相对论效应实验中的数据处理

相对论效应实验是近年来新开设的较为成功的近代物理实验,目前已经编入我系及复旦、南开等院校物理系近代物理实验课程系列之中。有关该实验的原理和装置,作者已在本刊第7卷第4期刊登的“相对论效应实验及装置”一文中予以介绍。作为该文的续篇,本文将着重讨论相对论效应实验中有关数据处理方面的一些方法和特点。一、实验的总体安排本实验通过同时测定高速电子的动量值和动能来验证两者间具有相对论关系E_k=(p~2c~2+m~2c~4)~(1/2)-mc~2,并验证此关系在高能区(0.5～2.0MeV)明显有别于经典     

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.     

B_4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱradiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5℃. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.     

X射线天文望远镜的进展

综述了近年来X射线天文望远镜(如准直型望远镜、编码孔径望远镜、正入射周期多层膜望远镜、掠入射单层膜望远镜和掠入射非周期多层膜望远镜以及新型的“龙虾眼”型望远镜)的发展；阐述了各种X射线天文望远镜工作的原理和成像特点，指出各种X射线天文望远镜之间的性能是相互补充的；简要说明了国内近年来在X射线天文望远镜研究方面取得的进展，并展望了下一步工作．     

改进型验证相对论效应实验装置

验证相对论效应实验装置能够形象直观而又方便地验证快速电子的能量与动量的相对论关系，近年来的重新设计和改进在保留原有优点和特色的基础上改进了原装置的不足，突出了综合型、设计型的特点，真正达到了一机多用的目的，符合面向二十一世纪物理实验教学改革的趋势和方向。     

水窗波段反射式偏振光学元件的设计和制作

水窗波段是软X射线进行生物活细胞显微成像的最佳波段,因此对于水窗波段偏振光学元件的研究有着非常重要的意义。用菲涅耳公式计算出在水窗波段内不同材料组合对应不同波长的最大反射率,模拟分析了多层膜周期和表界面粗糙度对多层膜偏振光学元件性能的影响。用超高真空磁控溅射镀膜设备,制作出2．40nm、3．00nm和4．30nm波长处W／B4C多层膜偏振元件,并用X射线衍射仪对元件的周期厚度进行了测量,得到的测量结果与设计值偏差很小,可以进行实际应用。为水窗波段反射式偏振光学元件的研究提供了理论依据,同时也为相应偏振光学元件的制备确定了合适的工艺参量。     

具有禁带展宽特性的一维光子晶体

提出了介质的光学厚度系数成圆形分布的一维光子晶体结构,与周期结构的光子晶体相比,该结构具有禁带展宽特性.同时讨论了起止膜层及膜层的光学厚度对该结构禁带特性的影响,优化出了在所选材料的介电常数所允许的频率范围内,具有完全禁带特征的光子晶体结构.     

基于多层膜技术的硬X射线Laue透镜衍射效率的理论研究

采用耦合波理论分析了X射线在多层膜Laue透镜中的传播,选择Cu的Kα线作X射线光源,计算了多层膜Laue透镜的衍射效率.材料为WSi2/Si,最外层宽度为10 nm,深度为8 500 nm的多层膜Laue透镜,倾斜情况下外层区域局部光栅的衍射效率可达59%,理论上证明了多层膜Laue透镜是实现X射线聚焦的有效手段.     

Design, Fabrication and Measurement of Ni/Ti Multilayer Used for Neutron Monochromator

Ni/Ti multilayers, which can be used for neutron monochromators, are designed, fabricated and measured. Firstly, their reflectivities are simulated based on the Nevot-Croce model. Reflectivities of two Ni/Ti multilayer mirrors with periods d = 10.3 nm （M1） and d = 7.8 nm （M2） are calculated. In the calculation, the reflectivity of the Ni/Ti multilayer is taken as a function of the gazing angle with different roughness factors δ =1.0 nm and = 1.5 nm. Secondly, these two multilayers are fabricated by the direct current magnetron sputtering technology. Thirdly their structures are characterized by small-angle x-ray diffraction. The roughness factors are fitted to be 0.68 nm and 1.16nm for M1 and M2, respectively. Finally their reflective performances are measured on the V14 neutron beam line at the Berlin Neutron Scattering Centre （BENSC）, Germany. The experimental data show that the grazing angle of the reflected neutron intensity peak increases, but the reflected neutron intensity decreases, with the decreasing periods of the multilayers.     

X射线Kirkpatrick-Baez显微镜用超反射镜的研制

 介绍了一种可应用于X射线Kirkpatrick-Baez（KB）显微镜的光学元件—X射线超反射镜。选用的W和B₄C作为镀膜材料，膜对数为20，采用单纯型调优的方法实现了X射线超反射镜设计，用磁控溅射的方法在Si基片上完成了W/B₄C X射线超反射镜的制备。采用高分辨率X射线衍射仪（8 keV）测量了X射线超反射镜的反射特性。制备的X射线超反射镜在掠入射角分别为1.052°和1.143°处，反射角度带宽为0.3°，反射率达到20%，可满足KB型显微镜的要求。