Analytical model of electron transport characteristics for 4H-SiC material and devices

Based on 4H-SiC material parameters, three different analytical expressions are used to characterize the electron mobility as the function of electric field. The first model is based on simple saturation of the steady-state drift velocity with electric field (conventional three-parameter model for silicon). The second GaAs-based mobility model partially reflects the peak velocity in high electric fields. The third multi-parameter model proposed in this paper is more realistic since it well reproduces the drift velocity－field characteristics obtained by Monte Carlo calculations, revealing the peak drift velocity with subsequent saturation at higher electric fields. Thus, the drift velocity model presented in this paper is much better for device simulation. In this paper, the influence of mobility model on DC characteristics of 4H-SiC MESFET is calculated and the better accordance with the experimental results is presented with multi-parameter model.     

Raman scattering studies on manganese ion-implanted GaN

This paper reports that the Raman spectra have been recorded on the metal-organic chemical vapour deposition epitaxially grown GaN before and after the Mn ions implanted. Several Raman defect modes have emerged from the implanted samples. The structures around 182 cm^-1 modes are attributed to the disorder-activated Raman scattering, whereas the 361 cm^-1 and 660 cm^-1 peaks are assigned to nitrogen vacancy-related defect scattering. One additional peak at 280 cm^-1 is attributed to the vibrational mode of gallium vacancy-related defects and/or to disorder activated Raman scattering. A Raman-scattering study of lattice recovery is also presented by rapid thermal annealing at different temperatures between 700 °C and 1050 °C on Mn implanted GaN epilayers. The behaviour of peak-shape change and full width at half maximum (FWHM) of the A₁(LO) (733 cm^-1) and E^H₂ (566 cm^-1) Raman modes are explained on the basis of implantation-induced lattice damage in GaN epilayers.     

Fabrication and characterization of the normally-off N-channel lateral 4H–SiC metal–oxide–semiconductor field-effect transistors

In this paper, the normally-off N-channel lateral 4H–Si C metal–oxide–semiconductor field-effect transistors(MOSFFETs) have been fabricated and characterized. A sandwich-(nitridation–oxidation–nitridation) type process was used to grow the gate dielectric film to obtain high channel mobility. The interface properties of 4H–Si C/SiO_2 were examined by the measurement of HF I–V, G–V, and C–V over a range of frequencies. The ideal C–V curve with little hysteresis and the frequency dispersion were observed. As a result, the interface state density near the conduction band edge of 4H–Si C was reduced to 2 × 10~(11) e V~(-1)·cm~(-2), the breakdown field of the grown oxides was about 9.8 MV/cm, the median peak fieldeffect mobility is about 32.5 cm~2·V~(-1)·s~(-1), and the maximum peak field-effect mobility of 38 cm~2·V~(-1)·s~(-1) was achieved in fabricated lateral 4H–Si C MOSFFETs.     

Atomic-layer-deposited Al_2O_3 and HfO_2 on InAlAs: A comparative study of interfacial and electrical characteristics

Al_2O_3 and HfO_2 thin films are separately deposited on n-type InAlAs epitaxial layers by using atomic layer deposition(ALD).The interfacial properties are revealed by angle-resolved x-ray photoelectron spectroscopy(AR-XPS).It is demonstrated that the Al_2O_3 layer can reduce interfacial oxidation and trap charge formation.The gate leakage current densities are 1.37×10~6 A/cm~2 and 3.22×10~6 A/cm~2 at+1V for the Al_2O_3/InAlAs and HfO_2/InAlAs MOS capacitors respectively.Compared with the HfO_2/InAlAs metal-oxide-semiconductor(MOS) capacitor,the Al_2O_3/InAlAS MOS capacitor exhibits good electrical properties in reducing gate leakage current,narrowing down the hysteresis loop,shrinking stretch-out of the C-V characteristics,and significantly reducing the oxide trapped charge(Q_(ot)) value and the interface state density(D_(it)).     

A quantum explanation of the magnetic properties of Mn-doped graphene

Mn-doped graphene is investigated using first-principles calculations based on the density functional theory(DFT).The magnetic moment is calculated for systems of various sizes,and the atomic populations and the density of states(DOS)are analyzed in detail.It is found that Mn doped graphene-based diluted magnetic semiconductors(DMS)have strong ferromagnetic properties,the impurity concentration influences the value of the magnetic moment,and the magnetic moment of the 8×8 supercell is greatest for a single impurity.The graphene containing two Mn atoms together is more stable in the 7×7 supercell.The analysis of the total DOS and partial density of states(PDOS)indicates that the magnetic properties of doped graphene originate from the p–d exchange,and the magnetism is given a simple quantum explanation using the Ruderman–Kittel–Kasuya–Yosida(RKKY)exchange theory.     

Effect of substrate doping on the flatband and threshold voltages of strained-Si pMOSFET

The effect of substrate doping on the flatband and threshold voltages of strained-Si/SiGe p metal-oxide semiconductor field-effect transistor (pMOSFET) has been studied. By physically deriving the models of the flatband and threshold voltages, which have been validated by numerical simulation and experimental data, the shift in the plateau from the inversion region to the accumulation region as the substrate doping increases has been explained. The proposed model can provide valuable reference to the designers of strained-Si devices and has been implemented in software for extracting the parameters of strained-Si MOSFET.     

Study of a double epi-layers SiC junction barrier Schottky rectifiers embedded P layer in the drift region

<正>This paper proposes a double epi-layers 4H—SiC junction barrier Schottky rectifier(JBSR) with embedded P layer (EPL) in the drift region.The structure is characterized by the P-type layer formed in the n-type drift layer by epitaxial overgrowth process.The electric field and potential distribution are changed due to the buried P-layer,resulting in a high breakdown voltage(BV) and low specific on-resistance(R_(on,sp)).The influences of device parameters,such as the depth of the embedded P+ regions,the space between them and the doping concentration of the drift region,etc.,on BV and R_(on,sp) are investigated by simulations,which provides a particularly useful guideline for the optimal design of the device.The results indicate that BV is increased by 48.5%and Baliga's figure of merit(BFOM) is increased by 67.9%compared to a conventional 4H-SiC JBSR.     

一种新型的光控光导半导体开关解析模型

建立了一个新型的光控光导半导体开关（简称光导开关）解析模型,该模型通过拉氏变换求解了连续性方程,考虑了载流子的表面复合和体复合效应、载流子输运过程中的载流五－载流子散射效应和漂移速度的负微分效应、光作用过程的丹倍效应和光的反射、光强随深度的衰减效应。计算了光导开关的几个重要参考并获得了开关电流和输出电压等的波形,。计算表明光电导的关系在所谓的“线性模式”下并非是严格线性的。最后将计算结果与实验结果进行了比较,两者相符较好。     

Efficient thermal analysis method for large scale compound semiconductor integrated circuits based on heterojunction bipolar transistor

In this paper, an efficient thermal analysis method is presented for large scale compound semiconductor integrated circuits based on a heterojunction bipolar transistor with considering the change of thermal conductivity with temperature.The influence caused by the thermal conductivity can be equivalent to the increment of the local temperature surrounding the individual device. The junction temperature for each device can be efficiently calculated by the combination of the semianalytic temperature distribution function and the iteration of local temperature with high accuracy, providing a temperature distribution for a full chip. Applying this method to the InP frequency divider chip and the GaAs analog to digital converter chip, the computational results well agree with the results from the simulator COMSOL and the infrared thermal imager respectively. The proposed method can also be applied to thermal analysis in various kinds of semiconductor integrated circuits.     

基于分布活化能模型法的农林生物质热解动力学对比研究

采用热重质谱（TG-MS）联用技术,考察杏壳、小麦秸秆与杨树木屑等典型农林生物质的热解行为及动力学。结果表明,组分差异使得三种生物质在主要反应区间内（200–450℃）表现出不同的特征。采用等转化率法计算发现,杏壳平均活化能为188.22 kJ/mol,秸秆平均活化能为220.77 kJ/mol,木屑平均活化能为175.87 kJ/mol。利用分布活化能模型（DAEM）法计算生物质中各组分的平均活化能,发现三种生物质中存在平均活化能较高的第四组分（杏壳297.44 kJ/mol、秸秆284.35 kJ/mol和木屑309.96 kJ/mol）,而半纤维素与纤维素呈现“秸秆<杏壳<木屑”规律。各类动力学计算方法能够互为补充,等转化率方法的整体计算结果与单组分分布活化能模型法结果接近,方法更简便,而分布活化能模型法可以求得原料不同组分的动力学参数,弥补等转化率法的不足,综合使用可以形成对热解反应更为全面的认识。