椭圆型激光驻波场作用下Cr原子的汇聚特性研究

利用近共振激光驻波场操纵中性原子实现纳米级条纹沉积技术是一种新型的研制纳米结构长度标准传递的方法.分析了Cr原子在椭圆型激光驻波场作用下的沉积特性，分别对不同椭圆激光驻波场功率下Cr原子的沉积条纹及不同y平面上沉积条纹特性进行了模拟和分析.同时针对椭圆激光驻波场作用下Cr原子发散角对沉积条纹特性的影响进行了模拟计算，比较了不同发散角条件下沉积条纹的对比度和半高宽. 关键词： 原子光刻 椭圆激光驻波场 Cr原子

Focusing characteristic of chromium atoms under elliptical standing wave

Direct-write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms are deposited on the substrate. The characteristics of chromium atoms deposit on a substrateare are discussed. We simulated and analysed the characteristics of nanostructure under different laser power and on different y-plane. At the same time, the characteristics of nanostructure are analysed with respect to the effects of atomic beam divergence, the resulting full width at half maximum and contrast are shown under respective conditions.