GaxN2:Zn3-x薄膜的分子束外延生长及其光学和电子输运性能表征

本文采用分子束外延技术,通过对金属分子束的精确控制,在MgO(002)基底上成功生长了Ga_xN₂∶Zn_3-x合金薄膜.高分辨率单晶X光衍射仪表征结果表明Ga_xN₂∶Zn_3-x合金薄膜仍是以(400)Zn₃N₂为主导的复合晶体结构,对衍射数据的分析得到该薄膜晶粒尺寸小.用扫描电子显微镜和能谱射线分析仪对其表面和成分做了深入的分析和讨论,在固定的金属流量比的生长环境下,不同厚度的样品在成膜后x均为0.65,化学通式Zn_2.35Ga_0.65N₂.该结果表明Ga元素属于重度掺杂,同时也体现了分子束外延技术在共掺杂技术中的优越性.本文也测量并讨论了Zn_2.35Ga_0.65N₂薄膜的光学性能,实验得到的1.85 eV的光学带隙与理论推算基本吻合,说明Ga的掺入有Ga-N结构...     

YBa2Cu3O7-x涂层导体的外延生长和性能对CeO2缓冲层的依赖性

利用倾斜衬底沉积法在无织构的金属衬底上生长了MgO双轴织构的模板层,在这一模板层上实现了YBa₂Cu₃O_7-x薄膜的外延生长.在外延YBa₂Cu₃O_7-x薄膜前,依次沉积了钇稳定的立方氧化锆和CeO₂作为缓冲层.利用X射线衍射2θ扫描、扫描、Ω扫描和极图分析测定了这些膜的结构和双轴织 关键词： 2Cu₃O_7-x镀膜导体')" href="#">YBa₂Cu₃O_7-x镀膜导体 2缓冲层')" href="#">CeO₂缓冲层 厚度依赖性 外延生长     

SrRuO3超薄膜制备条件和拓扑霍尔效应的关联

使用激光分子束外延在SrTiO₃(001)衬底上生长SrRuO₃薄膜,并研究激光能量密度、生长温度和靶材表面烧蚀度等生长参数对于SrRuO₃表面形貌、基本磁电性质以及拓扑霍尔效应的影响.当在最优条件下生长SrRuO₃薄膜时,样品表面平整、台阶清晰,具有最低的金属-绝缘体转变温度,电阻率最低,且具有最显著的拓扑霍尔效应;而改变生长参数生长的SrRuO₃薄膜由于存在更多的缺陷,其表面较粗糙,金属-绝缘体转变温度增大,或表现出绝缘体行为,而拓扑霍尔效应会变弱甚至消失.     

高气压反射式高能电子衍射仪监控脉冲激光外延氧化物薄膜

在超高真空分子束外延（MBE）生长技术中，反射式高能电子衍射仪（RHEED）能实时显示半导体和金属外延生长过程，给出薄膜表面结构和平整度的信息，成为MBE必备的原位表面分 析仪.为了研究氧化物薄膜如高温超导（YBa₂Cu₃O₇） 、铁电薄膜（Sr_1-xBa_x TiO₃）及它们的同质和异质外延结构的生长机理，获得高质量的符合各种应用 需要的氧化 物多层薄膜结构，在常规的制备氧化 关键词： 高温超导薄膜 RHEED     

激光分子束外延BaTiO3薄膜最顶层表面原子平面与薄膜生长机理

用激光分子束外延技术在SrTiO₃(001)衬底上外延生长了高质量的BaTiO_{3< /sub>薄膜,薄膜的生长过程由反射式高能电子衍射仪(RHEED)原位实时监测,表明薄膜具有 二维层状生长模式.薄膜的晶体结构和表面形貌分别由X射线衍射和原子力显微镜表征,显示 该薄膜为完全c轴取向四方相晶体结构,其表面具有原子尺度光滑性.采用角分辨X射线光电 子谱技术(ARXPS),研究了BaTiO3薄膜表面最顶层原子种类和排列状况.结果表 明,BaTiO3 关键词： 激光分子束外延 3薄膜')" href="#">氧化物BaTiO3薄膜 最顶层表面 角分辨X射线光电子谱}     

基于电子回旋共振-等离子体增强金属有机物化学气相沉积技术生长GaMnN稀磁半导体的研究

利用电子回旋共振-等离子体增强金属有机物化学气相沉积 (ECR-PEMOCVD)方法,采用二茂锰(Cp₂Mn)作为Mn源,高纯氮气作为氮源,三乙基镓(TEGa)作为Ga源,在蓝宝石(α-Al₂O₃)(0001)衬底上外延生长GaMnN稀磁半导体薄膜.反射高能电子衍射(RHEED)、X射线衍射(XRD)、原子力显微镜(AFM)表征了GaMnN薄膜的晶体结构和表面形貌.GaMnN薄膜均表现出良好的(0002)择优取向,表明制备的薄膜倾向于 关键词： GaMnN薄膜 稀磁半导体 铁磁性 居里温度     

La0.5Sr0.5CoO3薄膜的外延生长及其机理研究

利用脉冲激光制膜法,在多种衬底和温度条件下,系统研究了La_0.5Sr_0.5CoO₃(LSCO)薄膜的结构和外延生长特性,在LaAlO₃,SrTiO₃和MgO衬底上实现了LSCO薄膜的外延生长.外延生长的薄膜具有低的电阻率和金属性导电特征.研究表明,外延生长的最佳温度范围为700—800℃,最佳衬底为LaAlO₃.并着重探讨了衬底材料和淀积温度等多种因素对LSCO薄膜的生长与性 关键词：     

La掺杂BaSnO3薄膜的低温电输运性质

利用射频磁控溅射技术在MgO(001)单晶基片上沉积了一系列Ba_0.94La_0.06SnO₃薄膜,并对薄膜的结构和电输运性质进行了系统研究.所有薄膜均表现出简并半导体(金属)导电特性:在T>T_min的高温区(T_min为电阻最小值对应的温度),薄膜的电阻率随温度的升高而升高,并且与温度的平方呈线性关系.在T min的低温区域,薄膜的电阻率随温度降低而上升,并且电阻率随lnT呈线性变化,均匀无序系统中的电子-电子相互作用、弱局域效应以及Kondo效应均不能解释这种现象.经过定量分析,发现电阻率在低温下lnT的依赖关系源于颗粒间电子的库仑相互作用.同时,在Ba_0.94La_0.06SnO₃薄膜中也观察到霍尔系数R_H与lnT呈线性关系,并且该线性关系也定量的符合金属颗粒体系中库仑相互作用的理论.薄膜断面高分辨透射电子显微镜结果表明,虽然薄膜整体呈现外延结构,但其中...     

(Ce0.8Sm0.2O2-δ/Y2O3:ZrO2)N超晶格电解质薄膜的制备及表征

采用脉冲激光沉积技术(PLD), 在MgO单晶基底上, 依次沉积氧化钐掺杂的氧化铈(Ce_0.8Sm_0.2O_2-δ, SDC)和钇稳定氧化锆(8 mol%Y₂O₃:ZrO₂, YSZ)制备了五种(SDC/YSZ)_N (N=3, 5, 10, 20, 30) 超晶格电解质薄膜. 利用X射线衍射(XRD)、高分辨透射电子显微镜(HR-TEM)和交流阻抗对其形貌、相结构和电学性能进行了表征. 结果显示, (SDC/YSZ)_N超晶格电解质薄膜之间形成了明显的界面和较好的超晶格结构; 薄膜表面颗粒生长均匀、致密、平滑, 在薄膜的界面处没有元素相互扩散也未出现裂纹, 外延生长良好; 电导率随着(SDC/YSZ)_N超晶格电解质界面数的增加而增加, 而活化能则随之减少, 是较为理想的低温固体氧化物燃料电池电解质.     

氧压对SrTiO3和SrNb0.2Ti0.8O3薄膜晶格参数的影响及激光感生热电电压效应

采用脉冲激光沉积技术制备了SrTiO₃和SrNb_0.2Ti_0.8O₃薄膜.X射线衍射分析表明在LaAlO₃(100)单晶平衬底上生长的SrTiO₃及SrNb_0.2Ti_0.8O₃薄膜是沿［001］取向的近外延生长.随着氧压在一定范围内逐渐增大,SrTiO₃薄膜的晶格参数减小,而SrNb_0.2Ti_0.8O₃薄膜的晶格参数先减小后增大.同时摸索出制备具有二维电子气超晶格(SrTiO₃/SrNb_0.2Ti_0.8O₃)_L的最佳氧压为1.0×10^-2Pa.另外在LaAlO₃(100)倾斜衬底上制备的SrNb_0.2Ti_0.8O₃薄膜中观察到激光感生热电电压效应. 关键词： 0.2Ti_0.8O₃薄膜')" href="#">SrNb_0.2Ti_0.8O₃薄膜 晶格参数 激光感生热电电压 脉冲激光沉积     

Excitation, ionization, and reaction mechanism of a reactivecathodic arc deposition of TiN

This paper discusses the excitation, ionization and reaction mechanism of reactive cathodic arc deposition of TiN. Such arc plasmas art operated in the arc discharge type PVD apparatus. The 50 A arc is operated in N₂ atmosphere of 0.13 to 26.6 Pa. The arc voltage, the electron energy distribution and the spectral intensities are measured as a function of pressure. The deposited films are analyzed by XPS. It follows from the result that (1) the N₂ molecules impact with the high energy electron to be excited or ionized; (2) Ti ⁺⁺ ions which are initially emitted from the cathode spot recombine with electrons and turn Ti⁺ ions and Ti atoms and the recombination ratio increases with increasing pressure; (3) the TiN compound is produced on the substrate surface in the ensuing process, the excited N₂ are adsorbed on the substrate surface, the N ₂ are dissociated to N atoms through collisions with Ti⁺ ions of 40-60 eV, the N atoms react with the Ti atoms to form TiN     

Observation of triangular terraces and triangular craters of CaF2 film on Si(1 1 1) substrate

We have investigated the growth mode and surface morphology of CaF₂ film on Si(1 1 1)7×7 substrate by reflection high-energy electron diffraction (RHEED) using very weak electron beam and atomic force microscopy (AFM). It was found by RHEED intensity oscillation measurements and AFM observations that three-dimensional (3D) islands grow at RT; however, rather flat surface appears with two-dimensional (2D) islands around 300 °C. Especially, at high temperature of 700 °C, characteristic equilateral triangular terraces (or islands) with flat and wide shape grow with the tops directed toward [1 1 −2] of substrate Si(1 1 1). On the other hand, the desorption process of the CaF₂ film due to electron stimulated desorption (ESD) was also examined. It was found that the ESD process at 300 °C forms characteristic equilateral triangular craters on the film surface with the tops (or corners) directed toward [−1 −1 2] of substrate Si(1 1 1), provided that the film was grown at 700 °C.     

Structure analysis of thin iron-silicide film from φ-scan RHEED Patterson function

The atomic structure of thin iron silicide film, grown epitaxially on the Si(111) surface, has been analyzed by means of the three-dimensional RHEED Patterson function analysis. The iron-silicide-terminated surface with (2 × 2) periodicity has been prepared by a solid-phase epitaxy method. 2 ML of Fe were deposited on the Si(111)-(7 × 7) surface and annealed at 500°C. Three-dimensional Patterson function was calculated from series of φ-scanned RHEED intensity distributions converted to the k-space. The resulting model of γ-FeSi₂ structure consists of two silicide layers faulted to each other with three relaxed Si adatoms above the H₃ site.     

Stability and electronic structure studies of LaAlO_3/SrTiO_3 (110) heterostructures

The first-principles calculations are employed to investigate the stability, magnetic, and electrical properties of the oxide heterostructure of LaAlO3/SrTiO3(110). By comparing their interface energies, it is obtained that the buckled interface is more stable than the abrupt interface. This result is consistent with experimental observation. At the interface of LaAlO3/SrTiO3(110) heterostructure, the Ti–O octahedron distortions cause the Ti t2 gorbitals to split into the twofold degenerate dxz/dyz and nondegenerate dxy orbitals. The former has higher energy than the latter. The partly filled two-fold degenerate t2 gorbitals are the origin of two-dimensional electron gas, which is confined at the interface. Lattice mismatch between LaAlO3 and SrTiO3leads to ferroelectric-like lattice distortions at the interface, and this is the origin of spin-splitting of Ti 3d electrons. Hence the magnetism appears at the interface of LaAlO3/SrTiO3(110).     

GaSb/AlSb/GaAs应变层结构的分子束外延生长

本文以反射式高能电子衍射(RHEED)和其强度振荡为监测手段,在半绝缘GaAs衬底上成功地生长GaSb/AlSb/GaAs应变层结构,RHEED图样表明,GaSb正常生长时为Sb稳定的C(2×6)结构,AlSb为稳定的(1×3)结构,作者观察并记录GaSb,AlSb生长时的RHEED强度振荡,并利用它成功地生长10个周期的GaSb/AlSb超晶格,透射电子显微镜照片显示界面平整、清晰,采用较厚的AlSb过渡层及适当的生长条件,可在半绝缘GaAs衬底上生长出质量好的GaSb外延层,其X射线双晶衍射半峰宽小于 关键词：     

Towards the preparation of realistic model Ziegler-Natta catalysts: XPS study of the MgCl2/TiCl4 interaction with flat SiO2/Si(1 0 0)

Despite of the wide use of supported Ti based Ziegler-Natta catalysts in the olefin polymerization industry, questions concerning the role of each one of the catalyst components in the polymerization process, have not found a satisfactory answer yet. This is mainly because of the high sensitivity of these systems to oxygen and atmospheric moisture that makes their study in an atomic level rather complicated. Realistic surface science models of the pre-activated SiO₂ supported MgCl₂/TiCl₄ and TiCl₄ Ziegler-Natta catalysts were prepared by spin coating on flat conductive SiO₂/Si(1 0 0) supports under inert atmosphere. This preparation technique resembles the wet chemical impregnation which is the industrial method of the catalyst preparation. XPS analysis showed that the catalyst precursor anchors on the silica surface through bonding of the Ti atoms with surface silanes or siloxanes, while Mg is attached to the Ti through chlorine bridges. Thermal treatment of the catalysts at 723 K leads to total Cl desorption when MgCl₂ is not present while a significant amount of the Ti atoms is reduced to the Ti³⁺ state.     

Creation of variable concentrations of defects on TiO2(110) using low-density electron beams

Low density (˜μA/cm²) 0.48 and 1.0 keV electron beams have been used to create surface defects on a TiO₂(110) surface. These electron-beam induced defects were examined primarily by X-ray photoelectron spectroscopy (XPS) with supporting ultraviolet photoemission spectroscopy (UPS). Glancing and normal emission XPS spectra of nearly defect-free surfaces revealed that Ti atoms on the surface were similar to the bulk Ti, while some surface oxygen atoms were different from the bulk oxygen. XPS of Ti 2p_3/2 was used to quantify the defect concentration and to examine the defect electronic structure. Based on our calculation of defect concentrations and the comparison of our results with results and models from the literature, we conclude that oxygen vacancies induced by electron beams in the current study are mostly from the bridging oxygen sites, in agreement with the previous work. A range of defect concentrations with similar electronic structure, mainly composed of Ti³⁺, have been induced by low-density electron beams. Beam energy and exposure were the experimental variables. The rates of defect formation at low beam exposure were beam-energy dependent, with a faster growth rate at 0.48 keV than at 1.0 keV. These defects were similar to those by thermal annealing in vacuum, but a higher concentration of defects could be obtained with longer beam exposure. However, the e-beam induced defects were different from those produced by Ar⁺ ion bombardment since both this and previous studies have found defects produced by Ar⁺ ion bombardment to be complex, with a variety of different local environments where oxygen and titanium surface atoms coexist.     

掺钨VO_2薄膜的电致相变特性

采用直流磁控溅射与后退火工艺相结合的方法,在掺氟SnO_2(FTO)导电玻璃基底上制备了高质量的掺钨VO_2薄膜,对薄膜的结构、表面形貌和光电特性进行测试,分析了钨掺杂对其相变性能的影响.结果表明,室温下掺钨VO_2薄膜的阈值电压为4.2 V,观察到阈值电压下约有两个数量级的电流突变.随着温度升高,相变的阈值电压降低,且电流突变幅度减小.当施加8 V电压时,分别在不同温度下测试了掺钨VO_2薄膜的透过率.温度为20和50℃时,掺钨VO_2薄膜相变前后的红外透过率差量分别为23%和27%.与未掺杂的VO_2薄膜相比,掺钨VO_2薄膜具有相变温度低、阈值电压低和电阻率小的特点,在高速光电器件中有广阔的应用前景.     

ZnO薄膜的掺杂特性

通过MOCVD方法生长的ZnO薄膜一般为富锌生长,呈n型电导,要想得到高阻或低阻p-ZnO薄膜需要对其进行掺杂施主或受主杂质.主要研究在生长过程中通过NH₃对ZnO薄膜进行氮掺杂的情况,利用优化生长条件,即生长温度为610℃,Ar气(携带DEZn)流量为4sccm,O₂流量为120sccm,N₂流量为600sccm,得到在NH₃流量为80sccm时生长样品的结晶质量最高,在掺杂薄膜中NH₃流量高于或低于80sccm时,样品的表面形貌都将变差,只有在80sccm时表面粗糙度最低晶粒最小,表明该流量下获得的样品表面较光滑致密.所以80sccmNH₃流量为在R面蓝宝石上生长<110>取向ZnO薄膜的最佳掺杂流量.Hall测量结果表明,NH₃流量为50sccm的样品电导呈弱p型,电阻率为102Ω·cm,空穴载流子浓度为+1.69×10¹⁶cm^-3,迁移率为3.6cm²·V^-1·s^-1;当NH₃流量增加时样品的电导呈n型,电阻率最高达10⁸Ω·cm,我们认为与进入ZnO薄膜的H的量有关,并对其变化机理进行了详细的分析.     

SrTiO_3(001)衬底上多层FeSe薄膜的分子束外延生长

近几年,由于用分子束外延法在SrTiO_3衬底表面制备的单层FeSe具有很高的超导转变温度而引发了极大的研究热潮,随之而来的是对多层FeSe薄膜日益增长的研究兴趣.但目前还没有对成功生长高质量多层FeSe薄膜的详细报道.本文利用高能电子衍射仪(RHEED)实时监控在不同生长条件下制备的多层FeSe薄膜,发现在FeSe薄膜的生长初期,RHEED图像的强度演化基本符合台阶密度模型的描述特征,即台阶密度ρ正相关于衍射条纹强度.FeSe(02)衍射条纹的强度在第一生长周期内呈现稳定而明显的峰型振荡,而且不受高能电子掠射角的影响,最适合用来标定FeSe薄膜的厚度.结合扫描隧道显微镜对FeSe薄膜质量的原位观察,确定了制备多层FeSe薄膜的最佳生长条件,为FeSe薄膜的物性研究提供了重要的材料基础.