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Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process
作者姓名:姚建可  李海源  范正修  唐永兴  晋云霞  赵元安  贺洪波  邵建达
作者单位:[1]R&D Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800 [2]National Laboratory of High Power Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800 [3]Graduate School of the Chinese Academy of Sciences, Beijing 100049
基金项目:Supported by the National Natural Science Foundation of China under Grant No 60608020.
摘    要:TiO2 and ZrO2 films are deposited by electron-beam (EB) evaporation and by sol-gel process. The film properties are characterized by visible and Fourier-transform infrared spectrometry, x-ray diffraction analysis, surface roughness measure, absorption and laser-induced damage threshold (LIDT) test. It is found that the sol-gel films have lower refractive index, packing density and roughness than EB deposited films due to their amorphous structure and high OH group concentration in the film. The high LIDT of sol-gel films is mainly due to their amorphous and porous structure, and low absorption. LIDT of EB deposited film is considerably affected by defects in the film, and LIDT of sol-gel deposited film is mainly effected by residual organic impurities and solvent trapped in the film.

关 键 词:TiO2  ZrO2  沉淀物  电子束  薄膜
收稿时间:2007-3-27
修稿时间:2007-03-27

Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process
YAO Jian-Ke,LI Hai-Yuan,FAN Zheng-Xiu,TANG Yong-Xing,JIN Yun-Xia,ZHAO Yuan-An,HE Hong-Bo,SHAO Jian-Da.Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process[J].Chinese Physics Letters,2007,24(7):1964-1966.
Authors:YAO Jian-Ke  LI Hai-Yuan  FAN Zheng-Xiu  TANG Yong-Xing  JIN Yun-Xia  ZHAO Yuan-An  HE Hong-Bo  SHAO Jian-Da
Institution:R&D Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800National Laboratory of High Power Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Shanghai 201800Graduate School of the Chinese Academy of Sciences, Beijing 100049
Abstract:TiO2 and ZrO2 films are deposited by electron-beam (EB) evaporation and by sol-gel process. The film properties are characterized by visible and Fourier-transform infrared spectrometry, x-ray diffraction analysis, surface roughness measure, absorption and laser-induced damage threshold (LIDT) test. It is found that the sol-gel films have lower refractive index, packing density androughness than EB deposited films due to their amorphous structure and high OH group concentration in the film. The high LIDT of sol-gel films is mainly due to their amorphous and porous structure, and low absorption. LIDT of EB deposited film is considerably affected by defects in the film, and LIDT of sol-gel deposited film is mainly effected by residual organic impurities and solvent trapped in the film.
Keywords:42  79  Wc  68  55  Jk  68  60  Wm
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