共查询到18条相似文献,搜索用时 281 毫秒
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本文研究了Pd2Si的生成对周期性Pd/Si多层膜X射线衍射性能的影响。X射线衍射强度的测量数据表明Pd2Si的生成对长周期多层膜的衍射强度影响不大,但对短周期多层膜衍射强度的影响较大。在引入折射率修正后,我们不仅用单个峰的位置计算了多层膜的周期,而且还用了以两个峰的位置联立消去折射率修正的方法计算了多层膜的周期,前者的误差大于后者。模拟计算的结果说明:均匀Pd2Si层的生成不足以解释Pd/Si多层膜衍射强度随退火温度的变化,界面的平整化或粗糙化是影响衍射强度的另一个要素。
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多层膜界面粗糙度、入射光单色性对软X射线多层膜实际反射率均有影响。利用数学卷积积分,理论上推导出一个在入射光不同单色性下精确计算多层膜反射率的公式。利用给出的理论计算公式,简要分析了入射光不同单色性、不同界面粗糙度对Mo/Si多层膜反射率的影响。理论分析发现这两种因素对Mo/Si多层膜反射率影响完全不同:入射光低的单色性不但极大降低Mo/Si多层膜峰值反射率,而且使反射曲线的半峰全宽增加;而界面粗糙度是降低Mo/Si多层膜反射曲线上各点对应值,基本不改变Mo/Si反射曲线的半峰全宽,不改变反射曲线的形状。说明这两个因素在软X射线的长波段对多层膜反射性能的影响不同。 相似文献
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薄膜、多层膜和一维超点阵材料的X射线分析新进展 总被引:9,自引:0,他引:9
X射线散射和衍射对于厚度为几个原子层到几十微米的薄膜材料是灵敏的。一般而言,X射线方法是非破坏性的,其中不要求样品制备,它们提供恰如其分的技术路线,以获得薄膜材料的结构等信息;分析能对从完整单晶膜和多晶膜到非晶膜的所有材料进行。本文评述了用X射线方法表征和研究这类薄膜材料的新进展。全文包括引论、常用的X射线方法、原子尺度薄膜的研究、工程薄膜和多层膜的研究、一维超点阵结构研究、超点阵界面粗糙度的X射线散射理论、不完整性和应变的衍射空间图或倒易空间图研究七个部分 相似文献
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X射线散射和衍射对于厚度为几个原子层到几十微米的薄膜材料是灵敏的。一般而言,X射线方法是非破坏性的,其中不要求样品制备,它们提供恰如其分的技术路线,以获得薄膜材料的结构等信息;分析能对从完整单晶膜和多晶膜到非晶膜的所有材料进行。本文评述了用X射线方法表征和研究这类薄膜材料的新进展。全文包括引论、常用的X射线方法、原子尺度薄膜的研究、工程薄膜和多层膜的研究、一维超点阵结构研究、超点阵界面粗糙度的X射线散射理论、不完整性和应变的衍射空间图或倒易空间图研究七个部分 相似文献
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A series of Mo/Si multilayers with the same periodic length and different periodic number were prepared by magnetron sputtering, whose top layers were respectively Mo layer and Si layer. Periodic length and interface roughness of Mo/Si multilayers were determined by small angle X-ray diffraction (SAXRD).Surface roughness change curve of Mo/Si multilayer with increasing layer number was studied by atomic force microscope (AFM). Soft X-ray reflectivity of Mo/Si multilayers was measured in National Synchrotron Radiation Laboratory (NSRL). Theoretical and experimental results show that the soft X-ray reflectivity of Mo/Si multilayer is mainly determined by periodic number and interface roughness, surface roughness has little effect on reflectivity. 相似文献
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为了实现对Mo/Si多层膜的结构表征,测量了多层膜样品的小角X射线衍射谱。介绍了小角X射线衍射谱的分析方法,包括Bragg峰值拟合法,傅里叶变换法,反射谱拟合法。Bragg峰值拟合法和反射谱拟合法得到多层膜的周期厚度为7.09nm,两种模型的反射谱拟合法得到界面的粗糙度(扩散长度)为0.40~0.41nm(Si在Mo上),0.52~0.70nm(Mo在Si上),前者要比后者小,这与透射电镜法(TEM)得到的结果0.40nm(Si在Mo上),0.6~0.65nm(Mo在Si上)是一致的。通过基于扩散模型的反射谱拟合法得到的折射率剖面也与由高倍率透射电镜(HRTEM)积分得到的灰度值剖面在趋势上是一致的。通过X射线衍射谱和TEM图像对Mo/Si多层膜进行综合表征,得到了多层膜的精细结构信息,这对多层膜制备工艺的优化具有十分重要的意义。 相似文献
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FENG Shimeng YI Kui ZHAO Qiang TANG Zaosen FAN Zhengxiou 《Chinese Journal of Lasers》2000,9(2):134-139
1 IntroductionThe study of the roughness of multilayers has been widely reported, the roughnesswas considered as a Debye factor and detedrined by fitting the theoretical reflectivitywith the measured reflectivityL'--']. HOwever, the practical interfacial structUre oftenincludeS the roughness and the diffuse layer, both Of which have the different influenceon the X-my reflectivity, separately. So it is not very reaSOnable only consider theroUghness of the interface as a Debye factor.We kno… 相似文献
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This paper integrates the roughness with the diffuse layer as a transited layer factor for study of influence of the practical interface on the X-ray diffraction intensity of multilayer. By the study of a simple model of transited layer presented in this paper, it is given a formula to describe the quantitative relation of the transited layer with the X-ray diffraction intensity. The calculated thickness of transited layer of Mo/Si multilayer is given, which is consisted with the values measured with the high resolution microscopy. 相似文献
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软X射线Mo/Si多层膜反射率拟合分析 总被引:12,自引:5,他引:7
由于多层膜的表界面粗糙度和材料之间的相互扩散等因素,导致多层膜的实际反射率小于理论计算的反射率,因此,多层膜结构参量的确定对镀膜工艺参量的标定具有重要意义。由于描述单个非理想粗糙界面散射的Stearns法适用于软X射线短波段区域,采用它的数学模型来描述软X射线多层膜的粗糙度,利用最小二乘法曲线拟合法对同步辐射测得的Mo/Si多层膜的反射率曲线进行拟合,得到了非常好的拟合结果,从而确定了多层膜结构参量,同时分析了多层膜周期厚度,厚度比率,界面宽度以及仪器光谱分辨率对多层膜反射特性的影响,这些工作都为镀膜工艺改进提供了一定的理论依据。 相似文献
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S.M. Feng G.L. Zhu J.D. Shao K. Yi Z.X. Fan X.M. Dou 《Applied Physics A: Materials Science & Processing》2002,74(4):553-555
We deposited Co/C multilayer mirrors for a wavelength of 4.77 nm and W/Si multilayer mirrors for a wavelength of 1.77 nm by
use of ion-beam sputtering. The small-angle diffraction spectrum was used to analyze the structure of the multilayers. With
a combination of the experimental diffraction spectra and Apeles’ theory for calculation of the interfacial roughnesses of
the multilayers, the interfacial roughnesses of Co/C and W/Si are 0.80 nm and 0.60 nm, respectively, which are lower than
that of the substrate. The reflectivity of the Co/C multilayer is measured to be about 20% and that of the W/Si multilayer
about 1% at the grazing incidence angle of about 12°.
Received: 30 May 2000 / Accepted: 1 August 2000 / Published online: 11 February 2002 相似文献