N掺杂对β-Ga_2O_3薄膜日盲紫外探测器性能的影响

单斜氧化镓(β-Ga_2O_3)材料因其独特而优异的光电特性在日盲紫外探测领域具有广阔的应用前景,受到国内外研究者的广泛关注.本研究工作采用射频磁控溅射技术,在c面蓝宝石衬底上制备了未掺杂和氮(N)掺杂β-Ga_2O_3薄膜,研究了N掺杂对β-Ga_2O_3薄膜结构及光学特性的影响;在此基础上,构筑了未掺杂和N掺杂β-Ga_2O_3薄膜基金属-半导体-金属(metal-semiconductor-metal, MSM)型日盲紫外探测器,并讨论了N掺杂影响器件性能的物理机制.结果表明, N掺杂会导致β-Ga_2O_3薄膜表面形貌变得相对粗糙,且会促使β-Ga_2O_3薄膜由直接带隙向间接带隙转变.所有器件均表现出较高的稳定性和日盲特性,相比之下, N掺杂β-Ga_2O_3薄膜器件能展现出较低的暗电流和更快的光响应速度(响应时间和恢复时间分别为40和8 ms),与氧空位相关缺陷的抑制密切相关.本研究对开发新型的高性能日盲紫外探测器具有一定的借鉴意义.     

β-Ga_2O_3纳米材料的尺寸调控与光致发光特性

氧化镓(Ga_2O_3)纳米材料在紫外透明电极、高温气体传感器、日盲紫外探测器和功率器件等领域具有巨大的应用潜力,而实现高结晶质量和尺寸形貌可控的Ga_2O_3纳米材料是关键.本文通过水热法制备了不同尺寸的羟基氧化镓(GaOOH)纳米棒、纳米棒束和纺锤体,经后期高温煅烧均成功转变为高质量单晶_β-Ga_2O_3纳米材料并较好地保留了原始GaOOH的形态特征.利用X射线衍射(XRD)、拉曼散射光谱(Raman)和场发射扫描电子显微镜(FE-SEM)等表征手段系统研究了前驱液的pH值大小和阴离子表面活性剂浓度对GaOOH和_β-Ga_2O_3纳米材料晶体结构和表面形貌的影响,并深入探讨了不同条件下GaOOH纳米材料的生长机制.此外,室温光致发光谱(PL)测试发现不同形貌的β-Ga_2O_3纳米材料均展现出典型的蓝绿色发射峰和尖锐的红光发射峰,与纳米材料中本征缺陷的存在密切相关.上述研究结果为未来实现高质量β-Ga_2O_3纳米材料的可控制备提供了有益参考.     

基于MOCVD外延超薄氧化镓薄膜的高性能日盲和X射线探测器（特邀）

为了顺应光电探测器和阵列小尺寸、多功能、高密度集成的发展趋势,报告了一种基于超薄氧化镓(Ga_2O_3)制成的高性能日盲和X射线双功能探测器。基于金属有机化合物化学气相沉淀法,通过高温下的精细生长调控,实现了较薄厚度(70 nm)的高质量Ga_2O_3异质外延薄膜。得益于Ga_2O_3的超宽禁带和薄膜的高质量,基于此薄膜制备的金属-半导体-金属结构光电探测器在日盲紫外探测方面实现了5.5×10~7的光暗电流比,4.65×10~(15)Jones的探测率,3.53×10~4%的外量子效率,72.2 A/W的响应度,而且上述日盲紫外探测参数在不同的日盲光强下(14.7～548μW/cm~2)保持相对稳定;在X射线探测方面实现了1.91×10~4μC·cm~(-2)·Gy~(-1)的超高灵敏度,在等效厚度的情况下,超过之前报道的Ga_2O_3薄膜器件。同时,器件在较低的工作电压下,依然可以维持较高的综合性能。通过系统分析,薄膜质量的提升、本征氧空位电离和光致肖特基势垒降低效应等因素共同导致器件表现出针对日盲紫外和X射线的优良探测性能。此外,X射线诱导的级联效应也是超薄Ga_2O_3具备高X射线探测灵敏度的主要因素之一。该工作可为今后兼具高性能、低功耗的超薄日盲和X射线探测器提供有益的参考。     

β-Ga_2O_3纳米线的制备及其催化性能

使用磁控溅射方法制备了β-Ga_2O_3纳米线,并研究了催化性能.制备的样品具有很好的结晶度,衍射峰位对应β相Ga_2O_3.β-Ga_2O_3纳米线形貌为圆锥状,表面粗糙.226nm左右有明显的Ga_2O_3吸收峰,同时在512nm左右也有明显的催化剂Au的吸收峰.称取0.35mg的β-Ga_2O_3纳米线样品,加入300mL浓度为10~(-5) mol/L的亚甲基蓝溶液中,反应2h,降解率达到76.7%.     

镓基氧化物薄膜日盲紫外探测器研究进展EI北大核心CSCD

日盲紫外探测器在国防和民用领域均具有广阔的应用前景。基于宽禁带半导体材料的日盲紫外探测器具有无需昂贵的滤光片、工作电压低、全固态、体积小、重量轻、抗干扰能力强、工作温度范围广等特点,是公认的新一代紫外探测器。在众多的宽禁带半导体材料中,以Ga_(2)O_(3)作为典型代表的镓基氧化物材料因其优异的电学和光电特性已经成为近年来微电子学和光电子学领域的研究热点,特别是其本征日盲、耐高温、耐高压、化学稳定性好等优异特点使得该类材料在日盲紫外光电探测领域展现出巨大的发展潜力。鉴于此,本文综述了不同晶体结构的Ga_(2)O_(3)、镓酸盐氧化物、镓锡氧化物、镓铝氧化物等镓基氧化物薄膜及其日盲紫外探测器研究进展。     

三氧化二镓的高压拉曼光谱研究

β-Ga_2O_3是一种宽禁带半导体材料(E_g=4.8 eV)。研究β-Ga_2O_3在高压(高应力)条件下的相稳定性和晶格动力学特性对其材料应用具有重要的参考价值。目前关于Ga_2O_3在高压下的晶格动力学特性研究较少,且Ga_2O_3的β→α的高压相变压力仍然具有争议。本工作采用基于金刚石压砧(DAC)的高压拉曼光谱技术研究了Ga_2O_3的高压拉曼光谱特性与相变行为。研究发现β→α高压不可逆相变发生在22 GPa。本工作给出了α-Ga_2O_3和β-Ga_2O_3各拉曼振动模的压力系数与格林艾森参数,并发现β-Ga_2O_3的高频和低频拉曼模在压力系数方面存在着较大的非谐特性。     

氧化镓薄膜的制备及其日盲紫外探测性能研究

采用射频磁控溅射方法在蓝宝石单晶衬底上沉积氧化镓(Ga2O3)薄膜,并通过光刻剥离工艺(Lift-off)制备了金属-半导体-金属结构的Ga2O3日盲紫外探测器。对不同温度下沉积的Ga2O3薄膜分析表明,在800℃下获得的薄膜结晶质量最好,薄膜的导电性则随着沉积温度的上升先增大后减小。在800℃制备的β-Ga2O3薄膜的可见光透光率大于90%,光学吸收边在255 nm附近。在10 V偏压下,探测器的暗电流约为1n A,光电流达800 n A,对紫外光响应迅速。器件的响应度达到0.3 A/W,260 nm波长处的响应度是290 nm波长对应响应度的40倍,可实现日盲紫外波段的探测。     

β-Ga_2O_3 MOSFETs on the Si substrate fabricated by the ion-cutting process

β-Ga_2O_3 MOSFETs are demonstrated on heterogeneous Ga_2O_3-Al_2O_3-Si(GaOISi)substrate fabricated by ion-cutting process.Enhancement(E)-and depletion(D)-modeβ-Ga_2O_3 transistors are realized on by varying the channel thickness(T_(ch)).E-mode GaOISi transistor with a T_(ch)of 15 nm achieves a high threshold voltage V_(TH)of～8 V.With the same T increase,GaOISi transistors demonstrate more stable ON-current I_(ON)and OFF-current I_(OFF)performance compared to the reported devices on bulk Ga_2O_3 wafer.Transistors on GaOISi achieve the breakdown voltage of 522 and 391 V at 25°C and 200°C,respectively.     

超薄介质插层调制的氧化铟锡/锗肖特基光电探测器

本文通过在氧化铟锡(indium tin oxide, ITO)透明电极和锗(germanium, Ge)之间引入超薄氧化物介质层以调节其接触势垒高度,制备出低暗电流、高响应度的锗肖特基光电探测器.比较研究了采用不同种类介质Al_2O_3和MoO_3,以及不同掺杂浓度的锗和硅衬底上外延锗材料制作的ITO/Ge肖特基二极管特性.发现2 nm厚的Al_2O_3插层可有效提高ITO与n-Ge和i-Ge的接触势垒高度,而MoO_3插层对ITO与不同Ge材料的接触势垒高度影响不明显. ITO/Al_2O_3/i-Ge探测器由于其增大的势垒高度表现出性能最佳,暗电流(–4 V)密度低至5.91 mA/cm~2, 1310 nm波长处光响应度高达4.11 A/W.而基于硅基外延锗(500 nm)材料制作的ITO/Al_2O_3/Ge-epi光电探测器的暗电流(–4 V)密度为226.70 mA/cm~2, 1310 nm处光响应度为0.38 A/W.最后,使用二维位移平台对ITO/Al_2O_3/i-Ge光电探测器进行了单点成像实验,在1310 nm, 1550 nm两个波段得到了清晰可辨的二维成像图.     

无催化剂条件下长达毫米级的超宽Ga_2O_3单晶纳米带制备及特性

氧化镓(Ga_2O_3)单晶纳米带由于具有独特的性质在电子器件中具有潜在的应用,然而目前过小的接触面积使得基于这种纳米材料的器件制备变得非常复杂且充满挑战.本文利用碳热还原法,在无催化剂条件下使氧化镓粉末与碳纳米管在高温下反应,生长出不同结构的氧化镓纳米材料,发现了反应温度影响纳米结构的直径和比例的物理机制,并制备出了长达毫米级的超宽β-Ga_2O_3单晶纳米带,其横向尺寸可达44.3μm.利用透射电子显微镜(TEM)可以观察到纳米带呈单晶结构,进一步拉曼散射光谱(Raman)表明这种方法生长的β-Ga_2O_3纳米带的应变较小,缺陷密度较低,且室温光致发光谱(PL)显示该氧化镓纳米带在激发波长295 nm下发出425 nm的稳定且高亮度的蓝光.这种生长方法可为未来器件级氧化镓纳米带制备提供有益的参考.     

Luminescence properties of β-(Ga1−xInx)2O3 solid solutions

In this work, luminescence properties of β-(Ga_1−xIn_x)₂O₃ solid solutions were investigated with the purpose of making the new thermoluminophors for ultraviolet (UV) dosimetry. The doping of aliovalent cation admixture (Mg, Mo) in the β-Ga₂O₃ ceramic sample brings about the appearance of high-temperature thermoluminescence glow peaks with a maximum at 395 and 435 K. The maximum of the thermoluminophor photosensitivity shifts when the composition of solid solution changes.     

薄膜厚度对射频磁控溅射β-Ga2O3薄膜光电性能的影响

本文在室温下利用射频磁控溅射技术在(001)蓝宝石衬底上制备了不同厚度的β-Ga₂O₃薄膜,随后将其置于氩气气氛中800℃退火1 h.利用XRD,SEM,UV-Vis分光光度计、PL光致发光光谱仪和Keithley 4200-SCS半导体表征系统等考察薄膜厚度对所得氧化镓薄膜相组成、表面形貌、光学性能以及光电探测性能的影响.结果表明,随着薄膜厚度的增加,薄膜结晶质量提高,840 nm薄膜最佳,1050 nm薄膜结晶质量略有降低.不同厚度β-Ga₂O₃薄膜在波长200—300 nm日盲区域内均具有明显的紫外光吸收,禁带宽度随着薄膜厚度的增加而增加.PL谱中各发光峰峰强随着薄膜厚度的增加而减小,表明氧空位及其相关缺陷受到抑制.在β-Ga₂O₃薄膜基础上制备出日盲紫外光电探测器的探测性能(光暗电流比,响应度,探测率,外量子效率)也随薄膜厚度的增加呈先增后减的趋势.厚度约为840 nm的β-Ga₂O₃紫外光电探测器,在5...     

Enhanced luminescence from transparent Ni-doped MgO–Al2O3–SiO2 glass ceramics by Ga2O3 addition

Transparent Ni²⁺-doped MgO–Al₂O₃–SiO₂ glass ceramics without and with Ga₂O₃ were synthetized. The precipitation of spinel nanocrystals, which was identified as solid solutions in the glass ceramics, could be favored by Ga₂O₃ addition and their sizes were about 7.6 nm in diameter. The luminescent intensity of the Ni²⁺-doped glass ceramics was largely enhanced by Ga₂O₃ addition which could mainly be caused by increasing of Ni²⁺ in the octahedral sites and the reduction of the mean frequency of phonon density of states in the spinel nanocrystals of solid solutions. The full width at half maximum (FWHM) of emissions for the glass ceramics with different Ga₂O₃ content was all more than 200 nm. The emission lifetime increased with the Ga₂O₃ content and the longest lifetime is about 250 μs. The Ni²⁺-doped transparent glass ceramics with Ga₂O₃ addition have potential application as broadband optical amplifier and laser materials.     

Solid-state synthesis of potassium β- and β″-gallates

Direct synthesis of K-β- and β″-gallates by Ga₂O₃–K₂O solid-state reaction is described. The formation of K-β- or β″-gallates depends on the initial Ga₂O₃ phase. -Ga₂O₃ leads to K-β-gallate; β-Ga₂O₃ leads to K-β″-gallate. K-β″-Gallate is stable <1200°C. The high temperature stability of K-β″-gallate can be enhanced by doping with aliovalent ions.     

Self-assembly of β-Ga2O3 nanobelts

Self-assembly of β-Ga₂O₃ (beta-gallium oxide) nanobelts with diameters of 50–100 nm and lengths of tens to hundreds of microns have been studied using X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), and high-resolution transmission electron microscopy (HRTEM). Under appropriate conditions such as nanobelts concentration, controlled solvent evaporation, β-Ga₂O₃ nanobelts assemble into a fan-like structure on the substrate. A tendency of these nanobelts to align parallel to each other was also observed. The mechanism behind the formation of self-assembly of β-Ga₂O₃ nanobelts has been proposed on the basis of lateral capillary forces.     

基于旋涂法和电子束蒸发法制备的V2O5/Ag/V2O5叠层透明导电薄膜

利用溶胶-凝胶技术与电子束蒸镀相结合的方法在常温下制备了叠层V₂O₅/Ag/V₂O₅（VAV）透明导电薄膜,研究了各层薄膜厚度对叠层结构光电特性的影响。用原子力显微镜、紫外-可见光分光光度计、四探针电阻仪及开尔文探针对样品的表面形貌、光电性能及功函数等性质进行了表征。实验结果表明,该薄膜具有良好的光学和电学性质,可见光（380~780 nm）平均透过率达75%,迁移率为16.89 cm²/（V·s）,载流子浓度为－1.043×10²² cm^-3,方块电阻值为15.1 Ω/□,功函数为5.17 eV。该制备方法降低了V₂O₅薄膜的工艺制备难度,为该材料在太阳能电池中的应用创造了良好的前期基础。     

Dramatic reduction in dark current of β-Ga2O3 ultraviolet photodectors via β-(Al0.25Ga0.75)2O3 surface passivation

Solar-blind ultraviolet photodetectors with metal-semiconductor-metal structure were fabricated based on β -(Al_0.25Ga_0.75)₂O₃/β -Ga₂O₃ film grown by metal-organic chemical vapor deposition. It was known that various surface states increase dark current and a large number of defects can hinder the transport of carriers, resulting in low switching ratio and low responsivity of the device. In this work, β -(Al_0.25Ga_0.75)₂O₃ films are used as surface passivation materials. Owning to its wide band gap, we obtain excellent light transmission and high lattice matching with β -Ga₂O₃. We explore the change and mechanism of the detection performance of the β -Ga₂O₃ detector after β -(Al_0.25Ga_0.75)₂O₃ surface passivation. It is found that under the illumination with 254 nm light at bias 5 V, the β -(Al_0.25Ga_0.75)₂O₃/β -Ga₂O₃ photodetectors show dark current of just 18 pA and high current on/off ratio of 2.16×10⁵. The dark current is sharply reduced about 50 times after passivation of the β -Ga₂O₃ surface, and current on/off ratio increases by approximately 2 times. It is obvious that β -Ga₂O₃ detectors with β -(Al_0.25Ga_0.75)₂O₃ surface passivation can offer superior detector performance.     

High-responsivity solar-blind photodetector based on MOCVD-grown Si-doped β-Ga_2O_3 thin film

Si-doped β-Ga_2O_3 films are fabricated through metal-organic chemical vapor deposition(MOCVD). Solar-blind ultraviolet(UV) photodetector(PD) based on the films is fabricated by standard photolithography, and the photodetection properties are investigated. The results show that the photocurrent increases to 11.2 m A under 200 μW·cm-2254 nm illumination and ±20 V bias, leading to photo-responsivity as high as 788 A·W~(-1). The Si-doped β-Ga_2O_3-based PD is promised to perform solar-blind photodetection with high performance.     

Suppression of persistent photoconductivity in high gain Ga2O3 Schottky photodetectors

The defect-related photoconductivity gain and persistent photoconductivity (PPC) observed in Ga₂O₃ Schottky photodetectors lead to a contradiction between high responsivity and fast recovery speed. In this work, a metal-semiconductor-metal (MSM) Schottky photodetector, a unidirectional Schottky photodetector, and a photoconductor were constructed on Ga₂O₃ films. The MSM Schottky devices have high gain (> 13) and high responsivity (> 2.5 A/W) at 230-250 nm, as well as slow recovery speed caused by PPC. Interestingly, applying a positive pulse voltage to the reverse-biased Ga₂O₃/Au Schottky junction can effectively suppress the PPC in the photodetector, while maintaining high gain. The mechanisms of gain and PPC do not strictly follow the interface trap trapping holes or the self-trapped holes models, which is attributed to the correlation with ionized oxygen vacancies in the Schottky junction. The positive pulse voltage modulates the width of the Schottky junction to help quickly neutralize electrons and ionized oxygen vacancies. The realization of suppression PPC functions and the establishment of physical models will facilitate the realization of high responsivity and fast response Schottky devices.