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采用磁控溅射方法在(100)YSZ基底上沉积了YBa2Cu3O7/SrTiO3/YBa2Cu3O7异质外延三层膜,利用交流磁化率和四引线电阻测量的方法确定了三层膜的超导性能,利用X射线衍射和透射电子显微镜研究了三层膜的结构特征.研究结果表明,膜层的结晶质量较好,临界转变温度Tc在83.K和86.7K之间.YBCO膜层中的绝大多数甚至全部)晶粒为C取向,在有些膜中只存在少量的a或b取向的YBCO晶粒.三层膜中层界面比较清晰但不十分平整.在膜/基界面处有8-10nm厚的过渡层,它由多晶的BaZrO3组成.膜层和(10)YSZ基底之间具有如下的外延生长关系YSZ[001]//YBCO[110]//SrTjO3[110];YSZ(100)//YBCO(001)//SrTiO3(001). 相似文献
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The microstructure of the laser-ablated YBa2Cu3O7 (YBCO) thin film deposited on heated (100) SrTiO3 substrate was examined by transmission electron microscope. The par-ticles on the film mainly consist of CuO and few CuYO2. Most of these non-superconducting particles nucleate on or near the surface of the film and protrude about 100-400 nm in height, A large amount of a-axis YBCO grains also exist in the film, which nucleate at the substrate surface and grow perpendicularly above the c-axis YBCO film. The YBCO thin film deposited under low oxygen pressure has very different microstructure compared with YBCO thin film deposited under high oxygen pressure. 相似文献
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Nucleation of diamond on silicon wafers using C60 in the hot filament chemical vapour deposition system 下载免费PDF全文
Scanning electron microscopy and Raman shifts were used to study the process of diamond nucleation and growth using C60 in the hot filament chemical vapour deposition (HFCVD) system.The process of nucleation and growth of diamond films on silicon wafer using C60 as intermediate layer in HFCVD system is described.In order to increase the density of diamond nuclei on the wafers,it is not necessary to use negative bias.The UV-light pre-treatment is not beneficial for improving the diamond nucleation.The multi-layers of C60 molecules,but not a monolayer,can increase the density of diamond nuclei in the presence of H atoms. 相似文献
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§1 前言LR(k)文法在理论上和实际应用上都有重要意义。但其正规分析算法设置状态太多,占用存储太大,影响了实践使用。对比,已有人提出了一些优化措施,主要是合并状态以减少存储。从而得到熟知的 SLR(K)、LALR(K)文法和文[1]的 BCLR(K)文法、文[2]的 LBLR(K)文法。状态合并一般是从文法状态集到其真子集上的同态映射,因此必然要丢失描述语法分 相似文献
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通过X射线衍射、差热分析、电子显微镜、超导电性测量等手段研究了研磨对Y-123和Bi(Ph)-2223超导相和成相过程的影响。结果表明:研磨对Y-123和Bi(Ph)-2223超导相的影响显著不同,研磨导制了Bi(Ph)-2223超导相的破坏。同时指出Bi(Ph)-2223超导相同一结构特征的两种属性:好的可塑性和结构易破坏性。前者是优点,后者是缺点。在加工、测量、使用过程中,要尽力避免后一缺点带来的超导电性的破坏或由于局部结构破坏而导致的整体性能的降低。 相似文献