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排序方式: 共有273条查询结果,搜索用时 15 毫秒
1.
为了研究高功率系统中高反膜的损伤机制,对高功率系统中最常用的基频高反膜进行了损伤实验。利用台阶仪、扫描电镜、表面轮廓仪等手段,对实验样品的典型损伤形貌进行了比较和分析。结果表明:保护膜的存在增强了样品的抗激光损伤能力;未加保护膜样品的典型破坏形貌是由材料热物特性差异导致的分层剥落损伤,这类损伤在后续的脉冲辐照下会迅速发展;有保护膜样品的典型破坏形貌是中心带有μm量级小坑的等离子体烧蚀损伤区,其主要是由缺陷受热力作用喷溅导致,小坑附近膜面的凸起是这种力学作用的宏观体现,这类损伤在后续的脉冲辐照中表现得相对比较稳定。保护膜的存在,在一定程度上抑制了分层剥落这种灾难性损伤的出现,改善了样品的损伤特性。 相似文献
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In the comparison of damage modifications, absorption measurement and energy dispersive x-ray analysis, the effect of vacuum on the laser-induced damage of anti-reflection coatings is analyzed. It is found that vacuum decreases the laser-induced damage threshold of the films. The low laser-induced damage threshold in vacuum environments as opposed to air environments is attributed to water absorption and the formation of the O/Si, O/Zr sub-stoichiometry in the course of laser irradiation. 相似文献
3.
在千焦拍瓦高功率放大系统设计中,激光脉冲的时空和光谱整形技术一直受到人们的广泛关注。利用反应离子束刻蚀等微纳超精细加工而成的多层电介质结构反射镜可在高功率条件下实现啁啾脉冲的光谱整形。在光谱整形介质结构反射镜的设计与制造中,需要根据要求的反射率来合理提出反应离子束刻蚀误差容限指标。推导出反应离子束刻蚀误差容限的解析表达式。针对神光Ⅱ千焦拍瓦高功率放大系统设计中提出的多层介质光谱调制反射镜,分析了调制结构反射镜各层加工的容许误差,确定了反应离子束刻蚀误差容限指标。研究表明:刻蚀高折射率介质的加工误差容限为35 nm;刻蚀低折射率介质的加工误差容限为62 nm。此外,还从使用需要和加工难易的角度,对刻蚀方案进行了讨论。就加工难易程度而言,优选反应离子束刻蚀方案,且采用刻蚀并残留低折射率介质的方案更容易实现。 相似文献
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Graded index broadband antireflection coating prepared by glancing angle deposition for a high-power laser system 下载免费PDF全文
This paper reports that SiO2 is selected to fabricate broadband antireflection(AR) coatings on fused silica substrate by using glancing angle deposition and physical vapour deposition.Through accurate control of the graded index of the SiO 2 layer,transmittance of the graded broadband AR coating can achieve an average value of 98% across a spectral range of 300-1850 nm.Moreover,a laser-induced damage threshold measurement of the fabricated AR coating is performed by using a one-on-one protocol according to ISO11254-1,resulting in an average damage threshold of 17.2 J/cm2. 相似文献
6.
薄膜吸收是降低膜层激光损伤阈值的重要原因,为了研究薄膜吸收对激光损伤阈值的影响,对HfO2单层膜在1 064 nm处的吸收及其在不同波长激光辐照下的损伤阈值进行了测试和分析。研究结果表明:薄膜的激光损伤阈值由薄膜吸收平均值(决定于薄膜中缺陷的种类和数量)和吸收均匀性(决定于薄膜中缺陷的分布)共同决定;根据HfO2单层膜在1064 nm波长处的吸收值,不但可以定性判断薄膜在1 064 nm波长,而且还可以判断在其它波长激光辐照下的抗激光损伤能力。 相似文献
7.
<正>The optical performance of thin film polarizers is highly sensitive to the layer thicknesses of thin film.The thicknesses of the sensitive layers are optimized in order to gain broader polarizing zone in such case when the total layer thickness does not increase.An automatic layer thickness control system is established,and errors caused by different monitoring methods are analyzed.With this thickness control system,thin-film polarizers with T_p higher than 98%and T_p/T_s higher than 200:1(T_p and T_s are transmissions for p- and s-polarizations,respectively) with the bandwidth of 11 nm are prepared.Using the system allows for optimum repeatability of three successive runs. 相似文献
8.
Based on polarization state conversion, a technique for coaxially coherent combination of laser beams is introduced. Laser beams can be coaxially coupled into one beam with high combination efficiency and perfect beam quality. A polarized laser beam combination system based on master oscillator power amplifier (MOPA) configuration is developed and the efficiencies of both unit combination and the whole system are investigated. In the experiment of combining four beams with single longitudinal mode, a combination efficiency of 85.3% is achieved. It can be further enhanced by improving the stability of experimental environment and the quality of optical and mechanical components. 相似文献
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Laser Damage Mechanisms of Amorphous Ta2O5 Films at 1064, 532 and 355nm in One-on-One Regime 下载免费PDF全文
Ta2O5 films are deposited on fused silica substrates by conventional e-beam evaporation. Surface topography and chemical composition are examined by atomic force microscopy (AFM) and x-ray photoelectron spectroscopy (XPS). The calculation of electron structures of Ta2O5 and Ta2O5-x is attempted using a first-principle pseudopotential method within the local density approximation. The laser-induced damage threshold (LIDT) is performed at 1064, 532 and 355 nm in 1-on-1 regime, respectively. The results show that the LIDT increases with the wavelength increasing, which is in agreement with the wavelength effect. However, the LIDT results are not consistent with the empirical equation (I(λ)=aλm), which may be attributed to the intrinsic absorption of Ta2O5 at the wavelengths of 532 or/and 355 nm. Moreover, different damage morphologies are observed when the films are irradiated at different wavelengths. It is concluded that the laser damage at 1064 nm is the defect dominant mechanism and at 355 nm it is the intrinsic absorption dominant mechanism, whereas at 532 nm it is the combined defect and intrinsic absorption dominant mechanism. 相似文献