Ge(001)衬底上分子束外延生长高质量的Ge1-xSnx合金

Ge_1-xSn_x是一种新型IV族合金材料, 在光子学和微电子学器件研制中具有重要应用前景. 本文使用低温分子束外延(MBE)法, 在Ge(001)衬底上生长高质量的Ge_1-xSn_x合金, 组分x分别为1.5%, 2.4%, 2.8%, 5.3%和14%, 采用高分辨X射线衍射(HR-XRD)、卢瑟福背散射谱(RBS) 和透射电子显微镜(TEM)等方法表征Ge_1-xSn_x合金的材料质量. 对于低Sn组分(x≤ 5.3%)的样品, Ge_1-xSn_x合金的晶体质量非常好, RBS的沟道/随机产额比(χ_min)只有5.0%, HR-XRD曲线中Ge_1-xSn_x衍射峰的半高全宽(FWHM)仅100' 左右. 对于x=14%的样品, Ge_1-xSn_x合金的晶体质量相对差一些, FWHM=264.6'. 关键词： 锗锡合金 锗 分子束外延     

GaxN2:Zn3-x薄膜的分子束外延生长及其光学和电子输运性能表征

本文采用分子束外延技术,通过对金属分子束的精确控制,在MgO(002)基底上成功生长了Ga_xN₂∶Zn_3-x合金薄膜.高分辨率单晶X光衍射仪表征结果表明Ga_xN₂∶Zn_3-x合金薄膜仍是以(400)Zn₃N₂为主导的复合晶体结构,对衍射数据的分析得到该薄膜晶粒尺寸小.用扫描电子显微镜和能谱射线分析仪对其表面和成分做了深入的分析和讨论,在固定的金属流量比的生长环境下,不同厚度的样品在成膜后x均为0.65,化学通式Zn_2.35Ga_0.65N₂.该结果表明Ga元素属于重度掺杂,同时也体现了分子束外延技术在共掺杂技术中的优越性.本文也测量并讨论了Zn_2.35Ga_0.65N₂薄膜的光学性能,实验得到的1.85 eV的光学带隙与理论推算基本吻合,说明Ga的掺入有Ga-N结构...     

激光分子束外延BaTiO3薄膜最顶层表面原子平面与薄膜生长机理

用激光分子束外延技术在SrTiO₃(001)衬底上外延生长了高质量的BaTiO_{3< /sub>薄膜,薄膜的生长过程由反射式高能电子衍射仪(RHEED)原位实时监测,表明薄膜具有 二维层状生长模式.薄膜的晶体结构和表面形貌分别由X射线衍射和原子力显微镜表征,显示 该薄膜为完全c轴取向四方相晶体结构,其表面具有原子尺度光滑性.采用角分辨X射线光电 子谱技术(ARXPS),研究了BaTiO3薄膜表面最顶层原子种类和排列状况.结果表 明,BaTiO3 关键词： 激光分子束外延 3薄膜')" href="#">氧化物BaTiO3薄膜 最顶层表面 角分辨X射线光电子谱}     

用激光分子束外延在玻璃衬底上生长La0.67Sr0.33MnO3薄膜

采用激光分子束外延技术,在玻璃衬底上制备了La_067Sr_033MnO₃ （LSMO） 薄膜,X射线衍射测量结果表明在玻璃衬底上生长的LSMO薄膜沿c轴择优取向生长.在外磁场3 T和88, 220, 300 K条件下,LSMO薄膜的磁电阻变化率分别达到-378%, -268%和-607%.实验结果表明,在廉价的玻璃衬底上制备大面积和具有应用价值的锰氧化物薄膜是可行的. 关键词： 锰氧化物薄膜 玻璃衬底 外延生长     

用深能级瞬态谱方法研究赝晶Si/Ge0.25Si0.75/Si单量子阱的价带偏移

应变的Ge_xSi_1-x层和未应变的硅层间的能带偏移主要是价带偏移。量子阱中载流子的热发射能与界面的能带偏移有着密切的关系。本文用深能级瞬态谱(DLTS)研究分子束外延生长的p型Si/Ge_0.25Si_0.75/Si单量子阱的价带偏移,阱宽为15nm,考虑到电场的影响和量子阱中第一子能级的位置,对从DLTS得到的热发射能进行适当的修正,可以计算出Si/Ge_0.25Si_0.75/S 关键词：     

用激光分子束外延在Si衬底上外延生长高质量的TiN薄膜

采用激光分子束外延技术,利用两步法,在Si单晶衬底上成功地外延生长出TiN薄膜材料.原子力显微镜分析结果显示, TiN薄膜材料表面光滑,在10 μm×10 μm范围内,均方根粗糙度为0842nm.霍耳效应测量结果显示,TiN薄膜在室温条件下的电阻率为36×10^-5Ω·cm,迁移率达到5830 cm²/V·S,表明TiN薄膜材料是一种优良的电极材料.X射线θ—2θ扫描结果和很高的迁移率均表明,高质量的TiN薄膜材料被外延在Si衬底 关键词： 激光分子束外延 TiN单晶薄膜 外延生长     

La0.5Sr0.5CoO3薄膜的外延生长及其机理研究

利用脉冲激光制膜法,在多种衬底和温度条件下,系统研究了La_0.5Sr_0.5CoO₃(LSCO)薄膜的结构和外延生长特性,在LaAlO₃,SrTiO₃和MgO衬底上实现了LSCO薄膜的外延生长.外延生长的薄膜具有低的电阻率和金属性导电特征.研究表明,外延生长的最佳温度范围为700—800℃,最佳衬底为LaAlO₃.并着重探讨了衬底材料和淀积温度等多种因素对LSCO薄膜的生长与性 关键词：     

MnxSi1-x磁性薄膜的结构研究

利用X射线衍射(XRD)和X射线吸收近边结构(XANES)方法研究了在Si(100)衬底上及600℃温度条件下用分子束外延(MBE)共蒸发方法生长的Mn_xSi_1-x磁性薄膜的结构.由XRD结果表明,只有在高Mn含量(8％和17％)样品中存在着Mn₄Si₇化合物物相.而XANES结果则显示,对于Mn浓度在0.7%到17%之间的Mn_xSi_1-x样品,其Mn原子的XANES谱表现出了一致的谱线特征.基于多重散射的XANES理论计算进一步表明,只有根据Mn₄Si₇模型计算出的理论XANES谱才能够很好的重构出Mn_xSi_1-x样品的实验XANES谱.这些研究结果说明在Mn_xSi_1-x样品中,Mn原子主要是以镶嵌式的Mn₄Si₇化合物纳米晶颗粒存在于Si薄膜介质中,几乎不存在间隙位和替代位的Mn原子. 关键词： xSi_1-x磁性薄膜')" href="#">Mn_xSi_1-x磁性薄膜 分子束外延 XRD XANES     

Co100-xMnx合金在GaAs(001)表面的生长结构和磁性的实验研究

对Co_100-xMn_x合金在GaAs(001)表面的分子束外延生长、晶体结构和磁学性质进行了研究.结果表明,当0100-xMn_x合金薄膜是体材料中不存在的体心立方(bcc)结构,并且具有较强的铁磁性,当44100-xMn_x合金薄膜最初为bcc结构,随着厚度的增加,逐渐从bcc向面心立方(fcc)结构转化,最后成为完全的fcc结构,薄膜具有较 关键词：     

SrRuO3超薄膜制备条件和拓扑霍尔效应的关联

使用激光分子束外延在SrTiO₃(001)衬底上生长SrRuO₃薄膜,并研究激光能量密度、生长温度和靶材表面烧蚀度等生长参数对于SrRuO₃表面形貌、基本磁电性质以及拓扑霍尔效应的影响.当在最优条件下生长SrRuO₃薄膜时,样品表面平整、台阶清晰,具有最低的金属-绝缘体转变温度,电阻率最低,且具有最显著的拓扑霍尔效应;而改变生长参数生长的SrRuO₃薄膜由于存在更多的缺陷,其表面较粗糙,金属-绝缘体转变温度增大,或表现出绝缘体行为,而拓扑霍尔效应会变弱甚至消失.     

Photoelectric characteristics of nanostructured hydrochemically deposited films of the Pb<Subscript>0.975</Subscript>Sn<Subscript>0.025</Subscript>Se substitutional solid solution

The photoelectric characteristics of Pb_0.975Sn_0.025Se solid solution films prepared by the hydrochemical codeposition of PbSe and SnSe with the subsequent heat treatment in air at 573–700 K have been investigated. The thermal and optical band gaps, the temperature coefficient of the optical band gap, the dark resistance, the volt-watt sensitivity, and the range of spectral sensitivity have been determined in the temperature range of 220–300 K. It has been found that, after heat treatment below 573 K, the films of the Pb_0.975Sn_0.025Se solid solutions possess metallic conductivity, while being heat treated at elevated temperatures, they become semiconductors with p-type conductivity. The composition of the solid solution is independent of the heat treatment temperature; it is formed during deposition.     

Electrical characterization studies of p-type Ge,Ge1−ySny,and Si0.09Ge0.882Sn0.028 grown on n-Si substrates

The electrical properties of p-type Ge, Ge_1−ySn_y, and Si_0.09Ge_0.882Sn_0.028 samples grown on n-type Si substrates using ultra-high vacuum chemical vapor deposition have been investigated as a function of temperature. Degenerate parallel conducting layers were found in all Ge/Si, Ge_1−ySn_y/Si, and Si_0.09Ge_0.882Sn_0.028/Si samples, which are believed to be associated with dislocation defects at the interface produced by the lattice mismatch between the two materials. These degenerate conducting layers affect the electrical properties of all the thin epitaxial films. Additionally, temperature dependent Hall-effect measurements show that these materials exhibit a conductivity type change from p to n at around 370–435 K. The mobilities of these samples are generally lower than that of bulk Ge due to carrier scattering near the interface between the epitaxial layer and the Si substrate and also due to alloy scattering. Detailed behavior of temperature-dependent conductivity of these samples is also discussed.     

Studies on electrical switching behavior and optical band gap of amorphous Ge–Te–Sn thin films

Amorphous thin film Ge₁₅Te_85−x Sn _x (1≤x≤5) and Ge₁₇Te_83−x Sn _x (1≤x≤4) switching devices have been deposited in sandwich geometry using a flash evaporation technique, with aluminum as the top and bottom electrodes. Electrical switching studies indicate that these films exhibit memory type electrical switching behavior. The switching fields for both the series of samples have been found to decrease with increase in Sn concentration, which confirms that the metallicity effect on switching fields/voltages, commonly seen in bulk glassy chalcogenides, is valid in amorphous chalcogenide thin films also. In addition, there is no manifestation of rigidity percolation in the composition dependence of switching fields of Ge₁₅Te_85−x Sn _x and Ge₁₇Te_83−x Sn _x amorphous thin film samples. The observed composition dependence of switching fields of amorphous Ge₁₅Te_85−x Sn _x and Ge₁₇Te_83−x Sn _x thin films has been understood on the basis of Chemically Ordered Network model. The optical band gap for these samples, calculated from the absorption spectra, has been found to exhibit a decreasing trend with increasing Sn concentration, which is consistent with the composition dependence of switching fields.     

GeSn合金的晶格常数对Vegard定律的偏离

在Si (001)衬底上, 以高质量的弛豫Ge薄膜作为缓冲层, 先后生长Sn组分x分别为2.5%, 5.2%和7.8%的完全应变的三层Ge_1-xSn_x合金薄膜. 在Si (001)衬底上直接生长了x分别为0.005, 0.016, 0.044, 0.070和0.155的五个弛豫Ge_1-xSn_x样品. 通过卢瑟福背散射谱、高分辨X射线衍射和X射线倒易空间图等方法测量了Ge_1-xSn_x合金的组分 与晶格常数. 实验得到的晶格常数相对Vegard定律具有较大的正偏离, 弯曲系数b=0.211 Å.     

Strained and strain-relaxed epitaxial Ge1-xSnx alloys on Si（100） substrates

Epitaxial Ge1-xSnx alloys are grown separately on a Ge-buffer/Si(100) substrate and directly on a Si(100) substrate by molecular beam epitaxy (MBE) at low temperature. In the case of the Ge buffer/Si(100) substrate, a high crystalline quality strained Ge0.97Sn0.03 alloy is grown, with a χmin value of 6.7% measured by channeling and random Rutherford backscattering spectrometry (RBS), and a surface root-mean-square (RMS) roughness of 1.568 nm obtained by atomic force microscopy (AFM). In the case of the Si(100) substrate, strain-relaxed Ge0.97Sn0.03 alloys are epitaxially grown at 150°C-300°C, with the degree of strain relaxation being more than 96%. The X-ray diffraction (XRD) and AFM measurements demonstrate that the alloys each have a good crystalline quality and a relatively flat surface. The predominant defects accommodating the large misfit are Lomer edge dislocations at the interface, which are parallel to the interface plane and should not degrade electrical properties and device performance.     

Synthesis of compositionally controllable Cu<Subscript>2</Subscript>(Sn<Subscript>1−x</Subscript>Ge<Subscript>x</Subscript>)S<Subscript>3</Subscript> nanocrystals with tunable band gaps

In this work, we show that compositionally controlled Cu₂(Sn_1–xGe_x)S₃ nanocrystals can be successfully synthesized by the hot-injection method through careful tuning the Ge/(Sn+Ge) precursor ratio. The band gaps of the resultant nanocrystals are demonstrated to be linearly tuned from 1.45 to 2.33 eV by adjusting the composition parameter x of the Ge/(Sn+Ge) ratio from 0.0 to 1.0. The crystalline structures of the resultant NCs have been studied by the X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), select area electron diffraction (SAED), and Raman spectroscopy. A ligand exchange procedure is further performed to replace the native ligands on the surface of the NCs with sulfur ions. The photoresponsive behavior indicates the potential use of as-prepared Cu₂(Sn_1–xGe_x)S₃ nanocrystals in solar energy conversion systems. The synthesis of compositionally controlled Cu₂(Sn_1–xGe_x)S₃ nanocrystals reported herein provides a way for probing the effect of Ge inclusion in the Cu-Sn-S system thin films.     

Mo¨ssbauer study of iron sulfides doped with 3d-transition metals

It is found by Mo¨ssbauer measurements on M_0.025Fe_0.975S (M=Sc, Ti, V, Cr, Mn, Co, Ni, Cu) that the 3d-transition metal impurities profoundly affect both the crystallographic and spin rotation transitions of iron sulfide.It is noteworthy that both V_0.025Fe_0.975S and Co_0.025Fe_0.975S have Morin transition temperatures T_M which are distinctly different from that of FeS; furthermore, the directions of changes of T_M are opposite for V_0.025Fe_0.975S and Co_0.025Fe_0.975S.A vanadium impurity of 2.5% of the metal atoms in the iron sulfide makes the crystallographic transition take place rapidly in a narrow temperature region of about 15 K, while the α transition in FeS takes place over a wide temperature range of about 200 K.It is also found that the α transition for V_0.025Fe_0.975S has a hysteresis width of 5 K.     

Tunable band structure in diamond-cubic tin-germanium alloys grown on silicon substrates

Novel chemical methods based on deuterium-stabilized Sn hydrides and ultra-high-vacuum chemical vapor deposition were used to grow Sn_xGe_1−x alloys directly on silicon. Device-quality, strain-free films with a Sn-fraction as high as x=0.2 were obtained. The optical properties provide evidence for a well-defined Ge-like band structure. In particular, the direct band gap E₀ is reduced to a value as low as 0.41 eV for Sn_0.14Ge_0.86. The growth of these high-optical quality infrared materials creates entirely new opportunities for band gap engineering on Si.     

Diamond cubic Sn-rich nanocrystals: synthesis, microstructure and optical properties

Diamond cubic Sn-rich nanocrystals were fabricated with radii less than 20 nm by post-growth annealing at T=750 °C of Sn_xGe_1-x alloys grown on Ge(001) by molecular beam epitaxy. The crystal phase of the Sn-rich nanocrystals was determined to be diamond cubic from Fourier transform analysis of high-resolution transmission electron microscopy images. Optical transmittance of these Sn_xGe_1-x/Ge (001) films demonstrated changes in optical absorption that can be attributed to absorption from the nanocrystals. The energy bandgap was measured to be 0.45 eV for nanocrystals arrays in Ge with a mean diameter of 32 nm. PACS 68.37.Lp; 78.67.Hc; 81.07.Ta; 81.16.Dn; 68.65.Hb