采用HfO2/SiO2溶胶-凝胶薄膜制备衍射光栅

采用溶胶-凝胶方法制备了具有光敏性的HfO2/SiO2溶胶-凝胶薄膜,并利用其光敏性制备了衍射光栅.采用XPS分析了薄膜的成份,证实了Hf元素的存在.并用椭偏仪测试了薄膜的折射率,结果证实了HfO2的加入确实提高了体系的折射率.利用其光敏性,采用X射线作曝光光源通过掩模进行曝光,利用曝光部分与未曝光部分的溶解度差,在薄膜上制备了高为0.8 μm、周期为1 μm的衍射光栅.     

1感光溶胶-凝胶法制备光波导研究

采用溶胶-凝胶技术与化学修饰相结合的方法,制备了具有紫外感光特性的SiO2/Al2O3溶胶及其凝胶薄膜,并通过在溶胶中加入聚乙二醇使其形成有机-无机复合结构,经一次提拉制膜就可获得18 μm厚的感光性凝胶薄膜.利用薄膜自身的感光性,使紫外光通过掩模照射薄膜,再经过溶洗和200℃、1 h的热处理,就可获得厚度达到15 μm、线宽约为100 μm的波导阵列.对这种波导薄膜的折射率和的透射率进行了研究.     

低损耗有机无机混合溶胶凝胶波导的实验研究

利用有机无机混合的溶胶凝胶方法在硅基底上制备波导薄膜.采用正硅酸四乙酯和苯基三乙氧基硅烷作为反应先驱物，利用旋涂的方法成膜，对其折射率，传输损耗以及条形波导的光刻、刻蚀特性进行了研究.测量了波导薄膜折射率随成分变化的关系.实验表明，该方法工艺简单，可以获得具有较低损耗的波导薄膜.测试得到632.8 nm波段的损耗系数为0.23 dB/cm.采用ICP刻蚀工艺获得了较为平整的条形波导.     

采用溶胶凝胶协同自组装与光刻相结合的方法在反蛋白石结构薄膜中引入二维缺陷

采用溶胶凝胶协同自组装与光刻相结合的方法,在光子晶体反蛋白石结构中引入缺陷,通过溶胶凝胶协同自组装方法在硅片上垂直沉积胶体晶体复合薄膜,把BP212正性光刻胶均匀旋涂在复合薄膜上,通过曝光、显影等光刻工艺,把掩膜版图案复制在复合薄膜上,用此样品再次垂直沉积一层复合薄膜,使图案被复合薄膜覆盖.最后去除胶体微球与光刻胶图案,从而在反蛋白石结构中引入缺陷,用扫描电子显微镜对样品进行表征.分析了光刻胶图案对胶体微球排列的影响.     

支化聚甲基苯基硅烷薄膜波导的光折变效应研究

掺入0.33%苯基三氯硅烷制备了分子量为51 874的支化聚甲基苯基硅烷,由此改善了聚甲基苯基硅烷薄膜波导的成膜质量.报告了相应的成膜技术、膜厚控制技术、热处理技术和热氧化现象.采用紫外曝光手段研究了支化聚甲基苯基硅烷薄膜的光漂白效应,定性测试了曝光剂量与反应生成硅氧烷的正比关系.实验归纳了支化聚甲基苯基硅烷薄膜的光折变规律,获得了控制薄膜厚度和折射率的定量条件.     

基于KH560修饰的有机/无机杂化材料电光波导制备

利用溶胶-凝胶法制备了硅烷偶联剂KH560修饰的有机/无机杂化电光材料,分析了KH560的水解缩合的反应机理.对制备好的电光薄膜进行了表面形貌、折射率和电光特性的表征,并用反射法测量得出了该材料的电光系数为3.5pm/V.针对这种材料柔韧的特性,设计了上加载条形电光波导,并利用Opti-BPM软件模拟了二维和三维光场.摸索了其制备的加工工艺,制备了该结构的光波导,最后得到了这种波导的近场输出.     

聚合物自写入光波导的时域有限差分模拟

利用时域有限差分方法,对非线性光学聚合物SU-8环氧树脂在激光作用下,其折射率会升高的过程进行了数值模拟与分析,得到SU-8薄膜与激光作用一定时间之后,其内部折射率的分布。分别对表面是平面及表面带有微透镜的SU-8薄膜进行了模拟。结果表明,利用折射率升高引起的自聚焦效应,可以在SU-8薄膜内自写入波导;写入的波导以自聚焦焦点为分界点,分为锥形波导和柱形波导。写入的波导长度随着与激光作用时间的增加而增长;在与激光相同的作用时间里,表面带有微透镜的SU-8薄膜,与表面是平面的SU-8薄膜相比,锥形波导的旁瓣更收敛,写入的波导长度更长;在微透镜底面半径保持不变以及曝光时间一定时,微透镜冠高与底面半径比例为0.08时比比例为0.24时写入的波导长度要长12.2%,其中锥形波导部分要长19.2%。     

集成光学 光波导材料与制备

TN252 2006043283低损耗有机无机混合溶胶凝胶波导的实验研究=Alowloss planar waveguide by using organic-inorganic sol-gel[刊,中]/庞拂飞(中科院上海光机所.上海(201800)) ,韩秀友…∥光子学报.—2006 ,35(4) .—509-512利用有机无机混合的溶胶凝胶方法在硅基底上制备波导薄膜。采用正硅酸四乙酯和苯基三乙氧基硅烷作为反应先驱物,利用旋涂的方法成膜,对其折射率,传输损耗以及条形波导的光刻、刻蚀特性进行了研究。测量了波导薄膜折射率随成分变化的关系。实验表明,该方法工艺简单,可以获得具有较低损耗的波导薄膜。测试得到632 .8nm…     

基于平面波导激励的修正长程表面波的传感器研究

为了解决传统的强度检测型波导激励的表面等离子体共振传感器灵敏度不高的缺点,研究平面波导激励的介质膜-金属-被测介质的可激发修正的长程表面等离子体波结构。采用离子交换的方法制备折射率可用费米函数拟合的平面波导,研究了离子交换时间对平面波导的模数及等效折射率等特性的影响,为激励波导的优化设计提供有效依据。采用制备的平面波导激励介质膜-金属-被测介质的非对称结构,研究金属材质、介质膜厚和金属膜厚等因素对修正的长程表面等离子体波特性的影响,对被测溶液的折射率进行检测。实验结果表明,其灵敏度为传统的强度检测型表面等离子体共振传感器的6倍,并且具有较好的线性关系。     

基于KH56O修饰的有机/无机杂化材料电光波导制备

利用溶胶-凝胶法制备了硅烷偶联剂KH560修饰的有机/无机杂化电光材料,分析了KH560的水解缩合的反应机理.对制备好的电光薄膜进行了表面形貌、折射率和电光特性的表征,并用反射法测量得出了该材料的电光系数为3.5pm/V.针对这种材料柔韧的特性,设计了上加载条形电光波导,并利用Opti-BPM软件模拟了二维和三维光场....     

溶胶-凝胶法制备高折射率TiO2薄膜

 采用溶胶- 凝胶法制备了TiO₂纳米晶溶胶,并以旋涂法（spin-coating）镀制了高折射率光学薄膜。借助光散射技术和透射电镜研究了溶胶的微结构。采用原子力显微镜、场发射扫描电镜、紫外-可见-近红外光谱仪、椭偏仪、漫反射吸收光谱及强激光辐照实验,对膜层的结构、光学性能及抗激光损伤性能进行了系统的表征。结果显示:纳米晶薄膜的折射率达到了1.9,而传统的溶胶-凝胶薄膜折射率只有1.6;同时纳米晶薄膜的抗激光损伤阈值与传统的溶胶-凝胶薄膜相差不大,在1 064 nm处分别为16.3 J/cm²(3 ns脉冲) 和16.6 J/cm²(3 ns脉冲);纳米晶溶胶薄膜可以在保持较高抗激光损伤阈值情况下,大幅度提高薄膜折射率。     

Effects of refractive index modifiers and UV light on an epoxy-functional inorganic-organic hybrid sol-gel derived thin film system

Thin film systems consisting of (3-glycidyloxypropyl)trimethoxysilane (GDPTMS), dimethyldimethoxysilane (DMDMOS) and, either zirconium(IV) n-propoxide (Zr(OPrⁿ)₄) or diphenyldimethoxysilane (DPDMS) were synthesised via the sol-gel method. GDPTMS and DMDMOS were employed as the main network formers, whereas Zr(OPrⁿ)₄ or DPDMS was both a network former and a refractive index modifier. The comparative effects of Zr and DPDMS content, and UV light on the optical and thermal properties of the system were evaluated. Refractive index measurements and cross-sectional scanning electron microscopy of the resultant thin films were performed. The thermal stability of each system, in terms of temperature at 10% mass loss, was characterised by dynamic thermogravimetry. It was demonstrated that the selection of refractive index modifier along with UV irradiation plays an important role in tuning the optical and thermal properties of an epoxy-functional inorganic-organic hybrid sol-gel derived thin film system.     

Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process

TiO2 and ZrO2 films are deposited by electron-beam （EB） evaporation and by sol-gel process. The film properties are characterized by visible and Fourier-transform infrared spectrometry, x-ray diffraction analysis, surface roughness measure, absorption and laser-induced damage threshold （LIDT） test. It is found that the sol-gel films have lower refractive index, packing density and roughness than EB deposited films due to their amorphous structure and high OH group concentration in the film. The high LIDT of sol-gel films is mainly due to their amorphous and porous structure, and low absorption. LIDT of EB deposited film is considerably affected by defects in the film, and LIDT of sol-gel deposited film is mainly effected by residual organic impurities and solvent trapped in the film.     

SERS activity of silver and gold nanostructured thin films deposited by pulsed laser ablation

The deposition power dependence of visible transmittance and refractive index of room temperature-deposited ZnO:Al thin films by RF magnetron sputtering has been studied. All films exhibited high visible transmittance and near-complete UV absorption. The refractive index of the films decreased continuously with an increase in the RF power at all photon energies in the visible and near-IR region, which has been partially attributed to the decreased packing density of the films. For each film, the refractive index exhibited strong frequency dispersion in the weak-absorption region. The origin of optical dispersion at different RF power has been discussed in the light of a single-oscillator model.     

基于透射光谱确定溶胶凝胶ZrO2薄膜的光学常数

基于溶胶凝胶ZrO₂薄膜的紫外/可见/近红外透射实验光谱,采用Swanepoel方法结合Wemple-DiDomenico色散模型,方便地导出了ZrO₂薄膜在200—1200nm波长范围内的光学常数,包括折射率、色散常数、膜层厚度、吸收系数及能量带隙.研究发现,溶胶凝胶ZrO₂薄膜具有高折射率(1.63—1.93,测试波长为632.8nm)、低吸收和直接能量带隙(4.97—5.63eV) 等光学特性,而且其光学常数对薄膜制备过程中的重要工艺 关键词： 光学常数 Swanepoel方法 2薄膜')" href="#">ZrO₂薄膜 热处理     

Optical properties of dye-doped zirconia films by spectroscopic ellipsometry

The optical properties of zirconia films doped with rhodamine 6G and oxazine 725 by the sol-gel process were investigated using spectroscopic ellipsometry (SE). Accurate refractive index n and the extinction coefficient k were determined using a three-oscillator classical Lorentz model in the wavelength range of 300-800 nm. The derived refractive index of dye-doped films exhibited anomalous dispersion in the absorption region. Wavelength tunable output lasing action yellow and near-infrared wavelength region was achieved by DFB configuration using zirconia films doped with R6G and oxazine 725.     

Modulation of refractive index and thickness of poly(methyl methacrylate) thin films with UV irradiation and heat treatment

This paper reports changes in refractive index and thickness of spin-coated poly(methyl methacrylate) (PMMA) thin films upon irradiation by a conventional high-pressure mercury UV lamp. Significant increase in refractive index and reduction in thickness are detected. Index modulations of greater than 0.01 are achieved in the thin films after 4 min of irradiation. The thickness reduction of an irradiated PMMA film is consistent with its weight loss. This is caused by the escape of the volatile molecules generated during the irradiation process. A slight increase in the refractive index is also found in the film, heat-treated above its glass transition temperature (Tg). This thermal effect is detected in the UV irradiation process. We propose three possible aliphatic structures that are formed during the photochemical reaction and may exist in the main chain of irradiated PMMA after the irradiation. Their refractive indices in aggregate state are greater than that of PMMA based on an evaluation using the Lorentz-Lorenz equation. This is suggested to be an important reason for the refractive index increase in the UV-irradiated PMMA films. A UV-irradiated film, heat-treated above its Tg, has a rough surface with many tiny holes as illustrated by atomic force microscopy. These holes are attributed to the evaporation of the small molecules generated during the irradiation process.     

基于p偏振光双面反射的薄膜传感器光学参数的优化

ｐ偏振光在镀膜平板玻璃上、下表面反射光强比γ的角度调制曲线的性状与膜层光学参数密切相关。分析了γ与膜层折射率、消光系数及膜厚的相对梯度随光参数变化的着急为基于ｐ偏振光双面反射的薄膜传感器选择最佳参数提供了理论依据,计算表明该类型传感器对膜层折射率的测量分辨率高达１０＾－７。对不同工艺条件下得到的溶胶－凝胶ＳｎＯ２膜进行光学参数测定及初步气敏实验,结果表明ｐ偏振光双面反射可作为高灵敏度光化学传感器的     

长周期光纤光栅气敏薄膜传感器结构优化

基于三包层长周期光纤光栅模型,研究了包层表面涂覆一层溶胶凝胶气敏薄膜的长周期光纤光栅化学传感器的灵敏度Sn与薄膜光学参量(折射率n3和厚度h3)和光纤光栅结构参量(光栅周期、折变量和光栅长度)之间的关系。采用最优化数值方法,找到了获得高灵敏度所需的最佳膜层光学参量和光栅结构参量。理论计算表明,该类型传感器对膜层折射率的测量分辨率高达10-8。实验上制作了对乙醇气体敏感的传感器,并证实了传感器结构优化的必要性。