| 采用HfO2/SiO2溶胶-凝胶薄膜制备衍射光栅 |
| |
| 引用本文： | 谢永军,赵福华,魏伟,赵小侠,赵卫.采用HfO2/SiO2溶胶-凝胶薄膜制备衍射光栅[J].光子学报,2008,37(1):133-135. |
| |
| 作者姓名： | 谢永军 赵福华 魏伟 赵小侠 赵卫 |
| |
| 作者单位： | 中国科学院西安光学精密机械研究所,瞬态光学与光子技术国家重点实验室,西安,710119 |
| |
| 基金项目： | 国家自然科学基金
,
中国科学院知识创新工程项目 |
| |
| 摘 要： | 采用溶胶-凝胶方法制备了具有光敏性的HfO2/SiO2溶胶-凝胶薄膜,并利用其光敏性制备了衍射光栅.采用XPS分析了薄膜的成份,证实了Hf元素的存在.并用椭偏仪测试了薄膜的折射率,结果证实了HfO2的加入确实提高了体系的折射率.利用其光敏性,采用X射线作曝光光源通过掩模进行曝光,利用曝光部分与未曝光部分的溶解度差,在薄膜上制备了高为0.8 μm、周期为1 μm的衍射光栅.
|
| 关 键 词： | 信息光学 HfO2/SiO2溶胶-凝胶 光栅 光敏 |
| 文章编号： | 1004-4213（2008）01-0133-3 |
| 收稿时间： | 2006-09-01 |
| 修稿时间： | 2006年9月1日 |
Fabrication of Diffractive Grating Using HfO2-SiO2 Sol-Gel Film |
| |
| XIE Yong-jun,ZHAO Fu-hua,WEI Wei,ZHAO Xiao-xia,ZHAO Wei.Fabrication of Diffractive Grating Using HfO2-SiO2 Sol-Gel Film[J].Acta Photonica Sinica,2008,37(1):133-135. |
| |
| Authors: | XIE Yong-jun ZHAO Fu-hua WEI Wei ZHAO Xiao-xia ZHAO Wei |
| |
| Abstract: | A novel photosensitive HfO2/SiO2 gel film is prepared by sol-gel technique,and a grating is obtained in the HfO2/SiO2 sol-gel film.The Hafnium element is detected in the film by X-ray photoelectron spectroscopy (XPS).The refractive indexes of the film at different wavelengths are also measured,which shows that they are raised.Because of solubility difference between the exposed part and unexposed part,after the film is exposed through the mask by X-ray irradiation,a grating with highness of 0.8 μm and period of 1 μm is obtained in the HfO2/SiO2 sol-gel film,which also shows the film has good photosensitivity. |
| |
| Keywords: | Information optics HfO2/SiO2 sol-gel Grating Photosensitive |
| 本文献已被 维普 万方数据 等数据库收录！ |
| 点击此处可从《光子学报》浏览原始摘要信息 |
| 点击此处可从《光子学报》下载免费的PDF全文 |
|
