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1.
A 4H-SiC trench MOSFET structure with wrap N-type pillar for low oxide field and enhanced switching performance 下载免费PDF全文
An optimized silicon carbide (SiC) trench metal-oxide-semiconductor field-effect transistor (MOSFET) structure with side-wall p-type pillar (p-pillar) and wrap n-type pillar (n-pillar) in the n-drain was investigated by utilizing Silvaco TCAD simulations. The optimized structure mainly includes a p$+$ buried region, a light n-type current spreading layer (CSL), a p-type pillar region, and a wrapping n-type pillar region at the right and bottom of the p-pillar. The improved structure is named as SNPPT-MOS. The side-wall p-pillar region could better relieve the high electric field around the p$+$ shielding region and the gate oxide in the off-state mode. The wrapping n-pillar region and CSL can also effectively reduce the specific on-resistance ($R_{\rm on,sp}$). As a result, the SNPPT-MOS structure exhibits that the figure of merit (FoM) related to the breakdown voltage ($V_{\rm BR}$) and $R_{\rm on,sp}$ ($V_{\rm BR}^{2}R_{\rm on,sp}$) of the SNPPT-MOS is improved by 44.5%, in comparison to that of the conventional trench gate SJ MOSFET (full-SJ-MOS). In addition, the SNPPT-MOS structure achieves a much faster-witching speed than the full-SJ-MOS, and the result indicates an appreciable reduction in the switching energy loss. 相似文献
2.
A specially designed experiment is performed for investigating gate-induced
drain leakage (GIDL) current in 90nm CMOS technology using lightly-doped
drain (LDD) NMOSFET. This paper shows that the drain bias $V_{\rm D}$ has a
strong effect on GIDL current as compared with the gate bias $V_{\rm G}$ at the
same drain--gate voltage $V_{\rm DG}$. It is found that the difference between
$I_{\rm D}$ in the off-state $I_{\rm D}-V_{\rm G}$ characteristics and the
corresponding one in the off-state $I_{\rm D}-V_{\rm D}$ characteristics, which is
defined as $I_{\rm DIFF}$, versus $V_{\rm DG}$ shows a peak. The difference between
the influences of $V_{\rm D}$ and $V_{\rm G}$ on GIDL current is shown
quantitatively by $I_{\rm DIFF}$, especially in 90nm scale. The difference is
due to different hole tunnellings. Furthermore, the maximum $I_{\rm DIFF
}$($I_{\rm DIFF,MAX})$ varies linearly with $V_{\rm DG}$ in logarithmic coordinates
and also $V_{\rm DG}$ at $I_{\rm DIFF,MAX}$ with $V_{\rm F}$ which is the characteristic
voltage of $I_{\rm DIFF}$. The relations are studied and some related
expressions are given. 相似文献
3.
The defects associated with lead vacancies(VPd)in lead tungstate crystals(PbWO4) are investigated by the relativistic self-consistent discrete variational embedded cluster method.We focus on the density of states and the effect of Vpb on surroundings,the results show that the existence of Vpb can diminish the bandwidth of WOr^2- group,however,it can neither produce O^- and Pb^3 ions nor result in absorptions at 350 and 420nm,The charge balance of VPb may be evenly compensated by the surrounding oxygen ions. 相似文献
4.
Effect of F doping on capacitance-voltage characteristics of SiCOH low-k films metal-insulator-semiconductor structure 下载免费PDF全文
This paper investigates the capacitance--voltage
($C$--$V$) characteristics of F doping SiCOH low dielectric constant
films metal--insulator--semiconductor structure. The F doping SiCOH
films are deposited by decamethylcyclopentasiloxane (DMCPS) and
trifluromethane (CHF7755, 6855 http://cpb.iphy.ac.cn/CN/10.1088/1674-1056/19/5/057701 https://cpb.iphy.ac.cn/CN/article/downloadArticleFile.do?attachType=PDF&id=111779 F-SiCOH, low-k dielectrics, capacitance--voltage
characteristic Project supported by the National
Natural Science Foundation of China (Grant No.~10575074). 2/4/2009 12:00:00 AM This paper investigates the capacitance--voltage
($C$--$V$) characteristics of F doping SiCOH low dielectric constant
films metal--insulator--semiconductor structure. The F doping SiCOH
films are deposited by decamethylcyclopentasiloxane (DMCPS) and
trifluromethane (CHF$_{3})$ electron cyclotron resonance plasmas.
With the CHF$_{3}$/DMCPS flow rate ratio from 0 to 0.52, the
positive excursion of $C$--$V$ curves and the increase of flat-band
voltage $V_{\rm FB}$ from $-6.1$~V to 32.2~V are obtained. The
excursion of $C$--$V$ curves and the shift of $V_{\rm FB}$ are
related to the change of defects density and type at the Si/SiCOH
interface due to the decrease of Si and O concentrations, and the
increase of F concentration. At the CHF$_{3}$/DMCPS flow rate ratio
is 0.12, the compensation of F-bonding dangling bond to Si dangling
bond leads to a small $V_{\rm FB}$ of 2.0~V. 半导体结构;电压特性;电容电压;绝缘体;薄膜;金属;电子回旋共振等离子体;兴奋剂 This paper investigates the capacitance-voltage (C-V) characteristics of F doping SiCOH low dielectric constant films metal-insulator-semiconductor structure. The F doping SiCOH films are deposited by decamethylcyclopentasilox-ane [DMCPS) and trifluromethane (CHF3) electron cyclotron resonance plasmas. With the CHF3/DMCPS flow rate ratio from 0 to 0.52, the positive excursion of C-V curves and the increase of fiat-band voltage VFB from -6.1 V to 32.2V are obtained. The excursion of C-V curves and the shift of VFB are related to the change of defects density and type at the Si/SiCOH interface due to the decrease of Si and O concentrations, and the increase of F concentration. At the CHF3/DMCPS flow rate ratio is 0.12, the compensation of F-bonding dangling bond to Si dangling bond leads to a small VFB of 2.0V. 相似文献
5.
Hot carriers injection (HCI) tests for ultra-short channel n-MOSFET
devices were studied. The experimental data of short channel devices
(75--90\,nm), which does not fit formal degradation power law well,
will bring severe error in lifetime prediction. This phenomenon
usually happens under high drain voltage ($V_{\rm d}$) stress
condition. A new model was presented to fit the degradation curve
better. It was observed that the peak of the substrate current under
low drain voltage stress cannot be found in ultra-short channel
device. Devices with different channel lengths were studied under
different $V_{\rm d}$ stresses in order to understand the relations
between peak of substrate current ($I_{\rm sub}$) and channel
length/stress voltage. 相似文献
6.
Characteristics and parameter extraction for NiGe/n-type Ge Schottky diode with variable annealing temperatures 下载免费PDF全文
Current transport mechanism in Ni-germanide/n-type Ge
Schottky diodes is investigated using current--voltage
characterisation technique with annealing temperatures from 300~\duto 500~\du. Based on the current transport model, a simple method to
extract parameters of the NiGe/Ge diode is presented by using the
$I$--$V$ characteristics. Parameters of NiGe/n-type Ge Schottky
diodes fabricated for testing in this paper are as follows: the
ideality factor $n$, the series resistance $R_{\rm s}$, the
zero-field barrier height $\phi _{\rm b0}$, the interface state
density $D_{\rm it}$, and the interfacial layer capacitance $C_{\rm
i}$. It is found that the ideality factor $n$ of the diode increases
with the increase of annealing temperature. As the temperature
increases, the interface defects from the sputtering damage and the
penetration of metallic states into the Ge energy gap are
passivated, thus improving the junction quality. However, the
undesirable crystallisations of Ni-germanide are observed together
with NiGe at a temperature higher than 400~\du. Depositing a very
thin ($\sim $1~nm) heavily Ge-doped $n^{+}$ Ge intermediate layer
can improve the NiGe film morphology significantly. 相似文献
7.
Investigations on spectroscopic parameters, vibrational levels, classical turning points and inertial rotation and centrifugal distortion constants for the X1∑+g state of sodium dimer 下载免费PDF全文
The density functional theory (B3LYP, B3P86) and the quadratic
configuration-interaction method including single and double
substitutions (QCISD(T), QCISD) presented in Gaussian03 program
package are employed to calculate the equilibrium internuclear
distance $R_{\rm e}$, the dissociation energy $D_{\rm e }$ and the
harmonic frequency $\omega _{\rm e}$ for the $X{}^{1}\Sigma^{ +
}_{\rm g}$ state of sodium dimer in a number of basis sets. The
conclusion is gained that the best $R_{\rm e}$, $D_{\rm e}$ and
$\omega _{\rm e}$ results can be attained at the
QCISD/6-311G(3df,3pd) level of theory. The potential energy curve at
this level of theory for this state is obtained over a wide
internuclear separation range from 0.16 to 2.0~nm and is fitted to
the analytic Murrell--Sorbie function. The spectroscopic parameters
$D_{\rm e}$, $D_{0}$, $R_{\rm e}$, $\omega _{\rm e}$,
$\omega _{\rm e}\chi _{\rm e}$,
$\alpha _{\rm e}$
and $B_{\rm e}$ are calculated to be 0.7219~eV,
0.7135~eV, 0.31813~nm, 151.63~cm$^{ - 1}$, 0.7288~cm$^{ - 1}$,
0.000729~cm$^{ - 1}$ and 0.1449~cm$^{ - 1}$, respectively, which are in good
agreement with the measurements. With the potential obtained at the
QCISD/6-311G(3df,3pd) level of theory, a total of 63 vibrational
states is found when $J=0$ by solving the radial Schr\"{o}dinger equation
of nuclear motion. The vibrational level, corresponding classical turning
point and inertial rotation constant are computed for each vibrational
state. The centrifugal distortion constants
($D_{\upsilon }\, H_{\upsilon }$,
$L_{\upsilon }$, $M_{\upsilon }$, $N_{\upsilon }$ and $O_{\upsilon })$ are
reported for the first time for the first 31 vibrational states when $J=0$. 相似文献
8.
Energy transfer probability in organic electrophosphorescence device with dopant 总被引:1,自引:0,他引:1 下载免费PDF全文
Based on the energy transfer process from host to dopant in an organic
electrophosphorescent (EP) device, the expression of energy transfer
probability ($\eta )$ between the host (TPD) and guest (Ir(ppy)$_{3})$ EP
systems was proposed. The results show that: ({1}) The rate of the triplet
energy transfer ($K_{\rm HG}$ and $K_{\rm GH})$ increases exponentially with
increasing donor-acceptor molecular distance ($R$), whereas decreases as the
intermolecular distance ($R_{\rm HH})$ increases from 0.8 to 2.4 nm.
Furthermore, $K_{\rm GH}$ changes more quickly than $K_{\rm HG.}$ ({2}) The energy
transfer probability ($\eta )$ increases as $R$ reduces, and the $R_{\rm HH}$
changes can be safely neglected for $R<$0.9 nm. The situation changes for
0.9nm$ < R < 1.1$nm, $R_{\rm HH }$ ($<1$nm) plays an essential role when
$\eta $ changes
and increases with the latter. However, if $R > 1.1$nm, the transfer
probability will be below zero. Here, the energy transfer principle may be
less important, and the high electroluminescence (EL) quantum efficiency of
phosphorescent system will be attributed to the direct electron-hole
recombination in phosphorescent molecules. ({3}) The $\eta $ will increase when the
Forster radius ($R_{0})$ increases or Gibb's energy decreases. 相似文献
9.
The fabrication of nickel silicide ohmic contacts to n-type 6H-silicon carbide 总被引:1,自引:0,他引:1 下载免费PDF全文
This paper reports that the nickel silicide ohmic contacts to n-type
6H-SiC have been fabricated. Transfer length method test patterns
with NiSi/SiC and NiSi硅化镍;欧姆触点;n型碳化硅;制造;能带;带隙 Project supported by the National Basic Research Program of China (Grant
No~2002CB311904), the
National Defense Basic Research Program of China (Grant No~51327010101) and
the National Natural Science Foundation of China (Grant No~60376001). 2006-09-192006-10-30 This paper reports that the nickel silicide ohmic contacts to n-type 6H-SiC have been fabricated. Transfer length method test patterns with NiSi/SiC and NiSi2/SiC structure axe formed on N-wells created by N^+ ion implantation into Si-faced p-type 6H-SiC epilayer respectively. NiSi and NiSi2 films are prepared by annealing the Ni and Si films separately deposited. A two-step annealing technology is performed for decreasing of oxidation problems occurred during high temperature processes. The specific contact resistance Pc of NiSi contact to n-type 6H-SiC as low as 1.78× 10^-6Ωcm^2 is achieved after a two-step annealing at 350 ℃for 20 min and 950℃ for 3 min in N2. And 3.84×10-6Ωcm^2 for NiSi2 contact is achieved. The result for sheet resistance Rsh of the N+ implanted layers is about 1210Ω/□. X-ray diffraction analysis shows the formation of nickel silicide phases at the metal/n-SiC interface after thermal annealing. The surfaces of the nickel silicide after thermal annealing are analysed by scanning electron microscope. 相似文献
10.
Novel material for nonvolatile ovonic unified memory (OUM)-Ag11In12Te26Sb51 phase change semiconductor 下载免费PDF全文
In this paper, Ag_{11}In_{12}Te_{26}Sb_{51} phase change semiconductor films have been prepared by dc sputtering. The crystallization behaviour of amorphous Ag_{11}In_{12}Te_{26}Sb_{51} thin films was investigated by using differential scanning calorimetry and x-ray diffraction. It was found that the crystallization temperature is about 483K and the melting temperature is 754.8K and the activation energy for crystallization, E_a, is 2.07eV. The crystalline Ag_{11}In_{12}Te_{26}Sb_{51} films were obtained using initializer. The initialization conditions have a great effect on the sheet resistance of Ag_{11}In_{12}Te_{26}Sb_{51} films. We found that the effect of the initialization condition on the sheet resistance can be ascribed to the crystallinity of Ag_{11}In_{12}Te_{26}Sb_{51} films. The sheet resistance of the amorphous (R_{amo}) film is found to be larger than 1×10^6Ω and that of the crystalline (R_{cry}) film lies in the range from about 10^3 to 10^4Ω. So we have the ratio R_{amo}/R_{cry}=10^2~10^3, which is sufficiently large for application in memory devices. 相似文献
11.
This paper reports that a novel type of suspended ZnO nanowire field-effect
transistors (FETs) were successfully fabricated using a
photolithography process, and their electrical properties were
characterized by I--V measurements. Single-crystalline ZnO
nanowires were synthesized by a hydrothermal method, they were used
as a suspended ZnO nanowire channel of back-gate field-effect
transistors (FET). The fabricated suspended nanowire FETs showed a
p-channel depletion mode, exhibited high on--off current ratio of
~105. When VDS=2.5 V, the peak transconductances
of the suspended FETs were 0.396 μS, the oxide capacitance was
found to be 1.547 fF, the pinch-off voltage VTH was about
0.6 V, the electron mobility was on average 50.17 cm2/Vs. The
resistivity of the ZnO nanowire channel was estimated to be
0.96× 102Ω cm at VGS = 0 V. These
characteristics revealed that the suspended nanowire FET fabricated
by the photolithography process had excellent performance. Better
contacts between the ZnO nanowire and metal electrodes could be
improved through annealing and metal deposition using a focused ion
beam. 相似文献
12.
In the framework of density functional theory, using the plane-wave
pseudopotential method, the nitrogen vacancy ($V_{\rm N})$ in both
wurtzite and zinc-blende AlN is studied by the supercell approach.
The atom configuration, density of states, and formation energies of
various charge states are calculated. Two defect states are
introduced by the defect, which are a doubly occupied single state
above the valance band maximum (VBM) and a singly occupied triple
state below the conduction band minimum (CBM) for wurtzite AlN and
above the CBM for zinc-blende AlN. So $V_{\rm N}$ acts as a deep
donor in wurtzite AlN and a shallow donor in zinc-blende AlN. A
thermodynamic transition level $E({3 + } \mathord{\left/ {\vphantom
{{3 + } + }} \right. \kern-\nulldelimiterspace} + )$ with very low
formation energy appears at 0.7 and 0.6eV above the VBM in wurtzite
and zinc-blende structure respectively, which may have a wide shift
to the low energy side if atoms surrounding the defect are not fully
relaxed. Several other transition levels appear in the upper part of
the bandgap. The number of these levels decreases with the structure
relaxation. However, these levels are unimportant to AlN properties
because of their high formation energy. 相似文献
13.
High energy electron radiation effect on Ni and Ti/4H-SiCSchottky barrier diode at room temperature 下载免费PDF全文
This paper reports that Ni and Ti/4H-SiC Schottky barrier diodes
(SBDs) were fabricated and irradiated with 1~MeV electrons up to a
dose of 3.43×1014~e/cm2. After radiation, the Schottky
barrier height φ B of the Ni/4H-SiC SBD increased from
1.20~eV to 1.21~eV, but decreased from 0.95~eV to 0.94~eV for the
Ti/4H-SiC SBD. The degradation of φ B could be
explained by interface states of changed Schottky contacts. The
on-state resistance RS of both diodes increased with the
dose, which can be ascribed to the radiation defects. The reverse
current of the Ni/4H-SiC SBD slightly increased, but for the Ti/4H-SiC
SBD it basically remained the same. At room temperature,
φ B of the diodes recovered completely after one week,
and the RS partly recovered. 相似文献
14.
Design optimization of high breakdown voltage vertical GaN junction barrier Schottky diode with high-K/low-K compound dielectric structure 下载免费PDF全文
Kuiyuan Tian 《中国物理 B》2023,32(1):17306-017306
A vertical junction barrier Schottky diode with a high-$K$/low-$K$ compound dielectric structure is proposed and optimized to achieve a high breakdown voltage (BV). There is a discontinuity of the electric field at the interface of high-$K$ and low-$K$ layers due to the different dielectric constants of high-$K$ and low-$K$ dielectric layers. A new electric field peak is introduced in the n-type drift region of junction barrier Schottky diode (JBS), so the distribution of electric field in JBS becomes more uniform. At the same time, the effect of electric-power line concentration at the p-n junction interface is suppressed due to the effects of the high-$K$ dielectric layer and an enhancement of breakdown voltage can be achieved. Numerical simulations demonstrate that GaN JBS with a specific on-resistance ($R_{\rm on, sp}$) of 2.07 m$\Omega\cdot$cm$^{2}$ and a BV of 4171 V which is 167% higher than the breakdown voltage of the common structure, resulting in a high figure-of-merit (FOM) of 8.6 GW/cm$^{2}$, and a low turn-on voltage of 0.6 V. 相似文献
15.
The Ni/4H-SiC Schottky barrier diodes (SBDs) and transfer length
method (TLM) test patterns of Ni/4H-SiC Ohmic contacts were
fabricated, and irradiated with 1~MeV electrons up to a dose of
3.43× 1014~e/cm-2. After radiation, the forward
currents of the SBDs at 2~V decreased by about 50%, and the
reverse currents at -200~V increased by less than 30%. Schottky
barrier height (φ B ) of the Ni/4H-SiC SBD increased
from 1.20~eV to 1.21~eV under 0~V irradiation bias, and decreased
from 1.25~eV to 1.19~eV under -30~V irradiation bias. The
degradation of φ B could be explained by the variation
of interface states of Schottky contacts. The on-state resistance
(Rs) and the reverse current increased with the dose, which
can be ascribed to the radiation defects in bulk material. The
specific contact resistance (\rhoc) of the Ni/SiC Ohmic
contact increased from 5.11× 105~Ωega.cm2 to 2.97× 10-4~Ωega.cm2. 相似文献
16.
Effect of STI-induced mechanical stress on leakage current in deep submicron CMOS devices 总被引:1,自引:0,他引:1 下载免费PDF全文
The shallow trench isolation (STI) induced mechanical stress
significantly affects the CMOS device off-state leakage behaviour. In
this paper, we designed two types of devices to investigate this
effect, and all leakage components, including sub-threshold leakage
($I_{\rm sub})$, gate-induced-drain-leakage ($I_{\rm GIDL})$, gate
edge-direct-tunnelling leakage ($I_{\rm EDT})$ and
band-to-band-tunnelling leakage ($I_{\rm BTBT})$ were analysed. For
NMOS, $I_{\rm sub}$ can be reduced due to the mechanical stress
induced higher boron concentration in well region. However, the GIDL
component increases simultaneously as a result of the high well
concentration induced drain-to-well depletion layer narrowing as well
as the shrinkage of the energy gap. For PMOS, the only mechanical
stress effect on leakage current is the energy gap narrowing induced
GIDL increase. 相似文献
17.
Study on spectroscopic parameters and molecular constants of HCl(X~1Σ~+) molecule by using multireference configuration interaction approach 下载免费PDF全文
Equilibrium internuclear separations, harmonic frequencies
and potential energy curves (PECs) of HCl($X^{1}\Sigma ^{ + })$
molecule are investigated by using the highly accurate valence
internally contracted multireference configuration interaction
(MRCI) approach in combination with a series of
correlation-consistent basis sets in the valence range. The PECs are
all fitted to the Murrell--Sorbie function, and they are used to
accurately derive the spectroscopic parameters ($D_{\rm e}$,
$D_{0}$, $\omega_{\rm e}\chi_{\rm e}$, $\alpha_{\rm e}$ and $B_{\rm
e})$. Compared with the available measurements, the PEC obtained at
the basis set, aug-cc-pV5Z, is selected to investigate the
vibrational manifolds. The constants $D_{0}$, $D_{\rm e}$, $R_{\rm
e}$, $\omega_{\rm e}$, $\omega_{\rm e}\chi_{\rm e}$, $\alpha_{\rm
e}$ and $B_{\rm e}$ at this basis set are 4.4006~eV, 4.5845~eV,
0.12757~nm, 2993.33~cm$^{ - 1}$, 52.6273~cm$^{ - 1}$, 0.2981~cm$^{ -
1}$ and 10.5841~cm$^{ - 1}$, respectively, which almost perfectly
conform to the available experimental results. With the potential
determined at the MRCI/aug-cc-pV5Z level of theory, by numerically
solving the radial Schr\"{o}dinger equation of nuclear motion in the
adiabatic approximation, a total of 21 vibrational levels are
predicted. Complete vibrational levels, classical turning points,
inertial rotation and centrifugal distortion constants are
reproduced, which are in excellent agreement with the available
Rydberg--Klein--Rees data. Most of these theoretical vibrational
manifolds are reported for the first time to the best of our
knowledge. 相似文献
18.
The ohmic contacts of 4H-SiC are fabricated on nitrogen ion implanted layers made by performing
box-like-profile implantation three and four times. Implantation parameters such as the standard deviation σ and the projection range Rp are calculated by the Monte Carlo simulator TRIM. Ni/Cr ohmic contacts on Si-face 4H-SiC implantation layers are measured by transfer length methods (TLMs). The results show that the values of sheet resistance Rsh are 30~kΩ /□ and 4.9~kΩ/□ and the values of specific contact resistance ρc of ohmic contacts are 7.1× 10-4Ω.cm2 and 9.5× 10-5Ω.cm2 for the implanted layers with
implantation performed three and four times respectively. 相似文献
19.
Based on the MIS model, a simple method to extract parameters of
SiC Schottky diodes is presented using the $I$-$V$ characteristics.
The interface oxide capacitance $C_\i$ is extracted for the first time,
as far as we know. Parameters of 4H-SiC Schottky diodes fabricated
for testing in this paper are: the ideality factor $n$, the series
resistance $R_{\rm s}$, the zero-field barrier height $\phi_{\rm B0}$,
the interface state density $D_{\rm it}$, the interface oxide
capacitance $C_\i$ and the neutral level
of interface states $\phi_0$. 相似文献
20.
Magnetism and giant magnetocaloric effect in rare-earth-based compounds R_3BWO_9(R = Gd,Dy, Ho) 下载免费PDF全文
《中国物理 B》2021,30(7):77501-077501
The magnetism and magnetocaloric effect(MCE) of rare-earth-based tungstate compounds R_3 BWO_9(R=Gd,Dy,Ho) have been studied by magnetic susceptibility,isothermal magnetization,and specific heat measurements.No obvious long-range magnetic ordering can be found down to 2 K.The Curie-Weiss fitting and magnetic susceptibilities under different applied fields reveal the existence of weak short-range antiferromagnetic couplings at low temperature in these systems.The calculations of isothermal magnetization exhibit a giant MCE with the maximum changes of magnetic entropy being 54.80 J/kg-K at 2 K for Gd_3 BWO_9,28.5 J/kg-K at 6 K for Dy_3 BWO_9,and 29.76 J/kg-K at 4 K for Ho_3 BWO_9,respectively,under a field change of 0-7 T.Especially for Gd_3 BWO_9,the maximum value of magnetic entropy change(-ΔS_M~(max)) and adiabatic temperature change(-ΔT_(ad)~(max)) are 36.75 J/kg·K and 5.56 K for a low field change of 0-3 T,indicating a promising application for low temperature magnetic refrigeration. 相似文献