一种基于AlGaN和石墨烯的紫外-红外双色探测器

通过MOCVD和CVD生长技术,利用高Al组分Al Ga N和单层石墨烯材料进行纵向集成,成功制备了日盲紫外-近红外双色探测器。在工作温度为室温、调制频率为209 Hz以及工作电压分别为10 V和5 V的工作条件下,所制备的双色探测器在紫外波段263 nm处的响应度为5.9 m A/W,在近红外波段1.15μm处的响应度为0.67 m A/W,并且探测器的响应度均随着工作电压的增加而增大。     

超宽禁带半导体β-Ga_2O_3及深紫外透明电极、日盲探测器的研究进展

β-Ga_2O_3是一种新型的超宽禁带氧化物半导体,禁带宽度约为4.9 eV,对应日盲区,对波长大于253 nm的深紫外一可见光具有高的透过率,是天然的日盲紫外探测及深紫外透明电极材料.本文介绍了Ga_20_3材料的晶体结构、基本物性与器件应用,并综述了β-Ga_2O_3在深紫外透明导电电极和日盲紫外探测器中的最新研究进展.Sn掺杂的Ga_2O_3薄膜电导率可达到32.3 S/cm,透过率大于88%,但离商业化的透明导电电极还存在较大差距.在日盲紫外探测器应用方面,基于异质结结构的器件展现出更高的光响应度和更快的响应速度,ZnO/Ga_2O_3核/壳微米线的探测器综合性能最佳,在-6 V偏压下其对254 nm深紫外光的光响应度达1.3×10~3A/W,响应时间为20μs.     

ZnO单晶和BeZnO合金的生长及其紫外探测器研究

用分子束外延(MBE)的方法在c面蓝宝石衬底上生长出了高质量的ZnO单晶薄膜和BexZn1-xO合金薄膜。X射线光电子能谱(XPS)测试结果表明,合金材料中Be元素的摩尔分数分别为1.8%、4.9%、8.0%和15.3%。在此基础上制备了ZnO基和BexZn1-xO基的金属-半导体-金属(MSM)结构紫外探测器。ZnO单晶探测器的响应波长为375nm,在1V电压下,350nm处的光响应度高达43A/W,光电流和暗电流之比达到105量级。在BexZn1-xO基紫外探测器中,其截止响应波长随着合金中Be含量的增加逐渐蓝移,其中Be0.153-Zn0.847O合金探测器的截止响应波长为366nm,紫外波段和可见波段的光电流之比达到2~3个数量级,具有良好的信噪比。此外,提出了氧气等离子体表面处理降低探测器暗电流的方法,并使ZnO单晶探测器的暗电流降低了4个数量级。     

Cu掺杂Ga2O3薄膜的光学性能

采用射频磁控溅射和N2气氛退火处理制备了多晶Ga2O3薄膜和Cu掺杂Ga2O3薄膜.用X射线衍射仪、紫外-可见分光光度计、荧光光谱仪对Ga2O3薄膜和Cu掺杂Ga2O3薄膜的结构和光学性能进行了表征.结果表明,Cu掺杂后Ga2O3薄膜的结晶质量变差,透过率明显降低,吸收率增加,光学带隙减小.本征Ga2O3薄膜在紫外、蓝光和绿光出现了发光带,Cu掺杂后紫外和蓝光发射增强,且在475nm处出现了一个新的发光峰.     

基于MOCVD外延超薄氧化镓薄膜的高性能日盲和X射线探测器（特邀）

为了顺应光电探测器和阵列小尺寸、多功能、高密度集成的发展趋势,报告了一种基于超薄氧化镓(Ga_2O_3)制成的高性能日盲和X射线双功能探测器。基于金属有机化合物化学气相沉淀法,通过高温下的精细生长调控,实现了较薄厚度(70 nm)的高质量Ga_2O_3异质外延薄膜。得益于Ga_2O_3的超宽禁带和薄膜的高质量,基于此薄膜制备的金属-半导体-金属结构光电探测器在日盲紫外探测方面实现了5.5×10~7的光暗电流比,4.65×10~(15)Jones的探测率,3.53×10~4%的外量子效率,72.2 A/W的响应度,而且上述日盲紫外探测参数在不同的日盲光强下(14.7～548μW/cm~2)保持相对稳定;在X射线探测方面实现了1.91×10~4μC·cm~(-2)·Gy~(-1)的超高灵敏度,在等效厚度的情况下,超过之前报道的Ga_2O_3薄膜器件。同时,器件在较低的工作电压下,依然可以维持较高的综合性能。通过系统分析,薄膜质量的提升、本征氧空位电离和光致肖特基势垒降低效应等因素共同导致器件表现出针对日盲紫外和X射线的优良探测性能。此外,X射线诱导的级联效应也是超薄Ga_2O_3具备高X射线探测灵敏度的主要因素之一。该工作可为今后兼具高性能、低功耗的超薄日盲和X射线探测器提供有益的参考。     

用于日盲波段的MgZnO薄膜材料和紫外探测器

考虑ZnO优秀的物理和化学性能以及由于生长温度低而具有更低的缺陷密度从而易于实现高的光电器件效率等特点，本文采用射频磁控溅射和金属有机化学汽相沉积（MOCVD）方法在石英及蓝宝石衬底上生长了立方结构MgZnO薄膜，制备了MgZnO的MSM型紫外探测器。该器件实现了在日盲（太阳盲）波段的光响应，典型的光响应峰值分别在225和250nm，截止边为230和273nm。     

紫外Sc_2O_3薄膜的光学和结构性能表征及其激光作用下的损伤机理

利用电子束蒸发方法,在不同沉积温度(50~350℃)下制备了Sc2O3薄膜。分别用分光光度计,小角掠入射X射线衍射仪和轮廓仪测试了薄膜样品的光谱、微结构和表面粗糙度信息,并用薄膜分析软件Essential Macleod计算了Sc2O3薄膜的折射率和消光系数。结果表明:随着沉积温度升高,Sc2O3薄膜结晶程度增强,晶粒尺寸增大,且较高的沉积温度有利于获得较高的折射率。最后用355 nm,8 ns的三倍频Nd:YAG激光器测试了其激光损伤阈值(LIDT),最大值为2.6 J/cm2,且阈值与薄膜的消光系数、表面粗糙度、光学损耗均呈现相反的变化趋势。用光学显微镜和扫描电子显微镜表征了该薄膜的破坏形貌,详细分析了薄膜在不同激光能量作用下破坏的发展过程,以及Sc2O3薄膜在355 nm紫外激光作用下LIDT与制备工艺的关系,重点分析了355 nm激光作用下薄膜的破坏机理。     

MSM结构ZnO紫外探测器的制备与性质

采用射频磁控溅射在石英衬底上制备了c轴择优取向的ZnO薄膜,利用蚀刻技术制备了MSM结构的光导型紫外探测器。在3V偏压下,器件的暗电流小于250nA,光响应峰值在370nm,响应度是0.34A/W。其紫外(360nm)与可见光(420nm)的抑制比为4个数量级。器件的光响应时间上沿仅为20ns。     

K_2Te(Cs)日盲紫外光电阴极研究

研究了K2Te(Cs)日盲紫外阴极的制作工艺并制作了K2Te(Cs)日盲紫外阴极.测量了K2Te(Cs)日盲紫外阴极样品的光谱响应、光谱反射率和250nm波长激发条件下的荧光谱,测量结果表明:与Cs2Te日盲紫外阴极相比,在现有工艺条件下,K2Te(Cs)日盲紫外阴极的灵敏度高于Cs2Te日盲紫外阴极,光谱响应的峰值波长更短,位于250nm,而长波截止波长位于336nm;633nm的光谱灵敏度为10-4 mA/W数量级,较Cs2Te日盲紫外阴极低一个数量级.光谱反射率测量结果表明:K2Te(Cs)日盲紫外阴极的光谱反射率在200~437nm的波长范围内,均高于Cs2Te日盲紫外阴极,而在437~600nm的波长范围内,反射率却与Cs2Te日盲紫外阴极基本相同;折射率及消光系数也低于Cs2Te日盲紫外阴极.荧光谱测试结果表明:在同样条件下,250~350nm波长范围内,由于K2Te(Cs)紫外阴极的荧光强于Cs2Te紫外阴极,因此跃迁电子数量更多,阴极灵敏度更高,比较适用于日盲紫外探测成像器件的制造.     

薄膜厚度对射频磁控溅射β-Ga2O3薄膜光电性能的影响

本文在室温下利用射频磁控溅射技术在(001)蓝宝石衬底上制备了不同厚度的β-Ga₂O₃薄膜,随后将其置于氩气气氛中800℃退火1 h.利用XRD,SEM,UV-Vis分光光度计、PL光致发光光谱仪和Keithley 4200-SCS半导体表征系统等考察薄膜厚度对所得氧化镓薄膜相组成、表面形貌、光学性能以及光电探测性能的影响.结果表明,随着薄膜厚度的增加,薄膜结晶质量提高,840 nm薄膜最佳,1050 nm薄膜结晶质量略有降低.不同厚度β-Ga₂O₃薄膜在波长200—300 nm日盲区域内均具有明显的紫外光吸收,禁带宽度随着薄膜厚度的增加而增加.PL谱中各发光峰峰强随着薄膜厚度的增加而减小,表明氧空位及其相关缺陷受到抑制.在β-Ga₂O₃薄膜基础上制备出日盲紫外光电探测器的探测性能(光暗电流比,响应度,探测率,外量子效率)也随薄膜厚度的增加呈先增后减的趋势.厚度约为840 nm的β-Ga₂O₃紫外光电探测器,在5...     

Synthesis and optical characterization of c-axis oriented GaN thin films on amorphous quartz glass via sol–gel process

c-Axis oriented GaN nanocrystalline thin films were fabricated by nitridation of three different thin films of -GaO(OH), -Ga₂O₃ or β-Ga₂O₃ obtained by sol–gel technique on amorphous quartz glass substrates. All these GaN thin films showed near band edge emission at 390 nm and yellow luminescence at 570 nm. The crystalline nature and c-axis orientation as well as luminescence properties of the GaN thin films increased by several times by using a buffer layer of GaN on the substrate.     

Dramatic reduction in dark current of β-Ga2O3 ultraviolet photodectors via β-(Al0.25Ga0.75)2O3 surface passivation

Solar-blind ultraviolet photodetectors with metal-semiconductor-metal structure were fabricated based on β -(Al_0.25Ga_0.75)₂O₃/β -Ga₂O₃ film grown by metal-organic chemical vapor deposition. It was known that various surface states increase dark current and a large number of defects can hinder the transport of carriers, resulting in low switching ratio and low responsivity of the device. In this work, β -(Al_0.25Ga_0.75)₂O₃ films are used as surface passivation materials. Owning to its wide band gap, we obtain excellent light transmission and high lattice matching with β -Ga₂O₃. We explore the change and mechanism of the detection performance of the β -Ga₂O₃ detector after β -(Al_0.25Ga_0.75)₂O₃ surface passivation. It is found that under the illumination with 254 nm light at bias 5 V, the β -(Al_0.25Ga_0.75)₂O₃/β -Ga₂O₃ photodetectors show dark current of just 18 pA and high current on/off ratio of 2.16×10⁵. The dark current is sharply reduced about 50 times after passivation of the β -Ga₂O₃ surface, and current on/off ratio increases by approximately 2 times. It is obvious that β -Ga₂O₃ detectors with β -(Al_0.25Ga_0.75)₂O₃ surface passivation can offer superior detector performance.     

C+注入a-SiNx：H薄膜的微结构及光发射的研究

常温下对低压化学气相沉积制备的纳米硅镶嵌结构的a-SiN_x:H薄膜进行低能量高剂量的C⁺注入后,在800~1200℃高温进行常规退火处理。X射线光电子能谱(XPS)及X射线光电子衍射(XRD)等实验结果表明,当退火温度由800℃升高到1200℃后,薄膜部分结构由SiC_xN_y转变成SiN_x和SiC的混合结构。低温下利用真空紫外光激发,获得分别来自于SiN_x、SiC_xN_y、SiC的,位于2.95,2.58,2.29 eV的光致发光光谱。随着退火温度的升高,薄膜的结构发生了变化,发光光谱也有相应的改变。     

Elemental steps in the growth of thin β-Ga2O3 films on CoGa(1 0 0)

The oxidation of CoGa(1 0 0) at 700 K was studied by means of high resolution electron energy loss spectroscopy (EELS), scanning tunneling microscopy, low energy electron diffraction and Auger electron spectroscopy (AES). At 700 K, thin well-ordered β-Ga₂O₃ films grow on CoGa(1 0 0). The EEL spectrum of the Ga-oxide films exhibit Fuchs–Kliewer phonons at 305, 455, 645, and 785 cm⁻¹. For low oxygen exposure (<0.2 L), the growth of oxide-islands starts at step edges and on defects. The oxide films have the shape of long, rectangular islands and are oriented in the [1 0 0] and [0 1 0] directions of the substrate. For higher oxygen exposure, islands of β-Ga₂O₃ are found also on the terraces. After an exposure of 200 L O₂ at 700 K, the CoGa(1 0 0) surface is homogeneously covered with a thin film of β-Ga₂O₃.     

铥、铽及铕离子掺杂的BaAl2O4膜的阴极射线发光特性

利用喷雾热解法合成了Tm、Tb及Eu离子掺杂的铝酸钡(BaAl₂O₄)发光膜,研究了合成条件对其结构和发光特性的影响.在退火温度达到700℃时,生成了BaAl₂O₄膜.Tm³⁺和Tb³⁺掺杂的BaAl₂O₄膜分别发蓝光和绿光,而Eu³⁺掺杂的BaAl₂O₄膜的发光既有Eu²⁺的特征发射——宽的蓝光发射带,也有Eu³⁺的特征发射——窄的红光发射峰.BaAl₂O₄:Tm³⁺的发射主峰位于462nm,在电压为5kV和电流密度为57μA/cm²的条件下,其阴极射线发光(CL)亮度可达25cd/m²,效率可达0.11lm/W.BaAl₂O₄:Tb³⁺的发射主峰位于549nm,在相同的条件下,其阴极射线发光亮度可达120cd/m²,效率可达0.55lm/W.BaAl₂O₄:Eu³⁺的发射主峰位于616nm,其阴极射线发光亮度为50cd/m²,效率为0.23lm/W.BaAl₂O₄:Eu²⁺发蓝光,峰值位于452nm,其阴极射线发光亮度为640cd/m²,效率为2.93lm/W.     

Scalable fabrication of Bi_2O_2Se polycrystalline thin film for near-infrared optoelectronic devices applications

We present a controlled, stepwise formation of layered semiconductor Bi_2O_2 Se thin films prepared via the vapour process by annealing topological insulator Bi_2Se_3 thin films in low oxygen atmosphere for different reactions. Photodetectors based on Bi_2O_2 Se thin film show a responsivity of 1.7×10~4 A/W at a wavelength of 980 nm. Field-effect transistors based on Bi_2O_2 Se thin film exhibit n-type behavior and present a high electron mobility of 17 cm~2/V·s. In addition, the electrical properties of the devices after 4 months keeping in the air shows little change, implying outstanding air-stability of our Bi_2O_2 Se thin films. From the obtained results, it is evident that low oxygen annealing is a surprisingly effective method to fabricate Bi_2O_2 Se thin films for integrated optoelectronic applications.     

Characterization of vertical Au/β-Ga_2O_3 single-crystal Schottky photodiodes with MBE-grown high-resistivity epitaxial layer

High-resistivity β-Ga_2O_3 thin films were grown on Si-doped n-type conductive β-Ga_2O_3 single crystals by molecular beam epitaxy(MBE).Vertical-type Schottky diodes were fabricated,and the electrical properties of the Schottky diodes were studied in this letter.The ideality factor and the series resistance of the Schottky diodes were estimated to be about1.4 and 4.6×10~6 Ω.The ionized donor concentration and the spreading voltage in the Schottky diodes region are about4×10~(18)cm~(-3) and 7.6 V,respectively.The ultra-violet(UV) photo-sensitivity of the Schottky diodes was demonstrated by a low-pressure mercury lamp illumination.A photoresponsivity of 1.8 A/W and an external quantum efficiency of8.7 ×10~2%were observed at forward bias voltage of 3.8 V,the proper driving voltage of read-out integrated circuit for UV camera.The gain of the Schottky diode was attributed to the existence of a potential barrier in the i-n junction between the MBE-grown highly resistive β-Ga_2O_3 thin films and the n-type conductive β-Ga_2O_3 single-crystal substrate.     

衬底温度对ZnO薄膜的结构和光学特性的影响

利用等离子体辅助分子束外延(P-MBE)设备在蓝宝石衬底上通过改变生长温度,制备了不同的ZnO样品.研究了衬底温度对ZnO的结构、光学和电学性质的影响.样品的晶体结构利用X射线衍射谱进行表征.X射线衍射谱表明,所有的ZnO样品都是(002)取向的六角纤锌矿结构.随着生长温度的升高,X射线的(002)衍射峰的半峰全宽逐渐...