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介绍了一种可应用于X射线Kirkpatrick-Baez(KB)显微镜的光学元件—X射线超反射镜。选用的W和B4C作为镀膜材料,膜对数为20,采用单纯型调优的方法实现了X射线超反射镜设计,用磁控溅射的方法在Si基片上完成了W/B4C X射线超反射镜的制备。采用高分辨率X射线衍射仪(8 keV)测量了X射线超反射镜的反射特性。制备的X射线超反射镜在掠入射角分别为1.052°和1.143°处,反射角度带宽为0.3°,反射率达到20%,可满足KB型显微镜的要求。 相似文献
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Ni/Ti multilayers, which can be used for neutron monochromators, are designed, fabricated and measured. Firstly, their reflectivities are simulated based on the Nevot-Croce model. Reflectivities of two Ni/Ti multilayer mirrors with periods d = 10.3 nm (M1) and d = 7.8 nm (M2) are calculated. In the calculation, the reflectivity of the Ni/Ti multilayer is taken as a function of the gazing angle with different roughness factors δ =1.0 nm and = 1.5 nm. Secondly, these two multilayers are fabricated by the direct current magnetron sputtering technology. Thirdly their structures are characterized by small-angle x-ray diffraction. The roughness factors are fitted to be 0.68 nm and 1.16nm for M1 and M2, respectively. Finally their reflective performances are measured on the V14 neutron beam line at the Berlin Neutron Scattering Centre (BENSC), Germany. The experimental data show that the grazing angle of the reflected neutron intensity peak increases, but the reflected neutron intensity decreases, with the decreasing periods of the multilayers. 相似文献
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Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements. 相似文献
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The multilayer (ML) mirror with high-reflectivity (HR) at a specific emission line of 19.5 nm (Fe line) and low-reflectivity (LR) at 30.4 nm (He line) is needed to be designed and fabricated for observing the image of sun. Based on a variety of optimizations utilized different structures, the design is performed and the final results demonstrate that the reflectivity at 30.4 nm does not achieve minimum value when the reflectivity at 19.5 nm reaches the maximum value. The tradeoff should be done between the HR at 19.5 nm and LR at 30.4 nm. One optimized mirror is fabricated by direct current magnetron sputtering and characterized by grazing-incident X-ray diffraction (XRD) and synchrotron radiation (SR). The experimental results demonstrate that the ML achieves the reflectivity of 33.3% at 19.5 nm and of 9.6× 10-4 at 30.4 nm at the incident angle of 13°. 相似文献
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The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱradiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5℃. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation. 相似文献
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The multilayer Laue lens (MLL) is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current (DC) magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35-41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale. 相似文献
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在北京同步辐射装置(BSRF)的3W1B软X射线光束线上利用自行研制的同步辐射软X射线综合偏振测量装置对Ni的M2,3边附近(60—70 eV)进行了软X射线磁光(magneto-optical)法拉第效应(Faraday effect)的偏转测量,实验装置主要由起偏器,检偏器,样品架,圆形钕铁硼永磁铁和MCP探测器组成,偏振元件(起偏元件和检偏元件)均采用反射式非周期性Mo/Si宽带多层膜.实验采用反射起偏和反射检偏的模式,得到一系列能量范围在60—70 eV间的法拉第偏转角结果,
关键词:
软X射线
磁光Faraday效应
综合偏振测量装置
宽带多层膜 相似文献