InGaAs/GaAs应变量子阱的光谱研究

分别用光致发光谱（PL），光伏谱（PV）及时间分辨谱（TRPL）的方法，测量了应变InGaAs/GaAs单量子阱和多量子阱在不同温度下的光谱，发现单量子阱与多量子阱有不同的光学4性质。多量子阱PL谱发光峰和PV谱激子峰的强度与半高宽都比单量子阱的大，但单量子阱的半高宽随着温度的升高增大很快，这是由激子－声子耦合引起的，通过时间分辨谱研究发现了量子阱子能级之间的跃迁，多量子阱的发光寿命明显比单量子阱的长，我们利用形变势模型对量子阱的能带进行了计算，很好地解释了实验结果。     

生长温度和结构参数对InGaAs／GaAs量子阱光学特性的影响

研究了不同生长温度下制备的In0.15Ga0.85As/GaAs应变量子阱的PL谱,结果表明,生长温度越高,In偏析和In-Ga互混越严重,同时,导致更多的In脱附,PL谱发光峰蓝移。对不同In含量的和不同InGaAs厚度的InGaAs/GaAs量子阱进行PL谱测试,分析表明In含量<0.2,生长温度低于560℃时,In含量和InGaAs层量子阱的厚度对In偏析、脱附和In-Ga互混基本没有影响。     

GaAs间隔层厚度对InAs/GaAs量子点分子光学性质的影响

采用光致荧光发射谱(PL)和时间分辨荧光发射谱(TRPL)研究了GaAs间隔层厚度对自组装生长的双层InAs/GaAs量子点分子光学性质的影响.首先,测量低温下改变激发强度的PL谱,底层量子点和顶层量子点的PL强度比值随激发强度发生变化,表明两层量子点之间的耦合作用和层间载流子的转移随着间隔层厚度变大而变弱.接着测量改变温度的PL谱,量子点荧光光谱峰值位置(Emax)、半峰全宽及积分强度随温度发生变化,表明GaAs间隔层厚度直接影响到量子点内载流子的动力学过程和量子点发光的热淬灭过程.最后,TRPL测量发现60mL比40mL间隔层厚度样品的载流子隧穿时间有明显延长.     

利用InAs/GaAs数字合金超晶格改进InAs量子点有源区的结构设计

利用分子束外延技术,通过InAs/GaAs数字合金超晶格代替传统的直接生长InGaAs层的方式,在GaAs(100)衬底上生长了InAs量子点结构并成功制备了1.3μm InAs量子点激光器.通过原子力显微镜和光致荧光谱测试手段,对传统生长模式和数字合金超晶格生长模式的两种样品进行了表征,研究发现采用32周期InAs/GaAs数字合金超晶格样品的量子点密度非常高,发光性能良好.通过与常规生长方式所制备激光器的性能对比,发现采用InAs/GaAs数字合金超晶格生长InAs量子点的有源区也可以得到高质量的激光器.利用该方式生长的InAs量子点激光器的阈值电流为24 mA,相应的阈值电流密度仅为75 A/cm2,最高工作温度达到120℃.InAs/GaAs数字合金超晶格既可以保证生长过程中源炉的温度保持不变,还可以对InGaAs层的组分实现灵活调控.不需要改变生长速度,通过改变InAs/GaAs数字合金超晶格的周期数以及InAs层和GaAs层的厚度,便可以获得任意组分的InGaAs,从而得到不同发光波长的激光器.这种生长方式对量子点有源区的结构设计和外延生长提供了新思路.     

不同盖层对InAs/GaAs量子点结构和光学性质的影响

利用金属有机化合物气相沉积设备生长了不同盖层结构的InAs/GaAs量子点,采用原子力显微镜和光致发光光谱仪对量子点的结构和光学性质进行了研究.量子点层之间的盖层由一个低温层和一个高温层组成.对不同材料结构的低温盖层的对比研究表明,In组分渐变的InGaAs低温盖层有利于改善量子点均匀性、减少结合岛数目、提高光致发光强度;当组分渐变InGaAs低温盖层厚度由6.8 nm增加到12 nm,发光波长从1256.0 nm红移到1314.4 nm.另外,还对不同材料结构的高温盖层进行了对比分析,发现高温盖层采用In组分渐变的InGaAs材料有利于光致发光谱强度的提高. 关键词： 半导体量子点 盖层 组分渐变     

激光照射下的低温氧化生成锗的纳米结构及其特性

在高精度椭偏仪（HPE）系统中，采用激光照射硅锗合金衬底助氧化的新方法，在SiO2层中生成锗的双纳米面结构；并在样品生长过程中，用HPE同步测量样品的纳米结构. 用Raman光谱仪测量样品的横断面，发现很强的PL发光谱峰. 用量子受限模型和改进的量子从头计算（UHFR）方法分析了PL光谱的结构. 关键词： 高精度椭偏仪 锗的纳米结构 PL光谱 量子受限     

带有InGaAs覆盖层的InAs量子点红外探测器材料的发光与光电响应

利用分子束外延技术(MBE),在GaAs(001)衬底上自组织生长了不同结构的InAs量子点样品,并制备了量子点红外探测器件。利用原子力显微镜(AFM)和光致发光(PL)光谱研究了量子点的表面结构、形貌和光学性质。渐变InGaAs层的插入有效地释放了InAs量子点所受的应力,抑制了量子点中In组分的偏析,提高了外延层的生长质量,降低了势垒高度,使InAs量子点荧光波长红移。伏安特性曲线和光电流(PC)谱结果表明,生长条件的优化提高了器件的红外响应,具有组分渐变的InGaAs层的探测器响应波长发生明显红移。     

纳米柱高度对GaN基绿光LED光致发光谱的影响

纳米柱结构是释放高In组分InGaN/GaN绿光LED量子阱层应变的有效方法。本文采用自组装的聚苯乙烯微球掩模、感应耦合等离子体干法刻蚀和KOH溶液的湿法腐蚀,在GaN基绿光LED外延片上制备了3种高度的纳米柱结构,通过扫描电子显微镜观察纳米柱结构的形貌,并测试了常温和10 K低温时的光致发光谱(PL)。结果表明:应变释放对压电场的影响显著,使得纳米柱结构样品的内量子效率(IQE)提高,PL谱峰值波长蓝移;应变在量子阱中的不均匀分布还使得PL谱半高全宽(FWHM)展宽。与普通平面结构相比,高度为747 nm的纳米柱结构可使得IQE提升917%,PL谱峰值波长蓝移18 nm、FWHM展宽7 nm。另外,纳米柱结构样品的有源区有效面积减小可使得PL谱FWHM减小。     

具有超晶格应力调制结构的绿光InGaN/GaN多量子阱的发光特性

研究了具有InGaN/GaN超晶格(SL)插入结构的绿光InGaN/GaN多量子阱(MQW)的发光特性。结构测试表明,SL插入结构并没有引起MQW中平均In组份的增加,而是改变了In组份的分布,形成了高In组份的量子点和低In组份量子阱。其电致发光(EL)谱和光致发光(PL)谱均出现了双发光峰。我们认为这两个 峰分别来自于量子点和量子阱,且存在着载流子从阱向点转移的输运机制。最后变温PL积分强度的Arrhenius 拟合表明,SL插入结构并没有在MQW中引入新的缺陷,使其发光效率下降。     

双层堆垛长波长InAs/GaAs量子点发光性质研究

研究了双层堆垛InAs/GaAs/InAs自组织量子点的生长和光致发光(PL)的物理性质。通过优化InAs淀积量、中间GaAs层厚度以及InAs量子点生长温度等生长条件,获得了室温光致发光1391～1438nm的高质量InAs量子点。研究发现对量子点GaAs间隔层实施原位退火、采用Sb辅助生长InGaAs盖层等方法可以增强高密度(2×1010 cm-2)InAs量子点的发光强度,减小光谱线宽,改善均匀性和红移发光波长。     

Investigation of populated InAs/GaAs quantum dots by photoluminescence and photoreflectance

We studied self-assembled InAs/GaAs quantum dots by contrasting photoluminescence and photoreflectance spectra from 10 K to room temperature. The photoluminescence spectral profiles comprise contributions from four equally separated energy levels of InAs quantum dots. The emission profiles involving ground state and excited states have different temperature evolution. Abnormal spectral narrowing occurred above 200 K. In the photoreflectance spectra, major features corresponding to the InAs wetting layer and GaAs layers were observed. Temperature dependences of spectral intensities of these spectral features indicate that they originate from different photon-induced modulation mechanisms. Considering interband transitions of quantum dots were observed in photoluminescence spectra and those of wetting layer were observed in photoreflectance profiles, we propose that quantum dot states of the system are occupied up to the fourth energy level which is below the wetting layer quantum state.     

Growth of InGaAs-capped InAs quantum dots characterized by Atomic Force Microscope and Scanning Electron Microscope

Atomic force microscopy (AFM) is typically used to measure the quantum dot shape and density formed by lattice mismatched epitaxial growth such as InAs on GaAs. However, AFM images are distorted when two dots are situated in juxtaposition with a distance less than the AFM tip width. Scanning electron Microscope (SEM) is much better in distinguishing the dot density but not the dot height. Through these measurements of the growth of In_xGa_1-xAs cap layer on InAs quantum dots, it was observed that the InGaAs layer neither covered the InAs quantum dots and wetting layer uniformly nor 100% phase separates into InAs and GaAs grown on InAs quantum dots and wetting layer, respectively.     

Wetting layers effect on InAs/GaAs quantum dots

FEM combining with the K·P theory is adopted to systematically investigate the effect of wetting layers on the strain-stress profiles and electronic structures of self-organized InAs quantum dot. Four different kinds of quantum dots are introduced at the same height and aspect ratio. We found that 0.5 nm wetting layer is an appropriate thickness for InAs/GaAs quantum dots. Strain shift down about 3%∼4.5% for the cases with WL (0.5 nm) and without WL in four shapes of quantum dots. For band edge energy, wetting layers expand the potential energy gap width. When WL thickness is more than 0.8 nm, the band edge energy profiles cannot vary regularly. The electron energy is affected while for heavy hole this impact on the energy is limited. Wetting layers for the influence of the electronic structure is obviously than the heavy hole. Consequently, the electron probability density function spread from buffer to wetting layer while the center of hole's function moves from QDs internal to wetting layer when introduce WLs. When WLs thickness is larger than 0.8 nm, the electronic structures of quantum dots have changed obviously. This will affect the instrument's performance which relies on the quantum dots' optical properties.     

Island dissolution during capping layer growth interruption

A possible scenario for the dissolution of partially capped quantum dots was investigated. This model is based on the consideration of the total free energy being a sum of elastic and surface energies as the quantum-dot material redistributes itself as a second wetting layer on top of the capping layer. Quantitative results were obtained for the case of InAs/GaAs quantum dots that are partially capped by GaAs. We compare our results with supporting experimental evidence. Received: 29 January 2001 / Accepted: 30 January 2001 / Published online: 3 April 2001     

Competition between strain and confinement effects on the crystalline quality of InAs/GaAs (001) quantum dots probed by Raman spectroscopy

Self‐organized quantum dots (SOQDs) of InAs/GaAs (001) prepared at low growth temperatures have been carried out by Raman spectroscopy. The structural study performed on these samples using atomic force microscopy showed the presence of two families of quantum dots, and these results were confirmed by analysis of Raman spectra. The low temperature growth leads to smaller dots with nonuniform sizes. The disagreement between the lattice parameters violated the selection rules, and all Raman modes could be observed. SOQDs Raman spectrum shows contribution from the GaAs substrate, the wetting layer, InAs quantum dots and InGaAs alloys at InAs/GaAs interface. A spatial correlation model including the different vibration modes was used to adjust the experimental result. A good agreement of theoretical and experimental results was obtained. Copyright © 2012 John Wiley & Sons, Ltd.     

Emission of photoexcited charge carriers from InAs/GaAs quantum dots grown by gas-phase epitaxy

A model describing the emission of photoexcited electrons and holes from an array of InAs quantum dots into the GaAs matrix is suggested. The analytical expression obtained for the emission efficiency takes into account the thermal emission of charge carriers into the GaAs matrix and two-dimensional states of the InAs wetting layer, tunneling and thermally activated tunneling escape, and electron transitions between the quantum-confinement levels in the conduction band of InAs. The temperature dependences of the photosensitivity in the regions of the ground-state and first excited-state optical transitions in InAs/GaAs quantum dots grown by gas-phase epitaxy are investigated experimentally. A number of quantum dot parameters are determined by fitting the results of a theoretical calculation to the experimental data. Good agreement between the theoretical and experimental results is obtained in this way.     

Disorder-induced natural quantum dots in InAs/GaAs nanostructures

Properties of excitons confined to potential fluctuations due to indium distribution in the wetting layer which accompany self-assembled InAs/GaAs quantum dots are reviewed. Spectroscopic studies are summarized including time-resolved photoluminescence and corresponding single-photon emission correlation measurements. The identification of charge states of excitons is presented which is based on results of a theoretical analysis of interactions between the involved carriers. The effect of the dots’ environment on their optical spectra is also shown.     

多层GaSb(QDs)/GaAs生长中量子点的聚集及发光特性

通过对多层GaSb量子点的生长研究,发现随着生长层数的增加,量子点尺寸逐渐变大,密度没有明显变化,并且量子点出现了聚集现象;当层数增加到一定数量、量子点聚集到一定大小时,聚集的量子点处会出现空洞。这些现象表明,各层量子点在生长过程中存在关联效应,并且GaAs层不能很好地覆盖在聚集的量子点之上,在继续生长其它量子点层时,聚集的量子点处在高温下出现GaSb的蒸发,从而出现空洞。PL谱出现了很宽的量子点发光峰,这很可能是由于多层量子点在生长时大小分布较宽而导致的结果。     

Ab initio-based approach to the reconstruction on InAs(111)A wetting layer grown on GaAs substrate

The surface reconstructions on InAs(111)A wetting layer grown on GaAs substrate are investigated by our ab initio-based approach incorporating the chemical potentials of In atom and As molecules in the vapor phase as functions of temperature and beam equivalent pressure. The calculated results imply that the most stable surface structure of InAs with/without lattice constraint from the substrate is the In-vacancy surface under conventional growth conditions. The In-vacancy surface is dramatically stabilized on the wetting layer, since the atoms around the In-vacancy are easily displaced to effectively lower the strain energy due to the lattice constraint from the GaAs substrate. Distinctive feature between InAs(111)A surfaces with and without lattice constraint is found in the stable adsorption sites. In adatoms favor the In-vacancy site on the InAs without lattice constraint in contrast to the interstitial sites on the InAs wetting layer. These results suggest that the surface structure and adsorption-desorption behavior on the wetting layer are crucial for investigating the growth processes of nanostructures such as quantum dots and stacking fault tetrahedrons.     

Structure of InAs/GaAs quantum dots grown with Sb surfactant

InAs quantum dots in GaAs, grown under the presence of Sb by metalorganic chemical vapor deposition, were studied with cross-sectional scanning tunneling microscopy. Large flat quantum dots with a truncated pyramidal shape, base lengths between 15 and 30 nm, heights of 1–3 nm, and a rather pure InAs stoichiometry were found for the case of an Sb supply during the InAs deposition. If Sb is already supplied during GaAs stabilization prior to InAs deposition, the dots become even larger and tend to get intermixed with Ga, but remain coherently strained with a reversed cone-like In distribution. Regarding the quantum dot growth Sb acts as surfactant, whereas an incorporation of individual Sb atoms was observed in the wetting layer.