正放射Mo／B4C软X射线多层膜

采用Ｍｏ／Ｂ４Ｃ材料在短波长波段进行软Ｘ射线多层膜实验研究。在指定波长处对多层膜进行结构设计，并制备出了周期结构的Ｍｏ／Ｂ４Ｃ多怪膜样品。     

溅射制备的Co/V多层膜微观结构特征与铁磁共振研究

研究了用射频磁控溅射方法制备的［Ｃｏ（１５ｎｍ）／Ｖ（ｄＶ）］２０（０５ｎｍ≤ｄＶ≤４ｎｍ）多层膜的结构和磁性．用Ｘ射线衍射、透射电子显微镜、高分辨率透射电子显微镜等手段对其结构的分析,表明它们层状周期结构良好,沿膜的生长方向具有ｆｃＣｏ（１１１）和ｂｃｃＶ（１１０）织构,且是由小的柱状晶粒构成的多晶薄膜．界面一定程度的合金化,使其成为成分调制周期结构,也是它们的一个结构特征．由其铁磁共振谱计算得到较小的ｇ因子和４πＭｅｆ值,表明多层膜界面存在一定程度的合金化．对于Ｖ层厚度小于２２ｎｍ的多层膜,观测到自旋波共振谱,并作了分析．计算了层间耦合常数,说明Ｃｏ层之间存在较弱的层间交换耦合作用．     

5-溴水杨基荧光酮-溴化十六烷基三甲铵荧光熄灭法测定微量钼的研究

本文报道了在溴化十六烷基三甲铵（ＣＴＭＡＢ）存在下,以５－溴水杨基荧光酮（５－ＢｒＳＡＦ）作为荧光试剂,用荧光熄灭法测定微量钼的新方法。详细研究了各种条件实验。反应的适宜酸度范围为 ０．０８－０．２４ｍ ｏｌ·Ｌ－ １ ＨＣｌ,钼含量在０－ ４．０μｇ／２５ｍ Ｌ范围内呈线性关系,配合物的组成比为Ｍｏ（Ⅵ）∶５－ＢｒＳＡＦ∶ＣＴＭＡＢ＝ １∶２∶２,激发波长为３６５ｎｍ ,发射波长为５２５ｎｍ 。方法灵敏度高,检出限为２．０μｇ／Ｌ。用于样品中微量钼的测定,结果令人满意。     

四氯合铜酸苯铵盐的结构及其红外与拉曼光谱研究

制备了四氯四铜酸苯铵盐（Ｃ６Ｈ５ＮＨ３）２ＣｕＣｌ４单晶，Ｍｒ＝１８７．２６，由四园衍射数据确定了晶体结构，晶体属单斜晶系，空间群Ｐ２１／ａ，ａ＝０．７１８４（１），ｂ＝０．７４４８（２），ｃ＝１．５０７０（４）ｎｍ，β＝１００．６７（２）°，Ｖ＝０．７９２４ｎｍ＾３，Ｚ＝２，Ｄｘ＝１．６５０ｇｃｍ＾－３，（Ｍｏ，Ｋａ）＝０．０７１０６９ｎｍ，μ＝４．０５６ｍｍ＾－１，Ｆ（０００）＝３８９，Ｒ＝０     

铁磁多层膜内介观效应观察

铁磁金属多层膜（８１ＮｉＦｅ／Ｃｒ）面上刻蚀平行线凹槽（５００线／ｍｍ）以及多孔超薄多层膜（Ｃｏ／Ｃｕ），在Ｔ＜４．２Ｋ时，磁电阻特性反常。可解释为介观效应。     

邻羧基苯基荧光酮与碲显色反应的研究及应用

在ｐＨ＝４．５ＨＡｃ－ＮａＡｃ缓冲介质中,ＣＴＭＡＢ存在下,邻羧基苯基荧光酮（ｏ－ＣＰＦ）和Ｔｅ（Ⅳ）生成４∶１稳定络合物,λｍａｘ＝５６０ｎｍ,ε＝１．２５×１０５Ｌ·ｍｏｌ－１·ｃｍ－１。Ｔｅ（Ⅳ）含量在０—１０μｇ／２５ｍＬ内符合比耳定律,方法用于烟尘中碲的测定,结果令人满意。     

5—溴水杨基荧光酮—溴化十六烷基三甲铵荧光熄灭法测定微量？…

本文报道了在溴化十六烷基三甲铵（ＣＴＭＡＢ）存在下,以５－溴水杨基荧光酮（５－ＢrＳＡＦ）作为荧光试剂,用荧光熄灭法测定微量钼的新方法。详细研究了各种条件实验。 反应了适宜酸度范围为０．０８－０．２４ｍｏｌ．Ｌ＾－１ＨＣ１,钼含量在０－４．０ｕｇ／２５ｍＬ范围内呈线性关系,配合物的组成比为Ｍo（Ⅳ）：５－ＢrＳＡＦ：ＣＴＭＡＢ＝１：２：２,激发波长为３６５ｎｍ,发射波长为５２５ｎｍ。方法灵敏度高,检出     

小能量0.35μm激光—X射线转换研究

以小能量０．３５μｍ激光（＜１００Ｊ）辐照盘靶（Φ６００μｍ×４μｍ），用软Ｘ射线平响应探测器测量Ｘ射线角分布（ｄＥ／ｄΩ）和Ｘ射线转换效率（ηｘ）。ｄＥ／ｄΩ＝ａ＋ｂｃｏｓθ，与角无关。ηｘ随激光入射角增加而下降。按金盘、多层膜（０．１１μｍ）金盘和ＣＨ膜（０．４μｍ）金盘顺序，ηｘ依次下降。     

Y稳定的ZrO_2基体上YBa_2Cu_3O_7／SrTiO_3／YBa_2Cu_3O_7异质外延三层膜的制备、超导性能和显微结构

采用磁控溅射方法在（１００）ＹＳＺ基底上沉积了ＹＢａ２Ｃｕ３Ｏ７／ＳｒＴｉＯ３／ＹＢａ２Ｃｕ３Ｏ７异质外延三层膜，利用交流磁化率和四引线电阻测量的方法确定了三层膜的超导性能，利用Ｘ射线衍射和透射电子显微镜研究了三层膜的结构特征．研究结果表明，膜层的结晶质量较好，临界转变温度Ｔｃ在８３．Ｋ和８６．７Ｋ之间．ＹＢＣＯ膜层中的绝大多数甚至全部）晶粒为Ｃ取向，在有些膜中只存在少量的ａ或ｂ取向的ＹＢＣＯ晶粒．三层膜中层界面比较清晰但不十分平整．在膜／基界面处有８－１０ｎｍ厚的过渡层，它由多晶的ＢａＺｒＯ３组成．膜层和（１０）ＹＳＺ基底之间具有如下的外延生长关系ＹＳＺ［００１］／／ＹＢＣＯ［１１０］／／ＳｒＴｊＯ３［１１０］；ＹＳＺ（１００）／／ＹＢＣＯ（００１）／／ＳｒＴｉＯ３（００１）．     

2—溴甲基萘荧光和室温磷光性质研究

研究了２－溴甲基萘（２－ＢｒＭＮ）的荧光及磷光性质。２－溴甲基萘是一种优良的荧光试剂,λｅｘ／λｅｍ＝２７４／３３４ｎｍ,其浓度在１．０×１０＾－６～１．２×１０＾－４ｍｏｌ·Ｌ＾－１范围内与荧光强度呈良好的线性关系,相关系数ｒ＝０．９９９,最低检测限为４．７×１０＾－８ｍｏｌ·Ｌ＾－１。以β－环糊精（β－ＣＤ）作保护剂和１,２－二溴丙烷（ＤＢＰ）为重原子微扰剂的２－ＢｒＭＮ／β－ＣＤ／ＤＢＰ体系     

30.4 nm波长SiC/Mg多层膜反射镜

波长30.4 nm的He-II谱线是极紫外天文观测中最重要的谱线之一,空间极紫外太阳观测光学系统需要采用多层膜作为反射元件。为此研究了SiC/Mg、B4C/Mg、C/Mg、C/Al、Mo/Si、B4C/Si、SiC/Si、C/Si、Sc/Si等材料组合的多层膜在该波长处的反射性能。基于反射率最大与多层膜带宽最小的设计优化原则,选取了SiC/Mg作为膜系材料。采用直流磁控溅射技术制备了SiC/Mg多层膜,用X射线衍射仪测量了多层膜的周期厚度,用国家同步辐射计量站的反射率计测量了多层膜的反射率,在入射角12°时,实测30.4 nm处的反射率为38.0%。     

Co/C and W/Si multilayers deposited by ion-beam sputtering for the soft X-ray range

We deposited Co/C multilayer mirrors for a wavelength of 4.77 nm and W/Si multilayer mirrors for a wavelength of 1.77 nm by use of ion-beam sputtering. The small-angle diffraction spectrum was used to analyze the structure of the multilayers. With a combination of the experimental diffraction spectra and Apeles’ theory for calculation of the interfacial roughnesses of the multilayers, the interfacial roughnesses of Co/C and W/Si are 0.80 nm and 0.60 nm, respectively, which are lower than that of the substrate. The reflectivity of the Co/C multilayer is measured to be about 20% and that of the W/Si multilayer about 1% at the grazing incidence angle of about 12°. Received: 30 May 2000 / Accepted: 1 August 2000 / Published online: 11 February 2002     

X射线W/B4C宽带多层膜的优化设计和制备

介绍了X射线宽带多层膜材料W和B4C的选定方法,依据伯宁(BERNING)公式确定出了在0.154 nm处X射线宽带多层膜的最佳膜对数。引入适当的评价函数,利用具有全局寻优特性且效率较高的遗传算法,在波长0.154 nm处优化设计出了掠入射角(θ)0.5°~0.9°范围内反射率值达到40%的宽角度宽带多层膜。宽带多层膜反射镜采用磁控溅射方法制备,并用X射线衍射仪对样品进行了检测,结果表明在掠入射角(2θ)1.0°~1.8°之间的相对反射率光谱曲线比较平坦。     

Mo/Si aperiodic multilayer broadband reflective mirror for 12.5-28.5-nm wavelength range

Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.     

SiC/W/Ir multilayer-coated grating for enhanced efficiency in 50-100 nm wavelength range in Seya-Namioka mount

A broadband [SiC/W/Ir](2) multilayer coating was deposited onto a diffraction grating to enhance the grating efficiency in the 50-100 nm wavelength range in a Seya-Namioka mount. The holographic ion-beam etched grating had a laminar profile with 1200 lines/mm. The coating was designed by using the subquarterwave multilayer theory. The measurement results show that the efficiency in the -1st diffraction order is greater than 9.3% throughout the wavelength range of 50-100 nm, which is obviously higher than that of single-layer gratings with SiC, Ir, or Au coatings.     

Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics

Scandium/silicon multilayers have been deposited by magnetron sputtering and characterized by several techniques. Experimental peak reflectances of 0.22 and 0.37 have been measured respectively at wavelengths of 40 nm and 46 nm, for 10° incidence angle. The corresponding theoretical values for a perfect Sc/Si structure are respectively 0.38 and 0.57. In order to explain these differences between calculated and measured reflectivity, thin film and multilayer characterizations have been done. Effects of multilayer imperfections on the reflectivity have been estimated independently by means of simulation. Based on these results, a new design of Sc/Si multilayer is proposed with top layer thickness optimization. With this design, the experimental peak reflectance reaches 0.46 at a wavelength of 46 nm. PACS 78.67.Pt; 78.66.-W; 81.15.Cd     

4.48 nm正入射软X射线激光用Cr/C多层膜高反射镜的研制

针对4.48nm类镍钽软X射线激光及其应用实验,设计制备了工作于这一波长的近正入射多层膜高反射镜。选择Cr/C为制备4.48nm高反射多层膜的材料对,通过优化设计,确定了多层膜的周期、周期数以及两种材料的厚度比。模拟了多层膜非理想界面对高反射多层膜性能的影响。采用直流磁控溅射方法在超光滑硅基片上实现了200周期Cr/C多层膜高反射镜的制备。利用X射线衍射仪测量了多层膜结构,在德国BessyⅡ同步辐射上测量了在工作波长处多层膜反射率,测量的峰值反射率达7.5%。对衍射仪测量的掠入射反射曲线和同步辐射测量的反射率曲线分别进行拟合,得到的粗糙度和厚度比的结果相近。测试结果表明,所制备的Cr/C多层膜样品结构良好,在指定工作波长处有较高的反射峰,达到了设计要求。     

磁控溅射制备横向梯度分布的Mo/Si周期多层膜

 采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构,在基板65 mm长度范围内,多层膜周期从8.21 nm线性减小到6.57 nm,周期梯度为0.03 nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明：该横向梯度分布周期多层膜上不同位置,能反射在13.3~15.9 nm波段范围内不同波长的极紫外光,反射率为60%~65%。     

Design of broadband and broad angular Cr/C multilayer reflector for “near water window” region

Traditional periodic multilayer reflector working in the soft X-ray region should be placed at the designed incidence angle and wavelength, which is extremely difficult and complicate in practice especially for “near water window region” (4.43-6.50 nm). In this region, Ni-like-Ta laser working at the wavelength 4.48 nm provides a possible source which has caught a lot attention. In this paper, to overcome the shortcoming of the periodic structure, top-flat broad band (normal incidence) and broad angular (around quasi-Brewster angle) Cr/C non-periodic multilayer reflector have been designed for the 4.48 nm soft X-ray optical system. In the wavelength region 4.473-4.488 nm, 4.455-4.496 nm and 4.435-4.529 nm, mean theoretical normal-incidence reflectivity can get 35.0%, 24.2% and 12.6%, respectively, by the top-flat broad band reflectors. In the grazing incidence angle region 44.85-45.16°, 44.54-45.46° and 44.02-45.98°, mean s-component theoretical reflectivity at 4.48 nm can get 39.7%, 23.1% and 13.0%, respectively, by the top-flat broad angular reflectors.     

高反射率Mo/B4C多层膜设计及制备

 运用遗传算法优化设计了Mo/B₄C多层膜结构。入射光入射角度取10°时,设计的理想多层膜膜对数为150,周期为3.59 nm,Gamma值（Mo膜厚与周期的比值）为0.41,峰值反射率为33.29%。采用恒功率模式直流磁控溅射方法制作Mo/B₄C多层膜。通过在Mo/B4C多层膜与基底之间增加15 nm厚的Cr粘附层,提高多层膜与基底的粘附力。另外,还采用调整多层膜Gamma值的方法减小其内应力,调整后多层膜结构周期为3.59 nm, Mo膜厚1.97 nm, B4C膜厚1.62 nm,峰值反射率26.34％。制备了膜对数为150的Mo/B₄C膜并测量了其反射率,在波长7.03 nm处,Mo/B₄C多层膜的近正入射反射率为21.0％。最后对测量结果进行了拟合,拟合得到Mo/B₄C多层膜的周期为3.60 nm,Gamma值0.60,界面粗糙度为0.30 nm。