Static recording characteristics of new type super-resolution near-field structure

A novel super-resolution near-field optical structure (super-RENS) with bismuth (Bi) mask layer is proposed in this paper. Static optical recording tests with and without super-RENS are carried out using a 650-nm semiconductor laser at recording powers of 14 and 7 mW with pulse duration of 100 ns. The recording marks are observed by high-resolution optical microscopy with a charge-coupled device (CCD)camera. The results show that the Bi mask layer can also concentrate energy into the center of a laser beam at low laser power similar to the traditional Sb mask layer. The results above are further confirmed by another Ar+ laser system. The third-order nonlinear response induced by the plasma oscillation at the Bi/SiN interface during laser irradiation can be used to explain the phenomenon. The calculation results are basically consistent with our experimental results.     

Luminescence properties of Er in SiN/PS : Er

The decrease in luminescence from host porous silicon (PS) by thermal annealing prevents the optical activation of Er ions. We prepared a SiN layer on erbium-doped porous silicon (PS : Er) as the capping layer by photo-chemical vapor deposition (photo-CVD). After deposition of SiN, the sample was annealed in pure Ar atmosphere for optical activation. We observed an Er-related emission at 1532 nm with a full-width at half-maximum (FWHM) of 10 nm at 18 K from the sample with the SiN layer. In contrast, no emission was observed from the sample without the SiN layer. At 300 K, the peak intensity of Er³⁺-related photoluminescence (PL) for the sample annealed at 1100°C decreased to 40.0% of that observed at 18 K. From these results, it was found that the SiN layer on PS:Er is useful for both host PS and Er-related 1.5 μm luminescences.     

Nonlinear optical study of amorphous SiN:H films on the Si(111) substrate

A correlation between the resistivity-voltage dependences of the hydrogenated SiN/Si(111) films and the photo-induced third-harmonic generation (PITHG) at λ = 1064 nm in the reflected light regime was found. The contribution to the PITHG is both due to linear photo-induced surface changes as well as due to the hydrogen dopants. When the fundamental power density increases to higher than 1.2 GW/cm², there occurs a drastic decrease of the PITHG. Maximal PITHG changes are observed at a pump-probe delay time about 18 ps and the value of the PITHG slightly increases with the enhanced applied dc-electric field during illumination by a third-harmonic laser beam as a photo-inducing one. The deviation from the tripled frequency wavelength to higher wavelengths substantially suppresses the output PITHG signal. The crucial role of the interface trapping levels and silicon-hydrogen charge transfer is shown.     

In-situ SiN combined with etch-stop barrier structure for high-frequency AlGaN/GaN HEMT

The etch-stop structure including the in-situ SiN and AlGaN/GaN barrier is proposed for high frequency applications.The etch-stop process is realized by placing an in-situ SiN layer on the top of the thin AlGaN barrier.F-based etching can be self-terminated after removing SiN,leaving the AlGaN barrier in the gate region.With this in-situ SiN and thin barrier etch-stop structure,the short channel effect can be suppressed,meanwhile achieving highly precisely controlled and low damage etching process.The device shows a maximum drain current of 1022 mA/mm,a peak transconductance of 459 mS/mm,and a maximum oscillation frequency(fmax)of 248 GHz.     

SiN分子外电场情况下的发光特性

为全面分析外电场对分子发光特性的影响, 本文采用密度泛函B3P86方法6-31g(d)基组, 对SiN分子进行了基态结构的优化, 进而使用含时密度泛函方法(time dependent density functional theory, TDDFT), 计算了不同方向及大小的外电场情况下SiN分子的吸收谱、激发能、振子强度、跃迁偶极矩. 通过比较发现外电场对该分子的激发能、吸收谱、跃迁振子强度及跃迁偶极矩影响都比较明显, 说明了电场对SiN分子的激发特性影响比较复杂, 特别是在加场前后分子均有在可见光区波段的吸收谱, 这对研究分子的发光很有意义.同时对该分子所发可见光谱的产生机理进行了分析, 并与已有实验结果进行比较.     

Interfacial reactions of rf-sputtered TiNi thin films on (100) silicon with a SiN diffusion barrier

Silicon nitride (SiN) with a 50?nm thickness on Si(100) as a thermal barrier was obtained by plasma-enhanced chemical vapour deposition (PECVD). TiNi thin films were rf sputtered on a SiN/Si substrate and then annealed at 400–700°C for 30?min. Their interfacial reactions were studied using transmission electron microscopy, X-ray diffraction and Auger electron spectroscopy analyses. Experimental results show that the thickness of reaction layer in TiNi/SiN/Si specimens is clearly reduced, compared with that in TiNi/Si specimens under the same annealing conditions. The significant effect of the SiN layer as a diffusion barrier in TiNi/SiN/Si can be recognized. N and Si atoms diffuse from the SiN layer to react with TiNi films at 500°C and 600°C respectively. The TiN_{1 ? x} phase is formed in specimens annealed at 500°C, and mixed Ti₂Ni₃Si and Ti₄Ni₂O compounds are found at 600°C. In the specimen annealed at 700°C, the reaction layer has sublayers in the sequence TiNi/Ti₄Ni₂O/Ti₂Ni₃Si/TiN_{1 ? x} /SiN/Si. The SiN thermal barrier obtained by PECVD caused quite different diffusion species to cross the interfaces between TiNi/SiN/Si and TiNi/Si specimens during the annealing.     

一种新的超分辨记录点的读出技术

提出一种新的超分辨记录点的读出技术—超分辨反射膜技术，详细分析了其原理。用该技术，以Sb为超分辨反射膜，SiN为介电层，在激光波长为632．8nm和光学头的数值也径为0．40的读出光学系统中实现了直径为380nm的超分辨记录点的读出。同时研究了Sb薄膜厚度对读出信噪比的影响规律，发现最佳的Sb薄膜厚度为28～30nm，所得的信噪比为38～40dB。     

A novel Si-rich SiN bilayer passivation with thin-barrier AlGaN/GaN HEMTs for high performance millimeter-wave applications

We demonstrate a novel Si-rich SiN bilayer passivation technology for AlGaN/GaN high electron mobility transistors (HEMTs) with thin-barrier to minimize surface leakage current to enhance the breakdown voltage. The bilayer SiN with 20-nm Si-rich SiN and 100-nm Si$_{3}$N$_{4}$ was deposited by plasma-enhanced chemical vapor deposition (PECVD) after removing 20-nm SiO$_{2}$ pre-deposition layer. Compared to traditional Si$_{3}$N$_{4}$ passivation for thin-barrier AlGaN/GaN HEMTs, Si-rich SiN bilayer passivation can suppress the current collapse ratio from 18.54% to 8.40%. However, Si-rich bilayer passivation leads to a severer surface leakage current, so that it has a low breakdown voltage. The 20-nm SiO$_{2}$ pre-deposition layer can protect the surface of HEMTs in fabrication process and decrease Ga-O bonds, resulting in a lower surface leakage current. In contrast to passivating Si-rich SiN directly, devices with the novel Si-rich SiN bilayer passivation increase the breakdown voltage from 29 V to 85 V. Radio frequency (RF) small-signal characteristics show that HEMTs with the novel bilayer SiN passivation leads to $f_{\rm T}/f_{\rm max}$ of 68 GHz/102 GHz. At 30 GHz and $V_{\rm DS} = 20$ V, devices achieve a maximum $P_{\rm out}$ of 5.2 W/mm and a peak power-added efficiency (PAE) of 42.2%. These results indicate that HEMTs with the novel bilayer SiN passivation can have potential applications in the millimeter-wave range.     

SiN团簇光电子能谱的指认

应用含时密度泛函理论研究了SiN团簇低能激发态的性质.将计算结果与前人已有的计算结果进行了比较，此外还根据计算得到的低能激发能对SiN^-阴离子的光电子能谱进行了理论指认.研究表明，SiN^-阴离子的基态为¹Σ态，而光电子能谱上的X峰和A峰分别对应于¹Σ→²Σ和¹Σ→²Π的跃迁.研究结果还表明，用含时密度泛函的方法来处理激发态的问题是成功的. 关键词： 团簇 光电子能谱 基态 激发态     

High-electric-field-stress-induced degradation of SiN passivated AlGaN/GaN high electron mobility transistors

AlGaN/GaN high electron mobility transistors (HEMTs) are fabricated by employing SiN passivation, this paper investigates the degradation due to the high-electric-field stress. After the stress, a recoverable degradation has been found, consisting of the decrease of saturation drain current I_Dsat, maximal transconductance g_m, and the positive shift of threshold voltage V_TH at high drain-source voltage V_DS. The high-electric-field stress degrades the electric characteristics of AlGaN/GaN HEMTs because the high field increases the electron trapping at the surface and in AlGaN barrier layer. The SiN passivation of AlGaN/GaN HEMTs decreases the surface trapping and 2DEG depletion a little during the high-electric-field stress. After the hot carrier stress with V_DS=20 V and V_GS=0 V applied to the device for 10⁴ sec, the SiN passivation decreases the stress-induced degradation of I_Dsat from 36% to 30%. Both on-state and pulse-state stresses produce comparative decrease of I_Dsat, which shows that although the passivation is effective in suppressing electron trapping in surface states, it does not protect the device from high-electric-field degradation in nature. So passivation in conjunction with other technological solutions like cap layer, prepassivation surface treatments, or field-plate gate to weaken high-electric-field degradation should be adopted.     

The Interface Influence in TiN/SiN x Multilayer Nanocomposite Under Irradiation

Russian Physics Journal - The paper focuses on studying the kinetics of radiation-induced point defects formed in TiN/SiN x multilayer nanocomposites with account of their generation, diffusion...     

磁控溅射法制备的高反Ag_5In_5Te_(47)Sb_(33)相变薄膜的光谱性质及短波长静态记录性能

研究了磁控溅射制备的Ａｇ５Ｉｎ５Ｔｅ４７Ｓｂ３３相变薄膜的光谱及短波长静态记录性能。研究结果表明，晶态薄膜反射率较高，并在６００～９００ｎｍ波长范围内，晶态与非晶态的反射率和折射率相差很大。在ＣＤ－Ｅ系统的工作波长７８０ｎｍ处，晶态反射率高达５０％，光学常数为５．３４－１．０ｉ；非晶态反射率为２３％，光学常数为２．５－１．０３ｉ。从这一角度讲，Ａｇ５Ｉｎ５Ｔｅ４７Ｓｂ３３相变薄膜适于做ＣＤ－Ｅ系统的记录介质。另外，采用波长为５１４．４ｎｍ的短波长光学静态记录测试仪对Ａｇ５Ｉｎ５Ｔｅ４７Ｓｂ３３薄膜的记录性能进行了测试，结果表明，这种薄膜短波长记录性能较好，它在较低功率和短脉宽的激光束作用下就可得到较高的反射率对比度。     

Morphological differences between Bi, Ag and Sb nano-particles and how they affect the percolation of current through nano-particle networks

Nano-particles of Bi, Ag and Sb have been produced in an inert gas aggregation source and deposited between lithographically defined electrical contacts on SiN. The morphology of these films have been examined by atomic force microscopy and scanning electron microscopy. The Bi nano-particles stick well to the SiN substrate and take on a flattened dome shape. The Ag nano-particles also stick well to the SiN surface; however they retain a more spherical shape. Whereas, many of the Sb nano-particles bounce off the SiN surface with only a small fraction of the Sb nano-particles aggregating at defects resulting in a non-random distribution of the clusters. These nano-scale differences in the film morphology influence the viability of applying percolation theory to in situ macroscopic measurements of the film conductivity, during the deposition process. For Bi and Ag nano-particles the increase in conductivity follows a power law. The power law exponent, t, was found to be 1.27 ±0.13 and 1.40 ±0.14, for Bi and Ag respectively, in agreement with theoretical predictions of t ≈1.3 for 2D random continuum percolation networks. Sb cluster networks do not follow this model and due to the majority of the Sb clusters bouncing off the surface. Differences in the current onset times and final conductance values of the films are also discussed.     

Propagation of a filamentary femtosecond laser beam with high intensities at an air-solid interface

The propagation of a filamentary laser beam at an air-glass surface is studied by setting the incident angle satisfying the total reflection condition. The images of the trajectory of the filamentary laser beam inside the sample and the output far-field spatial profiles are measured with varying incident laser pulse energies. Different from the general total reflection, a transmitted laser beam is detected along the propagation direction of the incident laser beam. The energy ratio of the transmitted laser beam depends on the pulse energies of the incident laser beam. The background energy reservoir surrounding the filament core can break the law of total reflection at the air-glass surface, resulting in the regeneration of the transmitted laser beam.     

Transport mechanism of reverse surface leakage current in AlGaN/GaN high-electron mobility transistor with SiN passivation

The transport mechanism of reverse surface leakage current in the AlGaN/GaN high-electron mobility transistor(HEMT) becomes one of the most important reliability issues with the downscaling of feature size.In this paper,the research results show that the reverse surface leakage current in AlGaN/GaN HEMT with SiN passivation increases with the enhancement of temperature in the range from 298 K to 423 K.Three possible transport mechanisms are proposed and examined to explain the generation of reverse surface leakage current.By comparing the experimental data with the numerical transport models,it is found that neither Fowler-Nordheim tunneling nor Frenkel-Poole emission can describe the transport of reverse surface leakage current.However,good agreement is found between the experimental data and the two-dimensional variable range hopping(2D-VRH) model.Therefore,it is concluded that the reverse surface leakage current is dominated by the electron hopping through the surface states at the barrier layer.Moreover,the activation energy of surface leakage current is extracted,which is around 0.083 eV.Finally,the SiN passivated HEMT with a high Al composition and a thin AlGaN barrier layer is also studied.It is observed that 2D-VRH still dominates the reverse surface leakage current and the activation energy is around 0.10 eV,which demonstrates that the alteration of the AlGaN barrier layer does not affect the transport mechanism of reverse surface leakage current in this paper.     

微波电子回旋共振-化学气相沉积SiN_x薄膜的光学性能研究

研究了微波电子回旋共振－化学气相沉积ＳｉＮｘ薄膜的光学性能，这种ＳｉＮｘ薄膜具有透光谱宽、透光率高的特点，总结了透光谱、折射率、光隙能随微波功率、基片温度的变化关系     

直角棱镜平面反射衰减在激光光束诊断中的应用研究

论述了普通光学元件-直角平面反射镜在激光光束诊断中的应用,提出了利用直角棱镜的直角面反射进行光能衰减,详细论述了采用该方法进行光能衰减的可行性,分析了平面反射衰减法在激光束诊断中对测光束的影响,讨论了激光束发散角在直角面反射中的影响,结合半导体光束诊断进行了应用分析.实验证明,该方法结构简单,误差小,调整方便,利用普通反射棱镜直角面衰减即可满足激光强度的匹配要求,实现了待测激光束的无失真取样,达到了很好的测试效果.     

Nonlinear diffraction and total internal reflection in optical-beam interaction in defocusing media

We elaborate the theory of reflection of an optical signal beam from an inhomogeneous channel created by a high-power laser beam of different frequency in a nonlinear defocusing medium. We study the effects of total internal reflection and nonlinear diffraction in the interaction of these beams. We derive and analyze the equation for the trajectory of the reflected signal beam and obtain the expression for the critical value of beam-intersection angle below which the total internal reflection occurs. We discuss the results of numerical modeling of nonlinear Schr¨odinger equations for envelopes of the beams in media with quadratic, photorefractive, and thermal nonlinearities. We present experimental data on the interaction of beams of argon and helium–neon lasers in a cuvette with tinted alcohol.     

Effect of SiN:H_x passivation layer on the reverse gate leakage current in GaN HEMTs

This paper concentrates on the impact of SiN passivation layer deposited by plasma-enhanced chemical vapor deposition(PECVD) on the Schottky characteristics in GaN high electron mobility transistors(HEMTs). Three types of SiN layers with different deposition conditions were deposited on GaN HEMTs. Atomic force microscope(AFM), capacitance-voltage(C-V), and Fourier transform infrared(FTIR) measurement were used to analyze the surface morphology, the electrical characterization, and the chemical bonding of SiN thin films, respectively. The better surface morphology was achieved from the device with lower gate leakage current. The fixed positive charge Q_f was extracted from C-V curves of Al/SiN/Si structures and quite different density of trap states(in the order of magnitude of 1011-1012 cm~(-2)) was observed.It was found that the least trap states were in accordance with the lowest gate leakage current. Furthermore, the chemical bonds and the %H in Si-H and N-H were figured from FTIR measurement, demonstrating an increase in the density of Q_f with the increasing %H in N-H. It reveals that the effect of SiN passivation can be improved in GaN-based HEMTs by modulating %H in Si-H and N-H, thus achieving a better Schottky characteristics.     

Stable hysteretic reflection of light at a nonlinear interface

We have observed a hysteretic (bistable) reflection of a Gaussian laser beam at the interface between glass and a liquid solution of polystyrene microspheres as nonlinear medium with both branches of the hysteretic curve being stable, in contrast to the results of previous experiments.