含有量子点的双波长LED的光谱调控

本文通过对含有高In组分量子点的双波长LED进行了模拟计算, 并对器件的能带结构、载流子浓度、复合速率和辐射光谱进行了研究. 通过对器件结构的调整与对比, 发现蓝绿双波长LED的绿光量子阱中加入高In组分量子点后可以拓宽辐射光谱, 使LED光谱具有更高的显色指数, 为实现无荧光粉的白光LED提供指导. 量子点对载流子具有很强的束缚能力, 并且载流子在量子点处具有更短的寿命, 载流子优先在量子点处复合, 量子点处所对应的黄光与量子阱润湿层所对应的绿光的比例随量子点浓度的增大而增大, 载流子浓度较低时以量子点处的黄光辐射为主, 载流子浓度变大后, 量子点复合逐渐达到饱和, 绿光辐射开始占据主导. 对间隔层厚度和间隔层掺杂浓度的调节可以很方便地调控载流子的分布, 从而实现对含有量子点的双波长LED两个活性层辐射速率的调控. 结果表明, 通过对量子点浓度、间隔层厚度、间隔层掺杂浓度的控节可以很好地实现对LED辐射光谱的调控作用. 关键词： GaN 量子点 光谱调控 双波长LED     

载流子热迁移对自组织量子点光致荧光的影响

自组织量子点光致荧光的温度依赖性研究对实现高效的量子点光电器件有着非常重要的意义,而量子点中载流子的动力学过程会对量子点光致荧光产生直接影响。采用稳态速率方程模型,在考虑了自组织量子点中载流子热迁移的情况下,模拟获得了不同温度下自组织量子点的光致荧光光谱,并着重研究了三组具有不同基态能量的量子点的光致荧光强度随温度的变化。研究表明,随着温度升高,基态能量较高的量子点光致荧光强度减弱,而基态能量较低的量子点光致荧光强度则增强,当温度达到一定值时,所有量子点的光致荧光都将发生热猝灭。     

In_(0.2)Ga_(0.8)As/GaAs单量子阱PL谱温度特性及其机制

测量了不同阱宽In0.2Ga0.8As/GaAs单量子阱的PL谱的峰值波长和荧光谱线半峰全宽随温度的变化。利用Varshni公式对实验峰值波长进行拟合,得到了新的参数。结果表明,无位错应变量子阱带隙仍具有其体材料的特性:荧光谱线半峰全宽随温度升高迅速展宽,这主要归因于声子关联作用增强和激子热离化为自由载流子所致;阱宽越窄荧光峰值能量越高,将其与量子尺寸效应的理论计算结果进行了比较。文中还考察了谱线半峰全宽和阱宽的关系,利用合金无序对这一现象进行了解释。     

低浓度掺杂的量子点粒度分布对荧光辐射谱的影响

当量子点粒度分布为高斯分布时,应用有效质量近似,在低浓度掺杂范围内,得到了量子点荧光辐射谱线形函数与量子点尺寸之间的一般关系,解释了尺寸涨落对线形展宽的影响。对II-VI族的Cd Se量子点和IV-VI族的Pb Se量子点的数值计算表明:量子点荧光谱线的半峰全宽、荧光辐射强度、峰值波长等与实验结果基本一致。量子点尺寸的粒度分布对荧光辐射谱线展宽有较大的影响。荧光辐射谱展宽是一种非均匀展宽。     

非对称双量子阱中载流子耦合的温度依赖性

非对称双量子阱中载流子动力学过程的温度依赖性研究,对于实现室温下高效的量子阱光电器件有着非常重要的意义。随着温度的升高,量子阱中的载流子被热激发到势垒层中后,部分载流子会被量子阱再俘获,即在不同的量子阱之间发生了载流子的耦合。利用耦合多量子阱载流子动力学模型,模拟了非对称双量子阱中载流子耦合的温度依赖性。研究表明,在不同温度下,各量子阱的光致荧光强度比强烈地依赖于量子阱的激活能差。光致荧光强度比的最大值与激活能差成指数关系,而其所对应的温度与激活能差成线性关系。     

GaAs间隔层厚度对InAs/GaAs量子点分子光学性质的影响

采用光致荧光发射谱(PL)和时间分辨荧光发射谱(TRPL)研究了GaAs间隔层厚度对自组装生长的双层InAs/GaAs量子点分子光学性质的影响.首先,测量低温下改变激发强度的PL谱,底层量子点和顶层量子点的PL强度比值随激发强度发生变化,表明两层量子点之间的耦合作用和层间载流子的转移随着间隔层厚度变大而变弱.接着测量改变温度的PL谱,量子点荧光光谱峰值位置(Emax)、半峰全宽及积分强度随温度发生变化,表明GaAs间隔层厚度直接影响到量子点内载流子的动力学过程和量子点发光的热淬灭过程.最后,TRPL测量发现60mL比40mL间隔层厚度样品的载流子隧穿时间有明显延长.     

自组织量子点光致荧光的温度依赖性

自组织量子点光致荧光的温度依赖性研究,对于实现室温下高效的量子点光电器件有着非常重要的意义。而量子点中的载流子动力学过程将决定其光致荧光的温度依赖性。采用稳态速率方程模型模拟了自组织量子点中载流子动力学过程,并且考虑了量子点材料带隙随温度的变化;模拟了不同温度下自组织量子点的光致荧光光谱,并获得了光谱的积分强度、峰值能量及半峰全宽随温度的变化曲线。研究表明:模拟结果与已报道的实验数据符合得很好。由此可知,所采用的模型能够很好地反映自组织量子点中的载流子动力学过程。     

CdSe/CdS/ZnS 量子点体系中的超快载流子动力学

利用飞秒泵浦探测技术对CdSe/CdS/ZnS量子点体系中的超快载流子动力学过程进行了研究. 通过选择不同波长的泵浦光分别激发样品壳层和核层,研究了载流子在壳层和核层中的超快动力学过程. 实验结果表明,载流子在CdS壳层导带中弛豫过程非常迅速(约130 fs),时间明显短于载流子在CdSe核层导带中的弛豫时间(约400 fs). 实验中也发现在CdS壳层和CdSe核层的分界面存在一定量的缺陷态.     

自组织生长InAs/GaAs量子点发光动力学研究

介绍了最新发展的粒子数混合超快光谱测量技术,以及采用该技术对自组织生长InAs/GaAs量子点发光动力学的研究结果.实验发现,自组织InAs/GaAs量子点结构的发光寿命大约为1ns,与InAs层厚度关系不大;激子寿命与温度有一定的关系,但没有明显的实验证据表明与量子点的δ态密度有关;用粒子数混合技术,实验上可直接观察到量子点中载流子在激发态能级的态填充过程. 关键词：     

核壳结构硒化镉/硫化镉/巯基乙酸量子点载流子输运特性

采用水溶液法合成了巯基乙酸(TGA) 包覆的CdSe 量子点. 通过X 射线粉末衍射和高分辨透射显微镜检测结果证实, 合成得到闪锌矿结构CdSe 量子点. 能谱图和傅里叶变换红外光谱图结果说明, 在核CdSe 纳米粒子表面与配体TGA 之间有CdS 壳层结构形成. 利用样品表面光电压(SPV) 谱, 指认CdSe 量子点精细能带结构以及各自对应的激发态特征: 475 nm (2.61 eV) 和400 nm (3.1 eV) 两个波长处的SPV 响应峰分别与CdSe 核和CdS 壳层带-带隙跃迁相对应; 370 nm (3.35 eV) 附近SPV 响应峰可能与TGA 中羰基与巯基或羧基之间发生的n →π^* 跃迁有关. 场诱导表面光电压谱结果证实, 合成的CdSe 量子点具有明显的N 型表面光伏特性, 而上述n→π^* 跃迁则具有P 型表面光伏特性. 荧光光谱谱线均匀增宽以及SPV 响应峰位蓝移, 说明样品具有明显的量子尺寸效应. 结合不同pH 值下合成的CdSe 量子点的SPV 谱和表面光声谱发现, SPV 响应强度与表面光声光谱信号强度变化趋势恰好相反. 上述样品表面光伏效应表明, CdSe 量子点表面和相界面处的精细电子结构以及光生载流子的输运特性均与量子点的尺寸大小存在某种内在联系. 关键词： 硒化镉量子点 光生载流子 表面光电压谱 表面光声光谱     

Comparison of single-layer and bilayer InAs/GaAs quantum dots with a higher InAs coverage

Epitaxially grown self-assembled InAs quantum dots (QDs) have found applications in optoelectronics. Efforts are being made to obtain efficient quantum-dot lasers operating at longer telecommunication wavelengths, specifically 1.3 μm and 1.55 μm. This requires narrow emission linewidth from the quantum dots at these wavelengths. In InAs/GaAs single layer quantum dot (SQD) structure, higher InAs monolayer coverage for the QDs gives rise to larger dots emitting at longer wavelengths but results in inhomogeneous dot-size distribution. The bilayer quantum dot (BQD) can be used as an alternative to SQDs, which can emit at longer wavelengths (1.229 μm at 8 K) with significantly narrow linewidth (∼16.7 meV). Here, we compare the properties of single layer and bilayer quantum dots grown with higher InAs monolayer coverage. In the BQD structure, only the top QD layer is covered with increased (3.2 ML) InAs monolayer coverage. The emission line width of our BQD sample is found to be insensitive towards post growth treatments.     

双层堆垛长波长InAs/GaAs量子点发光性质研究

研究了双层堆垛InAs/GaAs/InAs自组织量子点的生长和光致发光(PL)的物理性质。通过优化InAs淀积量、中间GaAs层厚度以及InAs量子点生长温度等生长条件,获得了室温光致发光1391～1438nm的高质量InAs量子点。研究发现对量子点GaAs间隔层实施原位退火、采用Sb辅助生长InGaAs盖层等方法可以增强高密度(2×1010 cm-2)InAs量子点的发光强度,减小光谱线宽,改善均匀性和红移发光波长。     

自组织InAs/GaAs量子点垂直排列生长研究

利用自组织生长InAs/GaAs量子点的垂直相关排列机制，生长了上下两层用6.5nm GaAs间隔的InAs结构.下层InAs已经成岛，由于应力传递效应，上层InAs由二维生长向三维成岛生长的转变提前发生，临界厚度从1.7ML变成小于1.5ML.透射电子显微镜截面象显示形成上下两层高度差别很大的InAs量子点，但是由于两层量子点之间存在强烈的电子耦合，光致发光谱中只有与包含大量子点的InAs层相对应的一个发光峰.     

Long-wavelength light emission from InAs quantum dots covered by GaAsSb grown on GaAs substrates

We fabricated InAs quantum dots (QDs) with a GaAsSb strain-reducing layer (SRL) on a GaAs(0 0 1) substrate. The wavelength of emission from InAs QD is shown to be controllable by changing the composition and thickness of the SRL. An increase in photoluminescence intensity with increasing compositions of Sb and thickness of the GaAsSb SRL is also seen. The efficiency of radiative recombination was improved under both conditions because the InAs/GaAsSb/GaAs hetero-interface band structure more effectively suppressed carrier escape from the InAs QDs.     

Bandgap engineering of self-assembled InAs quantum dots with a thin AlAs barrier

We investigate the effects of a thin AlAs layer with different position and thickness on the optical properties of InAs quantum dots (QDs) by using transmission electron microscopy and photoluminescence (PL). The energy level shift of InAs QD samples is observed by introducing the thin AlAs layer without any significant loss of the QD qualities. The emission peak from InAs QDs directly grown on the 4 monolayer (ML) AlAs layer is blueshifted from that of reference sample by 219 meV with a little increase in FWHM from 42–47 meV for ground state. In contrast, InAs QDs grown under the 4 ML AlAs layer have PL peak a little redshifted to lower energy by 17 meV. This result is related to the interdiffusion of Al atom at the InAs QDs caused by the annealing effect during growing of InAs QDs on AlAs layer.     

EFFECT OF DOPANT ON THE UNIFORMITY OF InAs SELF-ORGANIZED QUANTUM DOTS

Low-temperature photoluminescence studies have been performed on Si-doped and Bedoped self-organized InAs/GaAs quantum dot(QD) samples to investigate the effect of doping. When Si or Be is doped into the sample,a remarkable decrease in line-width is observed. We relate this phenomenon to a model that takes the Si or Be atoms as the nucleation centers for the formation of QDs. When Si or Be is doped, more smalll uniform quantum dots are formed. The result will be of significance for the application of self-organized InAs quantum dots in semiconductor devices.     

A two-dimensional electron gas as a sensitive detector to observe the charge carrier dynamics of self-assembled QDs

The carrier tunneling dynamics of self-assembled InAs quantum dots (QD) is studied using a time-resolved conductance measurement of a nearby two-dimensional electron gas (2DEG). The investigated heterostructures consist of a layer of QDs with different coupling strengths to a 2DEG, adjusted by different thicknesses of the spacer layers. We demonstrate a strong influence of charged QDs on the conductance of the 2DEG, even for very weak coupling between the QD layer and the 2D system, where standard capacitance (C)–voltage (V) spectroscopy is unsuitable to investigate the electronic structure of these QDs.     

Electronic structure of asymmetric vertically coupled InAs/GaAs quantum dots

In this paper, the electronic structure of an asymmetric self-assembled vertically coupled quantum dots heterostructure has been investigated. The structure consists of two ellipsoidal quantum dot (QDs) caps made with InAs embedded in a wetting layer InAs and surrounded by GaAs. Using the strain dependent k·p theory, the energy of the two lowest states of a single electron/hole which is confined within the coupled QD structure has been calculated. As a result, it can be estimated the energy gap for different geometry parameters and for tuning the external magnetic field. The numerical results show that the energy gap is very sensitive to the size asymmetry of the structure and to the small separation distance of the dots but less sensitive to the existence of an external magnetic field and large interdot distance.     

Reasons of emission inhomogeneity in InAs quantum dot structures

The photoluminescence (PL) inhomogeneity has been studied in InAs quantum dots (QDs) embedded in the symmetric In_0.15Ga_0.85As/GaAs quantum wells (QWs) with QDs grown at different temperatures. It was shown that three reasons are responsible for the emission inhomogeneity in studied QD structures: (i) the high concentration of nonradiative recombination centers in the capping In_0.15Ga_0.85As layer at low QD growth temperatures, (ii) the QD density and size distributions for the structure with QD grown at 510 ^°C, (iii) the high concentration of nonradiative recombination centers in the GaAs barrier at higher QD growth temperatures.     

Photoluminescence of InAs quantum dots embedded in graded InGaAs barriers

The effects of the top barrier and the dot density on photoluminescence (PL) of the InAs quantum dots (QDs) sandwiched by the graded In_xGa_1−xAs barriers grown by metal-organic vapor phase epitaxy (MOVPE) have been studied. Two emission peaks corresponding to the ground state and the 1st excited state transitions of the QD structures have been observed, which matches well to the theoretical calculation. The PL emission linewidth and intensity of the InAs QDs structure are improved by reducing the Indium/Gallium composition variation of the graded In_xGa_1−xAs top barrier layer of the structure. The QDs’ ground states filling excitation power depends on the crystal quality of the InGaAs barrier layer and the QD density. The extracted thermal activation energy for the QDs’ PL emission is sensitive to the QD size.