高能Xe离子辐照引起的注碳a:SiO2中新结构的形成

先用120keV的碳离子注入非晶二氧化硅a:SiO2薄膜，再用能量为1754MeV的Xe离子辐照。注碳量为5．0×10^16—8．6×10^17ion／cm^2，Xe离子辐照剂量为1．0×10^11和5．0×10^11ion／cm^2。辐照后的样品中形成的新结构用显微傅立叶变换红外光谱仪进行测试分析。结果表明，Xe离子辐照引起了注碳a:SiO2中Si—C，C—C，Si—O—C键以及CO和CO2分子的形成与演化。在注碳量较高时，Xe离子辐照在样品中产生了大量的Si—C键。与注入未辐照和辐照的低注碳量样品比较，增强的Si—C键的形成，预示着辐照可引起注碳a:SiO2样品中的SiC结构相变。Amorphous silicon-dioxide （a:SiO2） films were firstly implanted at room temperature （RT） with 120 keV C-ions to doses ranging from 5.0 × 10^16 to 8.6 × 10^17 ion/cm^2, and then the C-doped a:SiO2 films were irradiated at RT with 1 754 MeV Xe ions to 1.0 × 10^11 and 5.0 × 10^11 ion/cm^2, respectively. The information of new tex- ture formation in the C-doped SiO2 films after high-energy Xe ion irradiation was investigated using micro-FTIR measurements. The obtained results showed that Si--C, C--C, Si--O--C bonds as well as CO and CO2 molecules were formed in the C-doped a-SiO2 films after Xe ion irradiation. Furthermore, Xe-ion irradiation induced a plenteous formation of Si--C bonds in the high dose C-ion implanted a:SiO2 films. Compared with the C-implanted sampies without Xe-ion irradiation and the low dose C-implanted samples with Xe-ion irraddiation, the enhanced and plenty of Si--C bond formation implied that the phase of SiC structures may be produced by Xe-ion irradiation in the high dose C-ion implanted a:SiO2 films.     

Fe/Nb多层膜中离子辐照效应研究(英文)

〗采用磁控溅射技术在Si衬底上沉积Si/\[Fe(10 nm)/Nb(4 nm)/Fe(4 nm)/Nb(4 nm)\]2/ \[Fe(4 nm)/Nb(4 nm)\]4多层膜。 用2 MeV的 Xe离子在室温下辐照多层膜。采用俄歇深度剖析、X射线衍射和振动样品磁强计分析辐照引起的多层膜元素分布、 结构及磁性变化。AES深度剖析谱显示当辐照注量达到1.0×1014 ions/cm2时, 多层膜界面两侧元素开始混合; 当辐照注量达到2.0×1016ions/cm2时, 多层膜层状结构消失, Fe层与Nb层几乎完全混合。XRD谱显示, 当辐照注量达到1.0×1014ions/cm2时, Nb的衍射峰和Fe的各衍射峰的峰位相对于标准卡片向小角方向偏移, 这说明辐照引起Nb基和Fe基FeNb固溶体相的形成;当辐照注量大于1.0×1015 ions/cm2时, 辐照引起非晶相的出现。 VSM测试显示,多层膜的磁性随着结构的变化而变化。 在此实验基础上, 对离子辐照引起界面混合现象的机理进行了探讨。The behavior of the metallic multilayers of Si/\[Fe(10 nm)/Nb(4 nm)/Fe(4 nm)/ Nb(4 nm)\]2/\[Fe(4 nm)/Nb(4 nm)\]4 under 2 MeV Xe ion irradiation has been investigated by depth profile analysis of Auger electron spectroscopy,X ray diffraction and vibrating sample magnetometer. The obtained experimental results show that the inter mixing between Fe and Nb layers occurs in the 1.0×1014 ions/cm2 irradiated multilayer sample which results in the formation of Nb based and Fe based FeNb solid solution. For the samples irradiated to fluence larger than 1.0×1014 ions/cm2, amorphisation is observed, and moreover, the layered structure of the multilayer samples is broken up completely for the samples under 1.0×1016 or 2.0×1016 ions/cm2 irradiation. Vibrating sample magnetometer measurement also reveals that the magnetization of the samples changes with the evolution of the structure of multilayers. Possible mechanism of the modification in Fe/Nb multilayers induced by Xe ion irradiation is briefly discussed.     

25 MeV/u Kr辐照下PET薄膜的损伤机制研究

通过25 MeV/u 86 Kr离子辐照叠层结晶聚对苯二甲酸乙二醇酯膜（PET）, 在不同的电子能损（3.40-7.25 keV/nm）和离子注量(5×1011----3×1012 ions/cm2)辐照条件下, 对Kr离子在PET中引起的辐照损伤效应进行了研究。借助傅里叶变换红外光谱分析,通过对样品的红外吸收峰进行扣除基底后的Lorentz拟合,分析了与主要官能团对应的吸收峰强度的变化趋势, 研究了化学结构与组分在重离子辐照下的变化规律; 利用X射线衍射光谱仪测量, 研究了Kr离子在PET潜径迹中引起的非晶化过程,并通过对吸光度和非晶化强度随离子注量的指数衰减规律的分析, 获得了不同电子能损离子辐照PET时主要官能团的损伤截面和非晶化截面及对应的潜径迹半径。 At room temperature, polyethylene terephthalate(PET) foil stacks were irradiated by 25 MeV/u Kr ions in the electronic stopping power range(3.3--7.66 keV/nm) and the fluence range from 5×1011 to 3×1012 ions/cm2. The behaviour of the main function groups with fluence and electronic stopping power were studied by using Fourier transform infrared(FTIR) spectroscopy, the degradation of the function group was investigated with the Lorentz fitting subtracted baseline. The amorphous processes in the latent tracks of PET were studied by X ray diffraction(XRD) measurements. The Kr ion induced degradation cross section and amorphisation cross sections(radii) for different electronic energy loss were acquired from the experimental data(FT IR and XRD) by exponential decay function respectively.      

HIRFL辐照终端照射野均匀度与离子通量的关系

采用固体核径迹探测器聚碳酸脂膜,测定了兰州重离子研究装置提供的55MeV/u40Ar和80MeV/u20Ne离子束经辐照终端束流均匀化扫描装置后照射野均匀度与离子通量之间的关系.结果表明:对于40Ar和20Ne离子束,离子通量小于1×106和2×107ions/cm2时,横向照射野均匀度缓Ne离子束照射慢增加;当离子通量分别介于1×106—1×107和2×107—1×108ions/cm2时,40Ar和20野均匀度逐渐增加;离子通量达到1×107和1×108ions/cm2时,40Ar和20Ne离子束照射野均匀度分别约为58%和61%.从而说明,辐照终端束流扫描装置对束流的均匀化程度目前并不能满足辐照生物效应、辐射育种和重离子治癌等研究工作的需要,须对其性能做进一步的提高. Using 55 MeV/u 40Ar and 80 MeV/u20Ne ion beams delivered by the Heavy Ion Research Facility at Lanzhou (HIRFL), the relationships between the irradiation homogeneities in irradiation fields generated by the beam scanning device located at the irradiation terminal of the HIRFL and ion fluence were measured respectively with 100 μm polycarbonate films by means of nuclear track detection. The results show that the homogeneity increases when the ion fluence are lower than ........     

高能重离子辐照的ODS铁素体钢脆化效应研究

与传统的铁素体钢相比,氧化物弥散强化(ODS) 的铁素体钢具有更优的耐高温和抗辐照性能,近年来成为先进核能装置重要的候选结构材料。在HIRFL 的扇聚焦型回旋加速器(SFC) 材料辐照终端,对一种氧化物弥散强化(ODS) 铁素体钢MA956 进行了高能Ne 离子辐照实验,旨在研究级联碰撞损伤和惰性气体原子注入条件下该材料力学性能的变化。利用辐照终端的能量衰减装置将SFC出口123.4 MeV的离子能量分解为介于38.5~121.0 MeV之间的30 个入射能量值,并通过双面辐照在厚度60 μm的样品中均匀产生了损伤。辐照剂量为9x1016 ions/cm2,在样品中的平均位移损伤为0.7 dpa,注入的Ne原子浓度为350 appm。辐照期间样品温度保持在440 ℃附近。对辐照前后的样品分别在室温和500 ℃下进行了小冲杆试验(Small-punchTest),获得了辐照前后样品的加载位移曲线,由此得到该辐照条件下样品的延性损失为18%~26%。通过扫描电子显微镜观察了断口形貌和厚度变化,估算了样品的等效断裂应变和断裂韧性。结果表明,MA956 钢经过高能Ne离子辐照后等延伸率减小,断裂韧性降低,样品发生了一定的脆化。透射电镜结果说明氧化物弥散相界面处微空洞的形成可能是导致脆化的原因。Oxide dispersion strengthened (ODS) ferritic steels have better high-temperature creep rupture strength and higher irradiation resistance than conventional ferritic steels, and show high prominence of application in advance nuclear reactors. Their stability under high-dose radiation conditions needs to be clarified. In the present study, a commercial ODS ferritic steel MA956 were irradiated with high 20Ne ions at a terminal chamber of the Sector-focused Cyclotron (SFC) at HIRFL (Heavy-ion Research Facility in Lanzhou). With the energy gradient degrader of the irradiation chamber, the primary energy (123.4 MeV) of the Ne-ion was dispersed into 30 different energies between 38.5~ 121.0 MeV, which resulted in a plateau distribution of lattice damage in the specimens. The specimens were irradiated from both sides so that the whole 60 m thickness was nearly uniformly damaged. The specimen temperature was maintained around 440 ℃ during the irradiation. The irradiation dose is about 9x1016 ions/cm2, corresponding to a damage level of 0.7 dpa and a Ne concentration of 350 appm. The specimens before and after irradiation were tested with the Small-punch Test technique, at room temperature and 500 ℃, respectively. The fracture morphology was observed by scanning electron microscopy.The results show that MA956 underwent some loss of ductility and fracture toughness after the irradiation with high-energy 20Ne ions. It may be ascribed to the formation of nano-scale cavities at the oxides/matrix interfacesin the ODS steel specimens under irradiation .     

离子辐照引起的金属／绝缘体界面混合与相变研究

载能离子穿过固体界面引起界面原子迁移使界面原子混合和物质成分变化，从而导致界面发生材料相变。简要介绍了载能离子辐照引起金属／绝缘体界面混合效应及相变现象的主要实验研究进展、低能离子和高能离子辐照引起金属／绝缘体界面现象差异，并对离子辐照引起界面混合及相变的机制进行了初步探讨。When penetrating an interface between two kind of solids, energetic ions can induce atomic diffusion at both sides of the interface and then result in intermixing, atom re-distribution or composition change, as well as phase transformation. Main progress on the study of intermixing and phase change at metal/insulator interface induced by energetic ion irradiations, the difference of phenomena occurred at metal/insulator interfaces induced by high-and low-energy ions were briefly reviewed. Furthermore, the possible mechanisms related to intermixing and phase change at metal/insulator interface produced by energetic ion irradiations were also discussed in short words.     

高能Pb离子辐照注碳SiO2的红外谱研究

室温下，先用120keV的C离子注入二氧化硅薄膜样品至剂量2.0×1017、5.0×1017或8.6×1017ions/cm2，再用950MeV的Pb离子分别辐照至剂量5.0×1011、1.0×1012或3.8×1012 ions/cm2，然后测量样品的傅里叶变换红外(FTIR)光谱. 通过分析测量得到的傅里叶变换红外谱，发现Pb离子辐照在注碳SiO₂样品中可引起大量的Si－C和Si (C)－O－C等化学键的形成，大剂量Pb离子辐照可在大剂量注碳的SiO₂中产生分子CO₂. 大量的Si－C键的存在和分子CO₂的形成，预示着高能Pb离子辐照在注碳SiO₂样品中有可能形成了纳米Si团簇和/或SiC晶粒.     

94MeV Xe离子辐照引起的薄膜硅光学带隙变化研究

室温下,用94MeV的Xe离子辐照纳米晶和非晶硅薄膜以及单晶硅样品,辐照量分别为1.0×1011,1.0×1012和1.0×1013ions/cm2。所有样品均在室温下用UV/VIS/NIR光谱仪进行检测分析。通过对比研究了纳米晶、非晶、单晶硅样品的光学带隙随Xe离子辐照量的变化。结果表明,不同结构的硅材料中Xe离子辐照引起的光学带隙变化规律差异显著:随着Xe离子辐照量的增加,单晶硅的光学带隙基本不变,非晶硅薄膜的光学带隙由初始的约1.78eV逐渐减小到约1.54eV,而纳米晶硅薄膜的光学带隙则由初始的约1.50eV快速增大至约1.81eV,然后再减小至约1.67eV。对硅材料结构影响辐照效应的机理进行了初步探讨。     

快重离子辐照对MoS2热导率的影响研究

利用0.97 GeV的209Bi离子辐照二硫化钼（MoS₂）晶体,辐照注量范围为1×1010～1×1012 ions/cm2,结合原子力显微镜（AFM）观测和Raman光谱分析研究了快重离子辐照对MoS₂热导率的影响。实验结果显示,快重离子辐照在MoS₂中产生了潜径迹,较高激光功率下的Raman测试使样品局部温度升高,导致E_1/2g和A_1g峰随注量增加向低波数方向移动,且峰形展宽。引入了通过改变激光功率测量Raman光谱得到MoS₂热导率的计算方法,获得了不同辐照注量下MoS₂的热导率的定量分析结果,随注量增加,热导率不断降低,从未辐照样品的563 W/mK下降到1×1012 ions/cm2辐照时的132 W/mK。Molybdenum disulphide (MoS₂) was irradiated by 0.97 GeV 209Bi ions with the fluence of 1×1010 to 1×1012 ions/cm2. The irradiation effect on the thermal conductivity of MoS₂ was analyzed by atomic force microscope (AFM) and Raman spectroscopy. The experimental results show that hillock-like latent tracks are observed on irradiated MoS₂ by AFM. The measurement of MoS₂ by Raman spectrometer with high laser power results in the increase of local temperature of MoS₂, which cause the downshift of peaks position and broadening of E_1/2g and A_1g peak. Furthermore, according to Raman spectra measured at different laser power, thermal conductivity of MoS₂ before and after irradiation was calculated, which show that the thermal conductivity of MoS₂ decreases with increasing fluence, from 563 to 132 W/mK for pristine and 1×1012 ions/cm2 irradiated MoS₂, respectively.     

Ne离子束辐照引起Gd2Ti2O7烧绿石体积肿胀效应研究

在液氮低温下用400 keV的Ne2+离子束对Gd₂Ti₂O₇多晶烧绿石进行了辐照实验研究, 离子束辐照量范围为5×1014—1×1016ions/cm2。利用掠X射线衍射技术对样品辐照层的结构变化进行了分析表征, X射线的掠射角分别为γ=0.25°, 0.5°, 1°和3°。结果表明: 在该实验条件的离子束辐照下, Gd₂Ti₂O₇辐照层会发生明显的体积肿胀效应, 体积肿胀程度随入射离子束辐照量的增大而增大; 在同一辐照量下, 辐照层的体积肿胀程度也随X射线入射角的增大而增大。当辐照量达到1×1016ions/cm2时, 辐照层发生非晶化相变。Polycrystalline pyrochlore Gd₂Ti₂O₇ compounds were irradiated with 400 keV Ne2+ ions at cryogenic temperature (~77 K). The irradiation fluences was ranging from 5×1014 to 1×1016 ions/cm2, corresponding to a peak ballistic damage dose of ~0.16 to 3.3 displacements per atom . Irradiation\|induced structural evolution was examined using grazing incidence X\|ray diffraction (GIXRD) at angles from 0.25° to 3° degrees. It was found that the lattice parameter increases as a function of (1) X\|ray incident angle and (2) ion irradiation fluence, suggesting that the irradiated layer is volumetrically swelled compared with the underlying un\|irradiated substrate. At ion fluence of 1×1016 ions/cm2, the irradiation layer was found to be amorphous.     

单晶YSZ的Xe+辐照损伤的电子显微分析

 不同注量200keV Xe⁺ 注入YSZ单晶样品的电子显微分析结果表明，随着辐照注量的增加，缺陷簇的密度增大，在1×10¹⁵~1×10¹⁶cm^-2Xe⁺注量，缺陷簇密度迅速增大，形成间隙型位错环；当Xe⁺注量增大到1×10¹⁷cm^-2，缺陷簇密度的增加变得缓慢，并且有直径为2～4nm的Xe气泡析出。选区电子衍射花样表明YSZ样品没有产生非晶化转变。在Xe⁺辐照的离位率高达约350dpa的情况下，YSZ晶体没有非晶化，其原因主要是由于注入的Xe⁺以气泡形式析出。     

Atomic mixing of Ni2O3/SiO2, NiO/SiO2, and Ni/SiO2 interfaces induced by swift heavy ion irradiation

We have investigated the interface mixing of Ni₂O₃/SiO₂, NiO/SiO₂, and Ni/SiO₂ induced by the irradiation with Ar, Kr and Xe ions of energies ranging from 90 MeV to 260 MeV. Since these energies are in the electronic stopping regime, atomic transport processes will not be directly initiated by elastic ion–target collisions, but need to be excited by secondary processes like electron–phonon coupling or Coulomb explosion. Nevertheless, we have observed a strong mixing effect in the ceramic systems if the electronic energy loss exceeds a certain threshold value. Estimation of an effective diffusion constant indicates that diffusion takes place in the molten ion track. In contrast to the ceramics, the metallic Ni layer is still insensitive even for the highest electronic stopping power used (S_e=28 keV/nm) and does not exhibit mixing with its SiO₂ substrate. In addition, NiO/SiO₂ and Ni/SiO₂ were irradiated in the nuclear stopping regime with 600 keV Kr and 900 keV Xe–ions. Here the intermixing effect is in good agreement with the assumption of ballistic atomic transport. Received: 5 February 2002 / Accepted: 11 February 2002 / Published online: 3 May 2002 RID="*" ID="*"Corresponding author. Fax: +49-711/685-3866, E-mail: bolse@ifs.physik.uni-stuttgart.de     

退火对Pb辐照Al2O3单晶发光特性的影响

研究了230MeV的²⁰⁸Pb²⁷⁺辐照Al₂O₃样品及随后在600,900,1100K高温条件下退火后的光致发光特性。从辐照样品的测试结果可以清楚地看到在波长为390,450nm处出现了强的发光峰。辐照量为1×10¹³ions/cm²时,样品的发光峰最强。经过600K退火2h后测试结果显示,380nm发光峰剧烈增强,而其他发光峰显示不明显。在900K退火条件下,380nm的发光峰开始减弱,而在360,510nm出现了明显的发光峰,至到1100K退火完毕后380nm的发光峰完全消失,而360,510nm的发光峰相对增强。从被辐照样品的FTIR谱中看到,波数在460~510cm^-1间的吸收是振动模式,经过离子辐照后,吸收带展宽,随着辐照量的增大,Al₂O₃振动吸收峰消失,说明Al₂O₃振动模式被完全破坏。1000~1300cm^-1之间为Al—O—Al桥氧的伸缩振动模式,辐照后吸收带向高波数方向移动,说明其振动模式受到影响。辐照剂量较小的样品,损伤程度相对较低,经退火晶化后,振动模式基本恢复到单晶状态;辐照剂量较高的样品,损伤程度大,退火处理后表面变得较粗糙,振动模式并未出现,说明结构破坏严重。     

Structural phase transformation in ZnS nanocrystalline thin films by swift heavy ion irradiation

Zinc sulfide (ZnS) thin films in zinc-blende (ZB) and wurtzite (W) phases have been fabricated by pulsed laser deposition. 150 MeV Ni ion beam irradiation has been carried out at different fluences ranging from 10¹¹ to 10¹³ ions/cm² at room temperature for ion induced modifications. Structural phase transformation in ZnS from W to ZB phase is observed after high energy ion irradiation which leads to the decrease in bandgap. Generation of high pressure and temperature by thermal spike during MeV ion irradiation along the ion trajectory in the films is responsible for the structural phase transformation.     

Phase formation by ion beam mixing in the Ti/Si multilayer system

The irradiation effect of 350 MeV Au⁺ ions on Ti/Si multilayers has been studied using Rutherford backscattering spectroscopy, X-ray reflectivity (XRR) and grazing incidence X-ray diffraction (GIXRD). Intermixing effects have been studied as a function of fluences of 0.46 × 10¹⁴, 1.82 × 10¹⁴ and 4.62 × 10¹⁴ cm⁻². Rutherford backscattering spectra (RBS) confirm mixing at the interface. X-ray reflectivity patterns show damage at the interfaces with the absence of a continuous fringe pattern at high fluence doses in comparison to the pristine interface. Mixing leads to titanium di-silicide (TiSi₂) phase formation as a shown by grazing incidence X-ray diffraction patterns. The observed intermixing is attributed to energy deposited by the incident ions in the electronic system of the target. Swift heavy ion irradiation induced intermixing increases with fluence.     

80keV N离子注入对ZnO薄膜结构的影响

室温下用80keVN离子注入ZnO薄膜样品,注量分别为5.01014,5.01015和5.01016ions/cm2,然后用X射线衍射和透射电镜技术对样品的结构特性进行了表征。实验结果表明,由高度(002)择优取向的致密柱状晶构成的薄膜中,注入5.0×1015ions/cm2时,观测到缺陷生成和局域无序化现象,但薄膜总体结构仍保持柱状晶和(002)择优取向;随着注量的增大,晶格常数c和压应力呈增大趋势。对注入N离子对ZnO薄膜结构特性的影响机理进行了简单的讨论。