初步研究了p种子层对微晶硅i层纵向均匀性及电池性能的影响.实验结果表明：采用此方法能改善p/i界面特性,提高本征材料纵向结构的均匀性并降低硼对本征层的污染,有效地提高单结微晶硅电池的性能.最后,通过优化沉积条件,制备得到光电转换效率为881%（1 cm 关键词： 单室 甚高频等离子体增强化学气相沉积 微晶硅太阳电池 p种子层     

电子回旋共振等离子体增强化学气相沉积a-CFx薄膜的化学键结构

使用CHF₃和C₆H₆混合气体做气源,在一个电子回旋共振等离子体增强化学气相沉积装置中制备了氟化非晶碳(a-CF_x)薄膜.利用发射光谱研究了等离子体中形成的各种碳氟、碳氢基团随放电宏观参量的变化规律,对薄膜做了傅里叶变换红外光谱和X射线光电子能谱分析,证实等离子体中的CF₂,CF和CH基团是控制薄膜生长、碳/氟成分比和化学键结构的主要前驱物 关键词： 氟化非晶碳薄膜 电子回旋共振等离子体     

Pathways in the molecular fragmentation for the C2H5OH/He electrical discharge

ABSTRACT

This study focuses on the glow discharge generated with a gases mixture of Ethanol (C₂H₅OH) and Helium (He), at different concentrations maintained at a total pressure of 2.0 Torr. We used optical emission spectroscopy (OES) to analyze the discharge mixture at different concentrations of Helium. Single Langmuir probe data was used to determine the Electron Energy Distribution Function (EEDF). For the total C₂H₅OH/He mixture plasma concentrations, the EEDF has a Maxwellian distribution function. A decrease in He concentration results in significant changes in the EEDF, this behavior is related to the increase in the C₂H₅OH percentage must increase the energy loses of the electrons in the inelastic collision with C₂H₅OH producing a significant change in the EEDF, therefore, the EEDF pattern results in an increase of electron–molecule reaction rates. The rise in electron temperature for increasing Helium percentage is explained by the decreasing electron energy loss in the inelastic collisions with C₂H₅OH molecule. It observes a decrease of electron density ne as a function of the Helium percentage, which can be related to the ratio between ionization cross sections of Helium and C₂H₆O molecule. The active species are generated in the electron-molecule processes, which are associated with electron impact dissociation of C₂H₅OH and Helium electronic impact excitation in the gas phase. The emission optical spectra (OES) show changes in the intensity of the most important peaks of the plasma mixture, which indicates the dependence in the formation of the plasma as a function of the percentage of the gases. The changes in the intensities of the same observed species are due to different processes of excitation and ionization energies of the system, in addition to the increase of He metastable states He I. Hydrogen is the main product obtained from the decomposition of C₂H₅OH.     

Bipolar atmospheric-pressure corona discharge in a He/H2 mixture

Results are presented from a study of the characteristics of a steady-state plasma in a He/H₂ mixture at high pressures. The plasma is formed in the outer region of a multielectrode corona discharge. It is shown that molecules of helium hydride form in such a medium, and their decomposition is accompanied by continuum emission in the 350–650 nm region. The corona discharge is distributed over the length and can be used in systems for the transverse electric circulation of the working medium of atmospheric-pressure plasma radiation sources. The reference spectra of the plasma emission and the dependence of the relative intensity of the lines and the brightness of the bands of He ₂ ^* on the value of the discharge current, pressure, and composition of the working mixture are investigated. Zh. Tekh. Fiz. 69, 33–37 (July 1999)     

Optical characterization of atmospheric‐pressure plasma needle

The atmospheric‐pressure plasma needle is a promising source that can be used efficiently for different industrial applications. A radio frequency (RF) (13.56 MHz) generator was used to generate a He–O₂/Ar mixture plasma. The ground‐state oxygen atomic density [O] was calculated as a function of discharge parameters by “actinometry”. The Ar‐I (2p₁ → 1s₂) line at 750 nm and the O‐I (³P → ³S) line at 844 nm were used to estimate the [O] atomic density. The rotational temperature T _R of He–O₂/Ar mixture was measured from the rotational levels of the “first negative system” (FNS) by using the “Boltzmann plot”. The effect of discharge parameters on the atomic oxygen density [O] and the gas temperature was monitored. These results show that [O] density increases with RF power and O₂ concentration, but decreases with the gas flow rate. Whereas the gas temperature increases with increase in the input RF power, it decreases with increase in the gas flow rate and O₂ concentration in the mixture. Since the [O] atomic density contributes to plasma‐based biomedical applications, the proposed optimum conditions for plasma‐based decontamination of heat‐sensitive materials in the present study are 0.6% oxygen, 500 sccm flow rate, and 26 W RF power.     

a-C∶H(N)薄膜结构的X射线光电子能谱分析

采用直流-射频等离子增强化学汽相沉积技术制备a-C∶H(N)薄膜，用X射线光电子能谱研究了混合气体中N₂含量对薄膜成分与结构的影响.a-C∶H(N)薄膜中含氮量可达9.09%.对a-C∶H(N)薄膜的C1s和N1s结合能谱的分析表明a-C∶H(N)薄膜的结构是由C₃N₄相镶嵌在sp²键结合的CN_x基体中组成.其中C₃N₄相中N和C原子比接近4∶3，不随薄     

The double M-effect induced by noble gases activated with negative ions

The M-effect (monochromatization-effect) is a powerful tool which can give high intensity monochromatic spectra with a certain wavelength depending on the type of used gas mixtures to generate plasma state. The effect consists in the emission of a single spectral line of plasmas ignited in certain gas mixtures. The main condition to obtain the M effect is the presence of an electropositive and an electronegative gas mixture. For example, in the case of Ne+H₂ monochrome radiation was obtained, the wavelength of Ne being 585.3 nm (1s²–2p⁵). In this paper we prove the general character of this effect, i.e. if the optical emission spectra reduced to nearly one line can be observed also in other gas mixture discharges, for example in the case of one electronegative gas and two electropositive gases. Different other mixtures, as Xe+Ne+H₂ and Xe+Ar+H₂ have been studied. In all these cases, the M-effect appeared without doubt.     

Diagnostics of a Compact Discharge-Pumped XeCl Laser with BCl3 Halogen Donor

The results of a comprehensive study of a compact UV-preionized XeCl laser are presented. The subjects of this study were: discharge voltage and current measurements, dye laser probing of the active medium, and the mass spectrometry of gas mixture degradation products. It is shown that the gas lifetime was significantly improved when the laser was operated with BCl₃ as a halogen donor instead of commonly used HCl. By the dye laser absorption and gain probing, the temporal and spatial dependences of the densities for several plasma components, Ne*, Xe*, Xe⁺*, Cl^–, XeCl* and of ground state boron atoms were measured. Some aspects of plasma kinetics for uniform and constricted phases of the discharge are discussed. By the mass spectrometry of gas mixture degradation products on long-term operation of the laser device several gaseous (N₂, O₂, CO₂, H₂O, C₂H₄) and solid (NiCl₂, H₃BO₃) products were detected in the laser chamber. NH₄Cl was determined to be a stable fraction of the deposits on optics surfaces. The reasons for the improvement of gas lifetime for BCl₃-containing gas mixtures are discussed.     

H_2+He流体混合物在部分离解区的物态方程

H2+He流体混合物在高温高压下由于氢的离解化学反应形成由H2,H,He三种粒子构成的混合体系,此时粒子间的相互作用较为复杂,离解能也会由于粒子间的这种复杂相互作用而降低.本文利用自洽流体变分理论来研究部分离解区H2+He流体混合物的高温高压物态方程,模型考虑了各种粒子间的相互作用及由温致和压致效应引起的离解能降低的自洽变分修正,并通过自洽流体变分过程对非理想的离解平衡方程求解得到粒子数密度分布,进而对自由能求导获得体系的热力学状态参量.计算结果与已有的冲击波实验数据、蒙特卡罗模拟及其他理论计算进行了比较.     

The effect of temperature on collision induced intersystem crossing in the reaction of CH2 with H2

Laser flash photolysis of ketene at 308 nm, coupled with H atom vacuum ultraviolet laser induced fluorescence, was used to determine the branching ratio for the CH₃ + H channel (1a) in the reaction of CH₂¹A₁ (¹CH₂) with H₂, over the temperature range 300–500 K. This reaction channel competes with collision induced intersystem crossing (CIISC) to form triplet methylene, CH₂³B₁ (³CH₂) (channel 1b). The branching ratio for H formation, k_1a/k₁, was determined by measuring the relative H atom yield in three time resolved measurements of H: (i) in ketene, H₂ mixtures, where H is exclusively formed by reaction 1a, (ii) in ketene, H₂, NO mixtures ([NO] [H₂]), where H is formed at short times by 1a and at longer times by ³CH₂ + NO, following 1b, and (iii) in ketene, He, NO mixtures ([NO] [He]), where H is exclusively formed from ³CH₂ + NO, following deactivation of singlet to triplet methylene by He. k_1a/k₁ was found to increase from 0.85 at 300 K to unity at 500 K, with the yield of CIISC decreasing from 0.15 to zero. This is the first measurement of the temperature dependence of the rate coefficient for CIISC in a reactive system. The rate coefficient for CIISC with an inert gas increases with T. It has been suggested that the fractional yield of CIISC will increase with temperature in reactive systems, thus reducing the rate coefficient for reaction at high temperature, with significant consequences for combustion systems. The present experiments demonstrate that this is not the case for reaction with H₂ and implies a different CIISC mechanism for reactive vs inert collision partners.     

A novel double-pulse laser plasma spectroscopic technique for H analysis in metal samples utilizing transversely excited atmospheric-pressure CO2 laser-induced metastable He atoms

The analysis of hydrogen in a metal sample (zircaloy-4), which is usually difficult to perform using conventional laser-induced breakdown spectroscopy (LIBS) techniques, has been achieved using a double-pulse technique under He gas at atmospheric pressure. In this technique, a transversely excited atmospheric-pressure (TEA) CO₂ laser (1.5 J, 200 ns) was focused onto the metal surface to induce a strong He gas plasma whilst simultaneously focussing a Nd-doped yttrium aluminum garnet (Nd:YAG) laser (120 mJ, 8 ns), synchronized with the TEA CO2 laser, onto the metal to ablate atoms into the resulting He gas plasma. The emission spectrum obtained shows a narrow H linewidth with low background intensity and long lifetime emission, thereby indicating that excitation takes place via metastable He atoms. The H emission from H₂O can be suppressed by a careful pretreatment involving heating the sample in a vacuum chamber.     

Multiple M‐Effect Signal in Noble Gases and Hydrogen Mixture Discharge

The M‐effect (monochromatization‐effect) is a powerful process which can give high intensity monochromatic spectra with a certain wavelength depending on the type of used gas mixtures to generate the plasma state. The effect consists in the emission of a single spectral line emerging from plasma under specific experimental conditions involving one electropositive gas and one electronegative gas mixture. For example, in the case of Ne‐H₂ mixture, a clear monochrome radiation was obtained, corresponding to the λ_Ne =585.3 nm wavelength at 2p₁‐1s₂ transition in the Paschen notation, the pressures ranging between 10‐100 torr. In this paper we prove the general character of this effect, i.e. if the optical emission spectra (OES) reduced to selective lines can be noticed also in other multiple gas mixture discharges. The Ne‐Ar‐Xe mixture discharges with different percentages of H2 as electronegative gas added in has been investigated. The triple M‐effect, means three specific monochromatic lines, could be revealed in the OES at 50% of H2 addition in Ne‐Ar‐Xe mixture (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)