基于透射光谱确定溶胶凝胶ZrO2薄膜的光学常数

基于溶胶凝胶ZrO₂薄膜的紫外/可见/近红外透射实验光谱,采用Swanepoel方法结合Wemple-DiDomenico色散模型,方便地导出了ZrO₂薄膜在200—1200nm波长范围内的光学常数,包括折射率、色散常数、膜层厚度、吸收系数及能量带隙.研究发现,溶胶凝胶ZrO₂薄膜具有高折射率(1.63—1.93,测试波长为632.8nm)、低吸收和直接能量带隙(4.97—5.63eV) 等光学特性,而且其光学常数对薄膜制备过程中的重要工艺 关键词： 光学常数 Swanepoel方法 2薄膜')" href="#">ZrO₂薄膜 热处理     

基于透射光谱确定溶胶凝胶ZrO2薄膜的光学常数

基于溶胶凝胶ZrO2薄膜的紫外/可见/近红外透射实验光谱,采用Swanepoel方法结合Wemple-DiDomenico色散模型,方便地导出了ZrO2薄膜在200-1200 nm波长范围内的光学常数,包括折射率、色散常数、膜层厚度、吸收系数及能量带隙.研究发现,溶胶凝胶ZrO2薄膜具有高折射率(1.63-1.93,测试波长为632.8 nm)、低吸收和直接能量带隙(4.97-5.63 eV) 等光学特性,而且其光学常数对薄膜制备过程中的重要工艺参数--膜层后处理温度表现出强烈的依赖性.此外,在膜层的弱吸收和中等吸收光谱区域内,计算得到的折射率色散曲线与分光光度法的测试结果基本符合,说明本实验中所建立的计算方法在确定溶胶凝胶ZrO2薄膜光学常数方面的可靠性.     

Ge20Sb15Se65薄膜的热致光学特性变化研究

采用磁控溅射法制备了Ge₂₀Sb₁₅Se₆₅薄膜, 研究热处理温度(150—400 ℃)对薄膜光学特性的影响. 通过分光光度计、X射线衍射仪、显微拉曼光谱仪对热处理前后薄膜样品 的光学特性和微观结构进行了表征, 并根据Swanepoel方法以及Tauc公式分别计算了薄膜折射率色散曲线和光学带隙等参数. 结果表明当退火温度(T_a)小于薄膜的玻璃转化温度(T_g)时,薄膜的光学带隙(E_g^opt)随着退火温度的增加由1.845 eV上升至1.932 eV, 而折射率由2.61降至2.54; 当退火温度大于薄膜的玻璃转化温度时,薄膜的光学带隙随退火温度的增加由1.932 eV降至1.822 eV, 折射率则由2.54增至2.71. 最后利用Mott和Davis提出的非晶材料由非晶到晶态的结构转变模型对结果进行了解释, 并通过薄膜XRD和Raman光谱进一步验证了结构变化是薄膜热致变化的重要原因. 关键词： 20Sb₁₅Se₆₅薄膜')" href="#">Ge₂₀Sb₁₅Se₆₅薄膜 热处理 光学带隙 折射率     

镱铒共掺Al2O3薄膜上转换机理及其温度特性

采用中频磁控溅射法制备了镱铒共掺Al₂O₃薄膜,铒镱掺杂浓度分别为0.3%,3.6%(摩尔分数,全文同).讨论了三价铒离子529nm和549nm光致发光的上转换机理.在291.8—573.3K温度区间测量了两绿上转换光谱荧光强度比的温度特性,拟合表达式为R=5.37exp(-738/T).366 K温度时灵敏度最大,为0.0039 K^-1.结果表明镱铒共掺Al₂O₃薄膜适合作为小型、高温和高灵敏的光学温度传感材料. 关键词： 2O₃薄膜')" href="#">镱铒共掺Al₂O₃薄膜 中频磁控溅射 上转换 荧光强度比     

退火对电子束热蒸发193nm Al2O3/MgF2反射膜性能的影响

设计并镀制了193nm Al₂O₃/MgF₂反射膜，对它们在空气中分别进行了250—400℃的高温退火，测量了样品的透射率光谱曲线和绝对反射率光谱曲线.发现样品在高反射区的总的光学损耗随退火温度的升高而下降，而后趋于饱和.采用总积分散射的方法对样品在不同退火温度下的散射损耗进行了分析，发现随着退火温度的升高散射损耗有所增加.因此，总的光学损耗的下降是由于吸收损耗而不是散射损耗起主导作用.对Al₂O₃材料的单层膜进行了同等条件的退火处理，由它们光学性能的变化推导出它们的折射率和消光系数的变化，从而解释了相应的多层膜光学性能变化的原因.反射膜的反射率在优化联系、镀膜工艺与退火工艺的基础上达98％以上. 关键词： 193nm 反射膜 退火 光学损耗 吸收     

TiN/Al2O3纳米多层膜的共格外延生长及超硬效应

采用多靶磁控溅射法制备了一系列具有不同Al₂O₃调制层厚度的TiN/Al₂O₃纳米多层膜. 利用X射线能量色散谱、X射线衍射、扫描电子显微镜、高分辨透射电子显微镜和微力学探针表征了多层膜的成分、微结构和力学性能. 研究结果表明，在TiN/Al₂O₃纳米多层膜中，单层膜时以非晶态存在的Al₂O₃层在厚度小于1.5 nm时因TiN晶体层的模板效应而晶化，并与TiN层形成共格外延生长，相应地，多层膜产生硬度明显升高的超硬效应，最高硬度可达37.9 GPa. 进一步增加多层膜中Al₂O₃调制层的层厚度，Al₂O₃层逐渐形成非晶结构并破坏了多层膜的共格外延生长，使得多层膜的硬度逐步降低. 关键词： 2O₃纳米多层膜')" href="#">TiN/Al₂O₃纳米多层膜 外延生长 非晶晶化 超硬效应     

溶胶-凝胶ZrO2-TiO2高折射率光学膜层的抗激光损伤性能研究

采用溶胶-凝胶方法制备了ZrO₂-TiO₂(Ti含量为0—100mol%)高折射率光学薄膜. 借助激光动态光散射技术研究溶胶微结构. 采用傅里叶变换红外光谱、原子力显微镜、薄膜光学常数分析仪、漫反射吸收光谱及强激光辐照实验，对膜层的结构、光学性能及抗激光损伤性能进行了系统表征. 结果显示，溶胶-凝胶工艺可以在部分牺牲折射率的情况下，使膜层的抗激光损伤性能得到大幅度提升. 随Ti含量从0mol%增加至100mol%，膜层的平均损伤阈值呈下降趋势，当Ti含量从0mol%增加至60mol%时，平均损伤阈值从57.1J/cm²下降到21.1J/cm²(辐照激光波长为1053nm，脉冲宽度为10ns，“R/1”测试模式)，当Ti含量从60mol%增加至100mol%时，平均损伤阈值变化很小. 综合溶胶微结构、膜层光学性能和损伤实验结果可以推断，强激光诱导多光子吸收是引起膜层损伤的主要原因. 不同配比的复合膜之间光学带隙的显著差异导致相同辐照激光情况下多光子吸收的概率发生变化，从而导致损伤阈值的规律性变化. 关键词： 2-TiO₂薄膜')" href="#">ZrO₂-TiO₂薄膜 溶胶-凝胶 激光诱导损伤 光学带隙     

限制电流对Ta/BaTiO3/Al2O3/ITO忆阻器的开关比和稳定性调控

利用磁控溅射技术沉积了Ta/Ba Ti O₃/Al₂O₃/ITO多层薄膜,观察到该结构中的电阻开关现象受到限制电流的调控.在限制电流大小为10^–2 A时,器件中的电阻开关现象达到最优. Ta/Ba Ti O₃/Al₂O₃/ITO多层薄膜的电阻开关具有良好的可重复性和稳定性.本文使用空间限制电流的传导模型对Ta/Ba Ti O₃/Al₂O₃/ITO器件中受限制电流调控的电阻开关传导机理进行了解释.     

离子束溅射制备Nb2O5光学薄膜的特性研究

研究了离子束溅射(IBS)制备的Nb₂O₅薄膜的光学特性、应力、薄膜微结构等特性,系统地分析了辅助离子源的离子束能量和离子束流对薄膜特性的影响.结果显示,在辅助离子源不同参数情况下,折射率在波长550 nm处为2.310—2.276,应力值为-281—-152 MPa.在合适的工艺参数下,消光系数可小于10^-4,薄膜具有很好的表面平整度.与用离子辅助沉积(IAD)制备的薄膜相比,IBS制备的薄膜具有更好的光学特性和薄膜微结构. 关键词： 2O₅薄膜')" href="#">Nb₂O₅薄膜 离子束溅射 光学特性 应力     

TeO2-Nb2O5-BaCl2玻璃的结构及光学性能研究

用传统熔融法制备了一种新型的氧氯碲酸盐玻璃:（90-x）TeO₂-10Nb₂O₅-xBaCl₂（x=10,20,30）,用密度比重天平、显微拉曼光谱仪、红外-可见-紫外分光光度计和棱镜耦合仪研究了组分变化对玻璃密度、结构、光学性质、折射率和色散的影响.研究结果表明:随玻璃中BaCl₂含量增加,玻璃密度出现了先增大后减小的现象;玻璃结构中双三角锥体[TeO₄]量减少,三角棱锥体[TeO₃]量增加;玻璃的折射率逐渐减小.新型的氧氯碲酸盐玻璃具有较高的线性折射率n_max=2.02259,非线性折射率N₂=6.8×10^-12esu与三阶非线性极化率χ^（3）=3.7×10^-13esu.制备的新型碲酸盐玻璃在可见和中红外光谱区具有高透过,在近紫外光谱区具有明显的吸收截止波长,且随BaCl₂含量增加吸收截止波长发生了明显的蓝移现象.利用经典的Tauc方程计算了玻璃样品的直接跃迁光学带隙和间接跃迁光学带隙,玻璃的光学带隙随BaCl₂含量增加而增大.     

Optical characterization of poly (ethylene oxide)/zinc oxide thin films

The optical characterization of poly (ethylene oxide)/zinc oxide thin films has been done by analyzing the absorption spectra in the spectral wavelength region 380–800 nm using a ultraviolet-spectrophotometer at room temperature. Thin film polymer composites made of poly (ethylene oxide) (PEO) containing zinc oxide (ZnO) filler concentrations (0%, 2%, 6%, 10%, and 14%) by weight were used in this study. The optical results obtained were analyzed in terms of the absorption formula for non-crystalline materials. The optical energy gap and other basic optical constants such as dielectric constants and optical conductivity were investigated and showed a clear dependence on the ZnO filler concentration. It was found that the optical energy gap for the composite films is less than that for the neat PEO, and that it decreases as the ZnO concentration increases. Enhancement of the optical conductivity was observed with increase in the ZnO concentration. Dispersion of refractive index was analyzed using the Wemple–DiDomenico single oscillator model. The refractive index (n), extinction coefficient (k), and dispersion parameters (E_o, E_d) were calculated for the investigated films.     

Structural and optical evaluation of WOxNy films deposited by reactive magnetron sputtering

Thin films of tungsten oxynitrides were deposited on substrates preheated at 300 °C from metallic tungsten target using reactive pulsed d.c. magnetron sputtering. The deposition was carried out at different nitrogen to total reactive gas partial pressures ratios. The energy dispersive analysis of X-ray showed that significant incorporation of nitrogen occurred only when the nitrogen partial pressure exceeded 74% of the total reactive gas pressure. X-ray diffraction analysis revealed that the formation of a specific crystalline phase is affected by the composition and the possibility of competitive growth of different phases. The increase of nitrogen content into the films increases the optical absorption and decreases the optical band gap. The refractive index was determined from the transmittance spectra using Swanepoel's method. It was found that the refractive index increases with increasing nitrogen content over the entire spectral range. The values of the tungsten effective coordination number, N_c, was estimated from the analysis of the dispersion of the refractive index, and an increase in N_c with increasing nitrogen content was observed.     

Size dependence of non-linear optical properties of SiO2 thin films containing InP nanocrystals

SiO₂ composite thin films containing InP nanocrystals were fabricated by radio-frequency magnetron co-sputtering technique. The microstructure of the composite thin films was characterized by X-ray diffraction and Raman spectrum. The optical absorption band edges exhibit marked blueshift with respect to bulk InP due to strong quantum confinement effect. Non-linear optical absorption and non-linear optical refraction were studied by a Z-scan technique using a single Gaussian beam of a He-Ne laser (632.8 nm). We observed the saturation absorption and two-photon absorption in the composite films. An enhanced third-order non-linear optical absorption coefficient and non-linear optical refractive index were achieved in the composite films. The nonlinear optical properties of the films display the dependence on InP nanocrystals size. Received: 27 June 2000 / Accepted: 27 June 2000 / Published online: 13 September 2000     

Influence of surface topography and annealing temperature on the surface and volume of dissipation electrical energy and Spitzer–Fan model in Al doped ZnO films

The aim of this work is to investigate the optical constants of aluminum doped zinc oxide films annealed at different temperatures. With increasing temperature, due to decreasing unfilled inter-granular volume per unit thickness, the optical transmittance spectra of films were increased. The films have a normal dispersion in the spectral range 400?<?λ?<?500 nm and the anomalous dispersion in IR range. The lattice dielectric constants ε_L, the free charge carriers concentration, the plasma frequency, Spitzer–Fan model and the waste of electrical energy as heat of films can be analyzed using the refractive index n and the extinction coefficient k spectra. With increasing annealing temperature, the lattice dielectric constants ε_L of films decrease however the free charge carriers concentration of films increase. The free carrier electric susceptibility of films annealed at 600 °C has maximum value. The energy loss by the free charge carriers when traversing the bulk and surface of films annealed at 600 °C has a minimum value in the near fundamental absorption edge and it with increasing energy increases.     

rf reactive co-sputtered Au-Ag alloy nanoparticles in SiO2 thin films

We have studied formation of Au-Ag alloy nanoparticles in sputtered SiO₂ thin films. Silica thin films containing Au-Ag nanoparticles were deposited on quartz substrates using rf reactive magnetron co-sputtering technique. The films heat-treated in reducing Ar + H₂ atmosphere at different temperatures. They were analyzed by using UV-vis spectrophotometry, atomic force microscopy and X-ray photoelectron spectroscopy (XPS) methods for their optical, surface morphological as well as structural and chemical properties. The optical absorption of the Au-Ag alloy nanoparticles illustrated one plasmon resonance absorption peak located at 450 nm between the absorption bands of pure Au and Ag nanoparticles at 400 and 520 nm, respectively, for the thin films annealed at 800 °C. XPS results showed that the alloys were in metallic state, and they had a greater tendency to lose electrons as compared to their corresponding monometallic state. Using lateral force microscopy analysis, we have found that the alloy particles were uniformly distributed on the surface with grain size of about 20 nm.     

Optical diagnostics of physicochemical properties of NiO/Al2O3 nanocomposites upon exposure to different gases and heat

We have studied nanostructural and optical properties of composites of nanostructured nickel oxide films on a substrate from porous aluminum oxide NiO/Al₂O₃ in the UV, visible, and IR spectral ranges on exposure of composites to different gases, vacuum, and heat. We have found that, upon irradiation of NiO/Al₂O₃ composites by laser radiation at a wavelength of 633 nm, they demonstrate a high sensitivity to carbon monoxide CO in the range of the excitonic absorption of nickel oxide. We assume that an increase in the transmission coefficient of the composite in the excitonic absorption band is determined by luminescence that is caused by the oxidation reaction of carbon monoxide. The sensitivity of composites to CO is enhanced with decreasing the size of NiO nanoparticles and after evacuation. The values of the diffuse reflection coefficient at the laser radiation wavelength of 633 nm correlate with the size of nickel oxide nanoparticles. Spectral changes in the range of the fundamental absorption band of NiO that occur in the IR range and in diffuse reflection spectra are related to the appearance of carbon-containing compounds in the composite exposed to CO.     

Optical characterization of thermally evaporated thin films of As40S40Se20 chalcogenide glass by reflectance measurements

40 S₄₀Se₂₀, deposited by thermal evaporation, were obtained in the 400 nm to 2200 nm spectral region. The optical constants of this amorphous material were computed using an optical characterization method based mainly on the ideas of Minkov and Swanepoel of utilising the upper and lower envelopes of the spectrum, which allows us to obtain both the real and imaginary parts of the complex refractive index, and the film thickness. Thickness measurements made by a surface-profiling stylus have been carried out to cross-check the results obtained by the optical method. The dispersion of the refractive index is discussed in terms of the single-oscillator Wemple–DiDomenico model. The optical band gap has been determined from absorption coefficient data by Tauc’s procedure. Finally, the photo-induced and thermally induced changes in the optical properties of a-As₄₀S₄₀Se₂₀ thin films were also studied, using both transmission and reflection spectra. Received: 11 February 1998/Accepted: 16 February 1998     

Gamma irradiation effects on structural and optical properties of amorphous and crystalline Nb<Subscript>2</Subscript>O<Subscript>5</Subscript> thin films

The structural and optical properties of RF sputtered Nb₂O₅ thin films are studied before and after gamma irradiation. The films are subjected to structural and surface morphological analyses by using X-ray (XRD) and field emission scanning electron microscope techniques. In the wavelength range of 300–2000 nm, the optical parameters for amorphous and crystalline Nb₂O₅ thin films are estimated at differently exposed γ-irradiation doses (0, 50, 100 and 200 kGy). The optical constants, such as optical energy band gap, absorption coefficient, refractive index and oscillators parameters of amorphous and crystalline Nb₂O₅ thin films are calculated. The optical band gaps of γ-irradiated amorphous and crystalline Nb₂O₅ thin films are determined. In the non-absorbing region, the real part of the refractive index of amorphous and crystalline Nb₂O₅ thin films slightly increases with the increase in the exposed γ-irradiation dose.     

Characteristics of a cylindrical magnetron and reactive sputtering of binary compound films

The characteristics of a cylindrical magnetron, such as the dependences of the discharge voltage, chamber pressure, and plasma radiation intensity on the reactive gas flow rate and discharge current, are studied. In this magnetron, titanium nitride (TiN) and titanium dioxide (TiO₂) films are obtained by reactive magnetron sputtering. The transmission and reflection spectra of the films in the visual range are taken. From the transmission data for the TiO₂ films, their refractive index and absorption factor in the wavelength range 350–800 nm, as well as the porosity, are found by the Valeev method. The variation of the fundamental absorption edge with film thickness is determined with the Urbach formula.