| 离子束溅射制备Nb2O5光学薄膜的特性研究 |
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| 引用本文： | 袁文佳,章岳光,沈伟东,马群,刘旭.离子束溅射制备Nb2O5光学薄膜的特性研究[J].物理学报,2011,60(4):47803-047803. |
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| 作者姓名： | 袁文佳 章岳光 沈伟东 马群 刘旭 |
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| 作者单位： | 浙江大学现代光学仪器国家重点实验室,杭州 310027 |
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| 基金项目： | 国家自然科学基金(批准号:60708013,60608014)和浙江省自然科学基金(批准号:Y1090504) 资助的课题. |
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| 摘 要： | 研究了离子束溅射(IBS)制备的Nb2O5薄膜的光学特性、应力、薄膜微结构等特性,系统地分析了辅助离子源的离子束能量和离子束流对薄膜特性的影响.结果显示,在辅助离子源不同参数情况下,折射率在波长550 nm处为2.310—2.276,应力值为-281—-152 MPa.在合适的工艺参数下,消光系数可小于10-4,薄膜具有很好的表面平整度.与用离子辅助沉积(IAD)制备的薄膜相比,IBS制备的薄膜具有更好的光学特性和薄膜微结构.
关键词：
2O5薄膜')" href="#">Nb2O5薄膜
离子束溅射
光学特性
应力
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| 关 键 词： | Nb2O5薄膜 离子束溅射 光学特性 应力 |
| 收稿时间： | 2010-06-25 |
Characteristics of Nb2 O5 thin films deposited by ion beam sputtering |
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| Yuan Wen-Jia,Zhang Yue-Guang,Shen Wei-Dong,Ma Qun,Liu Xu.Characteristics of Nb2 O5 thin films deposited by ion beam sputtering[J].Acta Physica Sinica,2011,60(4):47803-047803. |
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| Authors: | Yuan Wen-Jia Zhang Yue-Guang Shen Wei-Dong Ma Qun Liu Xu |
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| Institution: | State Key Laboratory of Modern Optical Instrumentation, Zhejiang University,Hangzhou 310027, China;State Key Laboratory of Modern Optical Instrumentation, Zhejiang University,Hangzhou 310027, China;State Key Laboratory of Modern Optical Instrumentation, Zhejiang University,Hangzhou 310027, China;State Key Laboratory of Modern Optical Instrumentation, Zhejiang University,Hangzhou 310027, China;State Key Laboratory of Modern Optical Instrumentation, Zhejiang University,Hangzhou 310027, China |
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| Abstract: | Optical properties, stress and microstructure of Nb2O5 thin films prepared by ion beam sputtering (IBS) are investigated, and the effects of assist ion beam energy and ion current on characteristics of Nb2O5 thin films are systematically discussed. The results show that with different parameters of assisted ion source, the refractive index changes from 2.310 to 2.276 and residual stress varies from -281MPa to -152 MPa. The extinction coefficient of Nb2O5 can be under 10-4, and the surface is very smooth in an optimum deposition condition. Thin films deposited by IBS exhibit better optical properties and microstructures than those deposited by ion assisted deposition (IAD). |
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| Keywords: | Nb2O5 thin films ion beam sputtering optical properties stress |
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