Transient optical properties in fused silica measured by time-resolved high-power laser photometer

A time-resolved high-power laser photometer, which measures the real-time variations of transmission, internal reflection, and scattering simultaneously with picosecond time resolution, was developed to investigate the material response sequence during high-power nanosecond laser irradiation in thick fused silica. It was found that the transient transmission decreased sharply, accompanied by an increase in internal reflection at the rising edge of the laser pulse. The transient transmission recovered, while laser damage did not occur, but it did not recover if the scattering increased, indicating the occurrence of laser damage. The reason for the sharp decrease of transmission and the relationship between the transmission drop and laser damage were discussed.     

Accumulation effect of SiO_2 protective layer on multi-shot laser-induced damage in high-reflectivity HfO_2/SiO_2 coatings

The accumulation effects in high-reflectivity(HR) HfO2/SiO2 coatings under laser irradiation are investigated.The HR HfO2/SiO2 coatings are prepared by electron beam evaporation at 1 064 nm.The laser-induced damage threshold(LIDT) are measured at 1 064 nm and at a pulse duration of 12 ns,in 1-on-1 and S-on-1 modes.Multi-shot LIDT is lower than single-shot LIDT.The laser-induced and native defects play an important role in the multi-shot mode.A correlative theory model based on critical conduction band electron density is constructed to elucidate the experimental phenomena.     

Preparation of high performance thin-film polarizers

<正>The optical performance of thin film polarizers is highly sensitive to the layer thicknesses of thin film.The thicknesses of the sensitive layers are optimized in order to gain broader polarizing zone in such case when the total layer thickness does not increase.An automatic layer thickness control system is established,and errors caused by different monitoring methods are analyzed.With this thickness control system,thin-film polarizers with T_p higher than 98%and T_p/T_s higher than 200:1(T_p and T_s are transmissions for p- and s-polarizations,respectively) with the bandwidth of 11 nm are prepared.Using the system allows for optimum repeatability of three successive runs.     

脉冲激光辐照光学薄膜的缺陷损伤模型

建立了缺陷吸收升温致薄膜激光损伤模型,该模型从热传导方程出发,考虑了缺陷内部的温度分布以及向薄膜的传导过程,通过引入散射系数简化了Mie散射理论得出的吸收截面.对电子束蒸发沉积的ZrO₂:Y₂O₃单层膜进行了激光破坏实验,薄膜样品的损伤是缺陷引起的,通过辉光放电质谱法对薄膜制备材料的纯度分析发现材料中的主要杂质元素为铂,其含量为0.9％.利用缺陷损伤模型对损伤过程进行了模拟,理论模型和实验结果取得了较好的一致性.     

Influence of Different Substrates on Laser Induced Damage Thresholds at 1064nm of Ta2O5 Films

Ta2O5 films are prepared on Si, BK7, fused silica, antireflection （AR） and high reflector （HR） substrates by electron beam evaporation method, respectively. Both the optical property and laser induced damage thresholds （LIDTs） at 1064 nm of Ta2O5 films on different substrates are investigated before and after annealing at 673 K for 12 h. It is shown that annealing increases the refractive index and decreases the extinction index, and improves the O/Ta ratio of the Ta2O5 films from 2.42 to 2.50. Moreover, the results show that the LIDTs of the Ta2O5 films are mainly correlated with three parameters： substrate property, substoichiometry defect in the films and impurity defect at the interface between the substrate and the films. Details of the laser induced damage models in different cases are discussed.     

Design of wideband graded-index antireflection coatings at oblique light incidence

We suggest a design method of graded-refractive-index (GRIN) antireflection (AR) coating for s-polarized or p-polarized light at off-normal incidence. The spectrum characteristic of the designed antireflection coating with a quintic effective refractive-index profile for a given state of polarization has been discussed. In addition, the genetic algorithm was used to optimize the refractive index profile of the GRIN antireflection for reducing the mean reflectance of s- and p-polarizations. The average reflectance loss was reduced to only 0.04% by applying optimized GRIN AR coatings onto BK7 glass over the wavelength range from 400 to 800 nm at the incident angle of θ₀ =70°.     

Effect of Microstructure of TiO2 Thin Films on Optical Band Gap Energy

TiO2 coatings are prepared on fused silica with conventional electron beam evaporation deposition. After annealed at different temperatures for four hours, the spectra and XRD patterns of TiO2 thin film are obtained. XRD patterns reveal that only anatase phase can be observed in TiO2 coatings regardless of the different annealing temperatures, and with the increasing annealing temperature, the grain size gradually increases. The relationship between the energy gap and microstructure of anatase is determined and discussed. The quantum confinement effect is observed that with the increasing grain size of TiO2 thin film, the band gap energy shifts from 3.4 eV to3.21 eV. Moreover, other possible influence of the TiO2 thin-film microstructure, such as surface roughness and thin film absorption, on band gap energy is also expected.     

窄带干涉滤光片抗击不同输出方式激光的损伤特性研究

利用Nd∶YAG调Q单脉冲激光和自由脉冲激光对硬膜窄带干涉滤光片进行激光损伤阈值的测试，并且采用表面热透镜技术测量了滤光片的吸收率。实验发现:窄带干涉滤光片的吸收率和激光损伤阈值强烈依赖于辐照激光波长与窄带干涉滤光片通带的相对位置；在调Q单脉冲激光作用下，不同中心波长的滤光片损伤形貌存在明显的差别，而在自由脉冲激光作用下，各滤光片的损伤形貌则趋于相同，均表现为典型的热熔烧蚀破坏。根据实验结果，结合损伤形貌，通过驻波场理论对激光作用下滤光片内电场分布的分析与模拟，探讨了两种激光模式作用下滤光片的损伤特征和损伤机理的不同特点。     

沉积温度对HfO2薄膜残余应力的影响

 用电子束蒸发方法制备了HfO₂薄膜，根据镀膜前后基片曲率半径的变化，用Stoney公式计算了薄膜应力，讨论了沉积温度对薄膜残余应力的影响。结果发现，HfO₂薄膜的残余应力均为张应力，应力值随沉积温度的升高先增大后减小，在280 ℃左右出现极大值。对样品进行了XRD测试，从微观结构上对实验结果进行了分析，发现微结构演变引起的内应力变化是引起薄膜残余应力改变的主要因素，HfO2薄膜在所选沉积温度60~350 ℃内出现了晶态转变，堆积密度随温度升高而增大。     

Antireflective characteristics of triangular shaped gratings

It is well known that conventional multi-layers are oftenused for antireflective coatings[1,2]. There are, however,only a handful of optical materials available, thus limit-ing the performance that could ideally be achieved. Onthe other hand, sub-wavelength structure surfaces, whichare surface-relief gratings with periods smaller than theincident wavelength, have been researched and foundto have antireflective properties[3,8]. Compared withstandard optical thin-film coating technologies, the h…