| Effect of Process Parameters on Laser Damage Threshold of TiO2 Coatings |
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| 作者姓名： | 姚建可 晋云霞 赵元安 贺洪波 邵建达 范正修 |
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| 作者单位： | [1]P＆D Centre for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800 [2]Graduate School, Chinese Academy of Sciences, Beijing 100080 |
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| 基金项目： | Supported by the National Natural Science Foundation of China under Grant No 60608020. |
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| 摘 要： | We investigate the laser damage behaviour of an electron-beam-deposited TiO2 monolayer at different process parameters. The optical properties, chemical composition, surface defects, absorption and laser-induced damage threshold （LIDT） of films are measured. It is found that TiO2 films with the minimum absorption and the highest LIDT can be fabricated using a TiO2 starting material after annealing. LIDT is mainly related to absorption and is influenced by the non-stoichiometric defects for TiO2 films. Surface defects show no evident effects on LIDT in this experiment.
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| 关 键 词： | 参数 阈值 TiO2 涂料 |
| 收稿时间： | 2007-3-2 |
| 修稿时间： | 2007-03-02 |
Effect of Process Parameters on Laser Damage Threshold of TiO2 Coatings |
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| YAO Jian-Ke,JIN Yun-Xia,ZHAO Yuan-An,HE Hong-Bo,SHAO Jian-Da,FAN Zheng-Xiu.Effect of Process Parameters on Laser Damage Threshold of TiO2 Coatings[J].Chinese Physics Letters,2007,24(9):2606-2608. |
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| Authors: | YAO Jian-Ke JIN Yun-Xia ZHAO Yuan-An HE Hong-Bo SHAO Jian-Da FAN Zheng-Xiu |
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| Institution: | 1 RggD Centre for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800; 2 Graduate School, Chinese Academy of Sciences, Beijing 100080 |
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| Abstract: | We investigate the laser damage behaviour of an electron-beam-deposited TiO2 monolayer at different process parameters. The optical properties, chemical composition, surface defects, absorption and laser-induced damage threshold (LIDT) of films are measured. It is found that TiO2 films with the minimum absorption and the highest LIDT can be fabricated using a TiO2 starting material after annealing. LIDT is mainly related to absorption and is influenced by the non-stoichiometric defects for TiO2 films. Surface defects show no evident effects on LIDT in this experiment. |
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| Keywords: | 42 79 Wc 68 37 Yz 68 60 Wm |
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