Emittance Measurements for Beams Extracted from LECR3 Ion Source

High quality ion beams are required by IMP cyclotron and atomic physics research, so it is important to research and measure beam emitt ance of ECR ion source. Intense beams extracted from ECR ion source usually have low energy, so it is suitable to use Electric-Sweep Scanner to measure the emittance. This kind of measurement is popularly used at ECR ion source, and it has some prominent merits such as high accuracy, very short time of data processing and easy expressing of the emittance pattern. So we designed and built this emittance scanner to measure emittance of the ion beams produced by LECR3 ion source. The structure of the ESS is shown in Fig.l, and the photo of the ESS is shown in Fig.2.     

A New Technique for Diagnosing Multi-charged Ion Beams Produced by ECR Ion Source

In order to study the transmission properties of multi-charged ion beams between the ECR ion source and the analyzing magnet, a new diagnostic system composed of three Wien-filters with three single-wires has been built and installed on the IMP ECR source test bcnch. The single-wire is used to measure the beam profile and the beam density distribution, and the Wien-filter is used to measure the charge state distribution of ion beam.     

2.45 GHz ECR离子源的微波阻抗匹配

ECR离子源的等离子体阻抗对其微波传输与阻抗匹配设计至关重要。在中国科学院近代物理研究所现有的2.45 GHz ECR 质子源上,对等离子体阻抗进行了测量。首先用水吸收负载代替等离子体负载测量得到了所用微波窗阻抗,然后根据质子源测量数据,推算得到了等离子体阻抗。实验结果表明,脊波导输出端阻抗与后续负载不完全匹配,等离子体阻抗随微波功率变化呈非线性。这些结果为ECR离子源过渡匹配和微波窗的设计提供了参考依据。Plasma impedance of an ECR ion source is important for microwave transmission and impedance matching design. Plasma impedance was measured indirectly with the 2.45 GHz ECR proton source at the Institute of Modern Physics, Chinese Academy of Sciences. In the test, we got microwave window mpedance by using water absorption load instead of plasma load, and the source plasma impedance was derived from the test data with the 2.45 GHz ECR proton source and microwave window impedance. The experimental results show that ridge waveguide output impedance and the subsequent load does not exactly match, plasma impedance variation is nonlinear with microwave power. The achievedresult is useful in the design of ridged waveguide and microwave window.     

NIRS的ECR离子源现状

Four ECR ion sources have been operated in National Institute of Radiological Sciences(NIRS). Two ECR ion sources supply various ion species for the Heavy Ion Medical Accelerator in Chiba(HIMAC). The 10GHz NIRS-ECR ion source mainly produces C~(2 ) ions for the heavy-ion therapy.Ions of Si,Ar,Fe,Kr and Xe are usually produced by the 18GHz NIRS-HEC ion source for physical and biological experiments.The other two compact ECR ion sources with all permanent magnet configuration have been developed for the new generation carbon therapy facility.One of these,the Kei-source,is a prototype which has been installed to the NIRS-930 cyclotron for axial injection.The other source,Kei2-source,is a demonstration source and utilized for the new generation Linac.In addition,both Kei sources have been used to study fundamental properties. In this paper,present status of the ion sources and recent developments are reported.     

用于聚焦离子束系统的离子源

介绍了现阶段两种用于聚焦离子束系统的离子源——液态金属离子源和气体场发射离子源的基本原理, 并对比了它们的优缺点。由于目前这两种离子源都难以满足纳米加工领域不断提高的技术要求, 因此提出了一种用于聚焦离子束的新型离子源——电子束离子源, 并介绍了电子束离子源的基本原理, 给出了设计参数、 模拟结果（20 kV的Ar+离子束, 发射度约为5.8×10-5·mm·mrad, 束斑约为1 μm）和初步的实验结果。 There are two kinds of ion sources, Liquid Metal Ion Source and Gas Field Ion Source, used to provide ion beams for the Focus Ion Beam system. The working mechanism of the two kinds of sources is presented and their advantages and disadvantages are summarized. With the rapid development in the nano technology, the requirements are hardly met with these two kinds of ion sources. Therefore, a new kind of ion source, electron beam ion source, is developed for the Focus Ion Beam system. The basic principle of the electron beam ion source is introduced and the design parameters, the result of the simulation (20 kV Ar+, extracted emittance is 5.8×10-5π·mm·mrad, raduis of the ion beam about 1 μm.) and the primary experimental results are presented     

VENUS离子源的最新结果(28GHz)

The nest generation, superconducting ECR ion source VENUS (Versatile ECR ion source for Nuclear Science) has operated with 28GHz since 2004,and has produced world record ion beam intesities. The VENUS project is focused on two main objectives. First, for the 88-Inch Cyclotron,VENUS will serve as the third injector soures boosting both the energy and itensity of beams available form the facility.Seconly,VENUS also serves as the prototype injector source for a high intensity heavy ion beam driver linac for a next generation radioactive ion beam facility, where the goal is to produce intense beams of medium to low charge states ions such as 240eμA of Xe 20 or 250eμA of U28 to 34 . These high intensity ion beam requerements present a challenge for the beam transport system since the total currents extracte from the ECR ion source reach several mA. Therefore in parallel to io beam develoments,we are also enhancing our ion beam diagnostics devices and are conducting an extensive ion beam simulation effort to improve the understanding of the ion beam ransprot form the VENUS ECR ion source. The paper will give an overview of recent experiments with the VENUS ECR ion source. Since the last ECR ion source workshop in Berkeley in 2004.we have installed a new plasma chamber,which includes X-ray shielding.This enables us to operate the source reliably at high power 28GHz operation.With this new chamber several high intensity beams(such as 2.4mA ofO6 ,600eμA of Ar9 ,etc.) have been produced. In addition, we have started the developent of high intensity uranium beams. For example, 200eμA of U33 and U34 have been produced so far. In respect to high charge state ions,leμA of Ar18 ,133eμA of Ar16 ,and 4.9eμA of U47 have been measured. In addition,ion beam profile meaurements are presented with ,and without the sextupole magnetic field energized. These expeerimental results are being compared with simulations using the WARP code.     

兰州全永磁ECR离子源——LAPECR1

The Lanzhou All Permanent magnet ECR ion source NO.1(LAPECR1)is the first all permanent magnet multiple ECRIS made in IMP.This ECRIS is running at 14.5GHz and can provide intense low charge state ion beams(varying from several to hundreds of eμA)or medium charge state ion beams(varying from several to tens of eμA).The size of source body is (?)102mm×296mm,the compactness and economical features enable the source suitable to be put on a HV platform or equipped by a small laboratory.This article gives the main parameters of the ion source.     

Operation of LECR2 for HIRFL Facility

LECI:L2 (Lanzhou Electron Cyclotron l:tesonance No.2) is a 14.5 GHz ECR ion source (ECRIS) used at the axial injection beam line as an external ion source of the injector SFC. In 2003, to be adapted with the SFC reconstruction and modification, the source was moved from the north side of the beam line to the east side, and the other source LECR1 worked at 10 GHz was removed from the beam line. At the moment LECR2 is the only ion source in service for HIRFL accelerators.     

高电荷态ECR离子源引出束流4D 发射度测量仪设计

为了进一步探究高电荷态电子回旋共振(ECR) 离子源引出束流品质和横向相空间耦合情况,根据中国科学院近代物理研究所高电荷态离子源引出束流发射度测量需求,针对束流流强为1 eμA∼1 emA,能量范围为10∼35 keV/q 的直流或脉冲高电荷态重离子束,设计了一台实时四维Pepper-pot 发射度测量仪。该Pepper-pot 型发射度测量仪具有响应时间快和工作范围宽等特点。针对强流重离子束诊断的特点,在结构与材料选择上做了设计与优化,并对获得图像的处理方法提出了具体的解决办法。For the purpose of on-line beam quality diagnostics and transverse emittance coupling investigation of the ion beams delivered by an Electron Cyclotron Resonance (ECR) ion source, a real-time 4D Pepper Pot type emittance scanner is under development at IMP(Institute of Moden Physics, Chinese Academy of Sciences). The high charge state ECR ion source at IMP could produce CW or pulsed heavy ion beam intensities in the range of 1 eμA∼1 emA with the kinetic energy of 10∼35 keV/q, which needs the design of the Pepper Pot scanner to be optimized accordingly. The Pepper Pot scanner has many features, such as very short response time and wide dynamic working range that the device could be applied. Since intense heavy ion beam bombardment is expected for this device, the structure and the material selection for the device is specially considered during the design, and a feasible solution to analyze the pictures acquired after the data acquisition is also made.     

高频ECR离子源的最新进展

As they are first optimized for their ion losses,ECRISs are always under a fundamental compromise: having high losses and strong confinement at the same time.To help ECR ion source developers in the design or improvement of existing machines,general comments are presented in a review article being soon published. In this 160 pages contribution,fundamental aspects of ECRISs are presented,with a discussion of electron temperature and confinement and ion confinement.Then,as microwaves play a key role in these machines, a chapter presents major guidelines for microwave launching and coupling to ECR plasma.Moreover,once ECR plasma is created,understanding this plasma is important in ion sourcery;and a section is dedicated to plasma diagnostics with an emphasis on the determination of electron and ion density and temperature by vacuum ultraviolet(VUV)spectroscopy.Another chapter deals with the role of magnetic confinement and presents updated scaling laws.Next chapter presents different types of ECRISs designed according to the main parameters previously described.Finally,some industrial applications of ECRISs and ECR plasmas in general are presented like ion implantation and photon lithography.Some hints taken from this review article are presented in the following article.     

首次使用核反应法鉴别JUNA深地加速器A/q=2的束流种类

JUNA团队计划利用CJPL所提供的极低本底条件和400 kV高压平台上2.45 GHz ECR离子源产生的毫安量级束流首次在天体物理能区对关键核反应进行直接测量。实验需要10 emA的质子束流和He+束流以及2 emA的He2+束流。使用2.45 GHz离子源产生毫安量级的He2+束流是离子源制造的难点。由于离子源分析磁铁分辨能力有限,无法区分He2+和H+₂离子,本文首次使用核反应法对离子源产生的A/q=2的束流进行了鉴别,结果显示,JUNA项目2.45 GHz ECR离子源无法产生毫安量级的He2+束流。该研究成果为JUNA项目离子源的设计提供了重要的参考依据。JUNA团队另外研制了一台微波频率为14.5 GHz的ECR离子源并成功产生2 emA的He2+束流来满足实验需求。     

一台14.5GHz新型高磁场高电荷态ECR离子源

自行研制成功一台14.5GHz新型高磁场高电荷态电子回旋共振(ECR)离子源.描述了该离子源结构特点、参数优化及其磁场分布,并给出了调试测量结果.该离子源轴向磁镜场在轴线上的最高磁场可达1.5T,六极永磁体在弧腔内表面磁场可达1.0T.经初步调试,可得到0⁷+140eμA,Ar¹¹+185eμA,Xe²⁶⁺50eμA.所得结果与1998年国际上最好的ECR离子源进行了比较.     

Afterglow工作模式下ECR离子源脉冲束的产生

为满足国家大科学工程兰州重离子冷却储存环的要求,在14.5GHz ECR 离子源上进行afterglow工作模式的实验,首次产生了高电荷态脉冲束流Ar¹¹⁺和Ar¹²⁺,给出了初步实验结果,并对结果进行了分析和解释.     

高电荷态ECR离子源——LECR3

研制成功了一台新的高电荷态ECR离子源,该离子源主要为原子物理实验提供各种高电荷态离子束流,是基于中国科学院近代物理研究所14.5GHz高电荷态ECR离子源设计建成的,同时在该离子源中应用多种有利于提高束流强度的技术,设计时考虑到采用双频加热,试图通过试验双频加热模式来提高高电荷态离子的产额,并设计建造了一套束流聚焦分析系统,以提高电荷态分辨率和束流传输效率.     

NSCL/MSU ECR离子源项目进展报告

Since the last ECR Workshop,NSCL/MSU has been involved in a vigorous ECR ion source R&D program,which resulted in the construction of an off-line test ECR ion source(ARTEMIS-B)for new beam development and ion optics studies.Also the design and partial completion of a 3rd generation,fully superconducting ECR ion source,SuSI has been accomplished.This paper is an overview of the construction projects and the different R&D activities performed with the existing ion sources.These activities include development of metallic ion beam production methods using evaporation with resistive and inductive ovens and sputtering of very refractory metals.Ion optics developments include testing different focusing elements(magnetic solenoid lens,electrostatic quadrupole triplet lens,Einzel lens,electrostatic double doublet quadrupole combined with an octupole lens),and different beam forming and diagnostics devices.The detailed results will be presented at the workshop in separate talks and posters.     

ECR离子源中的微波功率在线测量

 在中子发生器中采用ECR离子源是一种新技术。由于受结构的限制，ECR离子源不能像高频源离子源那样通过观察气体放电的颜色判断其工作状态，所以在运行中调节状态非常困难。解决这个问题的方法是：用定向耦合器加微波小功率计的方法在线测量ECR离子源的微波入射功率，通过微波入射功率可以直接得到ECR离子源引出离子束流的大小，从而推断微波信号源的放电过程是否正常,然后调整ECR离子源，最终使中子发生器工作在最佳状态。从ECR离子源后面的引出电极测得的最大束流为20 mA，且工作长时间稳定，当微波功率在160 W~500 W之间时，放电效果较好，离子束流随微波功率的增加而增加。     

Experimental study of the dependence of beam current on injection magnetic field in 6.4 GHz ECR ion source

The ion current from an electron cyclotron resonance (ECR) heavy ion source depends on the confining axial and radial magnetic fields. Some efforts were made by earlier workers to investigate magnetic field scaling on the performance of the ECR source. In order to study the dependence of the ion current on the injection magnetic field in the 6.4 GHz ECR source, we have measured the current by varying the peak injection field and have inferred that the variation of the current is exponential up to our maximum design injection field of 7.5 kG. An attempt has been made to understand this exponential nature on the basis of ion confinement time.     

单粒子态ECR离子源

介绍了一台2.45GHz电子回旋共振(ECR)单电荷离子源的磁场场形,以及它和总束流的关系.并且比较了国际上现有的几台同类型离子源的磁场场形.由此得出了关于2.45GHzECR离子源磁场场形的一些结论.     

6.4 GHz ECR ion source at VECC

The 6.4 GHz ECR ion source that was indigenously developed a few years ago has been operating continuously for injecting oxygen and neon beams to the cyclotron since 1997. VEC-ECR is a single stage high magnetic field ion source provided with a negatively biased electron repeller placed on the axis, near the injection mirror point. The supply of cold electrons and use of low mass mixing gas improve the stability of ECR plasma. Very recently, the effect of aluminum oxide coating on the copper plasma chamber wall has been studied. The plasma chamber wall was coated with aluminum by vacuum evaporation method and then exposed to oxygen gas to form aluminum oxide. It was noticed that the process substantially shifts the charge state distribution to the higher charge state with an enhancement of ion current by an order of magnitude. With the aluminized plasma chamber, the VEC-ECR can now produce 12 μA of O⁷⁺, 6.5 μA of Ar¹²⁺, 1.5 μA of Kr²⁰⁺ and 1.0 μA of Xe³¹⁺.     

Design Calculation of a Improved ECR Ion Source

The design of a ECR ion source in a working mode with a ω_ecr resonance surfaces and a 2ω_rf enclosed surface is presented.The 0.8T axial mirror field and 0.8T radial hexapole field are introduced with detailed discussions.The computational results show that the axial length of the ω_ecr resonance surface in the improved ECR ion source is extended significantly compared with the original CAPRICE one and a closed 2ω_rf equigauss surface is also formed.The new topology of the magnetic field in the improved ECR ion source will largely raise the intensity of high charged ion on the basis of the analysis of ionization mechanism.