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Graded index broadband antireflection coating prepared by glancing angle deposition for a high-power laser system 下载免费PDF全文
This paper reports that SiO2 is selected to fabricate
broadband antireflection (AR) coatings on fused silica substrate by
using glancing angle deposition and physical vapour deposition.
Through accurate control of the graded index of the SiO2 layer,
transmittance of the graded broadband AR coating can achieve an average
value of 98% across a spectral range of 300--1850~nm. Moreover,
a laser-induced damage threshold measurement of the fabricated AR
coating is performed by using a one-on-one protocol according to
ISO11254-1, resulting in an average damage threshold of
17.2~J/cm$^{2}$. 相似文献
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基于啁啾脉冲放大技术的超短脉冲激光系统是提供超快、超强激光的重要途径,具有良好输出波形和高损伤阈值的多层介质膜脉冲宽度压缩光栅是获得高峰值功率脉冲激光的关键. 基于傅里叶谱变换方法和严格模式理论,分析了多层介质膜光栅(MDG)在超短脉冲作用下的光学特性. 结果表明,当MDG的反射带宽小于具有高斯分布的入射脉冲的频谱宽度时,-1级反射脉冲呈非对称高斯分布,其前沿出现振荡,并且-1级反射脉冲能量开始剧烈下降. 讨论了MDG结构参数对其反射带宽的影响. 分析了MDG与超短脉冲作用时的近场光分布,对提高其抗激光损
关键词:
脉冲压缩光栅
傅里叶谱变换
模式理论
损伤阈值 相似文献
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以薄膜光学的干涉理论和衍射光学的傅里叶模式理论为基础,给出了0.8μm飞秒激光器用多层介质膜脉宽压缩光栅的理论设计;设计采用H3L(HL)^9H0.5L2.4H的多层介质膜为基底,当刻蚀后表面浮雕结构的占宽比为0.35,线密度为1480线/mm,槽深为0.2μm,顶层HfO2的剩余厚度为0.15μm时,对于Littrow角度(36.7°)和TE波模式入射的衍射光栅其-1级衍射效率达到95%以上.
关键词:
飞秒激光
脉宽压缩光栅
多层介质膜 相似文献
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Modelling Analysis of Influence of Substrate Surface Defect on Optical Characteristics of Single-Layer Coating 下载免费PDF全文
A simple and practical model is used to analyse the influence of substrate surface defect on the optical characteristics of a single-layer coating. A single-layer coating is prepared and its optical properties are fitted. Some explanations for the origin of the transition layer are presented. It is concluded that there is a transition layer forming between the substrate and coating, which is attributed to substrate surface defects, and its refractive index change is nearly of linearity. 相似文献
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用于展宽和压缩激光脉冲的多层膜脉宽压缩光栅是由多层介质高反膜和位于其顶层的浮雕光栅构成。以设计的高反射多层膜为基础,利用傅里叶模式理论分析了其衍射场分布,给出了TE波自准直角入射的使用条件下,多层介质膜脉宽压缩光栅衍射效率的表达式。以-1级衍射效率为评价函数,分别讨论了HfO2和SiO2为顶层材料时,多层膜脉宽压缩光栅-1级衍射效率高于0.95的光栅结构参量范围。结果表明,在该条件下,选择HfO2为顶层材料时,光栅结构参量有较大的取值范围。给出了优化的光栅结构参量,并分析了光栅制作误差及其使用条件的宽容度,对光栅制作工艺和使用具有一定的指导意义。 相似文献