基于石墨烯-钙钛矿量子点场效应晶体管的光电探测器

以等离子增强化学气相沉积法制备的石墨烯作为导电沟道材料,将其与无机CsPbI_3钙钛矿量子点结合,设计并制备了石墨烯-钙钛矿量子点场效应晶体管光电探测器.研究和分析了石墨烯作为场效应晶体管的电学特性及其与钙钛矿量子点结合作为光电探测器的光电特性.结果表明,石墨烯在场效应晶体管中表现出良好的电学性质,其与钙钛矿量子点的结合对波长为400 nm的光辐射具有明显的光响应,在光强为12μW时器件光生电流最大为64μA,响应率达6.4 A·W~(-1),对应的光电导增益和探测率分别为3.7×10~4,6×10~7Jones(1 Jones=1 cm·Hz~(1/2)·W~(-1)).     

High-sensitive phototransistor based on vertical HfSe2/MoS2 heterostructure with broad-spectral response

Van der Waals heterostructures based on the two-dimensional (2D) semiconductor materials have attracted increasing attention due to their attractive properties. In this work, we demonstrate a high-sensitive back-gated phototransistor based on the vertical HfSe₂/MoS₂ heterostructure with a broad-spectral response from near-ultraviolet to near-infrared and an efficient gate tunability for photoresponse. Under bias, the phototransistor exhibits high responsivity of up to 1.42×10³ A/W, and ultrahigh specific detectivity of up to 1.39×10¹⁵ cm·Hz^1/2·W^-1. Moreover, it can also operate under zero bias with remarkable responsivity of 10.2 A/W, relatively high specific detectivity of 1.43×10¹⁴ cm·Hz^1/2·W^-1, ultralow dark current of 1.22 fA, and high on/off ratio of above 10⁵. These results should be attributed to the fact that the vertical HfSe₂/MoS₂ heterostructure not only improves the broadband photoresponse of the phototransistor but also greatly enhances its sensitivity. Therefore, the heterostructure provides a promising candidate for next generation high performance phototransistors.     

Er~(3+)掺杂Na_5Lu_9F_(32)单晶体的红外光学特性

采用坩埚下降法成功地生长了Er~(3+)离子掺杂的Na_5Lu_9F_(32)(NLF)单晶体。测定了单晶体在400~2 500nm波段的吸收光谱与2.5~25μm红外波段的透过光谱。Na_5Lu_9F_(32)单晶体在400~7 150 nm宽波段范围具有好的光学透过性,在该波段的透过率达到90%。在透过光谱中几乎观察不到2.7μm中红外波段的吸收,说明单晶体中OH~-离子的含量极低。根据测定的吸收光谱,通过Judd-Ofelt理论计算了Er~(3+)在单晶体中的光学强度参数Ω_t(Ω_2=2.08,Ω_4=2.07,Ω_6=0.75),以及相应的辐射跃迁速率、荧光分支比和荧光寿命。根据Futchbauer-Ladenburg公式估算了样品的发射截面大约分别为1.42×10~(-20)cm~2(~4I_(13/2)→~4I_(15/2))和1.66×10~(-20)cm~2(~4I_(11/2)→~4I_(13/2))。在980 nm半导体激光器(LD)激发下,研究了单晶体的近红外1.5μm与中红外2.7μm的发射光谱特性。     

Very long wavelength infrared focal plane arrays with 50% cutoff wavelength based on type-Ⅱ In As/GaSb superlattice

A very long wavelength infrared(VLWIR) focal plane array based on In As/Ga Sb type-Ⅱ super-lattices is demonstrated on a Ga Sb substrate. A hetero-structure photodiode was grown with a 50% cut-off wavelength of 15.2 μm, at 77 K.A 320×256 VLWIR focal plane array with this design was fabricated and characterized. The peak quantum efficiency without an antireflective coating was 25.74% at the reverse bias voltage of-20 mV, yielding a peak specific detectivity of 5.89×1010cm·Hz~(1/2)·W~(-1). The operability and the uniformity of response were 89% and 83.17%. The noise-equivalent temperature difference at 65 K exhibited a minimum at 21.4 mK, corresponding to an average value of 56.3 mK.     

Analysis of proton and γ-ray radiation effects on CMOS active pixel sensors

Radiation effects on complementary metal-oxide-semiconductor(CMOS) active pixel sensors(APS) induced by proton and γ-ray are presented. The samples are manufactured with the standards of 0.35 μm CMOS technology. Two samples have been irradiated un-biased by 23 MeV protons with fluences of 1.43 × 10~(11) protons/cm~2 and 2.14 × 10~(11) protons/cm~2,respectively, while another sample has been exposed un-biased to 65 krad(Si) ~(60)Co γ-ray. The influences of radiation on the dark current, fixed-pattern noise under illumination, quantum efficiency, and conversion gain of the samples are investigated. The dark current, which increases drastically, is obtained by the theory based on thermal generation and the trap induced upon the irradiation. Both γ-ray and proton irradiation increase the non-uniformity of the signal, but the nonuniformity induced by protons is even worse. The degradation mechanisms of CMOS APS image sensors are analyzed,especially for the interaction induced by proton displacement damage and total ion dose(TID) damage.     

Absolute spectral distribution of soft X-ray emission from laserproduced gold plasma

Quantitative measurement of spectral distribution of soft X-ray emission from laser produced plasmas and estimation of X-ray conversion efficiency are reported. The X-ray emission from planar gold target irradiated by an Nd:glass laser was recorded using a high resolution transmission grating spectrograph. Spectral distribution of X-ray intensity was derived using calibrated film data and a deconvolution procedure to account for contribution of higher diffraction orders. Results of conversion efficiency per unit solid angle, at a laser intensity of ~4×10¹² W/cm² (λ_L = 1.054 μm), for 10< λ <80 Å and in the water window spectral region (23< λ< 44 Å) are presented. A three-fold increase in conversion efficiency was observed for second harmonic laser irradiation (λ_L = 0.527 μm) at an intensity of 8×10¹² W/cm²     

高Yb3+/Er3+掺杂的磷基有源光纤材料的光谱性质

研究了Yb³⁺/Er³⁺共掺60P₂O₅-15BaO-10Al₂O₃-5ZnO-10R₂O（R=Na,K）以P₂O₅为主体的磷基有源光纤材料的光谱性质,以及不同Yb³⁺/Er³⁺掺杂浓度对光谱性质的影响规律。当Er³⁺浓度为9.100×10¹⁹/cm³、Yb³⁺的掺杂浓度为5.407×10²⁰/cm³、Yb³⁺/Er³⁺浓度比为6：1时,玻璃样品在1 531 nm处的受激发射截面最大,为6.17×10^-21 cm²。同时,其荧光寿命为9.73 ms,荧光半高宽为53.16 nm,发射截面与半高宽的乘积为3.28×10^-32 m³,综合性能最佳。     

AlN插入层对AlxGa1-xN/GaN界面电子散射的影响

本文研究AlN作为Al_xGa_1-xN/GaN插入层引起的电子输运性质的变化, 考虑了Al_xGa_1-xN和AlN势垒层的自发极化、压电极化对Al_xGa_1-xN/AlN/GaN双异质结高电子迁移率晶体管(HEMT)中极化电荷面密度、二维电子气(2DEG) 浓度的影响, 分析了AlN厚度与界面粗糙度散射和合金无序散射的关系; 结果表明, 2DEG 浓度、界面粗糙度散射和合金无序散射依赖于AlN层厚度, 插入一层1–3 nm薄的AlN层, 可以明显提高电子迁移率.     

超薄EuF3电极修饰层对有机场效应晶体管性能的提升

采用EuF₃薄层修饰低功函数金属Ag源、漏电极,制备了CuPc有机场效应晶体管,研究了不同厚度EuF₃对器件性能的影响。结果表明,EuF₃的厚度由0 nm增至0.6 nm时,接触电阻由23.65×10⁵ Ω·cm减 至3.86×10⁵ Ω·cm,使得器件载流子迁移率由1.5×10^-3 cm²·V^-1·s^-1提高到4.65×10^-3 cm²·V^-1·s^-1。 UPS测试结果表明,薄层EuF₃在Ag与有机半导体间形成了界面偶极势垒,使源漏电极表面功函数增大,空穴注入势垒降低,Ag电极与有机半导体层界面的接触电阻减小,进而提升了空穴的注入效率。     

Active species in microwave postdischarge for steel-surfacenitriding

Production of nitrogen atoms has been studied in a 2.45-GHz flowing postdischarge in N₂ and N₂-H₂ gas mixtures with Ar as a buffer gas in the high-pressure regime (5×10³ to 6.5×10⁴ Pa). N atom densities have been measured by NO titration in the 10¹⁴-10 ¹⁵ cm³ range and monitored by the first positive emission resulting from the N atom recombination. The rate coefficient of the N+N+N₂ recombination has been found to be _k=6×10^-33 cm⁶ atom^-2 s ^-1 at T₀=300 K, which agrees with previously published data. The N atom production (or degree of N/N₂ dissociation) in front of an Fe-0.1%C substrate correlates well with the thickness of a γ' Fe₄N layer produced by the postdischarge treatment. The H₂ gas was first introduced in the initial phase of treatment to remove surface oxidizing and then was cut off to keep high densities of N atoms. It is deduced that N atoms are more active nitriding species than NH-type radicals     

Facile sensitizing of PbSe film for near-infrared photodetector by microwave plasma processing

High quality PbSe film was first fabricated by a thermal evaporation method, and then the effect of plasma sensitization on the PbSe film was systemically investigated. Typical detectivity and significant photosensitivity are achieved in the PbSe-based photodetector, reaching maximum values of 7.6×10⁹ cm·Hz^1/2/W and 1.723 A/W, respectively. Compared with thermal annealing, plasma sensitization makes the sensitization easier and significantly improves the performance.     

Effects of a Family Non-universal Z' Boson in \bar{B}_d→μ+μ- and B- →π-μ+μ-,ρ-μ+μ- Decays

Motivated by the recently updated experimental measurement on \bar{B}_d→μ⁺μ^- and B^-→π^-μ⁺μ^- decays by CDF and Belle collaborations, we revisit these
decays, as well as B^-→ρ^-μ⁺μ^- decay, within the Standard Model, and evaluate the effects of a family non-universal Z' boson. Under the constraint from {\cal B}(B^-→π^-μ⁺μ^-), we find the ranges of the Z' couplings S^LR_μμ< -5.2×10^-2 or D^LR_μμ < -8.1× 10^-2 are excluded. Within the allowed Z' parameters spaces, comparing with the SM predictions, we find that {\cal B}(\bar{B}_d→ μ⁺μ^-, {\cal B}(B^-→ π^-μ⁺μ^-), and {\cal B}(B^-→ρ^-μ⁺μ^-) could be enhanced by a factor about
226%, 245%, and 254%, respectively, byZ' contributions. However, they are hardly to be reduced. Furthermore, the zero crossing in the normalized forward-backward asymmetry spectrum of B^- →ρ^-μ⁺μ^- decay at low dimuon mass always exists.     

Etching mask optimization of InAs/GaSb superlattice mid-wavelength infared 640×512 focal plane array

In this paper we focused on the mask technology of inductively coupled plasma(ICP) etching for the mesa fabrication of infrared focal plane arrays(FPA).By using the SiO_2 mask,the mesa has higher graphics transfer accuracy and creates less micro-ripples in sidewalls.Comparing the IV characterization of detectors by using two different masks,the detector using the SiO_2 hard mask has the R_0A of 9.7×10~6 Ω·cm~2,while the detector using the photoresist mask has the R_0A of3.2 × 10~2 Ω·cm~2 in 77 K.After that we focused on the method of removing the remaining SiO_2 after mesa etching.The dry ICP etching and chemical buffer oxide etcher(BOE) based on HF and NH4 F are used in this part.Detectors using BOE only have closer R_0A to that using the combining method,but it leads to gaps on mesas because of the corrosion on AlSb layer by BOE.We finally choose the combining method and fabricated the 640×512 FPA.The FPA with cutoff wavelength of 4.8 μm has the average R_0A of 6.13 × 10~9 Ω·cm~2 and the average detectivity of 4.51 × 10~9 cm·Hz~(1/2).W~(-1)at 77 K.The FPA has good uniformity with the bad dots rate of 1.21%and the noise equivalent temperature difference(NEDT) of 22.9 mK operating at 77 K.     

InAs/GaAs quantum dot infrared photodetectors with different growth temperatures

InAs/GaAs quantum dot infrared photodetectors were fabricated with quantum dots grown at three different temperatures. Large detection wavelength shift (5–14.5 μm) was demonstrated by changing 40 degrees of the epitaxy temperature. The smaller quantum dots grown at lower temperature generate 14.5 μm responses. The detectivity of the normal incident 15 μm QDIP at 77 K is 3 × 10⁸ cm Hz^1/2/W. A three-color detector was also demonstrated with quantum dots grown at medium temperature. The three-color detection comes from two groups of different sizes of dots within one QD layer. This new type of multicolor detector shows unique temperature tuning behavior that was never reported before.     

LiNbO3和LiTaO3晶体Er3+/Yb3+掺杂水热外延层室温吸收光谱分析

本文引入与浓度和厚度有关的k_NL待定参数, 在J-O理论基础上, 对Er³⁺/Yb³⁺掺杂的LiNbO₃和LiTaO₃单晶衬底上 的多晶水热外延样品进行了基于吸收光谱的拟合计算. LiNbO₃:Ω₂=2.34× 10^-20 cm², Ω₄=0.77× 10^-20 cm², Ω₆=0.31×10^-20 cm², k_NL=4.32× 10^-2 mol·m^-2. LiTaO₃:Ω₂=1.68×10^-20 cm², Ω₄=0.84×10^-20 cm², Ω₆=0.45×10^-20 cm², k_NL=9.17×10^-3 mol· m^-2. 该方法可尝试推广到粉体或胶体等难以直接获得浓度和厚度数据的体系. 经上转换发光测试及光谱参数计分析认为Er³⁺/Yb³⁺离子的掺杂浓度比为1:1的情况下, 样品呈现绿色上转换发光光谱; 可尝试以降低基质声子能量的方法提高⁴I_13/2能级 对²H_11/2和⁴S_3/2能级的量子剪裁效率.     

钬铥双掺钨酸镱钾激光晶体光谱参数计算

采用顶部籽晶提拉法（TSSG）生长了钬铥双掺钨酸镱钾（KHo_0.04Tm_0.06Yb_0.9（WO₄）₂）激光晶体。测试了该晶体的吸收及荧光光谱,计算了其光谱参数。实验结果表明：该晶体在890~1 000 nm范围吸收带较宽,半峰宽为90 nm,计算了主峰1 000 nm处吸收截面为16.92×10^-20 cm²;Tm³⁺在1 690~1 812 nm范围存在较宽的吸收带,半峰宽为118 nm,易于实现Yb→Ho、Yb→Tm、Tm→Ho的能量传递。根据Judd-Ofelt理论,计算了该晶体的光谱强度参数。根据Tm³⁺、Ho³⁺、Yb³⁺离子能级图,讨论了产生1 750~2 200 nm荧光发射的3种能量传递方式。最后计算了主峰2 030 nm处受激发射截面为3.47×10^-20 cm²,表明该晶体可作为2 μm波段优异的激光增益介质。     

ZBLAN玻璃中Pr3+掺杂离子3P0和1D2能级的发光特性和寿命

对ZBLAN氟锆酸盐玻璃中Pr³⁺掺杂离子³P₀和¹D₂能级的寿命和发光特性进行了较详细的光谱学研究。首先测量了两种掺杂浓度(质量分数分别为1×10^-3,5×10^-3)的Pr³⁺:ZBLAN玻璃的吸收光谱,然后运用时间分辨激光光谱技术测量了³P₀和¹D₂能级在激光单光子共振激发下的荧光发射谱和能级寿命。将不同荧光发射谱带的强度和文献报道的Judd Ofelt理论计算辐射跃迁几率数值做了比较分析,证明了文献中理论计算结果的可靠性。由于浓度猝灭效应,在相同的激发条件下,掺杂浓度为1×10^-3样品的荧光发射强度明显大于5×10^-3样品的荧光发射强度。但是从我们的测量结果看,掺杂浓度对³P₀和¹D₂ 的能级寿命值无显著影响。掺杂浓度为1×10^-3时,Pr³⁺离子³P₀和¹D₂能级的寿命值分别为46,322μ_s。     

片上制备横向结构ZnO纳米线阵列紫外探测器件

将纳米技术与传统的微电子工艺相结合, 片上制备了横向结构氧化锌(ZnO)纳米线阵列紫外探测器件, 纳米线由水热法直接自组织横向生长于叉指电极之间, 再除去斜向的多余纳米线, 其余工艺步骤与传统工艺相同. 分别尝试了铬(Cr)和金(Au)两种金属电极的器件结构: 由于Cr电极对其上纵向生长的纳米线有抑制作用, 导致横向生长纳米线长度可到达对侧电极, 光电响应方式为受表面氧离子吸附控制的光电导效应, 光电流大但增益低, 响应速度慢, 经二次电极加固, 纳米线根部与电极金属直接形成肖特基接触, 光电响应方式变为光伏效应, 增益和速度得到了极大改善; 由于Au电极对其上纵向生长的纳米线有催化作用, 导致溶质资源的竞争, 相同时间内横向生长的纳米线不能到达对侧, 而是交叉桥接, 但却形成了紫外光诱导的纳米线间势垒结高度调控机理, 得到的器件特性为最优, 在波长为365 nm的20 mW/cm²紫外光照下, 1 V电压时暗电流为10^-9 A, 光增益可达8×10⁵, 响应时间和恢复时间分别为1.1 s和1.3 s.     

基于窄带隙聚合物的高性能可见-近红外光伏探测器

聚合物光伏探测器是一种极具应用前景的新型光电探测器件.研究了基于窄带隙聚合物的高性能可见-近红外光伏探测器,结果表明,所制备的光伏探测器在可见至近红外光谱范围内具有宽的光谱响应(380—960 nm)、出色的响应度(840 nm时达到380 mA/W)和归一化探测度;同时,器件在暗态反偏条件下的能级示意图揭示了器件内平均电场较低是较厚光敏层器件具有低噪声电流的主要原因.电容-电压与时间周期性响应曲线研究表明聚合物光伏探测器具有快速的响应能力和良好的周期重复性.     

薄膜厚度对射频磁控溅射β-Ga2O3薄膜光电性能的影响

本文在室温下利用射频磁控溅射技术在(001)蓝宝石衬底上制备了不同厚度的β-Ga₂O₃薄膜,随后将其置于氩气气氛中800℃退火1 h.利用XRD,SEM,UV-Vis分光光度计、PL光致发光光谱仪和Keithley 4200-SCS半导体表征系统等考察薄膜厚度对所得氧化镓薄膜相组成、表面形貌、光学性能以及光电探测性能的影响.结果表明,随着薄膜厚度的增加,薄膜结晶质量提高,840 nm薄膜最佳,1050 nm薄膜结晶质量略有降低.不同厚度β-Ga₂O₃薄膜在波长200—300 nm日盲区域内均具有明显的紫外光吸收,禁带宽度随着薄膜厚度的增加而增加.PL谱中各发光峰峰强随着薄膜厚度的增加而减小,表明氧空位及其相关缺陷受到抑制.在β-Ga₂O₃薄膜基础上制备出日盲紫外光电探测器的探测性能(光暗电流比,响应度,探测率,外量子效率)也随薄膜厚度的增加呈先增后减的趋势.厚度约为840 nm的β-Ga₂O₃紫外光电探测器,在5...