高气压反射式高能电子衍射仪监控脉冲激光外延氧化物薄膜

在超高真空分子束外延（MBE）生长技术中，反射式高能电子衍射仪（RHEED）能实时显示半导体和金属外延生长过程，给出薄膜表面结构和平整度的信息，成为MBE必备的原位表面分 析仪.为了研究氧化物薄膜如高温超导（YBa₂Cu₃O₇） 、铁电薄膜（Sr_1-xBa_x TiO₃）及它们的同质和异质外延结构的生长机理，获得高质量的符合各种应用 需要的氧化 物多层薄膜结构，在常规的制备氧化 关键词： 高温超导薄膜 RHEED

In-situ monitoring of the growth of oxide thin films in PLD using high-pressure reflection high energy electron diffraction

Reflection high-energy electron diffraction (RHEED) is very surface sensitive and often used for the analysis and monitoring of thin film growth in ultrahigh vacuum deposition system (for instance, Molecular Beam Epitasis). In order to in-situ monitor the growth of oxide thin films at high oxygen pressure up to 50Pa, a high-pressure RHEED designed and fabricated by our group was used for first time in our pulsed laser deposition system (PLD). Using the PLD system the Nb-doped SrTiO₃ (STNO) and Y₁Ba2Cu₃O₇ (YBCO) thin films have been epitaxially grown on SrTiO₃ (001) substrates. T he RHEED patterns of the STNO and YBCO films and the oscillation of the intensity of the pattern have been measured by the high-pressure RHEED during deposition. In addition,the surface morpholoyg of the films and the dynamic analysis of film growth process were discussed.