电偏转扫描法测量高电荷态ECR源发射度

成功地研制了一套适合于低能离子束流发射度测量的电偏转扫描探测器.对该探测器的原理和结构作了较详细的描述,并给出该探测器对兰州近代物理研究所高电荷态ECR源LECR3引出离子束流发射度的测量结果.典型结果为:在引出高压为15.97kV,引出束流为190μA时,O⁴⁺水平发射度(x方向)为137πmm·mrad,垂直发射度(y方向)为120πmm·mrad(包括90%束流).最后,对测量结果作了一些分析和讨论.     

SECRAL等离子体韧致辐射谱的测量

The axial emitted bremsstrahlung spectra were measured on SECRAL(Superconducting ECR ion source with Advanced design in Lanzhou)using an HPGe detector.The spectral temperature T_(spe) was obtained from the linear fit of the spectra in the semi-log present.The evolution of T_(spe) with microwave power and magnetic field configuration is investigated in this paper.     

一台14.5GHz新型高磁场高电荷态ECR离子源

自行研制成功一台14.5GHz新型高磁场高电荷态电子回旋共振(ECR)离子源.描述了该离子源结构特点、参数优化及其磁场分布,并给出了调试测量结果.该离子源轴向磁镜场在轴线上的最高磁场可达1.5T,六极永磁体在弧腔内表面磁场可达1.0T.经初步调试,可得到0⁷+140eμA,Ar¹¹+185eμA,Xe²⁶⁺50eμA.所得结果与1998年国际上最好的ECR离子源进行了比较.     

Sensing of ultrasonic fields based on polarization parametric indirect microscopic imaging

This Letter tackles the issue of non-contact detection of ultrasonic fields by utilizing a novel optical method based on the parametric indirect microscopic imaging(PIMI) technique. A general theoretical model describing the three-dimensional anisotropic photoelastic effect in solid was developed. The mechanism of polarization status variations of light passing through the stress and strain fields was analyzed. Non-contact measurements of the ultrasonic field propagating in an isotropic quartz glass have been fulfilled by the PIMI technique under different ultrasonic excitation conditions. PIMI parameters such as sin δ, Φ, and the Stokes parameters have been found to be sensitive to ultrasonic fields.     

高电荷态ECR离子源——LECR3

研制成功了一台新的高电荷态ECR离子源,该离子源主要为原子物理实验提供各种高电荷态离子束流,是基于中国科学院近代物理研究所14.5GHz高电荷态ECR离子源设计建成的,同时在该离子源中应用多种有利于提高束流强度的技术,设计时考虑到采用双频加热,试图通过试验双频加热模式来提高高电荷态离子的产额,并设计建造了一套束流聚焦分析系统,以提高电荷态分辨率和束流传输效率.     

ECR离子源束流发射度的实验研究

利用最新自行研制的电扫描发射度探测系统, 在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究. 这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上. 试验中, 通过测量相关参数, 研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响. 利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论, 分析推导了离子源各可调参数与ECR等离子体的直接关系, 这为分析探索ECR离子源的工作机制提供了一定的参考依据.     

ECR离子源束流引出与传输的研究

针对ECR离子源的束流引出及传输研究，在中国科学院近代物理研究所的LECR3离子源实验平台上开展了大量的实验. 实验中研究了等离子体电极引出孔径、反射电极(抑制电极)偏压以及Glaser透镜等因素对束流引出与传输的影响. 研究的重点是试图通过系列实验与分析来研究如何能更有效地引出强流离子束流并减小其在传输空间的损失. 给出了实验的主要结果，结合这些数据对ECR离子源的束流引出与传输进行了较全面的分析，并综合这些实验结果与分析结果得出了该物理过程的一般物理图像.     

SECRAL在18GHz频率下产生强流高电荷态离子束的初步结果

A Superconducting ECR ion source with Advanced design in Lanzhou (SECRAL) was successfully built to produce intense beams of highly charged ions for Heavy Ion Research Facility in Lanzhou (HIRFL).The ion source has been optimized to be operated at 28GHz for its maximum performance.The superconducting magnet confinement configuration of the ion source consists of three axial solenoid coils and six sextupole coils with a cold iron structure as field booster and clamping.For 28GHz operation,the magnet assembly can produce peak mirror fields on axis 3.6T at injection,2.2T at extraction and a radial sextupole field of 2.0T at plasma chamber wall.A unique feature of SECRAL is that the three axial solenoid coils are located inside of the sextupole bore in order to reduce the interaction forces between the sextupole coils and the solenoid coils. During the ongoing commissioning phase at 18GHz with a stainless steel chamber,tests with various gases and some metals have been conducted with microwave power less than 3.2kW and it turned out the performance is very promising.Some record ion beam intensities have been produced,for instance,810eμA of O~(7 ),505eμA of Xe~(20 ),306eμA of Xe~(27 ),21eμA of Xe~(34 ),2.4eμA of Xe~(38 ) and so on.To reach better results for highly charged ion beams,further modifications such as an aluminium chamber with better cooling,higher microwave power and a movable extraction system will be done,and also emittance measurements are being prepared.     

兰州全永磁ECR离子源——LAPECR1

The Lanzhou All Permanent magnet ECR ion source NO.1(LAPECR1)is the first all permanent magnet multiple ECRIS made in IMP.This ECRIS is running at 14.5GHz and can provide intense low charge state ion beams(varying from several to hundreds of eμA)or medium charge state ion beams(varying from several to tens of eμA).The size of source body is (?)102mm×296mm,the compactness and economical features enable the source suitable to be put on a HV platform or equipped by a small laboratory.This article gives the main parameters of the ion source.