基于反射和透射光谱的氢化非晶硅薄膜厚度及光学常量计算

采用紫外-可见透射光谱仪测量了对靶磁控溅射沉积法制备的氢化非晶硅（a-Si:H）薄膜的透射光谱和反射光谱.利用T/(1-R)方法来确定薄膜的吸收系数,进而得到薄膜的消光系数|通过拟合薄膜透射光谱干涉极大值和极小值的包络线来确定薄膜折射率和厚度的初始值,并利用干涉极值公式进一步优化薄膜的厚度值和折射率|利用柯西公式对得到的薄膜折射率进行拟合,给出了a-Si:H薄膜的色散关系曲线.为了验证该方法确定的薄膜厚度和光学常量的可靠性,将理论计算得到的透射光谱与实验数据进行了比较,结果显示两条曲线基本重合,可见这是确定a-Si:H薄膜厚度及光学常量的一种有效方法.     

关于热生长SiO2薄膜厚度的测量

在半导体硅器件的研究工作中,需要准确地测量和控制SiO₂薄膜的厚度。由于干涉原理,SiO₂薄膜在白光照射下呈现颜色。但薄膜厚度与颜色相应的单色光的波长并不成简单的函数关系。本文叙述了用干涉显微镜测量热生长SiO₂薄膜厚度的方法。由测量结果得到SiO₂薄膜的折射率以及SiO₂和硅界面及空气和硅界面反射相移之差。并且测量了一组标准样品的薄膜厚度,列出了薄膜厚度与干涉颜色的对应关系。所得结果与从Rollet数据所推算的结果大致符合。样品厚度还包括了Rollet数据中所未包括的范围(3300—4200?)。     

光纤白光干涉法与膜厚纳米测量新技术研究

运用薄膜光学干涉原理、光纤技术和干涉光谱分析技术,用光纤反射式干涉光谱仪(Reflectromic Interference Spectroscopy)直接测试宽带入射光在单晶硅表面超薄SiO₂膜层前后界面反射形成的干涉光谱曲线,并用专业软件对被测光谱信号数据处理后,可直接用公式准确计算出SiO₂氧化膜的厚度和光学折射率通过对单晶硅片表面超薄SiO₂氧化膜的实测,并与成熟的椭圆偏振仪测试结果相比,测试误差≤2nm但该方法测试简单、快速,精度高,不需要制定仪器曲线和数表,可对薄膜任意位置的厚度在线测试经过对不同厚度聚苯乙烯薄膜的厚度测试表明,该方法适合0.5～20μm薄膜厚度的精确在线测量,测量误差小于7nm.     

基于透射率曲线确定聚合物太阳能电池功能层的光学常数和厚度

本文介绍了一种确定聚合物太阳能电池功能层光学常数和厚度的方法. 该方法借助于特定的色散模型拟合透射率测试曲线以获得功能层光学常数和厚度值. 文中比较了Forouhi-Bloomer和Lorentz-Oscillator模型在体异质结薄膜的透射率拟合计算中的适用性, 计算了poly(3-hexylthiophene)(P3HT)/[6,6]-phenylC₆₁-butyric acid methyl ester (PCBM)和 poly[2-methoxy-5-5(2'-ethyl-hexyloxy)-1,4-phenylenevinylene](MEH-PPV)/PCBM体异质结薄膜的光学常数和厚度. 拟合得到的曲线与实验曲线符合良好, 厚度计算的结果与台阶仪测量结果保持一致, 误差小于4%. 进一步分析得到的热退火和加入高沸点溶剂添加剂后P3HT/PCBM薄膜的光学常数和光学禁带值与相应器件伏安特性相符. 该方法适用于所有体异质结的功能层, 可用于聚合物太阳能电池的膜系优化和在线检测.     

ZrO2/SiO2溶胶-凝胶薄膜膜层间的渗透行为

 分别以丙醇锆和正硅酸乙酯为原料，采用溶胶-凝胶工艺制备了性能稳定的ZrO₂和SiO₂溶胶。用旋转镀膜法在K9玻璃上分别制备了单层SiO₂薄膜、单层ZrO₂薄膜、ZrO₂/ SiO₂双层膜和SiO₂/ZrO₂双层膜。采用原子力显微镜观察了薄膜的表面形貌，用椭偏仪测量薄膜的厚度与折射率，用紫外-可见光分光光度计测量了薄膜的透射率。对薄膜的透射光谱和椭偏仪模拟的数据进行分析，发现SiO₂/ZrO₂双层膜之间的渗透十分明显，而ZrO₂/SiO₂双层膜之间几乎不发生渗透。利用TFCalc模系设计软件,采用三层膜模型对薄膜的透射率进行模拟，得出的透射曲线与用紫外-可见光分光光度计测量的透射曲线十分符合。     

Sb掺和对TeOx薄膜光学和静态记录特性的影响

以真空蒸镀法在K9玻璃基底上制备了TeO_x:Sb单层薄膜,对薄膜的结构、光学和静态记录特性进行了研究.结果表明,Sb掺和后TeO_x薄膜的结构、反射光谱和光学常量均发生了明显变化.TeO_x:Sb薄膜具有良好的写入灵敏性并具有了一定的可擦除性能,该类薄膜有望作为可擦除光存储介质.     

磁控溅射MO薄膜电阻率的原位研究

研究了磁控溅射Mo薄膜的电阻率与薄膜厚度的关系。对Mo薄膜的电阻率进行了原位测量,得到电阻率与薄膜厚度的实验曲线。经拟合计算得到Mo薄膜电阻率与薄膜厚度关系的理论曲线。将实验曲线与理论曲线比较,结果显示在薄膜厚度较大时,电阻率与薄膜厚度的关系与Fuchs-Sondheimer(F-S)理论基本符合,如果计入晶粒尺寸对电阻率的贡献则完全符合F-S理论。并得到Mo薄膜尚未形成连续性薄膜前的导电机制为热电子发射机制的结论。 关键词：     

双层介电薄膜结构双液体变焦透镜的研究

在双层介电薄膜结构双液体变焦透镜模型的基础上,分析了透镜焦距与外加电压、双层介电薄膜的介电常量、薄膜厚度等参量的关系.并以降低双液体变焦透镜驱动电压为目的,选择了相对介电常量较高的五氧化二钽薄膜作为内层介电层,相对介电常量较低的防水层为外层介电层,分析了双层介电薄膜的厚度以及厚度的匹配对双液体变焦透镜的变焦范围和驱动电压的影响,在保证一定的变焦范围并尽可能降低透镜驱动电压情况下获得最佳透镜工艺参量.模拟结果表明:疏水层薄膜厚度比高介电层薄膜厚度小很多时,双液体变焦透镜可实现低压驱动,且双液体变焦透镜在一定变焦范围内所需驱动电压可下降到10V以下,而疏水层薄膜厚度与高介电层薄膜厚度相当或高于高介电层薄膜厚度都不能有效利用高介电薄膜的高介电性能来降低双液体变焦透镜的驱动电压.     

外延生长La0.7Sr0.3MnO3薄膜厚度对缺陷影响的慢正电子分析

采用脉冲激光沉积方法在(LaAlO₃)_0:3(Sr₂AlTaO₆)_0:7衬底上外延生长了La_0.7Sr_0.3MnO₃薄膜,并采用慢正电子束方法分析了薄膜在不同厚度和不同退火气氛下参数S的变化. 分析表明,薄膜中包含两种机制引入的氧空位,分别是薄膜生长气氛中氧压偏低造成薄膜的氧缺乏和由于薄膜应变引入空位型缺陷. 当薄膜厚度较薄时,应变造成的晶格畸变化比较大,当薄膜的厚度大于11 nm时,薄膜的应变驰豫已经比较完全. 原位退火的样品中正电子主要是被氧缺乏引起的氧空位捕获. 在氧气中退火的样品,S随厚度的变化反映了应变对薄膜微结构的影响.     

ZrO2/ SiO2多层膜的化学法制备研究

 分别以ZrOCl₂·8H₂O 和正硅酸乙酯为原料,采用溶胶-凝胶工艺制备了性能稳定的ZrO₂和SiO₂溶胶。用旋转镀膜法分别在K9玻璃和单晶硅片上制备了ZrO₂/ SiO₂多层膜。采用溶剂替换和紫外光处理等手段,有效地解决了ZrO₂/SiO₂多层膜中膜层开裂和膜间渗透等问题。应用扫描电子显微镜观测了薄膜的表面和剖面微观形貌,并用椭偏仪测得薄膜的厚度和折射率,研究了薄膜厚度、折射率与热处理温度、紫外光处理时间的关系,对所获得薄膜的紫外-可见、红外光谱进行了分析。用输出波长1064nm ,脉宽15ns 的电光调Q光系统产生的强激光进行了单层膜的辐照实验,结果发现溶剂替换后激光损伤阈值有所提高。     

利用线性液膜的红外热像测定YBCO的湿法化学刻蚀启动时长

提出了一种测定YBCO(YBa2Cu3O7-x)高温超导薄膜湿法腐蚀启动时长的红外热像新方法。该方法的实质是利用YBCO腐蚀时必然有化学热吸收或释放,从而引起YBCO表面液膜温度变化这一特点,通过红外热像实时监测系统,采集液膜温度变化过程的红外热像,从而判断反应启动时长。理论分析和实验结果均表明,YBCO表面2 mm宽线性液膜是较为理想的监测对象,因其同时具备温度变化信息和空间分布信息,可以将线性液膜中心作为理想的观测特征点;由滑动腐蚀液滴形成残留线性液膜具有温度变化灵敏度高的特点,YBCO(衬底为LaAlO3)竖直放置,可以表面避免液膜重力对启动时长的影响,获得更为准确的监测数据。由线性液膜的横向剖面灰度变化得到在本实验条件下YBCO薄膜与体积比H3PO4∶H2O=1∶300腐蚀液的反应启动时长介于0.3~0.4 s之间。     

YBCO薄膜过电流失超特性实验及分析

YBCO薄膜材料作为电阻型高温超导限流器的限流元件具有单位通流长度耐压高,失超后不易损毁等优点.本文设计一套实验设备,在不同幅值交流电源条件下,对YBCO薄膜过电流失超特性进行了测量.实验得到了在不同过电流作用下YBCO薄膜的阻抗及电压随时间的变化关系.大量实验数据表明,YBCO对短路电流有很好的限流效果.并且动作迅速,失超后有效限流电阻大.结合实验数据,文中将YBCO薄膜的过电流失超过程分为三个不同阶段.对应于不同幅值的交流电源,分析了不同阶段YBCO的电阻发展过程.本文得到的结论对YBCO薄膜限流元件的建模及失超传播分析有着重要的参考意义.     

Some aspects of interactions between HTSC-films and substrates

Different aspects of the interaction between YBa₂Cu₂O_y(YBCO) films and (100) ZrO₂〈Y〉 (YSZ) substrates have been investigated. It was determined using X-ray diffraction methods that the structural mismatch between the film and the substrate leads to a film deformation throughout its thickness. At the same time a strained layer appears in the substrate, whose thickness is proportional to the film thickness. The surface morphology changes of YBCO films which take place with variation of the growth temperaturet_sin the vicinity of the optimum temperature lead to changes of the film grain structure probably connected with nucleation centers. Tl₂Ba₂CaCu₂O_y(TBCCO) films on YSZ substrates were also synthesized. It was found that the dependence of the TBCCO film surface morphology changes with annealing temperature and the dependence of YBCO film surface morphology changes ont_sare similar.     

PREPARATION OF a-AXIS ORIENTED YBa2Cu3Ox THIN FILMS

The a-axis oriented YBa₂Cu₃O_x(YBCO) thin films could be grown on (100) SrTiO₃(STO) substrates with STO buffer layers by dc and rf magnetron sputtering either by low-ering the deposition temperature, or by using a self-template technique. For the latter, the resistivity of the thin film at 290K along the substrate [001] direction is about four times larger than that in the [010] direction. The zero resistance temperatures T_c0 are 89 K in both directions. So high quality a-axis oriented YBCO thin films can be prepared by the self-template technique. Also the T_c0 increase monotonously with the reduction of the thickness of the YBCO seed layer.     

关于YBCO薄膜过热现象的研究

在用YBa₂Cu₃O_z(YBCO)种膜液相外延生长Nd_1+xBa_2-xCuO_z(NdBCO)厚膜的过程中，YBCO晶体在高于熔点的温度下保持不熔化并且起到了外延种子的作用.采用高温金相显微镜,我们实时观察YBCO薄膜的熔化过程，发现了超导氧化物薄膜的过热现象，并且结合XRD极图的分析和Ba-Cu-O熔体的不润湿性现象合理解释了YBCO形成过热的机制.另外，通过对具有不同微观结构的YBCO薄膜熔化行为的横向比较，研究YBCO薄膜品质对于其过热度的影响，并用半共格界面能理论很好地解释了AFM和XRD分析及实时观察熔化过程的实验结果. 关键词： 过热 YBCO薄膜 熔化形核     

The film thickness dependent thermal stability of Al<Subscript>2</Subscript>O<Subscript>3</Subscript>:Ag thin films as high-temperature solar selective absorbers

The monolayer Al₂O₃:Ag thin films were prepared by magnetron sputtering. The microstructure and optical properties of thin film after annealing at 700 °C in air were characterized by transmission electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and spectrophotometer. It revealed that the particle shape, size, and distribution across the film were greatly changed before and after annealing. The surface plasmon resonance absorption and thermal stability of the film were found to be strongly dependent on the film thickness, which was believed to be associated with the evolution process of particle diffusion, agglomeration, and evaporation during annealing at high temperature. When the film thickness was smaller than 90 nm, the film SPR absorption can be attenuated until extinct with increasing annealing time due to the evaporation of Ag particles. While the film thickness was larger than 120 nm, the absorption can keep constant even after annealing for 64 h due to the agglomeration of Ag particles. On the base of film thickness results, the multilayer Al₂O₃:Ag solar selective thin films were prepared and the thermal stability test illustrated that the solar selectivity of multilayer films with absorbing layer thickness larger than 120 nm did not degrade after annealing at 500 °C for 70 h in air. It can be concluded that film thickness is an important factor to control the thermal stability of Al₂O₃:Ag thin films as high-temperature solar selective absorbers.     

GROWTH MODE OF Cu-RICH PARTICLES ON LASER-ABLATED YBa2Cu3O7 THIN FILMS

The microstructure of the laser-ablated YBa₂Cu₃O₇ (YBCO) thin film deposited on heated (100) SrTiO₃ substrate was examined by transmission electron microscope. The par-ticles on the film mainly consist of CuO and few CuYO₂. Most of these non-superconducting particles nucleate on or near the surface of the film and protrude about 100-400 nm in height, A large amount of a-axis YBCO grains also exist in the film, which nucleate at the substrate surface and grow perpendicularly above the c-axis YBCO film. The YBCO thin film deposited under low oxygen pressure has very different microstructure compared with YBCO thin film deposited under high oxygen pressure.     

LPE growth of PZNT film using superheating YBCO thin film as seed layer

A superheating YBa₂Cu₃O_7-δ (YBCO or Y123) thin film was applied as a seed layer to grow Pb[(Zn_1/3Nb_2/3)_0.91Ti_0.09]O₃ (PZNT) films by a liquid phase epitaxy (LPE) process. In the present work, the YBCO thin film underwent a growth temperature of 1050 °C, which was about 40 °C higher than its peritectic temperature. It is very interesting that the superheated YBCO seed film could be used to grow not only Nd_1+xBa_2-xCu₃O_7-δ (NBCO) films with similar compositions but also PZNT films with completely different compositions. The XRD analysis confirmed that the PZNT film grown on the YBCO seeded MgO substrate had a good epitaxial relationship of [100](001)_PZNT//[100](001)_YBCO//[100] (001)_MgO. Compared with the PZNT films directly grown on MgO substrates, the LPE PZNT film on YBCO/MgO presented a better surface morphology. It was found that the superheating YBCO seed film plays a crucial role for the LPE growth of PZNT in the process. Furthermore, the superheating mechanism was discussed in terms of thermodynamic theories as well. PACS 77.84.-s; 61.10.Nz; 68.37.Hk; 81.15.Lm; 82.45.Mp     

插入二氧化铈薄膜提高MOD-YBa2Cu3O7-x厚膜超导性能的研究

YBa₂Cu₃O_7-x(YBCO)膜存在“厚度效应”: 随着厚度增加, YBCO薄膜的临界电流密度下降, 尤其是YBCO薄膜的厚度超过1 μm时, 它的临界电流密度急剧下降. 本文在YBCO薄膜之间引入极薄的二氧化铈(CeO₂)薄膜, 成功制备出结构为YBCO/YBCO/CeO₂/YBCO的超导厚膜. 所制备的厚度为2 μm的YBCO膜临界电流密度为1.36 MA/cm² (77 K, 自场), 其性能比相同厚度的纯YBCO膜有了较大幅度的提升. 研究表明CeO₂薄膜起到了传递织构、松弛应力的作用.     

The effect of BZO doping concentration and thickness dependent properties of YBCO films grown by PLD on buffered NiW substrates

The effect of BaZrO₃ (BZO) doping is systematically studied in YBa₂Cu₃O_6+x (YBCO) thin films deposited by pulsed laser deposition (PLD) on buffered NiW substrates. Based on the structural and magnetic properties, the optimal BZO doping concentration is obtained to vary between 4 and 7.5 wt.%, depending mainly on applied magnetic field. This relatively high optimal concentration is linked to the nanograined target material and metal substrate that cause low-angle grain-boundaries and in-plane spread of YBCO crystals on NiW. Thickness dependent analysis of undoped and BZO-doped YBCO films predicts differences in growth mechanisms where early growth next to the substrate interface is 2D-type in BZO-doped films. This leads to the situation where crystallographic structure as well as superconducting properties are improved when the film develops and the thickness is increased. Therefore from the resistivity measurements a threshold thicknesses where reasonable properties occur are determined for both set of films. Measurements in thermally activated flux-flow regime (TAFF) indicate that above the threshold thickness relatively strong and isotropic vortex pinning is realized in BZO-doped YBCO films. Generally, this paper demonstrates that especially for thin film applications on NiW substrates even more compatible buffer layer structures should be utilized.