ECR源低能强流高电荷态离子束四维发射度测量仪的研制

为全面研究ECR（Electron Cyclotron Resonance）离子源引出的高电荷态离子束流品质,获取ECR离子源引出离子束流的横向四维相空间分布,提高向加速器的注入效率,中国科学院近代物理研究所研制了一台高精度Pepper Pot型发射度测量仪PEMiL（Pepper pot Emittance Meter in Lanzhou）。根据使用需求,利用KBr晶体喷涂技术取代传统的CsI闪烁体成像技术,解决了束流光斑重叠效应,获得了边界清晰的束流图像;并开发了相应的数据处理分析程序,以分析处理得到的束流横向四维相空间分布。利用PEMiL获得了75 keV,170 eμA的O5+束流横向四维发射度。分析结果表明:PEMiL测量分析后的束流发射度结果可靠性高,荧光屏电荷累积效应造成的发射度差异不超过25%,PEMiL可作为ECR离子源引出离子束流品质诊断的有效装置。     

2.45GHz ECR 强流等离子体源核心部件设计与实验研究

电子回旋共振(Electron Cyclotron Resonance,ECR)等离子体源能产生高电荷态离子、高流强的单电荷态离子，提供稳定的束流和良好的重复性.核心部件的设计对ECR等离子体源是至关重要的，磁场对等离子体的生成和分布有直接影响，良好的磁场可以提高等离子体的性能和效率.采用有限元分析方法对ECR等离子体源磁场进行分析与设计，得到了满足设计需求与目标的磁场位形，通过高斯计对设计的永磁环轴向磁场精确测量，发现磁场仿真结果与实验结果吻合比较好，只是轴向磁场最大值及对应位置上有点偏差.通过集成实验，研究核心部件对离子源引出束流强度的影响，引出束流稳定且强度达到7 m A.     

A Single Charge State ECR Ion Source

介绍了一台2.45GHz电子回旋共振（ECR）单电荷离子源的磁场场形,以及它和总束流的关系． 并且比较了国际上现有的几台同类型离子源的磁场场形． 由此得出了关于2.45GHz ECR 离子源磁场场形的一些结论．     

用于高电荷态离子与表面相互作用研究的原子物理实验平台

在重离子加速器国家实验室ECR离子源上,成功组建了用于高电荷态离子与表面相互作用研究的原子物理实验平台;利用该实验平台,研究了用不同电荷态和不同速度的高电荷态离子与不同表面相互作用的可见光和X射线发射的情况,同时还研究了高电荷态Xe离子轰击晶体材料所引起的材料性质和表面结构变化的情况.     

高电荷态ECR离子源引出束流4D 发射度测量仪设计

为了进一步探究高电荷态电子回旋共振(ECR) 离子源引出束流品质和横向相空间耦合情况,根据中国科学院近代物理研究所高电荷态离子源引出束流发射度测量需求,针对束流流强为1 eμA∼1 emA,能量范围为10∼35 keV/q 的直流或脉冲高电荷态重离子束,设计了一台实时四维Pepper-pot 发射度测量仪。该Pepper-pot 型发射度测量仪具有响应时间快和工作范围宽等特点。针对强流重离子束诊断的特点,在结构与材料选择上做了设计与优化,并对获得图像的处理方法提出了具体的解决办法。For the purpose of on-line beam quality diagnostics and transverse emittance coupling investigation of the ion beams delivered by an Electron Cyclotron Resonance (ECR) ion source, a real-time 4D Pepper Pot type emittance scanner is under development at IMP(Institute of Moden Physics, Chinese Academy of Sciences). The high charge state ECR ion source at IMP could produce CW or pulsed heavy ion beam intensities in the range of 1 eμA∼1 emA with the kinetic energy of 10∼35 keV/q, which needs the design of the Pepper Pot scanner to be optimized accordingly. The Pepper Pot scanner has many features, such as very short response time and wide dynamic working range that the device could be applied. Since intense heavy ion beam bombardment is expected for this device, the structure and the material selection for the device is specially considered during the design, and a feasible solution to analyze the pictures acquired after the data acquisition is also made.     

首次使用核反应法鉴别JUNA深地加速器A/q=2的束流种类

JUNA团队计划利用CJPL所提供的极低本底条件和400 kV高压平台上2.45 GHz ECR离子源产生的毫安量级束流首次在天体物理能区对关键核反应进行直接测量。实验需要10 emA的质子束流和He+束流以及2 emA的He2+束流。使用2.45 GHz离子源产生毫安量级的He2+束流是离子源制造的难点。由于离子源分析磁铁分辨能力有限,无法区分He2+和H+₂离子,本文首次使用核反应法对离子源产生的A/q=2的束流进行了鉴别,结果显示,JUNA项目2.45 GHz ECR离子源无法产生毫安量级的He2+束流。该研究成果为JUNA项目离子源的设计提供了重要的参考依据。JUNA团队另外研制了一台微波频率为14.5 GHz的ECR离子源并成功产生2 emA的He2+束流来满足实验需求。     

ECR源在回旋加速器上的运行

ECR 源是目前国际上重离子加速器领域中具有发展前景的新型离子源。经过长期的研究试验,不断地得到完善,目前已投入回旋加速器上进行。这是ECR 源实用性的飞跃。这里介绍美国劳伦斯实验室(LBL)的88时回旋加速器上首次使用ECR 源所提供的较高电荷态的重离子进行加速,系统提供了物理宴验的束流运行情况。     

Afterglow工作模式下ECR离子源脉冲束的产生

为满足国家大科学工程兰州重离子冷却储存环的要求,在14.5GHz ECR 离子源上进行afterglow工作模式的实验,首次产生了高电荷态脉冲束流Ar¹¹⁺和Ar¹²⁺,给出了初步实验结果,并对结果进行了分析和解释.     

单粒子态ECR离子源

介绍了一台2.45GHz电子回旋共振(ECR)单电荷离子源的磁场场形,以及它和总束流的关系.并且比较了国际上现有的几台同类型离子源的磁场场形.由此得出了关于2.45GHzECR离子源磁场场形的一些结论.     

高电荷态金属离子的产生实验研究

 为满足兰州重离子加速器的实验要求，在14.5GHz高电荷态ECR离子源上做了一系列产生金属离子的实验，尝试了多种方法，包括炉子加热及MIVOC（Metallic Ion form Volatile Compounds）两种方法，其中，用炉子做的结果较理想。实验主要研究了铜、锌、镍多种电荷态离子的产生，具有代表性的是39euA的¹³⁺，30euA的Zn¹³⁺和29euA的Ni¹⁰⁺。分别给出了这三种金属离子产生的多电荷态束流峰谱图，以及实验的一些其它现象及结果，并对其进行了讨论与总结。     

LAPECR2离子源在320kV高压平台上的试运行

The high charge state all permanent Electron Cyclotron Resonance Ion Source(ECRIS)LAPECR2 (Lanzhou All Permanent magnet ECR ion source No.2)has been successfully put on the 320kV HV platform at IMP and also has been connected with the successive LEBT system.This source is the largest and heaviest all permanent magnet ECRIS in the world.The maximum mirror field is 1.28T(without iron plug)and the effective plasma chamber volume is as large as (?)67mm×255mm.It was designed to be operated at 14.5GHz and aimed to produce medium charge state and high charge state gaseous and also metallic ion beams.The source has already successfully delivered some intense gaseous ion beams to successive experimental terminals.This paper will give a brief overview of the basic features of this permanent magnet ECRIS.Then commissioning results of this source on the platform,the design of the extraction system together with the successive LEBT system will be presented.     

一台14.5GHz新型高磁场高电荷态ECR离子源

自行研制成功一台14.5GHz新型高磁场高电荷态电子回旋共振(ECR)离子源.描述了该离子源结构特点、参数优化及其磁场分布,并给出了调试测量结果.该离子源轴向磁镜场在轴线上的最高磁场可达1.5T,六极永磁体在弧腔内表面磁场可达1.0T.经初步调试,可得到0⁷+140eμA,Ar¹¹+185eμA,Xe²⁶⁺50eμA.所得结果与1998年国际上最好的ECR离子源进行了比较.     

LECR2离子源的改造及初步运行结果

The Latest developed LECR2M (Lanzhou ECR No.2 Modified)source is the updated one of LECR2(Lanzhou ECR No.2)source at IMP.It has been assembled on the low energy ion beam experimental platform to produce MCI beams for atomic physics and material pllysics experimental research.In our updating program,the structure of injection and extraction components has been modified to make the source structure more simple and effective.The hexapole magnet has also been replaced by a new hexapole magnet with higher radial field and larger inner diameter.With this updating,stronger magnetic field confinement of the ECR plasma is possible and better base vacuum condition is also achieved.LECR2M was designed to be operated at 14.5GHz.During the preliminary test.1.3emA O6 beam was extracted with the injected rf power of 1.1kW.The source has been used to deliver intense MCI beams for different experiments.After some discussion of the main features of this newly updated source,some of the typical commissioning test results of LECR2M will be presented.     

X-Ray in Highly Charged Ar17+Ion Interacting with Mo Surface

The X-ray emission from the highly charged Ar¹⁷⁺ ion interacting with Mo surface are measured on the 14.5GHz Electron Cyclotron Resonance ion source facility at Institute of Modern, the Chinese Academy of Sciences in Lanzhou. Ar¹⁷⁺ ions came from Electron Cyclotron Resonance ion source and impacted on Mo surface.The incident ion with vacancy of inner shell captures electrons emitted from surface into highly excited Rydberg states, outer shell electron cascades into K vacancy giving rise to Kα X-ray emission of the incidentionsions.     

近物所在产生金属离子束方面的研究

Since 1998,many experiments for metallic ion production have been done on LECR2(Lanzhou ECR ion source NO.2),LECR3(Lanzhou ECR ion source NO.3)and SECRAL(Superconductiong ECB ion source Advanced design in Lanzhou)at Institute of Modern Physics.The very heavy metallic ion beams such as those of uranium were also produced by the plasma sputtering method,and supplied for HIRFL(Heavy Ion Research Facility in Lanzhou)accelerators successfully.During the test,11.SeμAU~(28 ),9eμAU~(24 ) were obtained.Some ion beams of the metal having lower melting temperature such as Ni and Mg ion beams were produced by oven method on LECR3 too.The consumption rate was controlled to be lower for ~(26)Mg ion beams production,and the minimum consumption was about 0.3mg per hour.In this paper,the main experimental results are given.Some discussions are made for some experimental phenomena and results,and some conclusions are drawn.     

SFC的新的轴向注入束流线

为了满足HIRFL-CSR对注入器SFC的束流强度和品种的越来越高的要求, 兰州重离子加速器国家实验室在研制超导ECR离子源的同时, 设计了一个新的SFC的轴向注入束流线. 这个系统可以分别使用现有的常规ECR离子源和新建造的超导ECR离子源, 期望把从C到U的各种离子的能量和束流强度提高到一个新的水平. 这个系统由二极磁铁, 四极透镜, GLASSER透镜, 螺线管, 螺旋形静电偏转器和两台丝网型线性聚束器组成. 在总结现有系统运行经验的基础上,无论在横向还是纵向, 其性能结构都做了必要的改进. 文章给出了新系统的设计思想, 系统的布局结构和束流光学计算结果, 并对进一步提高聚束效率和聚束器的改进设计作了简要的描述. 目前, 系统正在安装中.     

ECR离子源束流发射度的实验研究

利用最新自行研制的电扫描发射度探测系统, 在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究. 这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上. 试验中, 通过测量相关参数, 研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响. 利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论, 分析推导了离子源各可调参数与ECR等离子体的直接关系, 这为分析探索ECR离子源的工作机制提供了一定的参考依据.     

Texas的14.5GHzECR离子源

A new plasma chamber for the Texas A&M 14.5GHz ECR ion source ECR2 has been recently installed and the beam analysis line has been recently upgraded with the replacement of the solenoid with a shorter Glaser lens.The source is now used along with the 6.4GHz ECRl for injection of beams into the K500 cyclotron.The new plasma chamber incorporates water-carrying copper tubes,each with an inner diameter of 0.7mm and all outer diameter of 1.8mm.interposed between the NbFeB permanent magnets and the aluminum plasma-chamber wall.The design allows for a much higher water flow and thus better cooling than the previous design,which used a thin,water-cooled liner.The source commissioning and operation is described.