| 磁控溅射制备的W,WSi2,Si单层膜和W/Si,WSi2/Si多层膜应力 |
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| 引用本文： | 黄秋实,李浩川,朱京涛,王晓强,蒋励,王占山,唐永建.磁控溅射制备的W,WSi2,Si单层膜和W/Si,WSi2/Si多层膜应力[J].强激光与粒子束,2011,23(6):1659-1662. |
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| 作者姓名： | 黄秋实 李浩川 朱京涛 王晓强 蒋励 王占山 唐永建 |
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| 作者单位： | 1. 同济大学 物理系， 精密光学工程技术研究所， 上海 200092; 2. 上海市特殊人工微结构材料与技术重点实验室， 上海 200092; 3. 中国工程物理研究院 激光聚变研究中心， 四川 绵阳 621900 |
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| 基金项目： | 国家自然科学基金，科技部国际交流与合作专项项目 |
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| 摘 要： | 采用直流磁控溅射技术制备了厚度约100 nm的W,WSi2,Si单层膜和周期约为20 nm,Si膜层厚度与周期的比值为0.5的W/Si,WSi2/Si周期多层膜.利用台阶仪对镀膜前后基底表面的面形进行了测试,计算并比较了不同膜系的应力值.结果表明:W单层膜表现出较大的压应力,而W/Si周期膜则表现为张应力.WSi2单层...
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| 关 键 词： | 应力 形变 多层膜 磁控溅射 X射线 |
| 收稿时间： | 1900-01-01; |
Stress analysis of W, WSi2, Si single layers and W/Si, WSi2/Si multilayers fabricated by magnetron sputtering |
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| Huang Qiush,Li Haochuan,Zhu Jingtao,Wang Xiaoqiang,Jiang Li,Wang Zhanshan,Tang Yongjian.Stress analysis of W, WSi2, Si single layers and W/Si, WSi2/Si multilayers fabricated by magnetron sputtering[J].High Power Laser and Particle Beams,2011,23(6):1659-1662. |
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| Authors: | Huang Qiush Li Haochuan Zhu Jingtao Wang Xiaoqiang Jiang Li Wang Zhanshan Tang Yongjian |
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| Institution: | (1. Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092, China; . Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Tongji University, Shanghai 200092, China; . Research Center of Laser Fusion, CAEP, P. O. Box 919-987, Mianyang 621900, China) |
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| Abstract: | A series of W, WSi2, Si thin films and W/Si, WSi2/Si periodic multilayers were fabricated by using DC magnetron sputtering technology. Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated. The results indicate that W thin films show relatively large compressive stress, while W/Si multilayers show tensile stress. Both WSi2 thin films and WSi2/Si periodic multilayers show compressive stress. WSi2/Si periodic multilayers have the most stable stress state with no sharp change, and is a good material combination for X-ray multilayer optics with a large number of bilayers. |
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| Keywords: | deformation multilayer magnetron sputtering X-ray |
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