| ZnO/Ag/ZnO多层结构薄膜的光电性质 |
| |
| 引用本文： | 郭亮,赵东旭,张振中,李炳辉,张吉英,申德振.ZnO/Ag/ZnO多层结构薄膜的光电性质[J].发光学报,2011,32(9):920-923. |
| |
| 作者姓名： | 郭亮 赵东旭 张振中 李炳辉 张吉英 申德振 |
| |
| 作者单位： | 1. 中国科学院 激发态物理重点实验室 长春光学精密机械与物理研究所, 吉林 长春 130033;
2. 中国科学院 研究生院, 北京 100039 |
| |
| 基金项目： | 中国科学院知识创新工程重要方向项目(KJCX3.SYW.WOI)资助项目 |
| |
| 摘 要： | 通过磁控溅射方法生长了不同银层厚度的ZnO/Ag/ZnO多层结构的薄膜,并对其形貌、光吸收谱、光致发光和光响应特性进行了比较研究.结果表明ZnO薄膜中银薄层的加入使得光致发光的强度增强.银层厚度为6 nm样品制成的器件在350 nm处的光响应度为0.06 A/W,相对于ZnO薄膜提高了一个数量级.而当银层厚度达到15 ...
|
| 关 键 词： | ZnO多层结构 银薄层 光致发光 光响应 |
| 收稿时间： | 2011-03-03 |
Optoelectronic Properties of ZnO/Ag/ZnO Multiple Films |
| |
| GUO Liang,ZHAO Dong-xu,ZHANG Zhen-zhong,LI Bing-hui,ZHANG Ji-ying,SHEN De-zhen.Optoelectronic Properties of ZnO/Ag/ZnO Multiple Films[J].Chinese Journal of Luminescence,2011,32(9):920-923. |
| |
| Authors: | GUO Liang ZHAO Dong-xu ZHANG Zhen-zhong LI Bing-hui ZHANG Ji-ying SHEN De-zhen |
| |
| Institution: | 1. Key Laboratory of Excited State Processes, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China;
2. Graduate School of the Chinese Academy of Sciences, Beijing 100039, China |
| |
| Abstract: | The ZnO/Ag/ZnO multiple films with different thickness of Ag film were grown via magnetron sputtering method. The morphology, optical absorption spectra, photoluminescence and photoresponse properties were studied. The results exhibited that the intensity of photoluminescence was increased with the adding of the Ag film into ZnO film. The photo responsivity was 0.06 A/W at 350 nm when the thickness of the Ag film was 6 nm. Compared with ZnO film this value was improved one magnitude. However, the photo responsivity was decreased when the thickness of the Ag film was reached 15 nm. |
| |
| Keywords: | ZnO multiple film Ag film photoluminescence photoresponse |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《发光学报》浏览原始摘要信息 |
| 点击此处可从《发光学报》下载免费的PDF全文 |
|
