GaAs间隔层厚度对InAs/GaAs量子点分子光学性质的影响

采用光致荧光发射谱(PL)和时间分辨荧光发射谱(TRPL)研究了GaAs间隔层厚度对自组装生长的双层InAs/GaAs量子点分子光学性质的影响.首先,测量低温下改变激发强度的PL谱,底层量子点和顶层量子点的PL强度比值随激发强度发生变化,表明两层量子点之间的耦合作用和层间载流子的转移随着间隔层厚度变大而变弱.接着测量改变温度的PL谱,量子点荧光光谱峰值位置(Emax)、半峰全宽及积分强度随温度发生变化,表明GaAs间隔层厚度直接影响到量子点内载流子的动力学过程和量子点发光的热淬灭过程.最后,TRPL测量发现60mL比40mL间隔层厚度样品的载流子隧穿时间有明显延长.     

InAs/GaAs柱形岛的制备及特性研究

利用固源分子束外延（MBE）的方法经SK模式自组装生长由多层InAs／GaAs量子点组成的柱形岛.具体分析了GaAs间隔层厚度，生长停顿时间以及InAs淀积量对发光峰波长的影响.原子力显微镜（AFM）结果显示柱形岛表面的形状和尺寸都比较均匀；室温下不同高度的柱形岛样品的发光波长分别达到1.32和1.4μm，而单层量子点的发光波长仅为1.1μm，充分说明了量子点高度对发光波长的决定性影响，这为调节量子点发光波长提供了一种直观且行之有效的方法. 关键词： 柱形岛 生长停顿 间隔层厚度 PL谱     

InAs/GaAs透镜形量子点超晶格材料的纵向和横向周期对应变场分布的影响

对量子点超晶格材料中量子点纵向周期和同层量子点的横向周期间距对量子点及其周围应变场分布的影响进行了系统的研究.结果表明，横向和纵向周期通过衬底材料之间的长程相互作用对量子点沿中心轴路径应变分布的影响效果正好相反，在适当条件下，两者对量子点应变场分布的影响可以部分抵消.同时也论证了在单层量子点和超晶格量子点材料中，计算量子点的电子结构时，应综合考虑量子点空间周期分布对载流子限制势的影响，不能简单的利用孤立量子点模型来代替. 关键词： 应变 半导体量子点 自组织     

不同盖层对InAs/GaAs量子点结构和光学性质的影响

利用金属有机化合物气相沉积设备生长了不同盖层结构的InAs/GaAs量子点,采用原子力显微镜和光致发光光谱仪对量子点的结构和光学性质进行了研究.量子点层之间的盖层由一个低温层和一个高温层组成.对不同材料结构的低温盖层的对比研究表明,In组分渐变的InGaAs低温盖层有利于改善量子点均匀性、减少结合岛数目、提高光致发光强度;当组分渐变InGaAs低温盖层厚度由6.8 nm增加到12 nm,发光波长从1256.0 nm红移到1314.4 nm.另外,还对不同材料结构的高温盖层进行了对比分析,发现高温盖层采用In组分渐变的InGaAs材料有利于光致发光谱强度的提高. 关键词： 半导体量子点 盖层 组分渐变     

双层堆垛长波长InAs/GaAs量子点发光性质研究

研究了双层堆垛InAs/GaAs/InAs自组织量子点的生长和光致发光(PL)的物理性质。通过优化InAs淀积量、中间GaAs层厚度以及InAs量子点生长温度等生长条件,获得了室温光致发光1391～1438nm的高质量InAs量子点。研究发现对量子点GaAs间隔层实施原位退火、采用Sb辅助生长InGaAs盖层等方法可以增强高密度(2×1010 cm-2)InAs量子点的发光强度,减小光谱线宽,改善均匀性和红移发光波长。     

应变补偿层对量子点生长影响的理论研究

量子点的光学特性与量子点的大小均匀性、密度、内部应变以及隔离层的厚度等有密切关系.文中从理论角度定量研究了GaNXAs1-X应变补偿层对InAs/GaAs量子点生长质量的改善作用,分析了应变补偿层对隔离层厚度减小的作用.讨论了应变补偿层的补偿位置和补偿层N组分X对量子点生长时局部应变和体系应变的补偿作用.分析了应变补偿层对体系应变的减少作用,并计算了相邻层量子点的垂直对准概率.研究结果对实验中应变补偿的优化和高质量量子点阵列的生长实现提供了理论依据.     

离子束溅射Ge量子点的应变调制生长

采用离子束溅射技术制备了单层和双层Ge量子点, 通过原子力显微镜对比了不同Si隔离层厚度和不同掩埋量子点密度情况下表层量子点的尺寸和形貌差异, 系统研究了掩埋Ge量子点产生的应变对表层量子点的浸润层及形核的影响, 并用埋置应变模型对其进行解释. 实验结果表明, 覆盖Ge量子点的Si隔离层中分布着的应变场, 导致表层量子点浸润层厚度的降低, 从而增大点的体积; 应变强度随隔离层厚度的减小而增加, 造成表层量子点形状和尺寸的变化; 此外, 应变还调控了表层量子点的空间分布. 关键词： Ge量子点 埋层应变 离子束溅射     

InGaAsSb量子阱的MBE生长和光致发光特性研究

采用分子束外延(MBE)技术生长InGaAsSb多量子阱结构,利用光致发光光谱对材料的生长特性进行了研究.研究了衬底温度对材料激发光谱强度的影响,探索了发光波长与有源层量子阱厚度的关系.发现外延生长时衬底温度对材料的质量有重要影响;在一定范围内,量子阱厚度不断增加会导致材料的光致发光波长增加.     

埋置量子点应力分布的有限元分析

通过衬底材料和外延材料的交替生长方式制备出多层排列的自组装量子点超晶格结构.这些埋置量子点的应力/应变场影响着它们的光电性能、压电性能以及力学稳定性.基于各向异性弹性理论的有限元方法,研究了埋置金字塔形应变自组织Ge/Si半导体量子点的应力/应变分布以及流体静应变和双轴应变分布,并与非埋置量子点的应力/应变分布做了比较,指出了它们之间的异同以及覆盖层对量子点应力/应变分布的影响. 关键词： 量子点 应力分布 应变分布     

渐变型量子阱垒层厚度对GaN基双波长发光二极管发光特性调控的研究

采用软件理论分析的方法对渐变型量子阱垒层厚度的InGaN双波长发光二极(LED)的载流子浓度分布、 能带结构、自发发射谱、内量子效率、发光功率及溢出电子流等进行研究.分析结果表明, 增大量子阱垒层厚度会影响空穴在各量子阱的注入情况, 对双波长LED各量子阱中空穴浓度分布的 均衡性及双波长发光光谱的调控起到一定作用,但会导致内量子效率严重下降; 而当以特定的方式从n电极到p电极方向递减渐变量子阱垒层厚度时, 活性层量子阱的溢出电子流 得到有效的控制, 双发光峰强度达到基本一致, 同时芯片的内量子效率下降得到了有效控制, 且具备大驱动电流下较好的发光特性.     

The influence of strain-reducing layer on strain distribution and ground state energy levels of GaN/AlN quantum dot

This article deals with the strain distributions around GaN/AlN quantum dots by using the finite element method. Special attention is paid to the influence of Al_0.2Ga_0.8N strain-reducing layer on strain distribution and electronic structure. The numerical results show that the horizontal and the vertical strain components are reinforced in the GaN quantum dot due to the presence of the strain-reducing layer, but the hydrostatic strain in the quantum dot is not influenced. According to the deformation potential theory, we study the band edge modifications and the piezoelectric effects. The result demonstrates that with the increase of the strain reducing layer, the transition energy between the ground state electron and the heavy hole increases. This result is consistent with the emission wavelength blue shift phenomenon observed in the experiment and confirms that the wavelength shifts toward the short wavelength range is realizable by adjusting the structure-dependent parameters of GaN/AlN quantum dot.     

The influences of thickness of spacing layer and the elastic anisotropy on the strain fields and band edges of InAs/GaAs conical shaped quantum dots

Based on the continuum elastic theory, this paper presents a finite element analysis to investigate the influences of elastic anisotropy and thickness of spacing layer on the strain field distribution and band edges (both conduction band and valence band) of the InAs/GaAs conical shaped quantum dots. To illustrate these effects, we give detailed comparisons with the circumstances of isolated and stacking quantum dot for both anisotropic and isotropic elastic characteristics. The results show that, in realistic materials design and theoretical predication performances of the optoelectronic devices, both the elastic anisotropy and thickness of the spacing layer of stacked quantum dot should be taken into consideration.     

Bound to continuum intersubband transition optical properties in the strain reducing layer-assisted InAs quantum dot structure

In this paper, the impact of wetting layer, strain reducing layer and dot height on the electronic, linear and nonlinear optical properties of bound to continuum states transitions are investigated in a system of InAs truncated conical shaped quantum dot covered with the In_xGa_1−x As strain reducing layer. The electronic structure, containing two main states of S and wetting layer states (WL), was calculated by solving one electronic band Hamiltonian with effective-mass approximation. The results reveal that the presence of the strain reducing layer in the structure extends the quantum dot emission to longer wavelength which is reported as a red-shift of the photoluminescence (PL) peak in the experimental measurement. This study also highlights the possibility of improving the intersubband optical properties based on the significant size-dependence of the three layer dot matrix by employing the strain reducing and wetting layers. According to this simulation, relatively tall dots on the thick wetting layer introduce the optimized structure size for practical applications to meet the SRL assisted enhanced dot structure.     

Influence of Strain-Reducing Layer on Strain Distribution of Self-Organized InAs/GaAs Quantum Dot and Redshift of Photoluminescence Wavelength

A systematic investigation about the strain distributions around the InAs/GaAs quantum dots using the finite element method is presented. A special attention is paid to influence of an Ino.2 Gao.sAs strain reducing layer. The numerical results show that the horizontal- and vertical-strain components and the biaz~ial strain are reinforced in the InAs quantum dot due to the strain-reducing layer. However, the hydrostatic strain in the quantum dot is reduced. In the framework of eight-band k · p theory, we study the band edge modifications due to the presence of a strain reducing layer. The results demonstrate that the strain reducing layer yields the decreasing band gap, i.e., the redshift phenomenon is observed in experiments. Our calculated results show that degree of the redshift will increase with the increasing thickness of the strain-reducing layer. The calculated results can explain the experimental results in the literature, and further confirm that the long wavelength emission used for optical fibre communication is realizable by adjusting the dependent parameters. However, based on the calculated electronic and heavy-hole wave function distributions, we find that the intensity of photoluminescence will exhibits some variations with the increasing thickness of the strain-reducing layer.     

Impact of GaNAs strain compensation layer on the electronic structure of InAs/GaAs quantum dots

The strain and electron energy levels of InAs/GaAs(001) quantum dots (QDs) with a GaNAs strain compensation layer (SCL) are investigated. The results show that both the hydrostatic and biaxial strain inside the QDs with a GaNAs SCL are reduced compared with those with GaAs capping layers. Moreover, most of the compressive strain in the growth surface is compensated by the tensile strain of the GaNAs SCL, which implies that the influence of the strain environment of underlying QDs upon the next-layer QDs’ growth surface is weak and suggests that the homogeneity and density of QDs can be improved. Our results are consistent with the published experimental literature. A GaNAs SCL is shown to influence the strain and band edge. As is known, the strain and the band offset affect the electronic structure, which shows that the SCL is proved to be useful to tailor the emission wavelength of QDs. Our research helps to better understand how the strain compensation technology can be applied to the growth of stacked QDs, which are useful in solar cells and laser devices.     

A novel approach to increase emission wavelength of InAs/GaAs quantum dots by using a quaternary capping layer

In this paper, we present a new approach to obtain large size dots in an MBE grown InAs/GaAs multilayer quantum dot system. This is achieved by adding an InAlGaAs quaternary capping layer in addition to a high growth temperature (590°C) GaAs capping layer with the view to tune the emission wavelength of these QDs towards the 1.3 μm/0.95 eV region important for communication devices. Strain driven migration of In atoms from InAlGaAs alloy to the InAs QDs effectively increases the size of QDs. Microscopic investigations were carried out to study the dot size and morphology in the different layers of the grown samples. Methods to reduce structural defects like threading dislocations in multilayer quantum dot samples are also studied.     

Optimal capping layer thickness for stacked quantum dots

We study the effect of strain on the vertical and lateral self-organization of nanoscale patterns and stacked quantum dots during epitaxial growth. The computational approach is based on the level set method in combination with an atomistic strain code. Strain changes the energetics of microscopic parameters during growth, and thus determines the nucleation sites and the growth of islands and dots. Our results show that strain can lead to vertical alignment as well as lateral organization. Moreover, our simulations suggest that there is an optimal thickness of the capping layer to get the best alignment and most uniform size distribution of stacked quantum dots, and that its variation can be used to control the formation of interesting structures.     

Strain and optical transitions in InAs quantum dots on (001) GaAs

To investigate the strain characteristics of InAs quantum dots grown on (001) GaAs by solid source molecular beam epitaxy we have compared calculated transition energies with those obtained from photoluminescence measurements. Atomic force microscopy shows the typical lateral size of the quantum dots as 20–22 nm with a height of 10–12 nm, and photoluminescence spectra show strong emission at 1.26 μ m when the sample is capped with a GaAs layer. The luminescence peak wavelength is red-shifted to 1.33 μ m when the dots are capped by an In_0.4Ga_0.6As layer. Excluding the strain it is shown that the theoretical expectation of the ground-state optical transition energy is only 0.566 eV (2.19 μ m), whereas a model with three-dimensionally-distributed strain results in a transition energy of 0.989 eV (1.25 μ m). It has thus been concluded that the InAs quantum dot is spatially strained. The InGaAs capping layer reduces the effective barrier height so that the transition energy becomes red-shifted.     

Mo覆盖层对MgO/CoFeB/Mo结构磁各向异性的影响

研究了Mo覆盖层厚度对MgO/CoFeB结构磁各向异性的影响. 研究发现, 加平行磁场生长出来的MgO/CoFeB/Mo样品表现为面内各向异性, 并且随着CoFeB的厚度减小, 面内各向异性逐渐减弱; 在CoFeB厚度减小到1.1 nm时, 仍可以保持面内各向异性, 垂直方向的外加饱和场逐渐减少; 厚度在0.9 nm及以下的情况下, 面内各向异性消失. 改变Mo覆盖层厚度, 当t_Mo= 1.6 nm时, 垂直方向的饱和场最小. 当生长过程的磁场变为垂直磁场时, 不同厚度的Mo覆盖层对MgO/CoFeB 的磁各向异性影响不同. Mo厚度在1 nm及以下时MgO/CoFeB/Mo样品表现为面内各向异性, Mo覆盖层厚度在1.2和5 nm之间时样品出现了垂直磁各向异性; 并且垂直方向的矫顽力也发生了变化, Mo覆盖层厚度为1.4 nm时样品的磁滞损耗会大一些.