Zn1-x MgxS薄膜的磁控溅射制备及其性能研究

利用双靶磁控溅射法,在普通石英玻璃基底上成功制备出II-VI族化合物固溶体半导体Zn1-xMgxS多晶薄膜,并用X射线能量色散谱仪(EDS)、原子力显微镜(AFM)、X射线衍射仪(XRD)、紫外-可见(UV-V is)分光光度计、荧光分光光度计(PL)等测试手段表征了多晶薄膜的成份、表面形貌、晶体结构和光学性质。结果表明:磁控溅射法制备的Zn1-xMgxS多晶薄膜具有立方和六方相混晶相结构,晶粒生长均匀,薄膜在波长小于280nm的紫外区有强烈的吸收,在可见光区紫光范围有一个强的发光峰,而且随着Mg含量的增加,强度增加,吸收边和发光峰的蓝移也增加。蓝移说明了带隙的展宽,其禁带宽度大约从3.6 eV增至4.4 eV。较高的结晶质量和发光特性显示了它是一种制作短波光电器件和紫外探测器的理想材料。     

铝诱导非晶硅薄膜的场致低温快速晶化及其结构表征

铝诱导非晶硅薄膜晶化可以降低退火温度、缩短退火时间，是制备多晶硅薄膜的一种重要方法.在此基础上，通过在退火过程中加入电场加速了界面处硅、铝原子间的互扩散，实现了非晶硅薄膜的快速低温晶化.实验结果表明，外加电场，退火温度为400℃，退火时间为60min时，薄膜的晶化率大于60％；退火温度为450℃退火时间为30min时，薄膜已经呈现明显的晶化现象；退火温度为500℃退火时间为15min时，薄膜的x射线多晶峰强度与非晶峰强度之比为未加电场的3—4倍. 关键词： 非晶硅薄膜 多晶硅薄膜 外加电场     

多晶薄膜表面粗化与生长方式转变

采用原子力显微镜研究了磁控溅射多晶薄膜表面粗化行为对归一化沉积温度T_s/T_m(T_s是沉积温度，T_m是材料熔点)的依赖性与薄膜生长方式转变行为.随着T_s/T_m增加，薄膜表面粗糙度增加，而表征粗糙度随时间演化特征的生长指数β历经了先减小再增加的过程.β对T_s/T_m的依赖关系反映了薄膜生长方式的转变行为，即薄膜生长依次由随机生长方式向表面扩散驱动生长方式与异常标度行为生长方式转变.在低于体扩散控制薄膜生长的温度时，晶界扩散机理导致多晶薄膜的表面粗化的异常标度行为. 关键词： 多晶薄膜 表面粗化 温度 生长     

Dynamic Ni gettered by PSG from S-MIC poly-Si and its TFTs

A dynamic phosphor-silicate glass （PSG） gettering method is proposed in which the processes of the gettering of Ni by PSC and the crystallizing of α-Si into poly-Si by Ni take place simultaneously. The effects of PSC gettering process on the performances of solution-based metal induced crystallized （S-MIC） poly-Si materials and their thin film transistors （TFTs） are discussed. The crystallization rate is much reduced due to the fact that the Ni as a medium source of crystallization is extracted by the PSC during crystallization at the same time. The boundary between two neighbouring grains in S-MIC poly-Si with PSG looks blurrier than without PSG. Compared with the TFTs made from S-MIC poly-Si without PSC gettering, the TFTs made with PSC gettering has a reduced gate induced leakage current.     

Specific Features of the Adsorption of Carbon Monoxide on a Smooth Polycrystalline Platinum Electrode Modified with Adsorbed Silver Atoms

The adsorption of carbon monoxide at the surface of smooth polycrystalline platinum (smPt) is studied in conditions of a preliminary accumulation of various quantities of silver (θ_Ag) on the surface. A comparison with similar data obtained previously for Pt/Pt is conducted. It is discovered that on smPt, exactly as in the case of Pt/Pt, carbon monoxide undergoes adsorption at sites that are not occupied by adsorbed silver, without forcing the preliminarily adsorbed silver out. At small and intermediate Ag_ad, as opposed to Pt/Pt, a mere two peaks are observed in a voltametric curve in the region of electrodesorption of the mixed layer on smPt. It is shown that, in the region of potentials of the first peak, there occurs practically no transition of silver into solution in the course of oxidation of the mixed layer. Specific features that characterize the behavior of the CO_ads + Ag_ad mixed layer are discussed under the assumption about an “islet” character of the adsorption of silver.     

多晶La0.7Sr0.3MnO3的低温输运性质和磁电阻效应

详细研究了由纳米晶粒组成的块体多晶La_0.7Sr_0.3MnO₃(LSM)的电阻率和磁电阻效应,以及它们的温度依赖性.随着温度从室温降低,电阻率(ρ)在250K附近存在一最大值,低于该温度后,样品表现为金属导电特性,随后在50K附近存在一极小值.也就是说在低于50K的温度范围内,随着温度降低ρ反而升高,表现为绝缘体性的导电特性.经研究发现,这种随温度降低ρ反而增加的现象与隧穿效应的理论模型(lnρ∝T^-1/2)符合得很好 关键词： 0.7Sr_0.3MnO₃')" href="#">多晶La_0.7Sr_0.3MnO₃ 隧道效应 隧道磁电阻效应     

多晶硅薄膜低温生长中晶粒大小的控制

以SiCl4H2为气源,用等离子体增强化学气相沉积(PECVD)方法低温快速沉积多晶硅薄膜.实验发现,在多晶硅薄膜的生长过程中,气相空间各种活性基团的相对浓度是影响晶粒大小的重要因素,随功率、H2/SiCl4流量比的减小和反应室气压的增加,晶粒增大.而各种活性基团的相对浓度依赖于PECVD工艺参数,通过工艺参数的改变,分析生长过程中空间各种活性基团相对浓度的变化,指出“气相结晶”过程是晶粒长大的一个重要因素. 关键词： 气相结晶 多晶硅薄膜 晶粒生长 SiCl4     

ELECTRODEPOSITION OF POLYCRYSTALLINE Cd-RICH Hg_(1-x)Cd_xTe AND PHOTOELECTROCHEMICAL BEHAVIOR OF Hg_(0.09)Cd_(0.91)Te THIN FILM

Electrodeposition process of polycrystalline Cd-rich Hg_(1-z)Cd_xTe (x>0.5) in acidic bath of CdSO_4+HTeO_2~+HgCl_2 was investigated. The simultaneous electrodeposition technique of three kinds of ions at the same potential has been achieved. The XRD, SEM and EDAX analysis of the thin film electrodeposited on titanium substrate showed a typical cubic zinc blende polycrystalline structure and homogeneous dispersion. The photoelectrochemical behavior of (1-x)=0.09 polycrystalline thin film in a polysulfide redox couple solution was examined. Under illumination of 100 mW/cm~2, the short circuit photocurrent I_(sc)=1.88 mA/cm~2, the open circuit photovoltage V_(oc)=0.25 V, the fill factor F·F=0.22. The bandgap E_g measured with photoelectrochemical spectroscopy is 1.26 eV. Flatband potential φ_(tb), Obtained from Mott-Schottky curve is -1.26 Ⅴ (vs. SCE). Therefore, the obtainable maximum open circuit photovoltage could be 0.49 Ⅴ. The Cd-rich Hg_(1-x)Cd_x Te thin film should be a potential photoactive el     

硅薄膜太阳能电池研究的进展

从制备方法、材料和结构的观点出发,概述非晶硅（a-Si)和多晶硅（poly-Si)薄膜太阳能电池研究的进展。对非晶硅特别是对多晶硅薄膜太阳能电池研究的重要结果进行了讨论。阐述非晶硅太阳能电池的各种应用,并对其光电系统进行介绍。对太阳能电池新产品如太阳能电池屋顶瓦及超轻灵活的太阳能电池的开发也作了简介。对由太阳能电池提供动力的空调设备作了叙述。讨论所得出的创新方案。     

基于PECVD制备多晶硅薄膜研究

基于PECVD以高纯SiH4为气源研究制备多晶硅薄膜,在衬底温度550℃、射频(13.56MHz)电源功率为20W直接沉积获得多晶硅薄膜.采用X射线衍射仪(XRD) 和场发射扫描电子显微镜(SEM) 对多个样品薄膜的结晶情况及形貌进行分析,薄膜结晶粒取向均为<111>、<220>、<311>晶向.对550℃沉积态薄膜在900℃、1100℃时进行高温退火处理,硅衍射峰明显加强.结果表明,退火温度越高,退火时间越长,得到多晶硅薄膜表面晶粒趋于平坦,择优取向为<111>晶向,晶粒也相对增大.