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利用激光驻波场会聚原子沉积纳米结构的技术可以用来研制纳米结构长度传递标准.当激光驻波场的频率大于原子的共振频率时,原子由于受到偶极力的作用将被会聚到驻波的波节处.采用了一种新的技术方案减小了实验对大的激光功率的要求.利用激光驻波场会聚准直性较好的Cr原子,并使其沉积在硅基片上形成纳米光栅结构.经原子力显微镜测试表明纳米光栅的周期为215 nm.
关键词:
激光偶极力
纳米计量
原子沉积
蓝失谐 相似文献
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利用近共振激光驻波场操纵中性原子实现纳米光栅的沉积是一种新型的研制纳米结构方法,处于激光驻波场中的原子运动速度特性对最终纳米光栅的沉积特性有着重要的影响.利用半经典理论,基于4阶Runge-Kutta算法进行了不同铬原子纵向和横向运动速度条件下纳米光栅结构沉积的仿真研究.研究表明,铬原子纵向速度为最大概率速度960 m/s时,所形成的纳米光栅的半高宽为1.49 nm,对比度为62.1 ∶1,当铬原子的纵向速度为半最大概率速度480 m/s时,纳米光栅的半高宽为5.35 nm,对比度下降为25.6 ∶1.同
关键词:
原子光刻
纳米计量
激光驻波场
纳米光栅结构 相似文献
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利用近共振激光驻波场操纵中性原子实现纳米级条纹沉积技术是一种新型的研制纳米结构长度标准传递的方法.分析了Cr原子在椭圆型激光驻波场作用下的沉积特性,分别对不同椭圆激光驻波场功率下Cr原子的沉积条纹及不同y平面上沉积条纹特性进行了模拟和分析.同时针对椭圆激光驻波场作用下Cr原子发散角对沉积条纹特性的影响进行了模拟计算,比较了不同发散角条件下沉积条纹的对比度和半高宽.
关键词:
原子光刻
椭圆激光驻波场
Cr原子 相似文献
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与光子和电子不间,原子的激发亚稳态具有方便操作的内能态结构,这使利用内能态的光学淬灭原理实现光刻技术成为现实.基于原子光学的中性原子束光刻技术是下一代光刻技术(the next generation lithography,NGL)的一种,它可分两种途径实现:激光驻波原子直沉积技术和亚稳态中性原子光刻技术.前者可以实现图案的纳米尺度特征、大面积平行沉积和高分辨率;后者结合有效的抗蚀剂,同样可以实现纳米图形制造,在基板上获得的尖锐边缘分辨率目前可达40 nm.两种途径的原理相差甚远,但最终获得的结果相似. 相似文献
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纳米压印模板通常采用极紫外光刻、聚焦离子束光刻和电子束光刻等传统光刻技术制备,成本较高.寻找一种简单、低成本的纳米压印模板制备方法以提升纳米压印光刻技术的应用成为研究的重点与难点.本文以多孔氧化铝为母模板,采用纳米压印光刻技术对纳米多孔硅模板的制备进行了研究.在硅基表面成功制备出纳米多孔阵列结构,孔间距为350—560 nm,孔径在170—480 nm,孔深为200 nm.在激发波长为514 nm时,拉曼光谱的测试结果表明,相对于单面抛光的硅片,纳米多孔结构的硅模板拉曼光强有了约12倍左右的提升,对提升硅基光电器件的应用具有重要的意义.最后,利用多孔硅模板作为纳米压印母模板,通过热压印技术,成功制备出了聚合物纳米柱软模板. 相似文献
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Josef Lazar Jan Hrabina Mojmír ?ery Petr Klapetek Ond?ej ?íp 《Central European Journal of Physics》2012,10(1):225-231
We present an overview of design approaches for nanometrology measuring setups with a focus on interferometry techniques and
associated problems. The design and development of a positioning system with interferometric multiaxis monitoring and control
is presented. The system is intended to operate as a national nanometrology standard combining local probe microscopy techniques
and sample position control with traceability to the primary standard of length. 相似文献
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《中国物理 B》2020,(2)
Laser focused atomic deposition is a unique and effective way to fabricate highly accurate pitch standards in nanometrology.However,the stability and repeatability of the atom lithography fabrication process remains a challenging problem for massive production.Based on the atom-light interaction theory,channeling is utilized to improve the stability and repeatability.From the comparison of three kinds of atom-light interaction models,the optimal parameters for channeling are obtained based on simulation.According to the experimental observations,the peak to valley height of Cr nano-gratings keeps stable when the cutting proportion changes from 15% to 50%,which means that the channeling shows up under this condition.The channeling proves to be an effective method to optimize the stability and repeatability of laser focused Cr atomic deposition. 相似文献
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We propose one- and two-wavelength methods of absolute measurement of diffraction-grating spacings based on the Littman configuration for autocollimation. The one-wavelength method has been applied to measure the spacing of a grating with a nominal value of 2160grooves/mm . The grating spacing was measured to be 463.16 nm, with an experimental standard deviation of 0.24 nm. It has been demonstrated that the both methods can provide direct traceability in the submicrometer region in terms of wavelength standards for applications in the field of nanometrology. 相似文献
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利用近共振激光驻波场操纵中性原子实现纳米量级条纹沉积技术是一种新型的研制纳米结构长度传递标准的方法,采用了一种新颖的方法,通过预准直孔的设定,将原子束在空间分成三部分,利用中间部分的原子束和近共振激光驻波场相互作用,在激光驻波场辐射压力作用下使原子按照特定周期沉积在基板上,从而实现纳米条纹的制作.利用两侧部分的原子束与探测激光束相互作用,通过其感生荧光来监测中间部分原子束沉积过程中的准直效果,从而为原子的沉积过程提供实时的原子束特性监测.最后对纳米沉积条纹在经由三狭缝预准直结构作用前后的效果进行了三维仿真,结果表明,未采用该三狭缝预准直结构时,纳米沉积条纹的半高宽为32nm,对比度为8∶1,而采用该三狭缝预准直结构之后,纳米沉积条纹的半高宽为6.2nm,对比度为28∶1,大大提高了纳米沉积条纹的质量. 相似文献
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Cooling technology is facing new challenges with the increase of electronic equipment power onboard aircraft. The traditional heat sink based on high-altitude bleed air does not satisfy this increase of cooling demands. In this article, an air/air-type skin heat exchanger is studied for cooling aircraft electronic equipment. It uses outside high-altitude cold air rather than bleed air as a heat sink. This cooling technology can effectively remove the heat load of high-power electronic devices without greatly increasing aircraft performance penalty. To assess its high-altitude heat transfer performance, an experimental prototype was designed and made. Some experiments were conducted on a ground experimental test. The heat transfer criteria formulas were obtained for both the side air in the skin heat exchanger and its convective heat transfer coefficients. Based on these experimental analyses, the heat transfer performances of the skin heat exchanger in a high-altitude cruise condition are deduced when it is assumed to be installed at an unfavorable position and a favorable position, separately. This work tries to provide a technical support for its future onboard application. 相似文献
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微透镜制作中光刻胶与衬底匹配行为的研究 总被引:3,自引:0,他引:3
利用光刻/离子束刻蚀制作大面阵硅微透镜阵列,采用SEM和表面探针测试等手段分析所制样品的形貌特点,定性讨论制备工艺的不同对所制器件的影响.所用工艺为大面阵微尖阵列和微合阵列的离子束刻蚀制作奠定了基础. 相似文献