Optical performance, structure and thermal stability of Al（lwt.-%Si）//Zr and Al（pure）//Zr multilayers designed for the 17-19 nm range

We report on the optical performance, structure and thermal stability of periodic multilayer films con- taining Zr and Al（lwt.-%Si） or Al（pure） layers designed for the use as extreme ultraviolet （EUV） high reflective mirrors in the range of 1~19 am. The comparison of A1/Zr （Al（lwt.-%Si）/Zr and Al（pure）/Zr） multilayers fabricated by direct-current magnetron sputtering shows that the optical and structural per- formances of two systems have much difference because of Si doped in A1. From the results of grazing incidence X-ray reflection （GIXR）, X-ray diffraction （XRD）, and EUV, the Si can disfavor the crystalliza- tion of AI and smooth the interface, consequently increase the reflectance of EUV in the Al（lwt.-%Si）/Zr systems. For the thermal stability of two systems, the first significant structural changes appear at 250 ~C. The interlayers are transformed from symmetrical to asymmetrical, where the Zr-on-A1 interlayers are thicker than Al-on-Zr interlayers. At 295 ~C for Al（pure）/Zr and 298 ~C for Al（lwt.-%Si）/Zr, the interfaces consist of amorphous Al-Zr alloy transform to polycrystalline Al-Zr alloy which can decrease the surface roughness and smooth the interfaces. Above 300 ~C, the interdiffusion becomes larger, which can enlarge the differences between Zr-on-Al and Al-on-Zr interlayers. Based on the analyses, the Si doped in Al cannot only influence the optical and structural performances of Al/Zr systems, but also impact the reaction temperatures in the annealing process.     

Thinning and polishing of cross-section of depth-graded WSi2 /Si multilayer for linear zone plate application

A linear zone plate named multilayer laue lens (MLL) is fabricated using a depth-graded multilayer structure. The lens shows considerable potential in focusing an X-ray beam into a nanometer scale with high efficiency. In this letter, a depth-graded multilayer consisting of 324 alternating WSi 2 and Si layers with a total thickness of 7.9 μm is deposited based on the thickness sequence according to the demands of the zone plate law. Subsequently, the multilayer sample is sliced and thinned to an ideal depth along the cross-section direction using raw abrasives and diamond lapping. Finally, the cross-section is polished by a chemical mechanical polishing (CMP) technique to remove the damages and improve the surface smoothness. The final depth of the MLL is approximately 7 μm with an achieved aspect ratio greater than 400. Results of scanning electron microscopy (SEM) and atomic force microscopy (AFM) indicate that interfaces are sharp, and the multilayer structure remains undamaged after the thinning and polishing processes. The surface roughness achieved is 0.33 nm.     

Schwarzschild物镜装卡应力对光学元件面形的影响

为了实现接近衍射极限的分辨率,工作在极紫外波段的Schwarzschild物镜要求其光学元件的面形精度达到约1 nm（RMS值）;而在物镜的装配过程中,装卡产生的应力会影响光学元件的面形精度,定量计算装卡应力对元件面形的影响是获得高分辨率成像的关键。在光学设计、公差分析的基础上,采用有限元模型系统地分析了应力对Schwarzschild物镜光学元件面形精度的影响。结果表明:采用自行设计的物镜结构,应力对主镜面形的影响可以达到0.7 nm,而对副镜的影响可以忽略;应力所产生的光学元件面形变化会使系统的几何传递函数(5000 lp/mm)从0.76下降到0.61。     

Fabrication and characterization of sliced multilayer transmission grating for X-ray region

To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi 2 /Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 μm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.     

磁控溅射制备极紫外高反射率多层膜应力研究

为制备硼边附近6.7 nm波长的极紫外高反射率多层膜反射镜,研究了Mo_2C/B_4C,Mo/B_4C周期多层膜,重点解决薄膜应力难题。采用直流磁控溅射技术制备了膜层厚度为30 nm的Mo,Mo_2C,B_4C,单层膜,周期厚度为3.5 nm,30对的Mo_2C/B_4C,Mo/B_4C周期多层膜。利用台阶仪测试了镀膜前后基底面形,计算并比较了不同薄膜样品的应力值。结果表明Mo_2C/B_4C多层膜压应力要远小于Mo/B_4C多层膜,且成膜质量与Mo/B_4C相当。因此Mo_2C/B_4C是应用于6.7 nm反射镜较好的多层膜材料组合。     

基于多层膜技术的硬X射线Laue透镜衍射效率的理论研究

采用耦合波理论分析了X射线在多层膜Laue透镜中的传播,选择Cu的Kα线作X射线光源,计算了多层膜Laue透镜的衍射效率.材料为WSi2/Si,最外层宽度为10 nm,深度为8 500 nm的多层膜Laue透镜,倾斜情况下外层区域局部光栅的衍射效率可达59%,理论上证明了多层膜Laue透镜是实现X射线聚焦的有效手段.     

多层膜聚光镜对Schwarzschild显微镜成像均匀性的影响

 提出了利用多层膜聚光镜提高Schwarzschild显微镜成像均匀性的方法。设计了聚光镜的光学结构,使80%的等离子体辐射能量会聚在约0.8 mm直径的范围内。根据成像系统的工作波长和光线在聚光镜表面的入射角度,设计了Mo/Si周期多层膜,制备了聚光镜光学元件,膜层周期厚度为9.64 nm,周期数为30,对18.2 nm波长的峰值反射率为51.7%。利用所设计的聚光镜作为照明系统,对Schwarzschild物镜进行了网格成像实验。结果表明:在1.2 mm视场内可以实现2.5 μm的空间分辨力,并且完全消除了物镜中心遮拦所造成的像面光强分布不均匀性。     

Epoxy replication of hard X-ray supermirrors

The direct replication of W/Si supermirrors is investigated systematically. W/Si supermirrors are fabricated by direct current(DC) magnetron sputtering technology. After deposition,the supermirrors are replicated from the supersmooth mandrels onto ordinary float glass substrates by epoxy replication technique. The properties of the supermirrors before and after the replication are characterized by grazing incidence X-ray reflectometry(GIXR) measurement and atomic force microscope(AFM) . The results show that before and after replication,the multilayer structures are almost the same and that the surface roughness is 0.240 and 0.217 nm,respectively,which are close to that of the mandrel. It is demonstrated that the W/Si supermirrors are successfully replicated from the mandrel with good performance.     

适用于激光聚变实验的短焦距高放大倍率Wolter显微镜设计

围绕内爆压缩及阻滞阶段相关物理实验的诊断需求,提出了一种满足阿贝正弦条件的短焦距高放大倍率Wolter-Ⅲ型X射线显微镜的光学设计。详细介绍了Wolter-Ⅲ型显微镜的结构特点和设计方法,与Wolter-Ⅰ型相比可以通过将主平面向靠近物点方向移动的方式减小系统焦距,从而获得更大的放大倍数,实现显微镜与探测器的像质匹配,提高诊断系统的空间分辨。由光线追迹可以得出,在±190 μm的视场范围内,空间分辨率优于3 μm;在±240 μm范围内分辨率优于5 μm;在±300 μm范围内分辨率优于8 μm,几何集光立体角约为5×10?6 sr。     

Color space conversion of digital photofinishing by neural network

Digital photofinishing is developed with the combine ofdigital technology and silver printing technology. To re-produce high-quality image on printing paper, the colorspace conversion between colorimetric values and expo-sure control must be set up. However, this relation isvery difficult and is almost impossible to be expressedby a theoretical equation. Currently, neural network andthree-dimensional lookup table (3D LUT) are the rela-tively feasible method[1]. Comparatively, neural networkc…