不同厚度溅射Ag膜的微结构及光学常数研究

用直流溅射法在室温Si基片上制备了4．9nm-189.0nm范围内不同厚度的Ag薄膜，并用X射线衍射及反射式椭偏光谱技术对薄膜的微结构和光学常数进行了测试分析。结构分析表明：制备的Ag膜均呈多晶状态，晶体结构仍为面心立方；随膜厚增加薄膜的平均晶粒心潮6．3nm逐渐增大到14．5nm；薄膜晶格常数均比标准值（0．40862nm)稍小，随膜厚增加，薄膜晶格常数由0．40585nm增大到0.40779nm。250nm-830nm光频范围椭偏光谱测量结果表明：与Johnson的厚Ag膜数据相比，我们制备的Ag薄膜光学折射率n总体上均增大，消光系数k变化复杂；在厚度为4．9nm-83.7nm范围内，实验薄膜的光学常数与Johnson数据差别很大，厚度小于33．3nm的实验薄膜k谱线中出现吸收峰，峰位由460nm红移至690nm处，且其对应的峰宽逐渐宽化；当膜厚达到约189nm时，实验薄膜与Johnson光学常数数据已基本趋于一致。     

采用椭偏法结合分光光度法研究极薄银的光学常数

极薄银在滤光片、高反射镜等中有广泛的应用,其光学常数严重影响着膜系的特性。在室温条件下,采用电阻热蒸发技术分别在硅和玻璃基底上沉积5.3 nm~26 nm不同厚度的极薄银薄膜,用TalySurfCCI非接触式轮廓仪测量了薄膜的厚度,研究了不同厚度银薄膜的光学常数n和k。镀制厚度5.3 nm、7.9 nm、14.1 nm、26.0 nm的银薄膜,结果显示极薄银的光学常数与块状银光学常数不同,当膜厚小于14.1 nm时,折射率n在380 nm~600 nm随波长增加而增加,在600 nm~1 600 nm随波长增加缓慢减小至趋于稳定值2.6;消光系数k在380 nm~500 nm随着波长增加而增加,在500 nm~1 600 nm随波长增加而缓慢减小至趋于0不变;当膜厚大于14.1 nm时,折射率随波长增加而增加,消光系数随波长近似呈线性增加。整体上,膜厚增加时折射率减小且趋于块状银的折射率,k随厚度增加而增加并最终趋于块状膜。用此拟合的光学常数代入TFc膜系设计软件计算其透射率,发现与分光光度计测得的透射率吻合较好。     

磁控溅射制备铬薄膜的结构和光电学性质(英文)

用直流磁控溅射技术在石英基片上制备不同厚度(5nm～114nm之间)的铬膜.使用X射线衍射仪和分光光度计分别检测薄膜的结构和光学性质,利用德鲁特模型和薄膜的透射、反射光谱计算铬膜的厚度和光学常量,并采用Van der Pauw方法测量薄膜电学性质.结果表明:制备的铬薄膜为体心立方的多晶态,随着膜厚的增加,薄膜的结晶性能提高,晶粒尺寸增大;在可见光区域,当膜厚小于32nm时,随着膜厚的增加,折射率快速减小,消光系数快速增大,当膜厚大于32nm时,折射率和消光系数均缓慢减小并逐渐趋于稳定;薄膜电阻率随膜厚的增加为一次指数衰减.     

磁控溅射制备铬薄膜的结构和光电学性质

用直流磁控溅射技术在石英基片上制备不同厚度(5 nm~114 nm之间)的铬膜.使用X射线衍射仪和分光光度计分别检测薄膜的结构和光学性质,利用德鲁特模型和薄膜的透射、反射光谱计算铬膜的厚度和光学常量,并采用Van der Pauw方法测量薄膜电学性质.结果表明:制备的铬薄膜为体心立方的多晶态,随着膜厚的增加,薄膜的结晶性能提高,晶粒尺寸增大;在可见光区域,当膜厚小于32 nm时,随着膜厚的增加,折射率快速减小,消光系数快速增大,当膜厚大于32 nm时,折射率和消光系数均缓慢减小并逐渐趋于稳定;薄膜电阻率随膜厚的增加为一次指数衰减.     

膜层厚度对金属薄膜光学常数的影响

从麦克斯韦方程出发,可以得到超薄金属膜层光学常数n、k与其厚度有关系的理论依据。采用电阻热蒸发和电子束热蒸发的方法在K9玻璃基底上分别沉积了不同厚度的Cu膜、Cr膜、Ag膜,由椭偏法检测、Drude模型拟合,获得了不同厚度Cu膜、Cr膜、Ag膜光学常数n、k随波长λ的变化规律。超薄金属薄膜与块状金属的光学常数相差较大,随着薄膜厚度的增加,n、k值趋近于块状金属。通过对样品膜层吸收、色散特性的分析,发现连续金属薄膜在可见光波段对长波的吸收较大,而且相比于介质薄膜平均色散率高10mn～102nm量级。     

近红外波段锑基铋掺杂薄膜厚度对光学常数与光学带隙的影响

采用磁控溅射法制备了不同厚度的锑基铋掺杂薄膜,用X射线衍射(XRD)和透射电子显微镜(TEM)研究了薄膜结构随厚度的变化。利用椭圆偏振法测定了样品薄膜在近红外波段的光学常数与光学带隙,研究了膜厚对样品薄膜光学常数和光学带隙的影响。结果表明,膜厚从7 nm增加至100 nm时,其结构由非晶态转变为晶态。在950～2200 nm波段,不同厚度薄膜样品的折射率在4.6～8.9范围,消光系数在0.6～5.8范围,光学带隙在0.32～0.16 eV范围。随着膜厚的增加,薄膜的折射率和光学带隙减小,而消光系数升高;光学常数在膜厚50 nm时存在临界值,其原因是临界值前后薄膜微观结构变化不同。     

超薄Ag膜的椭偏光谱建模及解谱

用直流溅射法制备了6个不同厚度的超薄Ag膜。结合超薄Ag膜的结构特点,采用了Drude模型联合Lorentz Oscillator模型的解谱方法,得到1～6号样品的厚度分别为4.0,6.2,12.5,26.2,30.0和40.6 nm。从拟合结果的消光系数k图谱中发现,在1号到4号样品中分别于430,450,560和570 nm处出现了表面等离子体共振峰(SPR),随膜厚的增加共振峰宽化且峰位红移。最后,利用SPR理论计算出不同厚度Ag薄膜等离子体共振峰出现的位置,并和实验结果进行了比较。     

溅射气压对Ge2Sb2Te5薄膜光学常数的影响

实验研究了氩气气压对溅射制备的Ge2 Sb2 Te5 薄膜的光学常数随波长变化的影响 ,结果表明 :随薄膜制备时氩气气压的增加 ,Ge2 Sb2 Te5 薄膜的折射率n先增大后减小 ,而消光系数k先减小后增大。二者都随波长的变化而变化 ,且在长波长范围变化较大 ,短波长范围变化较小 ,解释了溅射气压对Ge2 Sb2 Te5 薄膜的光学常数影响的机理     

激光致晶态Ag11In12Te26Sb51相变介质光学常量的研究

研究了结晶度对Ag11In12Te26Sb51相变薄膜光学常数的影响。用初始化仪使相变薄膜晶化，改变晶化参量得到不同的结晶度，当转速固定时，随激光功率的增加，折射率基本随之减小，消光系数先是增大，而后减小；当激光功率固定时，随转速的增大，折射率也随之增大，消光系数也是先增大后减小。非晶态与晶态间的变换、薄膜微结构的变化（包括晶型的转变和原子间键合状态的变化）以及薄膜内残余应力的影响Ag11In12Te26Sb51相变薄膜复数折射率的主要原因。测量了单层膜的透过率和CD－RW相变光盘中Ag11In12Te26Sb51薄膜非晶态和晶态的反射率。     

Ag-MgF2复合纳米金属陶瓷薄膜的微结构及吸收光谱特性研究

对用真空蒸发技术制备的Ag-MgF2复合纳米金属陶瓷薄膜（Ag的质量分数为0.15、0.20、0.30）的微结构及吸收光谱特性进行了研究。微结构分析表明薄膜由平均粒径约18nm的fcc-Ag纳米晶粒嵌埋于主要呈非晶态的MgF2基体中所组成。对吸收光谱的研究表明，Ag纳米微粒的表面离子共振吸收峰出现在λ＝412nm-417nm波段范围内。随着Ag组分增加，吸收峰强度下降，呈现轻微红移并且逐渐宽化。     

垂直取向FePt/Ag纳米颗粒薄膜的结构和磁性

用磁控溅射法在单晶MgO(100)基片上制备了［FePt 2 nm/Ag dnm］₁₀多层膜， 经真空热处理后，得到具有高矫顽力的垂直取向L1₀-FePt/Ag颗粒膜.x射线衍射结 果表明，在250 ℃的热基片上溅射，当Ag层厚度d=3—11 nm时，FePt颗粒具有很好的［001］取向，随着Ag层厚度的增加，FePt颗粒尺寸减小.［FePt 2 nm/Ag 9 nm］₁₀经过6 00 ℃真空热处理15 min后，颗粒大小仅约8 nm，垂直矫顽力达到692 kA/m.这种无磁耦合作用的颗粒膜，适合用作超高密度的垂直磁记录介质. 关键词： 磁控溅射 垂直磁记录 纳米颗粒膜 0-FePt/Ag')" href="#">L1₀-FePt/Ag     

磁控溅射制备本征ZnO/Ag/ZnO透明导电薄膜的性质研究

室温下采用射频磁控溅射氧化锌（ZnO）粉末靶、银（Ag）靶,在玻璃衬底上制备ZnO/Ag/ZnO透明导电薄膜。首先,ZnO厚度为30 nm时,改变Ag厚度制备3层透明导电薄膜,研究Ag层厚度及膜层间配比对光电性能的影响;其次,按ZnO∶Ag厚度比为30∶11比例制备不同厚度的3层透明导电薄膜,研究多层厚度对薄膜光电性能的影响。结果表明：Ag厚度为8 nm及11 nm的ZnO/Ag/ZnO表面相对平整,结晶程度较好,在可见光范围内最高透过率达到90%及86%,并且方块电阻为6 Ω/□及3.20 Ω/□,具有优良的光电性;当按配比制备ZnO/Ag/ZnO 3层膜时,增加ZnO厚度对Ag层的增透作用反而减弱,同时增加Ag层厚度也会降低3层薄膜的整体光学性。     

Spatial and energy distribution of Co, Ag and Pt particles in pulsed laser deposition: in view of the fabrication of nanometer multilayer film

The measurement of thickness profiles of films (Co, Ag, Pt) with an ellipsometer, and the time-of-flight measurement, were used to investigate the spatial distribution of laser-ablated Co, Ag and Pt particles. Near a target, the spatial distribution shows the material dependence: it was observed that Co has the broadest distribution, and Ag has the narrowest distribution. However, at a distance far from the target, the distribution becomes independent of the materials. The time-of-flight measurement reveals that the kinetic energy distribution of ions is anisotropic and Co has a less anisotropic distribution than Ag. This study leads us to the optimum conditions for the fabrication of nm multi-layer (ML) films with good quality, which was confirmed by the fabrication of Co/Pt nm ML films. PACS 52.50Jm; 52.70.Nc; 81.15.Fg; 81.16.Mk; 68.65.Ac     

Optical properties and structures of silver thin films deposited by magnetron sputtering with different thicknesses

A series of thin Ag films with different thicknesses grown under identical conditions are analyzed by means of spectrophotometer. From these measurements the values of refractive index and extinction coefficient are calculated. The films are deposited onto BK7 glass substrates by direct current (DC) magnetron sputtering. It is found that the optical properties of the Ag films can be affected by films thickness.Below critical thickness of 17 nm, which is the thickness at which Ag films form continuous films, the optical properties and constants vary significantly with thickness increasing and then tend to a stable value up to about 40 nm. At the same time, X-ray diffraction measurement is carried out to examine the microstructure evolution of Ag films as a function of films thickness. The relation between optical properties and microstructure is discussed.     

The film thickness dependent thermal stability of Al<Subscript>2</Subscript>O<Subscript>3</Subscript>:Ag thin films as high-temperature solar selective absorbers

The monolayer Al₂O₃:Ag thin films were prepared by magnetron sputtering. The microstructure and optical properties of thin film after annealing at 700 °C in air were characterized by transmission electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and spectrophotometer. It revealed that the particle shape, size, and distribution across the film were greatly changed before and after annealing. The surface plasmon resonance absorption and thermal stability of the film were found to be strongly dependent on the film thickness, which was believed to be associated with the evolution process of particle diffusion, agglomeration, and evaporation during annealing at high temperature. When the film thickness was smaller than 90 nm, the film SPR absorption can be attenuated until extinct with increasing annealing time due to the evaporation of Ag particles. While the film thickness was larger than 120 nm, the absorption can keep constant even after annealing for 64 h due to the agglomeration of Ag particles. On the base of film thickness results, the multilayer Al₂O₃:Ag solar selective thin films were prepared and the thermal stability test illustrated that the solar selectivity of multilayer films with absorbing layer thickness larger than 120 nm did not degrade after annealing at 500 °C for 70 h in air. It can be concluded that film thickness is an important factor to control the thermal stability of Al₂O₃:Ag thin films as high-temperature solar selective absorbers.     

ZnO/Ag/ZnO多层结构薄膜的光电性质

通过磁控溅射方法生长了不同银层厚度的ZnO/Ag/ZnO多层结构的薄膜,并对其形貌、光吸收谱、光致发光和光响应特性进行了比较研究.结果表明ZnO薄膜中银薄层的加入使得光致发光的强度增强.银层厚度为6 nm样品制成的器件在350 nm处的光响应度为0.06 A/W,相对于ZnO薄膜提高了一个数量级.而当银层厚度达到15 ...     

Ag-SiO2复合薄膜形貌和吸收特性的研究

通过分层镀膜的方式制备Ag和SiO₂的分层结构，经过快速热退火后，Ag颗粒扩散到复合薄膜的表面附近. 通过改变Ag颗粒扩散的距离(SiO₂的膜厚)，可很好地控制Ag颗粒在复合薄膜表面附近的大小，浓度和形貌，进而对共振吸收特性产生影响. 在实验中，根据Ag颗粒扩散的长度来调节退火的时间. 发现经过足够长的时间(17.5min)后，Ag颗粒会形成平行于衬底的平面团簇. 由于Ag原子在平面团簇之间容易扩散，使得Ag颗粒的粒径平均值变小并趋于某一特定的半径，且粒径分布范围变小，导致吸收谱发生蓝移，吸收带变窄，且强度增加. 关键词： 复合薄膜 共振吸收 平面团簇     

纳米银六角阵列在掺氧氮化硅中的局域表面等离激元共振特性仿真

通过COMSOL Multiphysics 和 Lumerical FDTD solution对不同尺寸纳米银六角阵列在非晶态掺氧氮化硅(a-SiN_x:O)介质中的局域表面等离激元共振(LSPR)特性进行仿真, 计算结果表明半径为25 nm的纳米银六角阵列形成的局域表面等离激元(LSP)与厚度为70 nm的a-SiN_x:O的蓝光发射(460 nm)的共振效果最为显著, 随着纳米银颗粒尺寸的增大其消光共振峰红移. 在460 nm波长激发下半径为25 nm的纳米银阵列在a-SiN_x:O中的极化强度和表面极化电荷的分布模拟证明了该阵列在460 nm激发下形成的LSP为偶极子极化模式, 通过对该尺寸的纳米银阵列的LSP 在a-SiN_x:O中的最强垂直辐射空间计算, 获得了银颗粒上方a-SiN_x:O的最佳厚度为30 nm, 仿真结果对硅基蓝光发射器件(450–460 nm)的设计提供了重要的理论参考.     

The effect of Ag intermediate layer on crystalline, optical and electrical properties of nano-structured thin film

ITO thin films and ITO/Ag/ITO multilayered films were prepared on glass substrate by reactive thermal evaporation technique without intentionally heating the substrate. After deposition the films were annealed in air at three different temperatures (300°C, 420°C and 540°C). The thickness of each layer in the ITO/Ag/ITO films was kept constant at 50 nm/10 nm/40 nm. The opto-electrical and structural properties of ITO/Ag/ITO multilayered films were compared with conventional ITO single-layer films. Although both films had identical thickness, 100 nm, the ITO/Ag/ITO films showed a lower resistivity. XRD spectra showed that Ag intermediate layer had a small effect on crystalline properties of ITO/Ag/ITO films.