Characteristics of pentacene organic thin film transistor with top gate and bottom contact

High performance pentacene organic thin film transistors (OTFT) were designed and fabricated using SiO₂ deposited by electron beam evaporation as gate dielectric material. Pentacene thin films were prepared on glass substrate with S--D electrode pattern made from ITO by means of thermal evaporation through self-organized process. The threshold voltage V_TH was --2.75± 0.1V in 0---50V range, and that subthreshold slopes were 0.42± 0.05V/dec. The field-effect mobility (μ_EF) of OTFT device increased with the increase of V_DS, but the μ_EF of OTFT device increased and then decreased with increased V_GS when V_DS was kept constant. When V_DS was --50V, on/off current ratio was 0.48× 10⁵ and subthreshold slope was 0.44V/dec. The μ_EF was 1.10cm²/(V.s), threshold voltage was --2.71V for the OTFT device.     

对以并五苯和酞菁铜为不同有源层的有机薄膜晶体管特性研究

通过扫描电镜和X射线衍射对SiO₂衬底上生长并五苯和酞菁铜薄膜的表面形貌进行表征,并得到在SiO₂衬底上生长的并五苯薄膜是以岛状结构生长,其大小约为100nm,且薄膜有较好的结晶取向,呈多晶态存在. 酞菁铜薄膜则没有表现出明显的生长机理,其呈非晶态存在. 还对通过掩膜的方法制作得以酞菁铜和并五苯为有源层的顶栅极有机薄膜晶体管的特性进行了研究. 有源层的厚度为40nm,绝缘层SiO₂的厚度为250nm,器件的沟道宽长比(W/关键词： 有机薄膜晶体管 并五苯薄膜 酞菁铜薄膜 μ_EF)')" href="#">场效应迁移率(μ_EF)     

The effect of annealing temperature and film thickness on the phase of pentacene on the p+-Si substrate

This paper investigates the morphology and crystallization properties of the two crystalline phases of pentacene grown by thermal evaporation on p^＋-Si substrates at room temperature by the methods of atomic force microscopy and x-ray diffraction. This kind of substrate induces a thin film phase and a triclinic phase which are formed directly onto p^＋-Si substrates and constitute a layer consisting of faceted grains with a step height between terraces of 15.8A（1A=0.1 nm） and 14.9A, respectively. Above the critical thickness of the thin film phase, lamellar structures are found with an increasing fraction with the increase of the film thickness. When the film thickness is fixed, the fraction of lamellar structures increases with the increase of annealing temperature. These lamellar structures are identified as the second phase with a interplanar distance of 14.9A corresponding to the pentacene triclinic phase. Furthermore, the thin film phase consisting of several micrometre sized uniformly oriented grains at an annealing temperature of less than 80℃ and a deposition rate of 0.6A/s is observed.     

不同绝缘层上生长的并五苯薄膜及其OTFT器件性能的研究

分别以SiO₂和PMMA为绝缘层材料制备了底栅顶接触结构的OTFT器件,得到以PMMA为绝缘层的器件具有更好的性能,其场效应迁移率为0.207 cm2·Vs-1,开关电流比为4.93×103,阈值电压为-4.3 V;而以SiO₂为绝缘层的器件,其场效应迁移率仅为0.039 cm2·Vs-1,开关电流比为5.98×102,阈值电压为-5.4 V。为分析器件性能差异的原因,测得了SiO₂和PMMA薄膜表面的AFM图谱及其上沉积并五苯薄膜后的AFM和XRD图谱。通过AFM图谱发现PMMA表面较SiO₂表面粗糙度小,其表面粗糙度的均方根值为0.216 nm,而二氧化硅薄膜表面粗糙度的均方根值为1.579 nm;且发现在PMMA上生长的并五苯薄膜的成膜质量优于在SiO₂,具有较大的晶粒尺寸和较少的晶粒间界。通过XRD图谱发现在PMMA上生长的并五苯薄膜具有明显的衍射峰,进一步证明了在PMMA上生长的并五苯薄膜具有更好的结晶状况,将更有利于载流子的传输。     

Si3N4做电子加速层的聚［2-甲氧基-5-(2-乙基-己氧基)-1，4-苯撑乙烯撑］固态阴极射线发光

用Si₃N₄作为电子加速层制备了固态阴极射线发光器件,其中发光层为聚［2-甲氧基-5-(2-乙基-己氧基)-1,4-苯撑乙烯撑］(MEH-PPV).在交流电压的驱动下,实现了MEH-PPV的固态阴极射线发光.与SiO₂做电子加速层的器件进行了对比研究,两种器件在交流电场的驱动下都得到了波峰位于417nm的短波长发光峰,它来自有机物中电子从最低未占分子轨道到最高占据分子轨道的直接复合发光,这进一步证明了固态阴极射线理论的正确性.在交流高场下比 关键词： 固态阴极射线发光 3N₄')" href="#">Si₃N₄ 电子加速层 电致发光     

Si3N4做电子加速层的聚[2-甲氧基-5-(2-乙基-己氧基)-1,4-苯撑乙烯撑]固态阴极射线发光

用Si3N4作为电子加速层制备了固态阴极射线发光器件,其中发光层为聚[2-甲氧基-5-(2-乙基-己氧基)-1,4-苯撑乙烯撑](MEH-PPV).在交流电压的驱动下,实现了MEH-PPV的固态阴极射线发光.与SiO2做电子加速层的器件进行了对比研究,两种器件在交流电场的驱动下都得到了波峰位于417 nm的短波长发光峰,它来自有机物中电子从最低未占分子轨道到最高占据分子轨道的直接复合发光,这进一步证明了固态阴极射线理论的正确性.在交流高场下比较了Si3N4和SiO2的电子加速能力,发现SiO2的电子加速能力要优于Si3N4的电子加速能力.