变价元素铋掺杂钨酸铅晶体辐照损伤的研究

采用剂量为4Mrad的γ射线辐照Bridgman法生长的未掺杂和掺铋钨酸铅晶体,研究了辐照前后晶体的透射光谱、X射线激发发射光谱(XSL)的变化.利用正电子湮没寿命谱(PAT)和X光电子能谱(XPS)的实验手段,对钨酸铅晶体辐照前后的微观缺陷进行了研究,并对其抗辐照损伤性能及微观机理进行了初步探讨.研究表明,铋掺杂使得晶体中的正电子捕获中心和低价氧浓度下降;辐照后,未掺杂晶体中正电子捕获中心浓度下降,低价氧浓度上升,掺铋晶体则出现了与之完全相反的情况,正电子捕获中心浓度上升,低价氧浓度下降.提出掺铋钨酸铅晶体中铋的掺杂辐照前主要以Bi³⁺占据VPb的形式存在,辐照使变价元素铋发生Bi³⁺→Bi⁵⁺的变价行为,Bi⁵⁺可以替代W⁶⁺格位并使得晶体内部分(WO₄)^2－根团形成(BiO₃+V_o)^－.     

高能氩离子辐照硅产生的缺陷研究

在室温下750MeV氩离子对本征单晶硅进行辐照,通过用正电子湮没寿命测量技术、电子顺磁共振技术以及红外光吸收方法研究了辐照产生的缺陷.结果表明:电中性双空位是辐照产生的主要空位团;在4.3×10¹⁴ions/cm²的高剂量下未见样品发生非晶化转变;虽然在离子射程末端双空位的浓度随剂量的增加而显著增大,但在以电离激发过程为主要能损方式的区域里双空位的浓度基本不变.据此可以认为,电子能损过程对辐照产生的缺陷有退人作用.     

HgCdTe中特征正电子湮没寿命值的确定

提出了一种新的在热平衡状态下实时测量碲镉汞(MCT)中特征正电子湮没寿命的方法,用该方法测得HgCdTe中基体正电子湮没寿命τ_b为277±1Ps,汞空位缺陷捕获态寿命τ_d为306±2ps,并与用其它方法测量的结果进行了比较与讨论.     

金红石相和锐钛矿相TiO2本征缺陷的第一性原理计算

采用第一性原理的计算方法, 分别研究了金红石相和锐钛矿相TiO₂各种缺陷态形成的类型, 以及几何结构、生长气氛和Fermi能级位置对缺陷形成能的影响, 从理论上预测产生点缺陷的实验条件. 重点是讨论带电点缺陷的形成能, 并对结果进行适当修正. 研究发现, 本征缺陷的类型和浓度对 TiO₂的性能有一定的影响: 在富O条件下, TiO₂容易形成V_Ti(Ti空位)缺陷; 在富Ti条件下, TiO₂的Ti_i⁴⁺和V_O(O空位)缺陷将大量出现, 形成Schottky缺陷.     

3 MeV质子辐照对AlGaN/GaN高电子迁移率晶体管的影响

研究了AlGaN/GaN 高电子迁移率晶体管(HEMT)的质子辐照效应. 在3 MeV质子辐照下, 当辐照剂量达到1× 10¹⁵ protons/cm²时, 漏极饱和电流下降了20%, 最大跨导降低了5%. 随着剂量增加, 阈值电压向正向漂移, 栅泄露电流增加. 在相同辐照剂量下, 1.8 MeV质子辐照要比3 MeV质子辐照退化严重. 从SRIM软件仿真中得到不同能量质子在AlGaN/GaN异质结中的辐射损伤区, 以及在一定深度形成的空位密度. 结合变频C-V测试结果进行分析, 表明了质子辐照引入空位缺陷可能是AlGaN/GaN HEMT器件电学特性退化的主要原因.     

质子辐照空间级硅橡胶的正电子淹没寿命谱研究

 用正电子淹没寿命谱方法（PALS）研究了质子辐照对空间级硅橡胶KH-L-Y微观结构的影响。试验结果表明，PALS谱所揭示的最长寿命成分的t₃, I₃及自由体积分数Vf随辐照剂量的增加开始明显下降；而当辐照剂量大于10¹⁵cm^-2后，随剂量的增加平缓上升。辐照剂量小于10¹⁵cm^-2时，质子辐照使硅橡胶自由体积减小，分子链间堆砌紧密；辐照剂量大于10¹⁵cm^-2时，质子辐照使硅橡胶自由体积增大。交联密度及DMA测试结果同样表明，质子辐照在剂量较小时硅橡胶的交联密度及玻璃化转变温度增加，辐照以交联效应为主；而剂量较大时辐照降解占优势。     

Bi2WO6光催化剂的γ射线辐射效应

本文首次研究了高能辐射(γ射线)对Bi₂WO₆纳米晶体结构和光催化性能的影响. 结果表明,尽管高能辐射不会改变Bi₂WO₆纳米晶体的形貌,但是Bi₂WO₆粉末的颜色在高吸收剂量辐照(507 kGy)后发生了明显的变化,并且辐照后Bi₂WO₆的XRD谱图也显示,随着吸收剂量的增加,(113)晶面对应的2θ从28.37°移到28.45°,说明晶格参数在γ射线辐照下还是发生了细微的变化. XPS表征结果证明,Bi₂WO₆晶体结构的变化源于高剂量辐射下氧空位缺陷的产生. Bi₂WO₆纳米晶体的禁带宽度(E_g)随吸收剂量的增加也出现减小的趋势. 用水溶液中亚甲基蓝的可见光照分解反应作为模型反应考察了辐照后的Bi₂WO₆纳米晶体的光催化活性,结果表明,辐照后的Bi₂WO₆纳米晶体的光催化活性随着吸收剂量的增加而逐渐升高. 将经过反应后的Bi₂WO₆纳米晶体再次回收,进行循环催化,发现这些辐照后的Bi₂WO₆纳米晶体在三次循环使用后光催化性能仍然能够保持,说明高能辐射产生的氧空位缺陷具有良好的稳定性.     

氧含量对BiFeOδ多晶陶瓷介电特性的影响

采用固相反应法制备了不同含氧量的BiFeO_δ多晶陶瓷样品，利用HP4294A阻抗分析仪测量了样品的介电特性随频率和氧含量的变化，用正电子湮没寿命谱学的方法研究了样品中因氧含量的变化所引起的结构缺陷. 实验结果表明：引入氧空位和氧填隙离子缺陷都会使介电常数减小，而介电损耗则随氧含量的增加而增加，二者的变化范围均在10%—35%之间；对不同氧含量的BiFeO_δ样品，介电常数和介电损耗随测量频率的增加而减小. 氧空位的引入使得局域电子密度变小，正电子平均寿命τ_m增加. 在氧含量δ=2.99时电子密度最大(n_e=3.90×10²³/cm³)，继续增加氧含量对正电子寿命与局域电子密度的影响不大. BiFeO_δ样品的介电常数和介电损耗随氧含量的变化可以在空间电荷限制电导的框架下来理解.     

质子辐照ZnO白漆光学退化的慢正电子湮没分析

 采用慢正电子湮没光谱研究低能质子辐照下ZnO白漆的光学退化。研究结果表明,随质子辐照注量的增加, 多普勒展宽谱的S参数逐渐减小,W参数逐渐增大。质子辐照下S-W参数拟合曲线的斜率发生改变。S参数的减小可以归结为锌空位含量的减少以及准正电子素的形成。准正电子素{单电离氧空位（捕获一个电子）+正电子}的形成,能够降低正电子湮没的速率,导致S参数减小。S参数的减小证实了质子辐照导致ZnO白漆中单电离氧空位数量的增加。S-W参数拟合曲线斜率的变化可以归结于质子辐照下双电离氧空位向单电离氧空位的转变。     

GaAs晶体生长缺陷的正电子湮没研究

本文介绍用正电子湮没寿命和多普勒加宽技术研究750—950°掺Te液相外延生长的和1238℃熔体生长的GaAs晶体生长缺陷. 在800—1238℃生长的晶体中都观测到312±11ps的寿命组分τ₂, 其强度I₂, 多普勒加宽S参加和按捕获模型计算的平均寿命τ都随晶体生长温度增高而增大. 在掺Te外延晶体中, 312ps寿命的正电子陷阱浓度随晶体生长温度增高而线性地增大, 在熔体生长晶体中, 该陷阱浓度低得多, 远偏离以上线性关系. 312ps寿命归因于正电子在Ga空位湮没寿命, 结果显示出掺Te在GaAs晶体中诱导Ga空位.     

Effect of hydrogen on modulation-doped AlGaAs/InGaAs/GaAs heterostructures: a photoluminescence study

The effect of hydrogen on donors and interface defects in silicon modulation doped Al_xGa_1−xAs/In_yGa_1−yAs/GaAs heterostructures has been investigated by photoluminescence (PL). Hydrogenation was carried out on two sets of samples, one set consists of high quality pseudomorphic heterostructures and another set having partially lattice relaxed structures prone to the defects. On exposure of high quality pseudomorphic structures to hydrogen plasma above 150 °C, a significant blue shift in the PL peak positions as well as bandwidth narrowing is observed. This indicates, the reduction in two-dimensional electron gas in the In_yGa_1−yAs quantum well due to hydrogen passivation of silicon donors in the Al_xGa_1−xAs supply layer. The reactivation of the donors is observed upon annealing the hydrogenated sample for 1 h at 250 °C under hydrogen ambient. Another interesting feature is a significant improvement in the PL of lattice-relaxed structures upon hydrogenation of the samples above 250 °C, which is attributed to the hydrogen passivation of interface defects due to the misfit dislocations.     

Light-induced defects in plasma-hydrogenated InP: Zn

PhotoLuminescence (PL) measurements are used to investigate the effects of a H₂ plasma treatment in heavily doped p-type InP: Zn. Beside the large decrease in free hole concentration in the hydrogenated samples, a new Broad Luminescence Band (BLB) centered at about 1.32 eV appears upon laser irradiation during PL experiments above 50 K, and saturates for large values of the fight intensities. It is inferred that the plasma treatment produces some kind of non-radiative defects which can then rearrange into new BLB centers under illumination provided it is applied above a threshold temperature (50K). This mechanism is interpreted in terms of Recombination-Enhanced Defect Reaction (REDR) involving the two kinds of photogenerated carriers and appears to be low thermally assisted. The BLB is associated with the radiative emission at a phosphorus vacancy (V_p) close to a Zn acceptor (V _p ⁺ Zn _In ^– ). It is believed that the formation of BLB centers originates from V_p-related defects initially present in the freshly plasma-treated InP sample. The mechanisms involved in the Light-Induced Creation (LIC) of BLB centers are discussed.     

Electrical properties and emission mechanisms of Zn-doped β-Ga2O3 films

We study the electrical properties and emission mechanisms of Zn-doped β-Ga₂O₃ film grown by pulsed laser deposition through Hall effect and cathodoluminescence which consist of ultraviolet luminescence (UV), blue luminescence (BL) and green luminescence (GL) bands. The Hall effect measurements indicate that the carrier concentration increases from 7.16×10¹¹ to 6.35×10¹² cm⁻³ with increasing a nominal Zn content from 3 to 7 at%. The UV band at 272 nm is not attributed to Zn dopants and ascribed as radiative electron transition from conduction band to a self-trapped hole while the BL band is attributable to defect level related to Zn dopant. The BL band has two emission peaks at 415 and 455 nm, which are ascribed to the radiative electron transition from oxygen vacancy (V_O) to valence band and recombination of a donor–acceptor pair (DAP) between V_O donor and Zn on Ga site (Zn_Ga) acceptor, respectively. The GL band is attributed to the phonon replicas’ emission of the DAP. The acceptor level of Zn_Ga is estimated to be 0.26 eV above the valence band maximum. The transmittance and absorption spectra prove that the Zn-doped β-Ga₂O₃ film is a dominantly direct bandgap material. The results of Hall and cathodoluminescence measurements imply that the Zn dopant in β-Ga₂O₃ film will form an acceptor Zn_Ga to produce p-type conductivity.     

Excitonic photoluminescence properties of nanocrystalline GaSb and Ga0.62In0.38Sb embedded in silica films

The GaSb and Ga_0.62In_0.38Sb nanocrystals were embedded in the SiO₂ films by radio-frequency magnetron co-sputtering and were grown on GaSb and Si substrates at different temperatures. We present results on the 10 K excitonic photoluminescence (PL) properties of nanocrystalline GaSb and Ga_0.62In_0.38Sb as a function of their size. The measurements show that the PL of the GaSb and Ga_0.62In_0.38Sb nanocrystallites follows the quantum confinement model very closely. By using deconvolution of PL spectra, origins of structures in PL were identified.     

The observation of high concentrations of arsenic anti-site defects in electron irradiated n-type GaAs by X-band EPR

N-type GaAs doped with sulphur (2.8 × 10¹⁸ cm^-3) has been subjected to 2 MeV electron irradiation in stages at room temperature and examined by the EPR technique. When the free carrier absorption is first eliminated no EPR signal is detected. After further irradiation, the spectrum of the As anti-site defect appears, grows and subsequently saturates at a concentration of about 10¹⁸ cm^-3. The saturation concentration is about one third of [n] in most samples. The defects are stable on annealing to 500°C but are not observed in various irradiated p-type samples. It is suggested that grown-in defects such as [V_Ga-As_Ga-V_Ga] capture Ga interstitials during the irradiation and are thereby converted to the simpler anti-site defect.     

Solubility and point defect-dopant interactions in GaAs—II: Tin-doping

The form of the solubility curves for tin in both LPE and VPE grown GaAs are rationalised by a thermodynamic model which presumes that the dominant acceptor state due to tin is the donor-gallium vacancy complex Sn_GaV^?_Ga rather than the commonly postulated Sn^?_As.In LPE growth from tin-rich solutions where the arsenic concentration in the melt exceeds the gallium concentration, very low electron mobilities have been reported and this is shown to arise from auto-compensation of the Sn⁺_Ga donors by the Sn_GaV^?_Ga acceptors.     

Photoluminescence study of ZnO nano-islands

ZnO nano-islands, with much more uniform size, have been grown through two-step method by metal organic chemical vapor deposition (MOCVD). The room temperature band-edge UV emission intensity of nano-islands was usually undetectable or much smaller than that of thin film. Photoluminescence (PL) emission of those nano-islands shows the high intensity nearly as that of ZnO thin film, which is great different from previous reports. By meaningfully analyzing both PL and growth condition of those three samples (bulk ZnO wafer, nano-islands and film), neutral-donor-bound-exciton (D⁰X) emission observed on ZnO nano-islands sample is eventually attributed to hydrogen and aluminum, respectively. The abnormal phenomenon of nano-islands PL intensity has been explained by the point of zinc vacancies (V_Zn) complex defects. It is considered to govern the nonradiative combination and lead enhanced intensity of UV emission in ZnO nano-islands.     

Hydrogen depassivation of the magnesium acceptor by beryllium in p-type GaN

Under nitrogen-rich growth conditions, the present ab initio study predicts that hydrogen passivation is more effective on the acceptor Be instead of Mg in a co-doped p-type GaN. The formation energy is 0.24 eV for (H-Be_Ga) complex, and 0.46 eV for (H-Mg_Ga) complex. Congruently, the binding energy is 1.40 eV for (H-Be_Ga), and 0.60 eV for (H-Mg_Ga). Owing to the lower binding energy, (H-Mg_Ga) is not thermally stable. As Be is incorporated in Mg-doped GaN, a (H-Mg_Ga) may release a H⁺ cation at relatively elevated temperatures. Consequently, the H⁺ diffuses swiftly away from a Mg⁻_Ga, across a barrier of 1.17 eV, towards a Be⁻_Ga and forms a stable (H-Be_Ga) with it. The activation of Mg acceptors can be thus facilitated. In this view, the process of hydrogen depassivation of the Mg acceptor by Be can convert the as-grown high-resistivity Mg-doped GaN into a p-conducting material, as observed in the experiments.     

Defects in as-grown and annealed AlxGa1−xAs single crystals

Photoluminescence studies were made on Sn-, Te- and Ge-doped Al_xGa_1-xAs single crystals before and after annealing at 800°C for 21 h in evacuated and sealed quartz ampoules. The thin p-type surface layer, which was present on all nondegenerate n-Al_xGa_1-x As crystals after annealing, is attributed to the introduction of Si from the inner wall of the ampoule to form shallow Si_As and V_As-Si_As acceptor defects. Sn_As, V_Ga-Te (or) V_Al-Te), Ge_As and V_As-Ge_As defects were observed in Sn-, Te- and Ge-doped Al_x Ga_1-xAs after annealing. The defects were identified by plotting their characteristic recombination radiation energies versus Al composition x and comparing with previously established assignments in GaAs (x = 0). Two prominent bands, located at 1.53 and 1.46 eV independent of Al composition x, were detected in annealed (p) Al_xGa_1-xAs: Ge. The exact nature of the defects giving rise to these bands is not known.     

Study of n type porous GaAs by photoluminescence spectroscopy: Effect of the etching time on the deep levels

Photoluminescence (PL) analysis is used to study porous layers elaborated by electrochemical etching of n⁺ Si-doped GaAs substrate with different etching times. Temperature and power dependence photoluminescence (PL) studies were achieved to characterize the effect of the etching time on the deep levels of the n⁺ Si-doped GaAs. The energy emission at about 1.46 eV is attributed to the band-to-band (B-B) (e-h) recombination of a hole gas with electrons in the conduction band. The emission band is composed of four deep levels due to the complex of (V_AsSi_GaV_Ga), a complex of a (Ga vacancy - donor - As vacancy), a (Si_Ga-V_Ga³⁻) defect or Si clustering, and a (gallium antisite double acceptor-effective mass donor pair complex) and which peaked, respectively, at about (0.94, 1, 1.14, and 1.32 eV). The PL intensity behavior as function of the temperature is investigated, and the experimental results are fitted with a rate equation model with double thermal activation energies.