高电荷态ECR离子源引出束流4D 发射度测量仪设计

为了进一步探究高电荷态电子回旋共振(ECR) 离子源引出束流品质和横向相空间耦合情况,根据中国科学院近代物理研究所高电荷态离子源引出束流发射度测量需求,针对束流流强为1 eμA∼1 emA,能量范围为10∼35 keV/q 的直流或脉冲高电荷态重离子束,设计了一台实时四维Pepper-pot 发射度测量仪。该Pepper-pot 型发射度测量仪具有响应时间快和工作范围宽等特点。针对强流重离子束诊断的特点,在结构与材料选择上做了设计与优化,并对获得图像的处理方法提出了具体的解决办法。For the purpose of on-line beam quality diagnostics and transverse emittance coupling investigation of the ion beams delivered by an Electron Cyclotron Resonance (ECR) ion source, a real-time 4D Pepper Pot type emittance scanner is under development at IMP(Institute of Moden Physics, Chinese Academy of Sciences). The high charge state ECR ion source at IMP could produce CW or pulsed heavy ion beam intensities in the range of 1 eμA∼1 emA with the kinetic energy of 10∼35 keV/q, which needs the design of the Pepper Pot scanner to be optimized accordingly. The Pepper Pot scanner has many features, such as very short response time and wide dynamic working range that the device could be applied. Since intense heavy ion beam bombardment is expected for this device, the structure and the material selection for the device is specially considered during the design, and a feasible solution to analyze the pictures acquired after the data acquisition is also made.     

ECR离子源束流发射度的实验研究

利用最新自行研制的电扫描发射度探测系统, 在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究. 这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上. 试验中, 通过测量相关参数, 研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响. 利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论, 分析推导了离子源各可调参数与ECR等离子体的直接关系, 这为分析探索ECR离子源的工作机制提供了一定的参考依据.     

高电荷态ECR离子源——LECR3

研制成功了一台新的高电荷态ECR离子源,该离子源主要为原子物理实验提供各种高电荷态离子束流,是基于中国科学院近代物理研究所14.5GHz高电荷态ECR离子源设计建成的,同时在该离子源中应用多种有利于提高束流强度的技术,设计时考虑到采用双频加热,试图通过试验双频加热模式来提高高电荷态离子的产额,并设计建造了一套束流聚焦分析系统,以提高电荷态分辨率和束流传输效率.     

电偏转扫描法测量高电荷态ECR源发射度

成功地研制了一套适合于低能离子束流发射度测量的电偏转扫描探测器.对该探测器的原理和结构作了较详细的描述,并给出该探测器对兰州近代物理研究所高电荷态ECR源LECR3引出离子束流发射度的测量结果.典型结果为:在引出高压为15.97kV,引出束流为190μA时,O⁴⁺水平发射度(x方向)为137πmm·mrad,垂直发射度(y方向)为120πmm·mrad(包括90%束流).最后,对测量结果作了一些分析和讨论.     

断层扫描技术在束流发射度测量中的应用

 断层扫描技术可为束流诊断提供一种与束流模型无关的新方法,该方法至少能够提高一个量级的束流发射度测量精度,而且可以得到足够分辨率的束流横向四维相空间分布。为此建立了迭代重建算法（ART）程序,作为例子重建了一个二维相空间束流图像,获得了很有意义的结果,表明该技术可以为研究束流传输、验证束流动力学理论提供可靠的束流相空间参数。     

强流ECR离子源引出系统研究

为了提高强流ECR 离子源的引出束流品质,分别设计了1# 和2# 引出系统,利用束流引出模拟软件PBGUNS 对1# 和2# 引出系统进行了质子束流引出与传输的模拟计算,结合实际测得的发射度数据分析引出系统,发现2# 引出系统比1# 引出系统引出束流品质高。对ECR 离子源引出系统的电势等位线分布等参数引起的球差进行了简单数学推导及MATLAB 绘图,并结合1# 和2# 引出系统束流相图模拟结果证明了球差会使引出束流品质有效发射度增长,通过适当加大电极孔径可改善束流聚焦情况,得到了束流光学聚焦较好的束流引出系统设计。To improve the quality of extracted ion beam from a high current ECR ion source, 1# and 2# extraction systems were designed and tested. The PBGUNS code was used to simulate the 1# and 2# extraction systems of proton ion beam. The emittance measurement results with the two different extraction systems were compared and analyzed with the simulation, the conclusion that more high quality beam extracted from 2# system than 1# system was got. The formula derivation of ECR ion source extraction system spherical aberration and MATLAB drawing was done by the analyzing on the distribution of extraction field equipotentials, effective emittance increasing caused by spherical berration was proved by 1# and 2# extraction systems beam phase space simulation result, beam focusing would be improved if electrode hole size increasing appropriately and a general concept on good optics focusing of ion beam extraction system was proposed finally.     

ECR离子源束流引出与传输的研究

针对ECR离子源的束流引出及传输研究，在中国科学院近代物理研究所的LECR3离子源实验平台上开展了大量的实验. 实验中研究了等离子体电极引出孔径、反射电极(抑制电极)偏压以及Glaser透镜等因素对束流引出与传输的影响. 研究的重点是试图通过系列实验与分析来研究如何能更有效地引出强流离子束流并减小其在传输空间的损失. 给出了实验的主要结果，结合这些数据对ECR离子源的束流引出与传输进行了较全面的分析，并综合这些实验结果与分析结果得出了该物理过程的一般物理图像.     

电扫描型单缝单丝强流离子束发射度测量仪

 介绍了一台基于电偏转扫描方法的强流离子束发射度仪，讨论了发射度仪硬件的系统构成和设计要点，该发射度仪采用阶梯型电压对通过前缝的束流进行扫描来获得束流散角信息。并对测量计算软件和数据处理方法进行了介绍，采用了先扣除本底，再设置阈值的方法进行数据处理。处理后的数据利用程序可获得均方根和边界发射度、束斑大小、最大正负散角以及发射度相图。利用该发射度仪对ECR离子源引出的强流质子束的发射度进行了测量，并对测量数据进行了分析。对于引出电压为50 kV、脉冲重复频率为166 Hz、脉冲宽度为1 ms、平均束流强度为4 mA的质子脉冲束，其归一化均方根发射度为0.27 pmm·mrad。     

轴对称磁场的束流光学及其在ECR离子源中的应用

 带电粒子在轴对称磁场中一边沿着对称轴向前运动，一边绕对称轴旋转。所以横向运动可以分解为两部分：聚焦运动和子午面的旋转。因此，4维横向传输矩阵可以表示为聚焦矩阵和旋转矩阵的乘积。用旋转矩阵和聚焦矩阵重新推导了总的传输矩阵。然后给出了相应的相椭圆系数矩阵来进一步估算从ECR离子源引出束流的发射度.详细地讨论了束流分布函数的二次矩。     

ECR离子源中的微波功率在线测量

 在中子发生器中采用ECR离子源是一种新技术。由于受结构的限制，ECR离子源不能像高频源离子源那样通过观察气体放电的颜色判断其工作状态，所以在运行中调节状态非常困难。解决这个问题的方法是：用定向耦合器加微波小功率计的方法在线测量ECR离子源的微波入射功率，通过微波入射功率可以直接得到ECR离子源引出离子束流的大小，从而推断微波信号源的放电过程是否正常,然后调整ECR离子源，最终使中子发生器工作在最佳状态。从ECR离子源后面的引出电极测得的最大束流为20 mA，且工作长时间稳定，当微波功率在160 W~500 W之间时，放电效果较好，离子束流随微波功率的增加而增加。     

一台14GHzCAPRICE型ECR离子源的束流引出

An ion beam extracted from an ECRIS suffers from the inhomogeneous distribution of cold electrons within the minimum B configuration,necessary to confine the plasma.Especially for higher ion currents,the space charge force is not negligible any more,and because of the nonlinear force,emittance growth will occur. Measurements of the profile and the emittance of the beam directly behind the source show the complicated correlation between extraction voltage and plasma density.The emittance has been measured with a pepper pot device to account for the inhomogeneous azimuthal distribution of the beam.These results indicate that further information about the profile is required.To visualize the beam profile a tantalum foil with a thickness of 20μm has been used for an electrical beam power between 10 and 50W.Looking on the back side of the foil with a CCD camera it is possible to record the profile in real time.As a more sensitive diagnostic tool viewing targets made from BaF has been used. Three dimensional computer simulations have been used to identify the reason for the structures,observed in measurements.     

用于聚焦离子束系统的离子源

介绍了现阶段两种用于聚焦离子束系统的离子源——液态金属离子源和气体场发射离子源的基本原理, 并对比了它们的优缺点。由于目前这两种离子源都难以满足纳米加工领域不断提高的技术要求, 因此提出了一种用于聚焦离子束的新型离子源——电子束离子源, 并介绍了电子束离子源的基本原理, 给出了设计参数、 模拟结果（20 kV的Ar+离子束, 发射度约为5.8×10-5·mm·mrad, 束斑约为1 μm）和初步的实验结果。 There are two kinds of ion sources, Liquid Metal Ion Source and Gas Field Ion Source, used to provide ion beams for the Focus Ion Beam system. The working mechanism of the two kinds of sources is presented and their advantages and disadvantages are summarized. With the rapid development in the nano technology, the requirements are hardly met with these two kinds of ion sources. Therefore, a new kind of ion source, electron beam ion source, is developed for the Focus Ion Beam system. The basic principle of the electron beam ion source is introduced and the design parameters, the result of the simulation (20 kV Ar+, extracted emittance is 5.8×10-5π·mm·mrad, raduis of the ion beam about 1 μm.) and the primary experimental results are presented     

Optimization of Extraction System for Cold Cathode Ion Source

We have simulated ion trajectories with the SIMION 3D, version 7.0, package to optimize the extraction system of a cold-cathode ion source and compared the results with experimental data collected under the same operational conditions. The simulation determined the negative voltage applied to the extractor electrode and the extraction gap widths that maximize the ion-beam current for singly charged nitrogen ions with low emittance and small diameter. The experiment measured the input electrical discharge and output ion beam characteristics of the source at different nitrogen pressures. The extractor electrode voltage and the extraction gap width were determined at 8?×?10^?4?Torr nitrogen. The results of the simulation agreed well with the experimental data.     

磁场调控型离子源的设计与实验

磁场调控型离子源在离子源等离子体扩散空间中引入轴向强脉冲磁场,磁场起两方面的作用,一是形成潘宁放电效应,使原子、气体分子碰撞电离效率增加;二是在脉冲强磁场的作用下,强轴向磁场将质量较轻的离子约束在轴线上,对质量较重的金属离子约束能力较弱,导致其在等离子体膨胀引出通道中碰壁损失,能够提升引出轻离子的比例。开展了磁场调控的离子源放电结构、强脉冲螺线管磁场以及引出束流光学结构的设计;测量分析了引出离子流强和离子打靶束斑形貌。研究结果表明,强轴向磁场通过等离子体对混合离子成分的筛选作用,可有效提高引出离子流强中的轻离子成分比例。     

KB镜束流截面测量系统研制

为了对衍射极限储存环的束流横向截面尺寸及发射度进行测量,设计了一套Kirkpatrick-Baez(KB)反射镜聚焦成像系统,并在上海光源(SSRF)储存环进行预制研究。该系统主体由两面垂直放置的KB反射镜组成,分别在水平及垂直方向对弯转磁铁光源点进行成像,系统工作在硬X射线波段,聚焦光斑被闪烁体X射线相机采集。对影响系统成像质量的像差和点扩散函数进行了计算。目前,实现了对束流的实时成像,可精确测量束流横向截面尺寸为75.9 μm(水平方向)和20.2 μm(垂直方向),系统稳定性(RMS)小于0.1 μm。     

Analytical and simulation studies for diode and triode ion beam extraction systems

This work is concerned with ion beam dynamics and compares the emittance to aberration ratios of two-and three-electrode extraction systems. The study is conducted with the aid of Version 7 of SIMION 3D ray-tracing software. The beam dependence on various parameters of the extraction systems is studied and the numerical results lead to qualitative conclusions.