Influence of Oxygen Vacancy on Transport Property in Perovskite Oxide Heterostructures

Effect of oxygen vacancy on transport property of perovskite microstructures is studied theoretically. Compared with calculated and measured I-V curves, it is revealed that electron conduction plays an important role in the oxygen nonstoichiometry perovskite heterostructures even with hole-doped or un-doped material due to the oxygen vacancies. In addition, a detailed understanding of the influence of oxygen vacancy concentration and temperature on the conduction characteristics of oxide heterojunction with both forward and reverse biases is obtained by calculation.     

用激光分子束外延在Si衬底上外延生长高质量的TiN薄膜

采用激光分子束外延技术，利用两步法，在Si单晶衬底上成功地外延生长出TiN薄膜材料.原子力显微镜分析结果显示， TiN薄膜材料表面光滑，在10 μm×10 μm范围内，均方根粗糙度为0842nm.霍耳效应测量结果显示，TiN薄膜在室温条件下的电阻率为36×10^-5Ω·cm，迁移率达到5830 cm²/V·S，表明TiN薄膜材料是一种优良的电极材料.X射线θ—2θ扫描结果和很高的迁移率均表明，高质量的TiN薄膜材料被外延在Si衬底     

用激光分子束外延在Si衬底上外延生长高质量的TiN薄膜

采用激光分子束外延技术，利用两步法，在Si单晶衬底上成功地外延生长出TiN薄膜材料.原子力显微镜分析结果显示， TiN薄膜材料表面光滑，在10 μm×10 μm范围内，均方根粗糙度为0842nm.霍耳效应测量结果显示，TiN薄膜在室温条件下的电阻率为36×10^-5Ω·cm，迁移率达到5830 cm²/V·S，表明TiN薄膜材料是一种优良的电极材料.X射线θ—2θ扫描结果和很高的迁移率均表明，高质量的TiN薄膜材料被外延在Si衬底 关键词： 激光分子束外延 TiN单晶薄膜 外延生长     

基于红外图像的打击效能评估研究

开发新型智能化、模块化自动枪塔系统对于保护国家领土主权具有重要意义。针对现有枪塔打击效能评估系统过于复杂且不具有良好实时性等问题，提出基于红外图像分析的近距离、远距离打击效能评估准则，并通过计算机编程重点对远距离打击效能评估准则进行了数字实验验证。远距离评估准则是通过建立各种因素影响下的数字化模型，结合各种因素计算目标人群丧失战斗能力的概率值，最后将概率值转化为相应的打击效能评估值。针对3人目标群体的数字实验表明:0人丧失战斗力、1人丧失战斗力、2人丧失战斗力情况下的打击效能评估值分别为24.8、20.3、4.6，符合远距离打击效能评估准则，对实现自动打击具有一定的理论指导意义和工程应用价值。     

Dielectric and Ferroelectric Properties of La-Doped SrBi2Nb2O9 Ceramics

Sr1-xLa2x/3Bi2Nb20O （0 ≤ x ≤0.2） ceramic samples are prepared by the solid-state reaction method. Their structure, dielectric and ferroelectric properties are investigated. The incorporation of La^3＋ improves the den- sification and decreases the grain size of the ceramics without changing the crystal structure. The remanent polarization 2PT increases with increasing La content and reaches a maximum value of 22.8μC/cm^2 at x = 0.125, which is approximately 60% larger than that of pure SrBi2Nb2O9. The Curie temperature keeps almost unchanged at a value of about 440℃. The relationship between doping and the ferroeleetrie and dielectric properties are discussed.