25 MeV/u Kr辐照下PET薄膜的损伤机制研究

通过25 MeV/u 86 Kr离子辐照叠层结晶聚对苯二甲酸乙二醇酯膜（PET）, 在不同的电子能损（3.40-7.25 keV/nm）和离子注量(5×1011----3×1012 ions/cm2)辐照条件下, 对Kr离子在PET中引起的辐照损伤效应进行了研究。借助傅里叶变换红外光谱分析,通过对样品的红外吸收峰进行扣除基底后的Lorentz拟合,分析了与主要官能团对应的吸收峰强度的变化趋势, 研究了化学结构与组分在重离子辐照下的变化规律; 利用X射线衍射光谱仪测量, 研究了Kr离子在PET潜径迹中引起的非晶化过程,并通过对吸光度和非晶化强度随离子注量的指数衰减规律的分析, 获得了不同电子能损离子辐照PET时主要官能团的损伤截面和非晶化截面及对应的潜径迹半径。 At room temperature, polyethylene terephthalate(PET) foil stacks were irradiated by 25 MeV/u Kr ions in the electronic stopping power range(3.3--7.66 keV/nm) and the fluence range from 5×1011 to 3×1012 ions/cm2. The behaviour of the main function groups with fluence and electronic stopping power were studied by using Fourier transform infrared(FTIR) spectroscopy, the degradation of the function group was investigated with the Lorentz fitting subtracted baseline. The amorphous processes in the latent tracks of PET were studied by X ray diffraction(XRD) measurements. The Kr ion induced degradation cross section and amorphisation cross sections(radii) for different electronic energy loss were acquired from the experimental data(FT IR and XRD) by exponential decay function respectively.      

56Fe13+离子引起GaP晶体的微结构损伤

利用X射线衍射（XRD）技术、傅里叶变换红外光谱（FTIR）和Raman光谱对经不同剂量的56Fe13+离子辐照的GaP晶体的微结构进行了表征。结果表明:随着辐照离子剂量的增加,GaP晶体中产生了局部的无序与缺陷。随着56Fe13+离子剂量的增加,Raman光谱展示出振动峰强度逐渐减弱而且一些逐渐消失,但其峰位几乎没有发生变化;XRD显示出GaP晶体的衍射峰的强度逐渐减小;FTIR主要表现为宽化及其强度增加。这表明重离子56Fe13+的辐照使得GaP晶体中的缺陷与无序性增加,导致晶体产生了局部的非晶化。The Misconstructural damage of GaP irradiated with 56Fe13+ to fluences ranging from 1×107 ions/cm2~1×1010 ions/cm2 were analyzed by X-ray diffraction (XRD) techniques, Fourier transform infrared spectroscopy (FTIR) and Raman spectroscopy. The result shows that, with the increase of irradiation ion fluences, local disorder and defects were produced in GaP crystal. With the increase of ion fluence, Raman spectra reveal the intensity of scattering peaks gradually weakens and some scattering peaks gradually disappear, however no changes in the peak position were found. XRD measurement displays that the intensity of diffraction peaks gradually decreases with an increase in ions fluences. Result from FTIR spectra exhibits that the intensity of reflection peaks gradually increases and the FWHM of reflection peaks broadens. These phenomena indicate that, the irradiation of heavy-ion Fe produces defects and disorder in GaP crystal, leading to a local amorphization.     

快重离子辐照引起Ni/SiO2界面原子混合及相变研究

在室温下用308 MeV的Xe离子和853 MeV的Pb离子辐照Ni/SiO2样品, 用卢瑟福背散射和X射线衍射技术对样品进行了分析。 通过分析Ni/SiO2样品中元素成分分布和结构随离子辐照剂量和电子能损的变化, 探索了离子辐照在Ni/SiO2样品中引起的界面原子混合与结构相变现象。 实验结果显示, Xe和Pb离子辐照均能引起明显的Ni原子向SiO2基体的扩散并导致界面附近Ni, Si和O原子的混合。 实验观测到低剂量Xe离子辐照可产生NiSi2相, 而高剂量Xe离子辐照则导致了Ni3Si和NiO相的形成。 根据热峰模型, Ni原子的扩散和新相的形成可能由沿离子入射路径强电子激发引起的瞬间热峰过程驱动。Ni/SiO2 interface were irradiated at room temperature with 308 MeV Xe ions to 1×1012, 5×1012 Xe/cm2 and 853 MeV Pb ions to 5×1011 Pb/cm2, respectively. These samples were analyzed using Rutherford Backscattering Spectrometry (RBS) and X ray diffraction spectroscopy (XRD), from which the intermixing and phase change were investigated. The obtained results show that both Xe and Pb ions could induce diffusion of Ni atoms to SiO2 substrates and result in intermixing of Ni with SiO2. Furthermore, 1.0×1012 Xe/cm2 irradiation induced the formation of NiSi2 and 5.0×1012 Xe/cm2 irradiation created Ni3Si and NiO phases. The diffusion of Ni atoms and the formation of new phase may be driven by a transient thermal spike process induced by the intense electronic energy loss along the incident ion path.     

Ne离子束辐照引起Gd2Ti2O7烧绿石体积肿胀效应研究

在液氮低温下用400 keV的Ne2+离子束对Gd₂Ti₂O₇多晶烧绿石进行了辐照实验研究, 离子束辐照量范围为5×1014—1×1016ions/cm2。利用掠X射线衍射技术对样品辐照层的结构变化进行了分析表征, X射线的掠射角分别为γ=0.25°, 0.5°, 1°和3°。结果表明: 在该实验条件的离子束辐照下, Gd₂Ti₂O₇辐照层会发生明显的体积肿胀效应, 体积肿胀程度随入射离子束辐照量的增大而增大; 在同一辐照量下, 辐照层的体积肿胀程度也随X射线入射角的增大而增大。当辐照量达到1×1016ions/cm2时, 辐照层发生非晶化相变。Polycrystalline pyrochlore Gd₂Ti₂O₇ compounds were irradiated with 400 keV Ne2+ ions at cryogenic temperature (~77 K). The irradiation fluences was ranging from 5×1014 to 1×1016 ions/cm2, corresponding to a peak ballistic damage dose of ~0.16 to 3.3 displacements per atom . Irradiation\|induced structural evolution was examined using grazing incidence X\|ray diffraction (GIXRD) at angles from 0.25° to 3° degrees. It was found that the lattice parameter increases as a function of (1) X\|ray incident angle and (2) ion irradiation fluence, suggesting that the irradiated layer is volumetrically swelled compared with the underlying un\|irradiated substrate. At ion fluence of 1×1016 ions/cm2, the irradiation layer was found to be amorphous.     

22 MeV/u的Fe离子在PET 膜中引起的辐照效应研究

用能量为22 MeV/u的 Fe离子在室温和真空条件下辐照了多层堆叠的半晶质聚酯膜, 采用傅里叶转换红外吸收光谱、 紫外/可见吸收光谱 和X射线衍射技术分析测量了辐照后聚酯膜的微观结构所发生的变化, 详细研究了分子结构的变化和非晶化转变与离子剂量、 离子在样品中的平均电子能损以及吸收剂量的依赖关系． 分析结果表明: 辐照导致化学键的断裂、 新化学键的形成和非晶化转变． 非晶化效应和化学键的断裂随离子剂量和电子能损的增加而增大, 但变化的总量仅依赖于总的吸收剂量, 表明在所涉及的能损范围里, 辐照产生的变化与辐照离子的种类和能量没有直接的关系, 而只决定于材料对辐照离子能量的吸收程度． Semicrystalline polyethylene terephthalate (PET) film stacks were irradiated with 22 MeV/u Fe ions at room temperature under vacuum. Ion beam induced microscopic structural modifications and amorphous transformation were investigated by means of Fourier transform infrared spectrosocopy (FTIR), ultraviolet visible absorption spectrosocopy (UV/Vis) and X ray diffractometer (XRD). It was found that irradiation induces bond breaking, formation of new free radiculs and amorphous transformation. These effects were found to depend on ion fluence , the electronic energy loss and aborbed dose. The creation of alkyne groups was found only at the aborbed dose higher than 5.0 MGy.     

Structural and optical investigation of nonpolar a-plane GaN grown by metal-organic chemical vapour deposition on r-plane sapphire by neutron irradiation

Nonpolar (1120) a-plane GaN films are grown by metal-organic chemical vapour deposition (MOCVD) on r-plane (1102) sapphire.The samples are irradiated with neutrons under a dose of 1 × 10 15 cm 2.The surface morphology,the crystal defects and the optical properties of the samples before and after irradiation are analysed using atomic force microscopy (AFM),high resolution X-ray diffraction (HRXRD) and photoluminescence (PL).The AFM result shows deteriorated sample surface after the irradiation.Careful fitting of the XRD rocking curve is carried out to obtain the Lorentzian weight fraction.Broadening due to Lorentzian type is more obvious in the as-grown sample compared with that of the irradiated sample,indicating that more point defects appear in the irradiated sample.The variations of line width and intensity of the PL band edge emission peak are consistent with the XRD results.The activation energy decreases from 82.5 meV to 29.9 meV after irradiation by neutron.     

Structural, electrical and optical characterization of InGaN layers grown by MOVPE

We present a study on n-type ternary InGaN layers grown by atmospheric pressure metalorganic vapour phase epitaxy(MOVPE) on GaN template/(0001) sapphire substrate.An investigation of the different growth conditions on n-type InxGa1 xN(x = 0.06 0.135) alloys was done for a series of five samples.The structural,electrical and optical properties were characterized by high resolution x-ray diffraction(HRXRD),Hall effect and photoluminescence(PL).Experimental results showed that different growth conditions,namely substrate rotation(SR) and change of total H2 flow(THF),strongly affect the properties of InGaN layers.This case can be clearly observed from the analytical results.When the SR speed decreased,the HRXRD scan peak of the samples shifted along a higher angle.Therefore,increasing the SR speed changed important structural properties of InGaN alloys such as peak broadening,values of strain,lattice parameters and defects including tilt,twist and dislocation density.From PL results it is observed that the growth conditions can be changed to control the emission wavelength and it is possible to shift the emission wavelength towards the green.Hall effect measurement has shown that the resistivity of the samples changes dramatically when THF changes.     

离子注入/辐照引起Al2O3单晶的改性研究

600K温度下用110keV的He^＋,Ne^＋,Ar^＋离子注入及320K温度下用230MeV的^208Pb^27＋辐照Al2O3单晶样品,研究了离子注入和辐照对Al2O3单晶样品结构和光学特性的影响。从测得的光致发光谱可以清楚地看到,所有样品在波长为375,413和450nm处出现了强的发光峰。且所有5×10^16ion／cm^2注入样品的发光峰均最强。经过高能Pb辐照后的样品,在390nm处出现了新的发光峰。透射电镜分析发现在注入氖样品100nm入射深度以内形成了高浓度的小空洞（1-2nm）,在Ne沉积区域有少量大空洞形成。傅立叶变换红外光谱分析发现,波数在460-510cm^-1间的振动吸收带经过离子辐照后展宽,随着辐照量的增大,该振动吸收强度显著减弱。1000—1300cm^-1对应Al-O-Al桥氧伸缩振动模式的吸收带,辐照后向高波数方向移动。对离子注入和辐照对Al2O3单晶样品结构损伤机理进行了初步探讨。Single crystal sapphire （Al2O3 ） samples were implanted at 600 K by He, Ne and Ar ions with energy of 110 keV to doses ranging from 5 × 10^16 to 2× 10^17 ion/cm^2 or irradiated at 320 K by ^208Pb^27＋ ion with energy of 1.1 MeV/u to the fluences ranging from 1 × 10^12 to 5 × 10^14 ion/cm^2. The modification of structure and optical properties induced by ion implantation or irradiation were analyzed by using photoluminescence（PL） and Fourier transformation infrared spectrum（FIR） spectra and transmission electron microscopy（ TEM ） measurements. The PL measurements showed that absorption peaks located at 375,413 and 450 nm appeared in all the implanted or irradiated samples, the PL intensities reached up to the maximum for the 5 × 10^16 ion/cm^2 implanted samples. After Pb-ion irradiation, a new peak located at 390 nm formed. TEM analyses showed that small size voids,（ 1--2 nm） with high density were formed in the region from the surface till to about 100 nm in depth and also large size Nebubble formed in the Ne-doped region. From the obtained FTIR spectra, it was found that Pb-ion irradiation induced broadening of the absorption band in 460-510 cm^-1 and position shift of the absorption band in 1 000- 1 300 cm^- 1 towards to high wavenumber. The possible damage mechanism in single crystal sapphire induced by energetic ion implantation or irradiation was briefly discussed.     

Luminescence mechanism and energy level structure of Eu-doped GaN powders investigated by cathodoluminescence spectroscopy

1.5at% Eu-doped GaN powders were prepared by a co-precipitation method.Powder X-ray diffraction(XRD)results shows that there is only the wurtzite phase.Cathodoluminescence spectra were measured at room temperature and liquid nitrogen temperature,respectively.The band-to-band luminescence of GaN was shifted from 373 nm to 368 nm with the temperature decreasing from room temperature to liquid nitrogen temperature.The luminescence peaks at 537,557,579,590,597,614,653 and 701 nm are attributed to the Eu ions related transitions in the host of GaN powders and the peak positions were not influenced by the variation of temperature.With the increase of accelerating voltage,the intensity of all luminescence peaks was increased.The strongest luminescence peak at 614 nm shows non-symmetrical shape and is composed of 612,615 and 621 nm through Lorentzian fitting,which indicates there are oxygen and nitrogen environments of the Eu3+ions in the Eu-doped GaN powders.     

一种低活化铁素体/马氏体钢的高能重离子辐照效应研究

低活化的铁素体/马氏体钢是先进核能装置（如聚变堆）的重要候选结构材料。 在聚变堆实际工作环境下, 由于高温和高氦产生率引起的材料失效是这类材料面临的一个重要问题。 本项研究以兰州重离子加速器（HIRFL）提供的中能惰性气体离子束（20Ne, 122 MeV）作为模拟辐照条件, 借助透射电子显微镜, 研究了一种低活化的9Cr铁素体/马氏体钢（T92B）组织结构的变化和辐照肿胀。 实验结果表明, 高温下当材料中晶格原子的撞出损伤和惰性气体原子沉积浓度超过一定限值时, 材料内部形成高浓度的空洞, 并且空洞肿胀率显著依赖于辐照温度和剂量; 在马氏体板条界面及其它晶界处空洞趋于优先形成, 并且在晶界交汇处呈加速生长。 基于氦泡的形核生长与空洞肿胀的经典模型探讨了在不同辐照条件（He离子、 Ne离子、 Fe/He离子双束、 快中子、 Ni离子）下铁素体/马氏体钢中肿胀率数据的关联。Low activation Ferritic/Martensitic steels are a kind of important structural materials candidate to the application in advanced nuclear energy systems. Possible degradation of properties and even failure in the condition of high temperature and high helium production due to energetic neutron irradiation in a fusion reactor is a major concern with the application of this kind of materials. In the present work microstructural evolution in a 9Cr Ferritic/Martensitic steel (T92B) irradiated with 122 MeV 20Ne ions at temperatures between 0.3—0.5 Tm (Tm is the melting point of the material) was investigated with transmission electron microscopy. High concentration voids were observed in the specimens irradiated at high temperatures when the displacement damage dose and Ne concentration exceed a certain level. Preferential formation of voids at lath boundaries and other grain boundaries was found. The data of void swellings in 9Cr ferritic/martensitic steels irradiated in different conditions (such as with He ions, Ne ions, Fe/He dual beams, fast neutrons, Ni ions etc.) were compiled and analyzed based on a classic model of helium bubble formation, and bubble to void transition.     

Effect of 100 MeV Ni ion irradiation on MOCVD grown n-GaN

Metal-organic chemical vapor deposition (MOCVD) grown n-type Gallium nitride (GaN) has been irradiated with 100 MeV Ni⁹⁺ ions at room temperature. Atomic force microscopy (AFM) images show the nano-clusters' formation upon irradiation and the irradiated GaN surface roughness increases with the increasing ion fluences. High-resolution X-ray diffraction (HR-XRD) analysis reveals the formation of Ga₂O₃ due to the interface mixing of GaN/Al₂O₃ upon irradiation. FWHM values of GaN (0 0 0 2) increases due to the lattice disorder. Photoluminescence studies show reduced band edge emission and yellow luminescence (YL) intensity with the increasing ion fluences. Change in the band gap energy between 3.38 and 3.04 eV was measured by UV-visible optical absorption spectrum on increasing the ion fluences.     

Eu掺杂GaN薄膜的阴极荧光特性

通过MOCVD方法在蓝宝石衬底上生长GaN薄膜,利用离子注入方法将Eu³⁺离子注入到GaN基质中。X射线衍射结果表明：经过退火处理后,修复了部分离子注入所导致的晶格损伤。利用阴极荧光光谱可得到GaN∶Eu³⁺材料在623 nm处有很强的红光发射,该发射峰来源于Eu³⁺离子的内部4f能级跃迁。另外,Eu³⁺离子注入会在样品中引入电荷转移态,产生408 nm附近的发光。退火处理有助于获得更强的电荷转移态发光和Eu离子特征发光。GaN基质的黄光峰与Eu离子之间存在能量交换,将能量传递给Eu离子,促进Eu离子发光。     

Synthesis of blue-shifted luminescent colloidal GaN nanocrystals through femtosecond pulsed laser ablation in organic solution

We demonstrate the synthesis of GaN nanocrystals (NCs) with the sizes of less than the doubled exciton Bohr radius leading quantum confinement effects via a single-step technique. The generation of colloidal GaN nanoparticles (NPs) in organic solution through nanosecond (ns) and femtosecond (fs) pulsed laser ablation (PLA) of GaN powder was carried out. Ns PLA in ethanol and polymer matrix resulted in amorphous GaN-NPs with the size distribution of 12.4 ± 7.0 and 6.4 ± 2.3 nm, respectively, whereas fs PLA in ethanol produced colloidal GaN-NCs with spherical shape within 4.2 ± 1.9 nm particle size distribution. XRD and selected area electron diffraction analysis of the product via fs PLA revealed that GaN-NCs are in wurtzite structure. Moreover, X-ray photoelectron spectroscopy measurements also confirm the presence of GaN nanomaterials. The colloidal GaN-NCs solution exhibits strong blue shift in the absorption spectrum compared to that of the GaN-NPs via ns PLA in ethanol. Furthermore, the photoluminescence emission behavior of fs PLA-generated GaN-NCs in the 295–400 nm wavelength range is observed with a peak position located at 305 nm showing a strong blue shift with respect to the bulk GaN.     

Investigation of structural and optical properties of nanoporous GaN film

The structural and optical characteristics of porous GaN prepared by Pt-assisted electroless etching under different etching durations are reported. The porous GaN samples were investigated by scanning electron microscopy (SEM), high-resolution X-ray diffraction (HR-XRD), photoluminescence (PL) and Raman scattering. SEM images indicated that the density of the pores increased with the etching duration; however, the etching duration has no significant effect on the size and shape of the pores. XRD measurements showed that the (0 0 0 2) diffraction plane peak width of porous samples was slightly broader than the as-grown sample, and it increased with the etching duration. PL measurements revealed that the near band edge peak of all the porous samples were red-shifted; however, the porosity-induced PL intensity enhancement was only observed in the porous samples; apart from that, two additional strain-induced structural defect-related PL peaks observed in as-grown sample were absent in porous samples. Raman spectra showed that the shift of E₂ (high) to lower frequency was only found in samples with high density of pores. On the contrary, the absence of two forbidden TO modes in the as-grown sample was observed in some of porous samples.     

Epitaxial growth of GaN on Si (100)/sapphire (0001) using RF plasma-assisted ionized source beam epitaxy

A new approach to epitaxial GaN growth utilizing radiofrequency plasma-assisted ionized source beam epitaxy (PAISBE) is described. To facilitate the reaction between Ga and atomic nitrogen, the Ga beam was partially ionized and accelerated. The reactive atomic nitrogen flux was obtained from an RF discharge nitrogen plasma with controllable power and frequency. A grid was placed at the exit end of the plasma tube to prevent N _inf2 ^up+ from hitting the substrate. The growth parameters were chosen to systematically investigate the effects of Ga-beam ionization and grid bias. The crystal quality of the PAISBE-grown GaN was analysed by RHEED and x-ray diffraction. The FWHM of a 0.4-m-thick GaN epilayer grown with ionized Ga beam and RF nitrogen plasma with 140W power was measured to be 25 min at (0002) diffraction peak. This and other preliminary data from the present study indicate that PAISBE is a promising technique for GaN growth.     

Ca2SnO4∶Tb3+绿色荧光粉的制备及光致发光研究

采用高温固相法合成了Ca2 SnO4∶Tb3+绿色荧光粉.利用X射线衍射分析了Ca2 SnO4∶Tb3+物相的形成.测量了Ca2 SnO4∶Tb3+的激发和发射光谱,激发光谱由一个宽激发峰组成,研究了Tb3+浓度对样品激发光谱的影响,结果显示,随Tb3+浓度增大,宽带激发峰发生了红移.发射光谱由四个主要发射峰组成,峰值...     

Comprehensive study of blue and green multi-quantum-well light-emitting diodes grown on conventional and lateral epitaxial overgrowth GaN

Growths of blue and green multi-quantum wells (MQWs) and light-emitting diodes (LEDs) are realized on lateral epitaxial overgrowth (LEO) GaN, and compared with identical structures grown on conventional GaN. Atomic force microscopy is used to confirm the significant reduction of dislocations in the wing region of our LEO samples before active-region growth. Differences between surface morphologies of blue and green MQWs are analyzed. These MQWs are integrated into LEDs. All devices show a blue shift in the electroluminescence (EL) peak and narrowing in EL spectra with increasing injection current, both characteristics attributed to the band-gap renormalization. Green LEDs show a larger EL peak shift and a broader EL spectrum due to larger piezoelectric field and more indium segregation in the MQWs, respectively. Blue LEDs on LEO GaN show a higher performance than those on conventional GaN; however, no performance difference is observed for green LEDs on LEO GaN versus conventional GaN. The performance of the green LEDs is shown to be primarily limited by the active layer growth quality.     

GaN1-xPx三元合金的光学与结构特性

对采用金属有机化学气相淀积(MOCVD)技术生长的GaN1-xPx三元合金进行了低温光致发光(PL)和X射线衍射(XRD)测试分析,与来自GaN层的带边发射相比,P的摩尔分数比为0．03,0．11和0．15的GaN1-xPx的光致发光峰分别呈现出了73meV,78meV和100meV的红移,文中将这种红移归因于GaN1-xPx合金具有大的带隙能量弯曲系数。X射线衍射结果表明GaN1-xPx三元合金仍为六方结构晶体,且随着P组份比的增加,GaN1-xPx合金的(0002)衍射峰逐渐向小角度方向移动,即晶格常量变大,同时,(0002)衍射峰谱线不断宽化,说明由于替位式P原子的不规则分布以及部分间隙P原子的影响造成了GaN1-xPx样品的晶格畸变。在GaN1-xPx的光致发光谱及X射线衍射谱中均未观测到相应的有关GaP的峰,表明所生长的高P含量的GaN1-xPx三元合金没有产生明显的相分离。     

Strain Effect on Photoluminescences from InGaN MQWs with Different Barriers Grown by MOCVD

InGaN/GaN MQWs, InGaN/AlGaN MQWs and InGaN/AlInGaN MQWs are grown on （0001） sapphire substrates by MOCVD. Membrane samples are fabricated by laser lift-off technology. The photoluminescence spec-ra of membranes show a blue shift of peak positions in InGaN/GaN MQWs, a red shift of peak positions in InGaN/AlGaN MQWs and no shift of peak positions in InGaN/AIlnGaN MQWs from those of samples with substrates. Different changes in Raman scattering spectra and HR-XRD （0002） profile of InGaN/AlInGaN MQWs, from those of InGaN/GaN MQWs and InGaN/AlGaN MQWs, are observed. The fact that the strain changes differently among InGaN MQWs with different barriers is confirmed. The AIlnGaN barrier could adjust the residual stress for the least strain-induced electric field in InGaN/AIlnGaN quantum wells.