不同溶胶体系对纳米氧化锌发光特性的影响

采用溶胶-凝胶工艺制备ZnO纳米粉体,研究了两种不同溶剂下制备的纳米ZnO的荧光特性。实验结果表明两种氧化锌样品有相同的晶型和能带结构,其紫外发光相似,但其带间的可见发射表现出了巨大差异,其原因在于两溶剂的极性不同导致两体系凝胶、烧结的微过程不同,从而使两种ZnO样品的表面态结构和布局发生变化。     

溶剂对块体La基气凝胶性能的影响

采用溶胶-凝胶工艺,以氯化镧(LaCl3·7H2O)为前驱体,以甲醇和乙醇为溶剂,聚丙烯酸为分散剂,环氧丙烷为凝胶促进剂,分别合成两种性能不同的稀土La基气凝胶。采用扫描电子显微镜、傅里叶红外光谱仪、比表面积与孔径分析仪、力学性能测试仪对不同溶剂制备的两种稀土La基气凝胶的微观结构、成分、比表面积、孔径分布和力学性能进行了研究表征。结果表明,以甲醇和乙醇为溶剂制备的稀土La基气凝胶都具有纳米多孔材料的典型特征,由大量nm量级的球形和长条形颗粒胶连而成,孔洞结构丰富。以乙醇为溶剂制备的稀土La基气凝胶的网络骨架更纤细,孔洞更大,比表面积达到220m2·g-1,密度约为160mg·cm-3,但力学性能较差。而以甲醇为溶剂制备的稀土La基气凝胶的网络骨架更强壮,孔洞更小,比表面积达到95m2·g-1,密度约为350mg·cm-3,力学性能较好。样品性能上的差异可能是由甲醇的极性比乙醇的极性强引起的。     

形貌依赖的ZnO阴极射线发光性质研究

采用溶剂热法,通过调节水和乙醇混合液的比例制备了多种形貌的ZnO微米结构。利用扫描电子显微镜（SEM）对ZnO微米结构的形貌及尺寸进行了观察。采用可以实现纳米级微观区域光谱采集的阴极射线发光（CL）技术,对不同形貌的单个粒子的光谱进行精细表征,获得了位置依赖的ZnO阴极射线发光数据。实验结果表明：ZnO材料的发光性质与形貌有关,由于形貌差异导致其局部结晶质量、界面缺陷、表面电荷分布、表面晶面等方面的差异,几种因素共同作用决定其最终的发光性质。     

隔热材料的纳米成型与性能分析

经不同工艺和过程制备二氧化硅气凝胶,初步摸索出制备温度、溶剂、催化剂、反应时间最佳参数.在分析气凝胶干燥开裂的原因后,以三甲基氯硅烷(TMCS)为表面修饰剂,正己烷为干燥介质的表面改性工艺,一定程度控制了气凝胶的干燥收缩和开裂.在室温、常压下的通过不同的改性方案制备出四种不同气凝胶样品,揭示了改性条件、干燥温度对于气凝胶孔隙分布、微观结构的影响.     

无催化法制备低密度三聚氰胺-甲醛气凝胶

 以三聚氰胺和多聚甲醛为原料,二甲基亚砜为溶剂制备三聚氰胺-甲醛(MF)气凝胶,湿凝胶经超临界干燥,制备出密度最低可达70 kg/m3的MF气凝胶。采用红外吸收光谱、场发射扫描电镜、N2吸附-脱吸附分析和热失重分析表征了MF气凝胶的组成、微结构以及热性能。结果表明:以二甲基亚砜为溶剂制备的MF气凝胶,虽然其微观结构较以水为溶剂的气凝胶差,比表面积及孔径分布均一性均降低,但是其热稳定性有所提高。     

间苯三酚-甲醛气凝胶及其碳气凝胶的制备与表征

 以间苯三酚(P)和甲醛(F)为原料，经溶胶-凝胶、溶剂交换、超临界干燥和碳化等过程制备出了间苯三酚-甲醛气凝胶(PF)及其碳气凝胶(CPF)。测试结果表明气凝胶具有比较高的比表面积、是一种连续nm级3维网络结构的多孔材料；碳化后密度和平均孔径增大，比表面积基本无变化，且仍然维持气凝胶的网络结构。催化剂摩尔比决定气凝胶的微观结构，反应物质量分数控制着气凝胶密度。通过优化制备条件，可以制备出能满足惯性约束聚变(ICF)靶需要的不同结构和不同密度的气凝胶。     

Co掺杂的ZnO室温铁磁半导体材料制备与磁性和光学特性研究

采用溶胶-凝胶法制备出具有室温铁磁性的Co掺杂的ZnO稀磁半导体材料. 通过对样品的结构、磁性和发光特性的研究发现,样品具有室温铁磁性,并发现其铁磁性源于磁性离子对ZnO中Zn离子的取代. 对不同温度制备的样品的磁性以及其发光特性的变化研究发现,样品的铁磁性与样品中锌间隙位（Zn_i）缺陷的密度有关. 关键词： ZnO 稀磁半导体 铁磁性     

溶胶凝胶旋转涂敷技术制备ZnO:In薄膜的结构特性

采用溶胶凝胶法,结合旋转涂敷技术在石英衬底上制备了210—240nm厚度的ZnO∶In薄膜.使用掠角入射X射线衍射(GI_XRD)、常规X射线衍射、傅里叶变换红外光谱、原子力显微镜、光致发光谱以及不同入射角GI_XRD谱(α=1,2,3和5°)等手段,对不同掺杂浓度的ZnO∶In薄膜进行了结构分析.发现ZnO∶In薄膜内部是由大尺寸(002)晶向的无应力ZnO晶粒堆积而成,而薄膜表面主要是小尺寸的(002)和(103)晶粒,并且适量的In掺杂能有效改善ZnO薄膜内部的晶体结构特性. 关键词： ZnO∶In薄膜 晶体结构 掠角入射X射线衍射 溶胶凝胶法     

高压对纳米ZnO和ZnO/SnO2复合材料的结构和发光性能的影响

 利用溶胶-凝胶法制备出了纳米晶ZnO与含有3%摩尔分数SnO₂的ZnO/SnO₂复合材料,在六面顶压机上对制备出的两种样品进行了室温下、6GPa的高压处理。采用X射线衍射（XRD）、透射电子显微镜（TEM）和光致荧光谱（PL）等方法,对高压处理前后样品的结构和发光性质进行了表征。结果表明：高压处理后回收到的纳米晶ZnO和ZnO/SnO₂复合材料的平均粒径分别减小5.9%和26.3%;高压处理后ZnO和ZnO/SnO₂复合材料光致发光谱的发光带强度都有所降低,但ZnO/SnO₂复合材料发光带强度降低幅度比纯ZnO小,对产生这些现象的原因进行了讨论。     

ZnO/SiO2 复合薄膜的光学性能

采用溶胶-凝胶法在玻璃衬底上制备ZnO/SiO₂复合薄膜,分别用XRD、TEM、SEM对样品的结构和形貌进行表征,并研究了不同ZnO含量对复合薄膜透过率及荧光特性的影响。结果表明,样品经500 ℃退火处理生成了SiO₂和ZnO,其晶粒尺寸为18.7 nm,薄膜具有双层结构。复合薄膜的透过率随着其中ZnO含量的增加而降低,禁带宽度减小,光学吸收边红移。样品在355 nm波长激发下产生了384 nm的紫外发射峰和440 nm的蓝光发射带,并随ZnO含量的增加而增强,它们分别来自ZnO的电子-空穴复合发光和缺陷发光,及ZnO/SiO₂复合薄膜双层结构的缺陷发光。     

Modified thermal evaporation process using GeO2 for growing ZnO structures

In the current work, zinc oxide (ZnO) nano/microstructures are synthesized using a modified thermal-evaporation process by introducing germanium oxide (GeO₂) powder mixed with metallic Zn powder as the raw material. Without the use of any catalyst and oxygen flow in the furnace system, GeO₂ is utilized to provide an oxygen source for the growth of ZnO structure. The samples are treated by different temperatures ranging from 500 to 900 °C. Morphology, phase structure, and photoluminescence properties are investigated by scanning electron microscopy (SEM), X-ray diffractometer (XRD) and photoluminescence (PL) spectrometer. The structures and morphologies of the samples were found to vary with growth temperature. The XRD diffraction peaks show that the films grown at temperature from 600 to 800 °C consist of hexagonal wurtzite ZnO structures. Room-temperature PL measurement revealed ZnO spectra representing two bands: near-band-edge emission in the ultraviolet (UV) region and broad deep-level emission centered at about 500 nm. The strong UV emission in the PL spectra indicates that the GeO₂ supplies sufficient oxygen for formation of ZnO structures with few oxygen vacancies. The growth mechanism and the roles of GeO₂ for formation of ZnO structures are discussed in detail.     

Synthesis and characterization of ZnO nanoparticles using polyethylene glycol (PEG)

ZnO nanoparticles and ZnO encapsulated with polyethylene glycol (PEG) was synthesized using zinc acetate as a precursor at low temperature and characterized by different techniques. The influence of the types of solvent, synthesis parameters, and PEG encapsulation on the crystallization, the surface morphology, and the luminescent properties of ZnO nanoparticles prepared by the sol–gel process were investigated. The influence of different addition molar masses of the PEG during the synthesis on the ZnO emission peaks was systematically monitored. The crystallinity, the surface morphology, and the photoluminescence (PL) properties of ZnO depended highly on the synthesis process and PEG encapsulation. X-ray diffraction (XRD) spectra of ZnO nanoparticles show that all the peaks corresponding to the various planes of wurtzite ZnO indicate the formation of a single phase. The absorption edges of these ZnO nanoparticles are shifted by additions of the PEG polymer. The photoluminescence (PL) characterization of the ZnO nanostructures exhibited a broad emission in the visible range with maximum peak at 450 and/or 560 nm.     

氢化后ZnO发光性质的变化

通过低温光致发光(PL)谱研究氢化对ZnO发光性质的影响。氢通过一个直流等离子体发生装置引入到ZnO晶体。研究发现氢的引入影响了束缚激子的相对发光强度,特别是I4峰(3.363eV)的强度增加和3.366eV峰出现。比较未氢化样品,氢化样品PL谱显示不同的温度依赖。     

原子层沉积制备氧化锌纳米薄膜的光学性质研究

采用原子层沉积技术(ALD),以二乙基锌和水为前驱体,在衬底温度分别为110和190 ℃的条件下制备了致密的氧化锌纳米薄膜。采用X射线光电子能谱,荧光光谱和椭偏仪等表征手段对薄膜的成分和光学性质进行了研究。结果表明,随着沉积温度的增加,氧化锌薄膜内—OH含量降低,说明氧化锌薄膜生长过程中的化学反应更加完全;另外,沉积温度增加后,薄膜在365 nm处的激子发射峰出现了明显的增强,同时可见光区的荧光发射峰消失,表明薄膜内的缺陷态减少。随着成膜质量的提高,氧化锌薄膜的电子迁移率从25提高至32 cm2·(V·S)-1。椭偏测量的拟合结果表明,在375～800 nm的波长范围内,氧化锌薄膜的折射率逐渐从2.33降至1.9,呈现出明显的色散现象;另外,不同温度下制备的氧化锌薄膜光学带隙均为3.27 eV左右,这说明沉积温度对薄膜的带隙没有明显影响。     

退火温度对ZnO薄膜结构和发光特性的影响

采用反应射频磁控溅射法在 Si(100)基片上制备了高c轴择优取向的ZnO薄膜，研究了退火温度对ZnO薄膜的晶粒尺度、应力状态、成分和发光光谱的影响，探讨了ZnO薄膜的紫外发光光谱和可见发光光谱与薄膜的微观状态之间的关系.研究结果显示,在600—1000℃退火温度范围内，退火对薄膜的织构取向的影响较小，但薄膜的应力状态和成分有比较明显的变化.室温下光致发光光谱分析发现，薄膜的近紫外光谱特征与薄膜的晶粒尺度和缺陷状态之间存在着明显的对应关系；而近紫外光谱随退火温度升高所呈现的整体峰位红移是各激子峰相对比例变 关键词： ZnO薄膜 退火 光致发光 射频反应磁控溅射 可见光发射     

Temperature and concentration dependences of the photoluminescence of MEH-PPV polymer composite films with ZnO nanoparticles

The absorption and photoluminescence (PL) spectra of MEH-PPV: ZnO composite films have been investigated at different concentrations of ZnO nanoparticles and at different temperatures (in the case of PL). It has been shown that, at 297 K, with increasing concentration of ZnO nanoparticles in the composite, the intensity of the PL lines of MEH-PPV decreases, whereas the intensity of the PL lines of ZnO increases. At a relatively low concentration of ZnO nanoparticles, a decrease in the temperature leads to an increase in the intensity of PL lines associated with MEH-PPV and ZnO, whereas at higher concentrations of ZnO nanoparticles, the intensity of these lines decreases. This is accompanied by a slight shift in the maximum of the PL toward the infrared (IR) region and a narrowing of the PL line of MEH-PPV with a decrease in the temperature and with an increase in the ZnO concentration. The mechanism of energy transfer in composite systems consisting of a polymer and inorganic nanoparticles that can be responsible for the observed effects has been discussed.     

LiGaO2衬底上ZnO外延膜的结构与光学特性

采用磁控溅射法在(001),(100)及(010)LiGaO2衬底上制备了ZnO薄膜,通过X射线衍射(XRD)、原子力显微镜(AFM)、透过光谱以及光致发光谱(PL)对薄膜的结构、形貌及光学性质进行了表征.结果表明LiGaO2衬底不同晶面上制备的ZnO薄膜具有不同的择优取向,在(001)、(100)及(010)LiGaO2上分别获得了[001]、[1100]及[1120]取向的ZnO薄膜;不同取向的ZnO薄膜表面形貌差异较大;薄膜在可见光波段具有较高的透过率;在ZnO薄膜的光致发光谱中只观察到了位于378 nm的紫外发射峰,而深能级发射几乎观察不到,(1100)取向的薄膜紫外发射峰强度最大,半高宽也最小,薄膜光致发光件质的差异丰要和晶粒尺寸有关.     

Electrical and deep levels characteristics of ZnO/Si heterostructure by MOCVD deposition

ZnO films have been prepared on p-type Si substrates by metal-organic chemical vapour deposition （MOCVD） at different total gas flow rates. The current versus voltage and temperature （I - V - T） characteristics, the deep-level transient spectroscopy （DLTS） and the photoluminescence （PL） spectra of the samples were measured. DLTS shows two deep-level centres of E1 （Ec-0.13±0.02eV） and E2 （Ec-0.43±0.05eV） in sample 1202a, which has a ZnO/p-Si heterostructure. A deep level at Ec-0.13±0.01 eV was also obtained from the I -T characteristics. It was considered to be the same as E1 obtained from DLTS measurement. The emission related to this deep level center was detected by PL spectra. In addition, the energy location and the relative trap density of E1 was varied when the total gas flow rate was changed.     

Dominant ultraviolet-blue photoluminescence of ZnO embedded into synthetic opal

The temperature-dependent photoluminescence (PL) characteristics of zinc oxide (ZnO) embedded into the voids of synthetic opal were studied. ZnO was infiltrated into opal from aqueous solution with zinc nitrate precursor followed by thermal annealing. The PL spectra of the ZnO powder exhibit very high and broad emission peaks in the green region due to crystal defects, such as oxygen vacancies and zinc ion interstitials. In contrast to the PL spectra of ZnO powder, nanocrystals of ZnO embedded into the voids of FCC packed opal matrix exhibit dominant ultraviolet (UV)-blue and rapidly decreasing green PL emissions with decreasing temperature. The temperature-dependent PL characteristics show that the green band suppression in the ZnO nanocrystals is due to the influence of photonic crystal. The infiltration of nanoparticles into synthetic opal may be used for the fabrication of polycrystalline ZnO with dominant UV-blue PL. These results indicate that the luminescent materials embedded into photonic crystal may be promising for the fabrication of the RGB pixels in full-color displays.