多层介质膜脉冲压缩光栅近场光学特性分析

利用傅里叶模式理论分析了TE波自准直角入射的使用条件下，多层介质膜光栅的光栅区和多层膜区电场分布的特点.分别讨论了HfO₂和SiO₂为顶层光栅材料时，光栅结构参数对光栅脊峰值电场的影响，结果表明，对于不同膜厚的顶层材料，存在一个最佳膜厚度，使光栅脊峰值电场最小，并且当膜厚增大时，设计大高宽比的光栅可以降低该电场峰值.最后，在大角度条件下使用多层膜光栅也可以降低光栅脊处的峰值电场. 关键词： 衍射光学 多层介质膜光栅 模式理论 损伤阈值     

Design of High-Efficiency Diffraction Gratings Based on Rigorous Coupled-Wave Analysis for 800nm Wavelength

We report on the design of a high diffraction efficiency multi-layer dielectric grating with wide incident angle and broad bandwidth for 80Ohm. The optimized grating can achieve 〉 95% diffraction efficiency in the first order at an incident angle of 5° from Littrow and a wavelength from 77Ohm to 83Ohm, with peak diffraction efieieney of 〉 99.5% at 80Ohm. The electric field distribution of the optimized multi-layer dielectric grating within the gratings ridge is 1.3 times enhancement of the incidence light, which presents potential high laser resistance ability. Because of its high-effieieney, wide incident, broad bandwidth and potential high resistance ability, the multi-layer dielectric grating should have practical application in Ti：sapphire laser systems.     

Near-field optical properties of wide bandwidth metal multi-layer dielectric gratings for pulse compressor

Metal multi-layer dielectric gratings (MMDG) for pulse compressors in high-energy laser systems should provide broad bandwidth as well as high laser-induced damage thresholds. The non-uniform optical near-field distribution of MMDG is an important factor that limits damage resistant capabilities. MMDG for pulse compressors operating at 800 nm with a corrugated SiO₂ layer are designed by using a genetic algorithm and the Fourier mode method. The diffraction efficiency, bandwidth, and near-field distribution of the MMDG are theoretically investigated. For the single dielectric match layer grating, the bandwidth is 140 nm, if the thickness and refractive index of the match layer are changed, the maximum electric field in the grating ridge, match layer, and metal layer of the grating increases with the decrease in grating diffraction efficiency. For the multi-dielectric match layer grating, the bandwidth and the maximum electric field in the metal layer decrease with the increase in high- and low-index material pairs, and the maximum electric field in the grating ridge and match layer initially decreases and then increases. Over a wide wavelength range, the maximum electric field in the grating ridge, match layer, and metal layer is minimal near the central wavelength. Moreover, MMDG should be used at larger incident angles while keeping enough bandwidth to reduce the electric field in the grating.     

Design of high-efficiency diffraction gratings based on total internal reflection for pulse compressor

We present designs of high-efficiency compression grating based on total internal reflection (TIR) for picosecond pulse laser at 1053 nm. The setup is devised by directly etching gratings into the bottom side of a prism so that light can successfully enter (or exit) the compression grating. Dependence of the −1 order diffraction efficiencies on the constructive parameters is analyzed for TE- and TM-polarized incident light at Littrow angle by using Fourier modal method in order to obtain optimal grating structure. The electric field enhancement within the high-efficiency TIR gratings is regarded as another criterion to optimize the structure of the TIR gratings. With the criterion of high diffraction efficiency, low electric field enhancement and sufficient manufacturing latitude, TIR compression gratings with optimized constructive parameters are obtained for TE- and TM-polarized incident light, respectively. The grating for TE-polarized light exhibits diffraction efficiencies higher than 0.95 within 23 nm bandwidth and relatively low square of electric field enhancement ratio of 5.7. Regardless of the internal electric field enhancement, the grating for TM-polarized light provides diffraction efficiencies higher than 0.95 within 42 nm bandwidth. With compact structure, such TIR compression gratings made solely of fused silica should be of great interest for application to chirped pulse amplification (CPA) systems.     

多层介质膜脉宽压缩光栅的严格矢量分析

用于展宽和压缩激光脉冲的多层膜脉宽压缩光栅是由多层介质高反膜和位于其顶层的浮雕光栅构成。以设计的高反射多层膜为基础,利用傅里叶模式理论分析了其衍射场分布,给出了TE波自准直角入射的使用条件下,多层介质膜脉宽压缩光栅衍射效率的表达式。以-1级衍射效率为评价函数,分别讨论了HfO2和SiO2为顶层材料时,多层膜脉宽压缩光栅-1级衍射效率高于0.95的光栅结构参量范围。结果表明,在该条件下,选择HfO2为顶层材料时,光栅结构参量有较大的取值范围。给出了优化的光栅结构参量,并分析了光栅制作误差及其使用条件的宽容度,对光栅制作工艺和使用具有一定的指导意义。     

Optimization of thin-film design for multi-layer dielectric grating

Thin-film design used to fabricate multi-layer dielectric (MLD) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the MLD grating achieve both high diffraction efficiency and low electric field enhancement. Based on a (HLL)⁹H design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum MLD coating meeting these requirements by inserting a matching layer being half a quarter-wave of Al₂O₃ between the initial design and an optimized HfO₂ top layer. The optimized MLD coatings exhibits a low reflectance of 0.017% under photoresist at the exposure angle of 17.8° for 413 nm light and a high reflectance of 99.61% under air at the use angle of 51.2° for 1053 nm light. Numerical calculation of intensity distribution in the photoresist coated on the MLD film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. Furthermore, a MLD gratings with grooves etched into the top layer of this MLD coating provides a high diffraction efficiency of 99.5% and a low electric field enhancement ratio of 1.53. This thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation.     

全内反射式衍射光栅近场光学特性

 利用傅里叶模式理论分析了具有高衍射效率的全内反射式衍射光栅在TE 和TM偏振态下的近场光分布特点，讨论了光栅结构参数以及入射角度对光栅内电场增强的影响。结果表明：全内反射光栅内部电场分布对偏振态较敏感，光栅槽深和占宽比对电场增强影响较小，光栅内的峰值电场随光栅周期增大而增大，并且峰值电场随着入射角度的增大而减小。在应用于高功率激光时，降低光栅内部的电场增强可以有效降低损伤风险。     

Light diffraction on acoustophotorefractive holographic gratings

The intermediate regime of light diffraction on acoustophotorefractive holographic gratings written in cubic photorefractive crystals according to the synchronous-detection mechanism is studied. It is shown that the diffraction efficiency in sillenite-type gyrotropic crystals only slightly depends on the incident light polarization and the external electric field. The highest diffraction efficiency in nongyrotropic crystals was achieved for p-polarized writing and reading light and at a considerable external electric field strength.     

Effects of thermal treatment on femtosecond laser fabricated diffraction gratings in polystyrene

We report the fabrication of efficient, buried diffraction gratings and micro-craters in bulk polystyrene using femtosecond laser direct writing technique. We recorded a maximum diffraction efficiency of 10% for a buried grating fabricated at 1 μJ energy, 1 mm/s speed, and a period of 30 μm. Buried micro-craters, with typical dimensions of ∼2 μm, were achieved at low energies and high scanning speeds. From the field emission scanning electron microscope studies, the observed emission is attributed as due to the inner surface modifications and the debris settled around the voids. The fabricated gratings subjected to heat treatment were tested for the diffraction efficiency and emission at different excitation wavelengths and the observed results are presented. Raman spectra collected from the femtosecond laser modified regions revealed the disappearance of few Raman modes at high peak intensities associated with incident Gaussian laser pulse. Potential applications of these luminescent micro-craters are highlighted.     

Numerical simulation of the modulation to incident laser by the repaired damage site in a fused silica subsurface

One of the main factors of laser induced damage is the modulation to incident laser which is caused by the defect in the subsurface of the fused silica.In this work,the repaired damage site irradiated by CO 2 laser is simplified to a Gaussian rotation according to the corresponding experimental results.Then,the three-dimensional finite-difference time-domain method is employed to simulate the electric field intensity distribution in the vicinity of this kind of defect in fused silica front subsurface.The simulated results show that the modulation is notable,the E max is about 2.6 times the irradiated electric field intensity in the fused silica with the damage site (the width is 1.5 μm and depth is 2.3 μm) though the damage site is repaired by CO 2 laser.The phenomenon and the theoretical result of the annular laser enhancement existed on the rear surface are first verified effectively,which agrees well with the corresponding experimental results.The relations between the maximal electric field intensity in fused silica with defect depth and width are given respectively.Meanwhile,the corresponding physical mechanism is analysed theoretically in detail.     

A detailed study of metallic surface-relief grating

This paper presents a more detailed interaction of an electromagnetics light with a metallic surface-relief subwavelength grating utilizing the rigorous coupled-wave analysis. The focus of this work is the accurate modeling of undetermined aspects of diffraction patterns produced by binary metallic grating structures, specially gold grating. First-order diffraction efficiency for rectangular-groove gold grating with equal groove and ridge widths are presented for various wavelengths as a function of period, groove depth, polarization and angle of incidence. We also studied diffraction efficiency of both of TE and TM polarization modes against increasing of incident angle as well as TE polarization against increment of grating period. As a result, very low reflectivity at zero-order was found out for TE and TM polarizations at the pitch of Λ = 2λ. Having been studied diffraction efficiency of metallic surface-relief gratings, we also examined polarization-dependent efficiency of diffraction orders, for different groove depths. Simulation results have been completely presented.     

大角带宽高衍射效率体全息光栅的设计和制备

高性能体全息光栅是全息波导的重要耦合元件,角带宽小、平均衍射效率不高是制约体全息光栅性能的重要因素.以不对称倾斜记录为出发点,设计并制备了大角带宽高衍射效率的体全息光栅.首先讨论在横电模式光和横磁模式光下体全息光栅的记录参数与其衍射效率的关系,找到平均衍射效率较高的记录参数范围,随后进一步分析在此范围内的记录参数与体全...     

Nonlinear diffraction in gratings based on polymer–dispersed TiO 2 nanoparticles

In this letter we report a simple technique to produce volume holographic gratings based on photopolymerizable composites containing TiO₂ nanoparticles. Diffraction gratings with high refractive index modulation amplitude (up to 1.25 × 10⁻²) have been formed due to the periodic distribution of high refractive index nanoparticles in a low refractive index polymer matrix. The diffraction efficiency increases strongly on increasing the nanoparticle concentration. Taking the mixture with 10 wt.% TiO₂ nanoparticles, gratings with high diffraction efficiency, low level of scattering and high transparency in the visible-wavelength range have been obtained. This will ultimately lead to different applications of diffractive optical elements based on nanocomposites. The dependence of the gratings’ diffraction efficiency on the intensity of probe laser pulses at 1064 nm has been explored. It is shown that the nonlinear response of the gratings is attributed mainly to the nonlinear properties of the TiO₂ nanoparticles embedded in the polymer matrix. The mechanism of the grating formation and the reasons for the nonlinear behavior of the diffraction efficiency are discussed.     

电场的增强作用对介质膜光栅损伤形貌的影响

研究了电场在介质膜光栅结构中的增强效应对其抗激光损伤阈值的影响.使用傅里叶模式方法计算了电场在介质膜光栅浮雕结构内的分布.数值分析表明：电场在介质膜光栅中增强的最大值为入射光的2倍,其最大的位置出现在相对于入射光对面的光栅槽侧壁。实验测试介质膜光栅样品在1 064 nm和12 ns, 51.2°和TE偏振光入射时,其抗激光损伤阈值为6.61 J/cm2.对损伤形貌进行扫描电镜精确分析,发现介质膜光栅的初始损伤产生于电场在介质膜光栅内增强最大的位置处.     

Theoretical and experimental research on spectral performance and laser induced damage of Brewster's thin film polarizers

Polarizers respectively with broad polarizing region bandwidth, large layer thickness error tolerance and high extinction ratio are designed and prepared. Transmittance spectra of the prepared samples are measured at Brewster's angle, and the results show that different requirements can be fulfilled by optimized designs. Spectral performance of designs with higher layer thickness error tolerance coincides better with the theoretical spectra. Laser induced damage threshold of the prepared samples are evaluated. Electric field distribution, defect, film absorption, and damage morphology are investigated, and the results indicate that electric field distribution in high index layers is the main reason that causes the difference of laser induced damage threshold. For both p polarized and s polarized light, the lower the electric field peak value and the farther the layer, which has the strongest electric field away from air, the higher the laser induced damage threshold.     

Photorefractive optical properties of volume phase gratings induced in sillenite crystals, when the grating vector lies on the (111) plane

We study the diffraction efficiency of volume phase gratings in Bi₁₂GeO₂₀, when the grating vector, lying on a (111) plane, is at an angle with respect to the crystallographic direction. An external bias field parallel to the direction is applied during recording, thus, the recording conditions depend on the grating vector orientation. The basic parameters determining the diffraction efficiency are the grating vector orientation, the rotatory power and the field-induced linear birefringence (primary and secondary). Analytic expressions for the diffraction efficiency have been obtained by taking into account all the above-mentioned parameters, provided that linearly polarized light is incident on the crystal. In this configuration, the influence of the secondary electro-optic effect (inverse piezoelectric and photoelastic effects) to the diffraction efficiency is actually stronger than the influence of the primary effect. Experimental results are given. Received: 3 January 2000 / Revised version: 6 June 2000 / Published online: 13 September 2000     

激光束在LiNbO3:Fe晶体中的异常衍射现象(Ⅰ)——e光入e光出的衍射

根据的相位光栅各向异性衍射理论,应用顾世杰、李荫远发展的方法,对于激光束在厚的LiNbO₃:Fe晶体(厚度≈1cm)中的异常衍射现象作了计算。如果晶体中被照射后有无规的电荷富集分布,则Fourier分解后可得到无穷个相位光栅,衍射图形决定于光栅的衍射效率。计算结果表明,对e光入e光出的衍射图形,可以解释中央光斑(由透镜效应所决定)两边的光瓣。结果与实验基本符合。 关键词：     

基于严格耦合波理论的多层介质膜光栅衍射特性分析

基于严格耦合波理论建立了多层介质膜光栅的衍射机理模型,给出了TE波自准直条件下多层介质膜光栅衍射效率的表达式.以－1级衍射效率为评价函数,分析了表面浮雕结构分别为HfO₂和SiO₂材料的介质膜光栅获得衍射效率优于96%的结构参数.数值计算表明,顶层材料为HfO₂的介质膜光栅具有更宽的结构选择范围.最后分析了介质膜光栅的制备容差和允许的入射角度范围. 关键词： 衍射效率 多层介质膜光栅 严格耦合波理论     

LiKSO4单晶体内体位相光栅引起的光衍射现象

本文报道光通过LiKSO₄单晶体产生的有规律性的衍射现象,衍射环和衍射带。观察了不同实验条件对衍射现象的影响,可以肯定这些现象是波矢k垂直于c轴的体位相光栅所产生。伴随衍射环内外各出现副环的来源尚未能理解。 关键词：     

用于高能啁啾脉冲压缩的光子晶体光栅的设计

 为了克服目前高能短脉冲装置压缩光栅的损伤阈值无法满足要求的问题,针对星光Ⅲ装置皮秒激光束的压缩器,设计了由熔石英材料构成的、具有较高损伤阈值的光子晶体光栅,该光栅由2维光子晶体和表面光栅结构两部分组成,具有高反射效率和强角色散的能力。计算结果显示:经过优化设计的光子晶体光栅在波长1 053 nm,57°～77°的入射范围内,-1级衍射效率超过了92%,而当入射角为71°时,在1 040～1 090 nm光谱范围内,-1级衍射效率超过92%,性能满足使用要求。