HgCdTe红外探测器离子注入剂量优化研究

在中波响应波段的p型Hg_0.709Cd_0.291Te(MCT)分子束外延生长薄膜上，利用材料芯片技术获得叠加注入不同硼离子剂量的系列大光敏元面积(500μm×500μm)的n-op-p结.通过测量液氮温度下不同离子注入剂量单元的电流-电压特性和对零偏微分电阻R₀分析，观测到p-n结的性能与硼离子注入剂量明显的依赖关系.在另一片薄膜材料(镉组分值为0.2743)上通过该方法获得R₀A优于现有常规数值的探测器单元. 关键词： p-n结 离子注入 碲镉汞薄膜     

短波碲镉汞光伏器件的低频噪声研究

对所研制的短波光伏碲镉汞器件进行了变温电流-电压特性和低频噪声研究，测试温度范围255—293K.实验结果表明随着温度的下降，器件的优值因子R₀A从45×10³Ωcm²增加到7×10⁴Ωcm².器件在低频区的主要噪 声成分是1/f噪声和产生-复合噪声，在高频区主要是散粒噪声.在测试的偏压内，器件的1/f噪声功率谱密度与流过器件的电流的平方成正比，器件的Hooge系数为3×10^-4—7×10^-4.从噪声 功率谱密度曲线分析中得到产生-复合噪声的特征时间常数τ，通过τ的温度特性得到了器件的深能级. 关键词： 碲镉汞 优值因子 低频噪声 深能级     

GaS/GaAs界面电学性质研究

报道了微波放电法在GaAs表面生长GaS薄膜．用电容 电压法（C-V）、伏安法（I-V）以及深能级瞬态谱（DLTS）等测试手段对GaS/GaAs界面的电学性质进行了研究．GaS/GaAs界面的CV特性反映此处的界面特性比较好，界面态密度约为10¹²/（cm²·eV）．DLTS的测试得到了与其一致的结果．另外，从I-V曲线中漏电流的大小，估算出GaS的电阻率为10¹¹Ω·cm 关键词：     

碲化铋红外透明导电薄膜的制备与光电性能（特邀）

采用射频磁控溅射法在石英衬底和硒化锌衬底上制备了碲化铋薄膜,分别研究了薄膜厚度、退火温度对薄膜微观结构和光电性能的影响。利用X射线衍射仪、X射线光电子能谱仪和冷场发射扫描电子显微镜,分析了薄膜结构、成分和形貌。结果表明,退火有利于薄膜的结晶,且不改变晶体的择优取向。傅里叶变换红外光谱测试结果表明,在石英衬底和硒化锌衬底上沉积的薄膜,光学透过率随着薄膜厚度和退火温度的增加而减小,在硒化锌衬底上沉积的薄膜透过波段比石英长,且光学透过率更加稳定。霍尔效应测试结果表明,随着薄膜厚度和退火温度的增加,薄膜的电阻率逐渐减小,最小为1.448×10^-3Ω·cm,迁移率为27.400 cm²·V^-1·s^-1,载流子浓度为1.573×10²⁰ cm^-3。在石英衬底上沉积的15 nm厚的Bi₂Te₃薄膜,在1～5μm波段的透过率达到80%,退火200℃后透过率达到60%,电阻率为5.663×10^-3Ω·cm。在...     

质子辐照对纯铝薄膜微观结构的影响

利用透射电子显微镜(TEM)详细分析了不同剂量的质子辐照纯铝薄膜样品的微观结构, 质子的能量E=160 keV.实验表明,质子辐照能够在Al薄膜中诱发空位位错圈,在实验范围内,位错密度随辐照剂量的增加而增加;质子辐照在1×10¹¹—4×10¹¹/mm²范围内随辐照剂量的增加,位错圈数量密度以及位错圈尺寸都随之增加.在较高剂量6×10¹¹/mm²辐照下,位错圈数量密度减小,但其尺寸显著 关键词： 质子辐照 空位簇缺陷 位错圈 微观结构     

Mg+注入对GaN晶体辐射损伤的研究

在蓝宝石衬底上通过金属有机物化学气相沉积(metal-organic chemical vapor deposition，MOCVD)方法外延生长的GaN薄膜具有良好的结晶品质，χ_min达到2.00%. 结合卢瑟福背散射/沟道(Rutherford backscattering/channeling，RBS/C)和高分辨X射线衍射(high-resolution X-ray diffraction，HXRD)的实验测量，研究了不同剂量和不同角度Mg⁺注入GaN所造成的辐射损伤. 实验结果表明，随注入剂量的增大，晶体的辐射损伤也增大，注入剂量在1×10¹⁵atom/cm²以下，χ_min小于4.78%，1×10¹⁶atom/cm²是Mg⁺注入GaN的剂量阈值，超过这个阈值，结晶品质急剧变差，χ_min达到29.5%；随机注入比沟道注入的辐射损伤大，且在一定范围内随注入角度的增大，损伤也增大，在4×10¹⁵atom/cm²剂量下偏离〈0001〉沟道0°，4°，6°，9°时的χ_min(%)分别为6.28，8.46，10.06，10.85；经过700℃/10min+1050℃/20s两步退火和1000℃/30s高温快速退火后，晶体的辐射损伤都有一定程度的恢复，而且1000℃/30s高温快速退火的效果更好，晶体的辐射损伤可以得到更好的恢复. 关键词： GaN 卢瑟福被散射/沟道 高分辨X射线衍射 辐射损伤     

Tm3+/Ho3+共掺碲酸盐玻璃的2.0μm发光特性及能量传递

研究了Tm³⁺/Ho³⁺共掺TeO₂-WO₃-ZnO玻璃在808 nm激光二极管抽运下的2.0μm发光特性及Tm³+与Ho³⁺之间的能量传递.应用Judd-Ofelt理论计算了Ho³⁺在碲酸盐玻璃中的谱线强度参量Ω_t (t=2,4,6)、自发辐射概率A_r、辐射寿命τ_r等.计算了Ho³⁺的吸收截面σ_a(λ)和受激发射截面σ_e(λ).结果表明：碲酸盐玻璃中Tm³⁺→Ho³⁺正向能量传递系数大约是Tm³⁺←Ho³⁺反向能量传递系数的18倍.Ho³⁺离子的⁵I₇能级的寿命为3.9ms，2.0μm处的最大发射截面为9.15×10^-21cm².在0.5mol% Tm₂O₃和0.15mol% Ho₂O₃共掺的碲酸盐玻璃中能获得2.0μm的最大增益.通过比较氟化物、碲酸盐和镓铋酸盐重金属氧化物等玻璃中Ho³⁺的量子效率η，σ_e×τ_m值和增益系数G(λ)等，发现Tm³⁺/Ho³⁺共掺碲酸盐玻璃是一种理想的2.0μm激光器用基质玻璃. 关键词： 2.0μm发光 能量传递 增益 碲酸盐玻璃     

新型透明导电薄膜ErF3掺杂In2 O3的研制

利用电子束沉积技术首次制备了氟化铒 (ErF₃) 掺杂的氧化铟(In₂O₃)透明导电薄膜(IEFO),研究了薄膜的晶体结构、光学特性和电学特性。利用原子力显微镜测试了不同厚度薄膜的形貌,初步研究了薄膜的生长过程。研究发现:IEFO薄膜为多晶结构,Er原子的掺入改变了薄膜的优势生长方向,使薄膜在(211)、(222)、(444)3个方向上的生长趋势基本相同。 薄膜电阻率为1.265×10^-3 Ω·cm,电子迁移率为45.76 cm²·V^-1·s^-1,电子浓度为1.197×10²⁰ cm^-3,在380~780 nm范围内的可见光平均透过率为81%。     

碲镉汞异质结能带结构的优化设计

分别对带隙较宽(较窄)的p型材料在带隙较窄(较宽)的n型材料之上的碲镉汞(MCT)异质结的能带结构进行了理论分析.在应用的理论模型中提出了一个简单的载流子浓度近似模型用于计入载流子简并效应和导带非抛物线性，同时还考虑到了价带失配的影响.就p-n结位置(z_B)和界面电荷密度(Q)两个参数对MCT异质结能带结构的影响进行了系统分析，发现这些影响是不可忽略的.根据这些影响特征，进一步得出了z_B和Q参数之间的优化设计规律. 关键词： 碲镉汞(MCT) 异质结 载流子浓度近似     

Sn离子注入PbTe的热电性能和结构

对碲化铅(PbTe)在室温下进行了Sn离子注入(200keV,6×10¹⁶和1×10¹⁷ion/cm²).应用电学和热学测量、X射线衍射技术(XRD)和X射线光电子能谱(XPS)研究了Sn离子注入PbTe的热电性能和注入层结构. 关键词：     

Fabrication and characterization of 4H—SiC bipolar junction transistor with double base epilayer

In this paper we report on a novel structure of a 4H-SiC bipolar junction transistor with a double base epilayer that is continuously grown.The measured dc common-emitter current gain is 16.8 at IC = 28.6 mA(J C = 183.4 A/cm2),and it increases with the collector current density increasing.The specific on-state resistance(Rsp-on) is32.3mΩ·cm 2 and the open-base breakdown voltage reaches 410 V.The emitter N-type specific contact resistance and N + emitter layer sheet resistance are 1.7×10-3 Ω·cm2 and 150 /,respectively.     

The fabrication and characterization of 4H SiC power UMOSFETs

The fabrication of 4H-SiC vertical trench-gate metal-oxide-semiconductor field-effect transistors(UMOSFETs) is reported in this paper.The device has a 15-μm thick drift layer with 3×1015 cm-3 N-type doping concentration and a 3.1μm channel length.The measured on-state source-drain current density is 65.4 A/cm2 at Vg = 40 V and VDS = 15 V.The measured threshold voltage(Vth) is 5.5 V by linear extrapolation from the transfer characteristics.A specific on-resistance(Rsp-on) is 181 mΩ·cm2 at Vg = 40 V and a blocking voltage(BV) is 880 V(IDS = 100 μA@880V) at Vg = 0 V.     

Ultra-low on-resistance high voltage (>600 V) SOI MOSFET with a reduced cell pitch

A low specific on-resistance (R S,on) silicon-on-insulator (SOI) trench MOSFET (metal-oxide-semiconductor-field-effect-transistor) with a reduced cell pitch is proposed.The lateral MOSFET features multiple trenches:two oxide trenches in the drift region and a trench gate extended to the buried oxide (BOX) (SOI MT MOSFET).Firstly,the oxide trenches increase the average electric field strength along the x direction due to lower permittivity of oxide compared with that of Si;secondly,the oxide trenches cause multiple-directional depletion,which improves the electric field distribution and enhances the reduced surface field (RESURF) effect in the SOI layer.Both of them result in a high breakdown voltage (BV).Thirdly,the oxide trenches cause the drift region to be folded in the vertical direction,leading to a shortened cell pitch and a reduced R S,on.Fourthly,the trench gate extended to the BOX further reduces R S,on,owing to the electron accumulation layer.The BV of the MT MOSFET increases from 309 V for a conventional SOI lateral double diffused metal-oxide semiconductor (LDMOS) to 632 V at the same half cell pitch of 21.5 μm,and R S,on decreases from 419 m · cm 2 to 36.6 m · cm 2.The proposed structure can also help to dramatically reduce the cell pitch at the same breakdown voltage.     

Edge termination study and fabrication of a 4Hben SiC junction barrier Schottky diode

The 4H-SiC junction barrier Schottky (JBS) diodes terminated by field guard rings and offset field plate are designed, fabricated and characterized. It is shown experimentally that a 3-μm P-type implantation window spacing gives an optimum trade-off between forward drop voltage and leakage current density for these diodes, yielding a specific on-resistance of 8.3 mΩ·cm². A JBS diode with a turn-on voltage of 0.65 V and a reverse current density less than 1 A/cm² under 500 V is fabricated, and the reverse recovery time is tested to be 80 ns, and the peak reverse current is 28.1 mA. Temperature-dependent characteristics are also studied in a temperature range of 75 ℃-200 ℃. The diode shows a stable Schottky barrier height of up to 200 ℃ and a stable operation under a continuous forward current of 100 A/cm².     

Probing into the effect of Auger recombination mechanism on zero bias resistance-area product in In1−xGaxAs detector

D* (Detectivity), an important figure of merit for photodetectors, is limited by zero bias resistance-area product (R₀A). R₀A is determined by Auger recombination mechanism, depending on the composition, temperature, carrier concentration and other parameters of the photodetectors. To investigate R₀A of In_1−xGa_xAs infrared photodetectors, in this paper, theoretical analysis of Auger recombination mechanism was carried out in the room temperature, by taking CCCH, CHHL and CHHS into account. The calculated results show that there are significant influences on R₀A for various parameters in both p- and n-type regions of the devices. With carrier concentration around 10¹⁷ to 10¹⁸ cm⁻³, R₀A of 10⁸ Ω cm² (n-region) and 10⁶ Ω cm² (p-region) are obtained for x=0.47, when thickness and surface recombination velocity of the sample are 5 μm and 100 m/s, respectively.     

Ionic conductivity of pure and doped Li3N

The ionic conductivity of Li₃N crystals doped with various metal ions (magnesium, copper and aluminum) or hydrogen has been investigated. The metal ions have a negative effect on the conductivity whereas hydrogen increases it. The intrinsic Li⁺ ionic conductivity of pure Li₃N is (2·-4)×10^-4Ω^-1cm^-1 at room temperature with an activation energy of 0.26?0.27 eV. Doping with hydrogen to a maximum level of 0.5?1.0 atom% results in a conductivity of 6×10^-3Ω^-1cm^-1 and an activation energy which has been lowered to 0.20 eV. A model is proposed for the action of hydrogen whereby the Li-N bonds next to an NH^2- group are weakened thereby facilatating the creation of Li⁺ Frenkel defects and the vacancy migration. Hydrogen-doped Li₃N is termed an enhanced intrinsic conductor.     

Li2Mo2O6多晶材料的结构与电性能的研究

本文用固相反应烧结制备出Li₂Mo₂O₆多晶材料。经X射线分析、红外光谱和电子顺磁共振谱(EPR)的研究,确定了它的结构是Li₂Mo₂O₄和MoO₂两个晶相组成的烧结体。钼离子以四价状态存在于MoO₂晶相结构中。采用交流阻抗谱分析了晶界与温度变化的相关性。测得了样品的ln(σ_总T)-1/T 曲线是由两段直线和一段曲线所组成;总电导率化能σ_27℃=1.36×10^-3(Ω·cm)^-1,σ_115℃=1.49×10^-3(Ω·cm)^-1,σ_300℃=9.71×10^-3(Ω·cm)^-1,σ_370℃=2.42×10^-3(Ω·cm)^-1;电导活化能E₁=0.043eV,E₂=0.235eV,E_平均=0.76eV。采用维格纳极化电池法测得电子电导率σ_e,σ_e27℃=2.240×10^-5(Ω·cm)^-1,σ_e300℃=4.476×10^-3(Ω·cm)^-1。实验证明,室温下材料为固体电解质,300℃附近为良好的离子与电子混合导体。 关键词：     

NbTi0.5Ni0.5O4 as anode compound material for SOFCs

NbTi_0.5Ni_0.5O₄ (NTNO) has been prepared using solid state synthesis and investigated as a potential anode material. The oxide form of NTNO has single phase rutile-type structure with tetragonal (P42/mnm) space group. The reduced form is a composite of nano-scaled particles of metallic Ni and Nb_1.33Ti_0.67O₄ phase. Reduced NTNO showed high electronic conductivity up to 280 S.cm^− 1 at 900 °C in reducing atmosphere, but suffers from low CTE equal to 3.78 10^− 6 K^− 1. Studies of NTNO as anode material were carried out in a three electrode - electrochemical half cell configuration under pure humidified H₂ at 900 °C using a 2 mm thick zirconia electrolyte and without any additional current collector material. The results show a reasonable series resistance (R_s) equal to 2.7 Ωcm² (about 50% higher than for metallic gold layers) indicating a good current collection performance for a 10 μm layer of material. The polarization resistance (R_p) was equal to 33 Ωcm² and is attributed to a poor density of three phase boundaries (TPB) and shortage of oxide ion conduction in the anode layer. The results show the potential of NTNO as an anode material, especially after optimization of the microstructure towards the increase of TPB length.     

一种印刷型薄膜太阳能电池p-n结调制技术

能带值为0.5~0.85 eV材料的稀缺是多结太阳能电池面临的一个主要挑战,本文使用非真空的机械化学法合成了能带值为0.83 eV的Cu₂SnS₃化合物,使用印刷技术将其制备成吸收层薄膜,并采用superstrate太阳能电池结构(Mo/Cu₂SnS₃/In₂S₃/TiO₂/FTO glass)对其光伏特性进行了研究.实验表明所制备的太阳能电池短路电流密度、开路电压、填充因子和转换效率分别为12.38 mA/cm²、320 mV、0.28和1.10%.此外,为更好地满足多结太阳能电池对电流匹配的需求,本文对所制备太阳能电池的Cu₂SnS₃/In₂S₃ p-n结进行了分析.通过在p-n结界面植入一层薄的疏松缓冲层,使调制后的太阳能电池短路电流密度从最初的12.38 mA/cm²增加到了23.15 mA/cm²,相应太阳能电池转换效率从1.1%增加到了1.92%.该p-n调制技术对印刷型薄膜太阳能电池具有重要借鉴意义.     

Spectral properties of Nd:Ca2Nb2O7 crystal

This paper reports the spectral properties of Nd³⁺:Ca₂Nb₂O₇. The spectral parameters of Nd³⁺ in Nd³⁺:Ca₂Nb₂O₇ crystal have been investigated based on Judd-Ofelt theory. The spectral parameters were obtained. The parameters of line strengths Ω_λ are Ω₂=4.967×10⁻²⁰ cm², Ω₄=5.431×10⁻²⁰ cm², Ω₆=5.693×10⁻²⁰ cm². The radiative lifetime, the fluorescence lifetime and the quantum efficiency are 122 μs, 103 μs and 84.4%, respectively. The fluorescence branch ratios calculated: β₁=0.425, β₂=0.479, β₃=0.091, β₄=0.004. The emission cross section at 1068 nm is 6.204×10⁻²⁰ cm².