Optical properties of hexagonal boron nitride thin films deposited by radio frequency bias magnetron sputtering

The optical properties of hexagonal boron nitride (h-BN) thin films were studied in this paper. The films were characterized by Fourier transform infrared spectroscopy, UV--visible transmittance and reflection spectra. h-BN thin films with a wide optical band gap E_g (5.86 eV for the as-deposited film and 5.97 eV for the annealed film) approaching h-BN single crystal were successfully prepared by radio frequency (RF) bias magnetron sputtering and post-deposition annealing at 970~K. The optical absorption behaviour of h-BN films accords with the typical optical absorption characteristics of amorphous materials when fitting is made by the Urbach tail model. The annealed film shows satisfactory structure stability. However, high temperature still has a significant effect on the optical absorption properties, refractive index n, and optical conductivity σ of h-BN thin films. The blue-shift of the optical absorption edge and the increase of E_g probably result from stress relaxation in the film under high temperatures. In addition, it is found that the refractive index clearly exhibits different trends in the visible and ultraviolet regions. Previous calculational results of optical conductivity of h-BN films are confirmed in our experimental results.     

Microstructure and Optical Properties of AgxO Prepared by Direct-Current Magnetron-Sputtering Method

Two series of AgxO films are prepared on glass substrates by dc magnetron-sputtering method at room temperature and 90℃ under different oxygen to argon gas ratio （OAR） conditions. The mierostrueture is investigated by XRD and SEM in order to obtain the information on the component evolution of AgO＋Ag2O to Ag2O. Its optical properties are investigated by reflectance and absorption spectroscopy to extract the information on metallic and dielectric behaviour evolution of Ag2O, AgO and silver particles and the interband transition. The results indicate that the AgxO film prepared at room temperature is mainly made up of AgO and Ag2 O clusters while Ag2O is the primary component of AgxO prepared at 90℃. The AgxO film mainly consisting of the primary component shows indirect interband transition structure occurring at 2.89eV. Combination of increasing OAR and substrate temperature is an effective method to lower the threshold of thermal decomposition temperature of AgxO and to deal with the bottleneck of short-wavelength optical and magneto-optieM storage.     

Microstructural and Optical Absorption Properties of Cu—MgF2 Nanoparticle Cermet Film

We examine the microstructural and optical absorption spectra of 10-30vol% Cu-MgF2 nanoparticle cermet films prepared by co-evaporation in vacuum.The results show that the Cu-MgF2 cermet films are mainly composed of the amorphous MgF2 matrix with embedded fcc Cu nanoparticles of average size 12-24nm.The results also show that the optical absorption of the films decreases as the wavelength increases in the range of 200-800nm.The surface plasmon resonance absorption peaks of Cu nanoparticles in 10,20 and 30vol% Cu-MgF2 films appear at 578,588 and 606 nm,respectively.The interband transition absorption of Cu starts from 590nm downwards.Based on the Maxwell-Garnett theory,the experimental optical absorption properties of the films have been quantitatively evaluated.     

Influences of Y2O3 dopant content on residual stress,structure, and optical properties of ZrO2 thin films

Four kinds of Y2O3 stabilized ZrO2 （YSZ） thin films with different Y2O3 contents （from 0 to 12 mol%） are deposited on BK7 glass substrates by electron-beam evaporation method. The effects of different Y2O3 dopant contents on residual stress, structure, and optical properties of ZrO2 thin films are investigated. The results show that residual stress in YSZ thin films varies from tensile to compressive with the increase of Y2O3 molar content. The addition of Y2O3 is beneficial to the crystallization of YSZ thin film and transformation from amorphous to high temperature phase, and the refractive index decreases with the increase of Y2O3 molar content. Moreover, the variations of residual stress and the shifts of refractive index correspond to the evolution of structures induced by the addition of Y2O3.     

Structures and optical properties of tungsten oxide thin films deposited by magnetron sputtering of WO_3 bulk:Effects of annealing temperatures

Tungsten oxide thin films were deposited on glass substrates by the magnetron sputtering of WO3 bulk at room temperature. The deposited films were annealed at different temperatures in air. The structural measurements indicate that the films annealed below 300℃ were amorphous, while the films annealed at 400℃ were mixed crystalline with hexagonal and triclinic phases of WO3. It was observed that the crystallization of the annealed films becomes more and more distinct with an increase in the annealing temperature. At 400℃, nanorod-like structures were observed on the film surface when the annealing time was increased from 60 min to 180 min. The presence of W=O stretching, W–O–W stretching, W–O–W bending and various lattice vibration modes were observed in Raman measurements. The optical absorption behaviors of the films in the range of 450–800 nm are very different with changing annealing temperatures from the room temperature to 400℃. After annealing at 400℃, the film becomes almost transparent. Increasing annealing time at 400℃ can lead to a small blue shift of the optical gap of the film.     

Influence of Annealing Temperature on Structure, Optical Loss and Laser-Induced Damage Threshold of TiO2 Thin Films

TiO2 thin films are prepared on fused silica with conventional electron beam evaporation deposition. After annealed at different temperatures for 4h, the spectra and XRD patterns of the TiO2 thin film are obtained. Weak absorption of coatings is measured by the surface thermal lensing technique, and laser-induced damage threshold （LIDT） is determined. It is found that with the increasing annealing temperature, the transmittance of TiO2 films decreases. Especially when coatings are annealed at high temperature over 1173K, the optical loss is very serious. Weak absorption detection indicates that the absorption of coatings decreases firstly and then increases, and the absorption and defects play major roles in the LIDT of TiO2 thin films.     

Optical properties of carbon nanotubes and BaTiO3 composite thin films

Multiwalled carbon nanotubes and BaTiO₃ composite films have been prepared by pulsed-laser deposition technique at room temperature and high temperature of 600℃, separately. The structures of the composite films are investigated by using scanning electron microscopy and x-ray diffraction. The optical behaviours of the samples produced at different temperatures are compared with Raman spectroscopy, and UV-visible absorption. And the observation by Z-scan technique reveals that the composite films have a larger optical nonlinearity, and the samples prepared at high temperatures have better transmittance and opposite sign imaginary part of optical third-order nonlinearity.     

Nonlinear optical switching and all-figures of merit in Bi2S3-xSex/PMMA nanocomposite films investigated by Z scan under visible CW laser

Bi2S3-xSex/poly(methyl methacrylate)(PMMA)nanocomposite films were prepared using microwave assisted synthesis with different compositions of x.Crystal structure,surface morphology,and optical properties were investigated to characterize the prepared nanocomposite films.The crystallinity and optical band gap of the prepared Bi2S3-xSex/PMMA were affected by x.The prepared samples showed a blue shift in the absorption edge.The laser power dependent nonlinear refraction and absorption of Bi2S3-xSex/PMMA nanocomposite films were investigated by using the Z-scan technique.The optical nonlinearity of the nanocomposite films exhibited switchover from negative nonlinear refraction to positive nonlinear refraction to negative nonlinear refraction effects,and from saturable absorption to reverse saturable absorption to saturable absorption with an increase and decrease in the composition.An interesting all-optical figure of merit was reported to assess the nanocomposite films for a practical device.It was calculated that the device all-figures of merit were based on the nonlinear response,which is important for the all-optical switching device.The results demonstrate that the optimized all-optical figures of merit can be achieved by adjusting the composition and input laser power,which can be used for the design of different all-photonic devices,and the results of nonlinear switching behavior can open new possibilities for using the nanocomposite films in laser Q-switching and mode-locking.     

Effect of Process Parameters on Laser Damage Threshold of TiO2 Coatings

We investigate the laser damage behaviour of an electron-beam-deposited TiO2 monolayer at different process parameters. The optical properties, chemical composition, surface defects, absorption and laser-induced damage threshold （LIDT） of films are measured. It is found that TiO2 films with the minimum absorption and the highest LIDT can be fabricated using a TiO2 starting material after annealing. LIDT is mainly related to absorption and is influenced by the non-stoichiometric defects for TiO2 films. Surface defects show no evident effects on LIDT in this experiment.     

Influence of Post-Annealing Temperature on Properties of Ta-Doped ZnO Transparent Conductive Films

Ta-doped ZnO transparent conductive films are deposited on glass substrates by rf sputtering at 300℃. The influence of the post-annealing temperature on the structural, morphologic, electrical, and optical properties of the films is investigated by x-ray diffraction, Hall measurement, and optical transmission spectroscopy. The lowest resistivity of 3.5 ×10^-4 Ω·cm is obtained from the film annealed at 400℃in N2. The average optical transmittance of the films is over 90%. The optical bandgap is found to decrease with the increase of the annealing temperature.     

Influence of Ytterbia Content on Residual Stress and Microstructure of Y2O3--ZrO2 Thin Films Prepared by EB-PVD

Y2O3 stabilized ZrO2 （YSZ） thin films with different Y2O3 molar contents （0, 3, 7, and 12 mol%） are deposited on BK7 substrates by electron-beam evaporation technique. The effects of different Y2O3 contents on residual stresses and structures of YSZ thin films are studied. Residual stresses are investigated by means of two different techniques： the curvature measurement and x-ray diffraction method. It is found that the evolution of residual stresses of YSZ thin films by the two different methods is consistent. Residual stresses of films transform from compressive stress into tensile stress and the tensile stress increases monotonically with the increase of Y2O3 content. At the same time, the structures of these films change from the mixture of amorphous and monoclinic phases into high temperature cubic phase. The variations of residual stress correspond to the evolution of structures induced by adding of Y2O3 content.     

Optical properties of ZnO thin films on SiO_2 substrates deposited by radio frequency magnetron sputtering

The optical properties of both the annealed and as-deposited ZnO thin films by radio frequency (RF) magnetron sputtering on SiO2 substrates were studied. In the annealed films, two pronounced well defined exciton absorption peaks for the A and B excitons were obtained in the absorption spectra, a strong free exciton emission without deep-level emissions was observed in the photoluminescence (PL) spectra at room temperature. It was found that annealing the films in oxygen dramatically improved the optical properties and the quality of the films.     

The effects of post-thermal annealing on the optical parameters of indium-doped ZnO thin films

Indium-doped ZnO thin films are deposited on quartz glass slides by RF magnetron sputtering at ambient temper- ature. The as-deposited films are annealed at different temperatures from 400 C to 800 C in air for 1 h. Transmittance spectra are used to determine the optical parameters and the thicknesses of the films before and after annealing using a nonlinear programming method, and the effects of the annealing temperatures on the optical parameters and the thickness are investigated. The optical band gap is determined from the absorption coefficient. The calculated results show that the film thickness and optical parameters both increase first and then decrease with increasing annealing temperature from 400 C to 800 C. The band gap of the as-deposited ZnO:In thin film is 3.28 eV, and it decreases to 3.17 eV after annealing at 400 C. Then the band gap increases from 3.17 eV to 3.23 eV with increasing annealing temperature from 400 C to 800 C.     

Multilayer Au/TiO2Composite Films with Ultrafast Third-Order Nonlinear Optical Properties

We report on the ultrafast third-order optical nonlinearity in multilayer Au/TiO2 composite films fabricated on quartz substrates by pulsed laser deposition technique. The linear optical properties of the films are determined and optical absorption peaks due to surface plasmon resonance of Au particles are observed at about 590hm. The third-order optical nonlinearities of the films are investigated by z-scan method using a femtosecond laser （50 fs） at the wavelength of 800 nm. The sample showed fast nonlinear optical responses with nonlinear absorption coefficient and nonlinear refractive index being -3.66 × 10^-10 m/W and -2.95 × 10^-17 m^2/W, respectively. The results also show that the nonlinear optical effects increase with the increasing Au concentration in the composite films.     

Microstructure and optical absorption of Au-MgF2 nanoparticle cermet films

The microstructure and optical absorption of Au-MgF2 nanoparticle cermet films with different Au contents are studied. The microstructural analysis shows that the films are mainly composed of the amorphous MgF2 matrix with embedded fcc Au nanoparticles with a mean size of 9.8-21.4nm. Spectral analysis suggests that the surface plasma resonance （SPR） absorption peak of Au particles appears at λ=492-537nm. With increasing Au content, absorption peak intensity increases, profile narrows and location redshifts. Theoretical absorption spectra are calculated based on Maxwell-Garnett theory and compared with experimental spectra.     

Fabrication and Characterization of Nanocrystalline VO2 Thin Films

Nanocrystalline VO2 films with phase transition temperature 34℃ have been fabricated on SiaN4-film-coated silicon and quartz substrates by argon-annealing films of metastable VO2(B). The original VO2(B) films are obtained by ion beam sputtering in an argon-oxygen atmosphere at 200℃. The nanocrystalline VO2 films exhibit strong changes in electrical and optical properties when a phase transition is completed. The phase transition temperature in the as-fabricated samples is about 34℃, which is smaller in comparison with 68℃ in the singlecrystalline VO2 material. A lower phase transition temperature is favorable for device applications such as smart window coating and low power consumption optical switching.     

Temperature effect on emission lines and fluorescence lifetime of the ~4F_(3/2) state of Nd:YVO_4

By measuring the absorption and fluorescence spectra and the fluorescence lifetime of 4F3/2 state of Nd3+ ions in YVO4 (2 at.-%) crystal at different temperature, the effects of temperature on the spectra and the lifetime of F3/2 state have been investigated. As the temperature is increased, the line width of the 4F3/2 -4I11/2 transitions is found to increase and the spectral line toward the longer wavelength, which are duo to the ion-phonon interaction. The variation fluorescence lifetime of the 4F3/2 state of Nd:YVO4 is found to be anomalous in the measured range 8 - 300 K. It is about 81 us at room temperature and decreases to 30 us at 8 K. The experimental results are explained by ascribing to the thermal mixing between the two Stark levels of 4F3/2 state with different lifetime.     

Development in Laser Induced Extrinsic Absorption Damage Mechanism of Dielectric Films

Absorption of host and the temperature-dependence of absorption coefficient have been considered in evaluating temperature distribution in films, when laser pulse irradiates on films. Absorption of dielectric materials experience three stages with the increase of temperature： multi-photon absorption; single photon absorption; metallic absorption. These different absorption mechanisms correspond to different band gap energies of materials, which will decrease when the temperature of materials increases. Evaluating results indicate that absorption of host increases rapidly when the laser pulse will be over. If absorption of host and the temperature-dependence of absorption are considered, the maximal temperatures in films will be increased by a factor of four.     

Substrate Dependence of Properties of Sputtered ITO Films

High-quality indium-tin-oxide (ITO) films are deposited on p-type Czochralski silicon and 7059 Coming glass by direct-current magnetron sputtering at various temperatures. The structural, electrical and optical properties of the ITO films are investigated as functions of the substrate temperature. A comparison between the characteristics of the ITO films on silicon and Coming glass is presented. The results show that for the ITO film on silicon,the nucleation begins from room temperature; the resistivity reaches a maximum value at 75℃; the reflectivity increases with increasing temperature; when temperature is above 125℃, the ITO grows in a three-dimensional manner and forms a granular structure. However, for the ITO film on glass, it is still in an amorphous state at 75℃. Moreover, both the resistivity and the reflectivity decrease with increasing temperature. Above 125℃, the ITO grows in a two-dimensional manner and forms a domain structure.     

A Spectroscopic Ellipsometry Study of TiO2 Thin Films Prepared by dc Reactive Magnetron Sputtering： Annealing Temperature Effect

TiO2 thin films are obtained by dc reactive magnetron sputtering. A target of titanium （99.995%） and a mixture of argon and oxygen gases are used to deposit TiO2 films on to silicon wafers （100）. The crystalline structure of deposited and annealed film are deduced by variable-angle spectroscopic ellipsometry （VASE） and supported by x-ray diffractometry. The optical properties of the films are examined by VASE. Measurements of ellipsometry are performed in the spectral range O. 72-3.55 e V at incident angle 75^o. Several SE models, categorized by physical and optical models, are proposed based on the ＇simpler better＇ rule and curve-fits, which are generated and compared to the experimental data using the regression analysis. It has been found that the triple-layer physical model together with the Cody-Lorentz dispersion model offer the most convincing result. The as-deposited films are found to be inhomogeneous and amorphous, whereas the annealed films present the phase transition to anatase and rutile structures. The refractive index of TiO2 thin films increases with annealing temperature. A more detailed analysis further reveals that thickness of the top sub-layer increases, whereas the region of the bottom amorphous sub-layer shrinks when the films are annealed at 300℃.